JP2616516B2 - Harmful component heating purification device and purification method - Google Patents

Harmful component heating purification device and purification method

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Publication number
JP2616516B2
JP2616516B2 JP3156472A JP15647291A JP2616516B2 JP 2616516 B2 JP2616516 B2 JP 2616516B2 JP 3156472 A JP3156472 A JP 3156472A JP 15647291 A JP15647291 A JP 15647291A JP 2616516 B2 JP2616516 B2 JP 2616516B2
Authority
JP
Japan
Prior art keywords
gas
heat storage
chamber
storage layer
catalyst
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3156472A
Other languages
Japanese (ja)
Other versions
JPH054026A (en
Inventor
彰 橋本
順二郎 粟野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP3156472A priority Critical patent/JP2616516B2/en
Publication of JPH054026A publication Critical patent/JPH054026A/en
Application granted granted Critical
Publication of JP2616516B2 publication Critical patent/JP2616516B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、各種排ガス中に混入し
たCO(一酸化炭素)、HC(炭化水素)等の悪臭成分
や有害成分、細菌、ダニ等を適正温度に加熱し酸化浄
化、死滅する加熱浄化装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an oxidative purification by heating odorous components such as CO (carbon monoxide) and HC (hydrocarbon) and harmful components, bacteria, ticks and the like mixed in various exhaust gases to an appropriate temperature. The present invention relates to a heat purifying device that is extinct.

【0002】[0002]

【従来の技術】近年、各種の燃焼機や乾燥、熱処理時に
発生するCOやHC成分は、その有害性や臭気のため浄
化し排出することが必要不可欠なものになっている。
バンド機や樹脂、ビニール等の融着時に有害ガスが発生
し、その浄化が求められている。また生活環境の中で
は、タバコの煙や細菌、ダニ等の浄化も必要となってい
る。COやHC成分の浄化や細菌、ダニ等の死滅方法と
しては、有害成分を含んだガス自身を加熱しガス中の酸
素と反応させる方法が最も浄化効率が高く信頼性も高
い。ガスの温度を上げ空気中の酸素がCOやHCと反応
するには、800〜900℃以上の温度が必要になる。
酸化触媒を用いる方法では200〜400℃の温度範囲
で反応を進める事ができ熱エネルギーの無駄を省くこと
ができる。
In recent years, various combustor and drying, CO and HC components generated during the heat treatment is adapted to what is essential to discharge to purify because of its hazardous properties and odor.
A harmful gas is generated at the time of fusing a band machine, resin, vinyl, or the like, and purification thereof is required. In the living environment, it is also necessary to purify tobacco smoke, bacteria, mites and the like. As a method of purifying CO and HC components and killing bacteria and mites, a method of heating a gas containing a harmful component and reacting it with oxygen in the gas has the highest purification efficiency and high reliability. In order to raise the temperature of the gas and allow oxygen in the air to react with CO and HC, a temperature of 800 to 900 ° C or higher is required.
In the method using an oxidation catalyst, the reaction can proceed in a temperature range of 200 to 400 ° C., and waste of heat energy can be reduced.

【0003】以下、従来の加熱による有害成分浄化装置
について説明する。図3は、従来の触媒加熱浄化装置の
一例で、(a)は触媒浄化装置本体、(b)は熱交換も
含めたシステムを示す。図中、25は触媒浄化装置本
体、27は熱交換、22は加熱装置、23は触媒を示
す。(a)で有害成分を含んだガスは20の入口から触
媒加熱装置本体に導入され、22の加熱装置により所定
の温度に昇温され、23の触媒によりCO、HC等が酸
化浄化され、24の出口から排出される。この時ガスの
昇温に要したエネルギーはガスと一緒に排出される事に
なる。このエネルギーの一部を回収する目的で熱交換
を用いたシステムが(b)である。この場合26から導
入され27の熱交換で昇温されたガスは、矢印に沿っ
て流れ、25の触媒浄化装置本体に進む。ここで加熱浄
化されたガスは、再び27の熱交換に入り冷却され2
8から排出する。すなわちガスの昇温に要したエネルギ
ーの一部を回収しエネルギーロスを少なくしようとする
ものである。
Hereinafter, a conventional apparatus for purifying harmful components by heating will be described. 3A and 3B show an example of a conventional catalyst heating and purifying apparatus. FIG. 3A shows a catalyst purifying apparatus main body, and FIG. 3B shows a system including heat exchange. In the figure, 25 is a catalyst purifying apparatus main body, 27 a heat exchanger, 22 is a heating apparatus, 23 denotes the catalyst. In (a), the gas containing harmful components is introduced into the main body of the catalyst heating device from the inlet of 20, the temperature is raised to a predetermined temperature by the heating device of 22, CO, HC, etc. are oxidized and purified by the catalyst of 23, and 24 Is discharged from the exit. At this time, the energy required to raise the temperature of the gas is discharged together with the gas. System using a heat exchanger <br/> the purpose of recovering some of this energy is (b). In this case introduced from 26 gas that is heated by the heat exchanger 27 flows along the arrows, the flow proceeds to 25 catalytic purifier body. Here heated purified gas is cooled again enters 27 the heat exchanger 2
Discharge from 8. In other words, part of the energy required to raise the temperature of the gas is recovered to reduce energy loss
Things .

【0004】一方これに対し図4は、蓄熱体を用いた加
熱浄化装置の例で、(a)の状態と(b)の状態を交互
に繰り返す事により熱エネルギーの削減をはかったもの
である。6が蓄熱体、10が加熱装置である。29,3
0は有害成分を含んだガスの流れを制御するダンパーを
示す。(a)でガスは1の流入口から3の矢印のように
進み27の入口から下部の蓄熱体を通過する。そして1
0の加熱装置により加熱、浄化され上部の蓄熱体で冷却
されて28の出口から11の流出口へ進む。次に一定時
間後(b)のようなガスの流れになるようにダンパー2
9,30をそれぞれ操作する。すなわち(a)で加熱浄
化されたガスから熱を奪った上部の蓄熱体が今度はガス
に熱を与えるように働き、ガスを加熱するエネルギーの
一部または大部分を補うように働く。すなわちこの浄化
装置内で熱が往復し省エネルギーとなる。触媒を用いる
場合は上下の蓄熱体層の間に置くことができる。
[0004] On the other hand, FIG. 4 shows an example of a heating and purifying apparatus using a heat accumulator, in which heat energy is reduced by alternately repeating the states (a) and (b). . 6 is a heat storage body, 10 is a heating device. 29,3
0 indicates a damper for controlling the flow of gas containing harmful components. In (a), the gas advances from the inlet 1 as shown by the arrow 3 and passes through the lower heat storage from the inlet 27. And one
Heated and purified by the heating device 0, cooled by the upper heat storage body, and then proceeded from the outlet 28 to the outlet 11. Next, the damper 2 is moved so that the gas flows as shown in FIG.
Operate 9, 30 respectively. In other words, the upper heat storage element that has taken heat from the gas purified by heating in (a) works to give heat to the gas, and works to supplement part or most of the energy for heating the gas. That is, heat is reciprocated in the purifying device to save energy. When a catalyst is used, it can be placed between the upper and lower heat storage layers.

【0005】[0005]

【発明が解決しようとする課題】しかしながら上記(図
3)で示す従来例1の構成で用いられる熱交換27
は、通常伝導率のよい薄肉のアルミニウムが主体となっ
ており熱交換効率は50〜60%が限界である。またS
OxやNOx等の腐食性のガスを含んだ排ガスに対して
はアルミニウムが腐食するため使用できなかった。(図
4)に示す従来例2では耐食性の蓄熱体を用いる事によ
り従来例1の欠点を解消できるものであるが蓄熱体や加
熱装置の側壁からの放熱やダンパー等の構成が複雑であ
ったりする欠点があった。また浄化装置内部でガスの流
れを切り替えるとき、ガスの出入口や風上側の蓄熱体層
に溜まったガスが浄化されないまま排出される構成であ
った。
[SUMMARY OF THE INVENTION However the heat exchanger used in the configuration of the conventional example 1 shown in (Fig. 3) 27
Is usually mainly made of thin aluminum having good conductivity, and the heat exchange efficiency is limited to 50 to 60%. Also S
Exhaust gas containing corrosive gas such as Ox and NOx could not be used because aluminum corroded. In the conventional example 2 shown in FIG. 4, the disadvantage of the conventional example 1 can be solved by using the corrosion-resistant heat storage body, but the structure of the heat storage body, the heat radiation from the side wall of the heating device, the damper, and the like are complicated. There was a drawback to do. Further, when the flow of gas is switched inside the purifier, the gas accumulated in the gas inlet / outlet and the heat storage layer on the windward side is discharged without being purified.

【0006】本発明は、上記従来例2の問題点を解決す
るもので、放熱によるロスを最小限に抑えるとともにダ
ンパーの構造等を簡素化し、未浄化のまま有害成分が排
出される事がない有害成分浄化装置を提供することを目
的としている。
The present invention solves the above-mentioned problem of the conventional example 2, in which the loss due to heat radiation is minimized, the structure of the damper is simplified, and no harmful components are discharged without being purified. It is intended to provide a harmful component purifying apparatus.

【0007】[0007]

【課題を解決するための手段】上記の目的を達成するた
めに本発明の有害成分浄化装置は、本体の一端が開口し
他端が閉じた構造であり、閉じられた部分で互いに連通
した2室を有し、2室 を分割壁を介して対称位置に、そ
れぞれの室の開口部側に蓄熱体層を配置し、閉じられた
側に加熱装置および触媒を配置するとともに、それぞれ
の室の開口部が同一面上に配置され1つの駆動系で制御
されるスライドダンパーを介して、それぞれの室がガス
の流入流路および流出流路、外気雰囲気のいずれかと連
通できる構成を有している。
In order to achieve the above object, a harmful component purifying apparatus of the present invention has a structure in which one end of a main body is open and the other end is closed, and the two parts communicate with each other at a closed portion. The two chambers are arranged symmetrically via a dividing wall , the heat storage layer is arranged on the opening side of each chamber, and the heating device and the catalyst are arranged on the closed side. Openings are arranged on the same plane, and each chamber has a configuration that can communicate with any one of a gas inflow channel and an outflow channel and the outside atmosphere via a slide damper controlled by one drive system. .

【0008】[0008]

【作用】この構成による有害成分を含んだガスの浄化に
ついて説明する。この浄化装置本体の2室は同一面上に
配置した開口部でそれぞれガスの流出流路、流入流路ま
たは外気雰囲気の一方とのみ連通した状態で作動する。
まず1のパターンとして有害成分を含んだガスは流入流
路から一方の室に流入し蓄熱体及び加熱装置、触媒によ
り加熱浄化されもう一方の室の蓄熱体層で冷却されガス
流出流路に排出される。この時ガスの冷却側で使われる
蓄熱体層は、ガスから熱を奪い蓄熱する。
The operation of this embodiment for purifying gas containing harmful components will be described. The two chambers of the purifier main body are operated in a state of being communicated with only one of a gas outflow channel, an inflow channel and an outside air atmosphere at openings arranged on the same plane.
First, as one pattern, gas containing harmful components flows into one chamber from the inflow channel, is heated and purified by the heat storage unit, the heating device, and the catalyst, is cooled by the heat storage layer in the other room, and is discharged to the gas outflow channel. Is done. At this time, the heat storage layer used on the gas cooling side deprives the gas of heat and stores heat.

【0009】2のパターンは、1つの駆動系で動作する
スライドダンパーによりガスの流入流路と連通していた
室の開口部を外気雰囲気と連通するように切り替える。
流出流路と連通している側は、そのまま連通している状
態を維持することでガスの代わりに外気が導入され浄化
装置本体内部をいままでと同じ方向に流れ蓄熱体、加熱
装置、触媒を経てもう一方の室の蓄熱体層で冷却されガ
ス流出流路に排出される。すなわちガスの入り口付近や
蓄熱体層中の未浄化の有害成分が外気により加熱装置、
触媒に追いやられ、浄化される。
The second pattern operates with one drive system.
The opening of the chamber that has been in communication with the gas inflow passage by the slide damper is switched to communicate with the outside air atmosphere.
On the side that is in communication with the outflow channel, the outside air is introduced instead of gas by maintaining the state of communication with the outflow channel, and flows through the inside of the purification device body in the same direction as before, and the heat storage element, heating device, and catalyst are removed. After that, it is cooled by the heat storage layer of the other chamber and discharged to the gas outflow passage. That is, unpurified harmful components near the gas inlet and in the heat storage layer are heated by the outside air,
Purified by catalyst.

【0010】3のパターンは、同様にスライドダンパー
を操作し浄化装置本体内のガスの流れがそれぞれの室で
1のパターンと逆転するように切り替える。有害成分を
含んだガスは、1のパターンとは反対の室から浄化装置
本体内部に入り、その室の蓄熱体層を通過する。この蓄
熱体層は1のパターンのとき熱を蓄えているのでこのパ
ターンではガスに熱を与えるように働く。ガスは加熱装
置によってさらに加熱され浄化される。そしてもう一方
の室の蓄熱体層によって冷却され、排出される。
In the third pattern, the slide damper is similarly operated to switch the gas flow in the purifier body so that the gas flow in each chamber is reversed from the first pattern. The gas containing the harmful component enters the inside of the purification device main body from the room opposite to the first pattern, and passes through the heat storage layer in that room. Since the heat storage layer stores heat in the case of the first pattern, the heat storage layer functions to apply heat to the gas in this pattern. The gas is further heated and purified by the heating device. Then, it is cooled and discharged by the heat storage layer in the other chamber.

【0011】最後の4のパターンは、2のパターンと同
様にスライドダンパーによりガスの流入流路と連通して
いた室の開口部を外気雰囲気と連通するように切り替
え、外気がこの室から導入され、蓄熱体層、加熱装置、
触媒を経てもう一方の室の蓄熱体層で冷却され、ガス流
出流路に排出されることで、ガスの入り口付近や蓄熱体
層中の未浄化の有害成分を外気により加熱装置、触媒に
追いやり浄化する。
In the last pattern (4), similarly to the pattern (2), the opening of the chamber which has been in communication with the gas inflow passage by the slide damper is switched so as to communicate with the outside air atmosphere, and the outside air is introduced from this chamber. , Heat storage layer, heating device,
After passing through the catalyst, it is cooled by the heat storage layer in the other chamber, and is discharged into the gas outflow passage, so that unpurified harmful components near the gas inlet and in the heat storage layer are driven by external air to the heating device and the catalyst. Purify.

【0012】以上の4つのパターンを一定時間毎に繰り
返す事は、1つのスライドダンパーを操作することによ
って有害成分を含んだガスが浄化に必要な温度まで加温
されるための熱エネルギーを加熱浄化装置本体の内部で
閉じこめる事ができ、またガスの流れの切り替え時に未
浄化の有害成分が排出される事がなく、蓄熱体や加熱装
置からの放熱も最外壁からの放熱のみであるため、エネ
ルギー効率および浄化効率の高い有害成分浄化装置であ
る事がわかる。
Repetition of the above four patterns at regular time intervals is achieved by operating one slide damper to heat and purify heat energy required to heat a gas containing harmful components to a temperature required for purification. Since it can be trapped inside the device body, no unpurified harmful components are discharged when the gas flow is switched, and heat is only released from the outermost wall, heat is only released from the heat storage unit and the heating device. It can be seen that the harmful component purifying device has high efficiency and purification efficiency.

【0013】[0013]

【実施例】(実施例1) 以下本発明の一実施例について、図面を参照しながら説
明する。
(Embodiment 1) An embodiment of the present invention will be described below with reference to the drawings.

【0014】図1(a)において、1は有害成分を含ん
だガスの流入口、2はその流入流路、11はガスの流出
口を示す。7は触媒浄化装置本体、6は蓄熱体層、10
は加熱装置、9は触媒を示す。(b)は(a)のA−B
線の断面図を示す。左右の2室の開口部は31の同一面
上にあり1つの駆動系で制御できる12のスライド部お
よび13の本体部からなるスライドダンパーで流入流
路、流出流路または外気雰囲気と連通する(それぞれ
5,4,33で示した)。図1(b)は装置の下方が閉
じられた一端を示し、8の分割壁で分けられた左右の2
室がここで連通している。排ガスの流れは矢印3で示し
た。34は開いた開口部を示す。この図1(a)および
(b)の状態を説明する。有害成分を含んだガスは
(a)の1から入り左に進み矢印から34の開口部を通
過して加熱浄化装置本体に導入される。そして(b)の
矢印で示したようにガスは流れる。この時左の室の蓄熱
体層6によりガスは加熱され、触媒を通過して下部の加
熱装置10により更に必要な温度まで加熱され右の室の
触媒によって浄化される。そして右の室の蓄熱体層6で
熱交換し、冷却された状態で開口部34から流出流路1
1に排出される。(c)および(c)のA−B線に沿っ
た断面図(d)は、(a)および(b)の状態から一定
時間後スライドダンパーの操作により外気が左側の室に
導入される状態を示した。この操作によって左側の室に
は未浄化の有害成分が無い状態をつくり出す事ができ
る。
In FIG. 1A, reference numeral 1 denotes an inlet of a gas containing a harmful component, 2 denotes an inflow passage thereof, and 11 denotes an outlet of a gas. 7 is a catalyst purification device main body, 6 is a heat storage layer, 10
Denotes a heating device, and 9 denotes a catalyst. (B) is AB of (a)
FIG. The openings of the two chambers on the left and right are on the same plane 31 and can be controlled by one drive system, and are connected to the inflow channel, the outflow channel or the outside atmosphere by slide dampers composed of 12 slide sections and 13 main body section ( (Indicated by 5, 4, 33, respectively)). FIG. 1 (b) shows one end in which the lower part of the device is closed, and two right and left sides divided by eight dividing walls.
The rooms communicate here. The flow of the exhaust gas is indicated by arrow 3. Reference numeral 34 denotes an open opening. The states shown in FIGS. 1A and 1B will be described. The gas containing the harmful component enters from 1 in (a), proceeds to the left, passes through the opening at 34 from the arrow, and is introduced into the heating and purification apparatus main body. Then, the gas flows as indicated by the arrow in FIG. At this time, the gas is heated by the heat storage layer 6 in the left chamber, passes through the catalyst, is further heated to a required temperature by the lower heating device 10, and is purified by the catalyst in the right chamber. Then, heat is exchanged in the heat storage layer 6 in the right chamber, and the flow path 1
It is discharged to 1. (C) and (d) are cross-sectional views taken along line AB in (c), showing a state in which outside air is introduced into the left chamber by operating the slide damper after a certain period of time from the states of (a) and (b). showed that. By this operation, a state where there is no unpurified harmful component in the left chamber can be created.

【0015】次にスライドダンパーを操作し(e)およ
び(f)の状態になるようにし、再びガスを流す。
Next, the slide damper is operated so as to be in the state of (e) and (f), and gas is flowed again.

【0016】この時はガスは(e)で流入流路を右に流
れ、(f)の右の室を上から下へ流れて左の室に移り、
下から上へ流れて流出流路に排出される。右室の蓄熱体
層は(b)及び(d)の状態の時に十分熱エネルギーを
蓄熱しており、(f)の状態ではガスを熱交換によって
加熱する働きをする。(g)および(h)は、(e)お
よび(f)の状態から一定時間後スライドダンパーの操
作により外気が右側の室に導入される状態を示した。
(c),(d)と同様にこの操作によって右側の室には
未浄化の有害成分がない状態を作り出すことができる。
以上の4つのパターンを繰り返すことは、1つのスライ
ドダンパーを操作することにより熱エネルギーは加熱浄
化装置内に閉じ込められ、ロスする量が非常に少なく、
また有害成分が未浄化のまま排出されることがないこと
を意味する。図2に本実施例のスライドダンパーについ
て示した。(a)がスライドダンパーのスライド部分1
2を示し、(b)がスライドダンパーの本体部13を示
す。14はスライド部の開口、16はガスの流入流路、
17は外気雰囲気、18はガスの流出流路と連通してい
る。図2の(c)の状態は図1の(a)(b)の状態に
相当する。浄化装置本体の左の室の開口部がガスの流入
流路と連通し、右の室がガスの流出流路と連通してい
る。図2の(d)・(e)・(f)がそれぞれ図1の
(c)(d)・(e)(f)・(g)(h)の状態に相
当する。すなわちスライドダンパーのスライド部を1つ
の駆動系で操作することによって、浄化装置本体内部で
ガスの流れを逆転でき、しかも外気を導入するパターン
を組み入れる事ができて未浄化のガスが排出される事が
ない。
At this time, the gas flows to the right in the inflow channel at (e), flows from the top to the bottom at the right chamber in (f), and moves to the left chamber.
It flows upward from below and is discharged to the outflow channel. The heat storage layer in the right chamber sufficiently stores heat energy in the states (b) and (d), and functions to heat the gas by heat exchange in the state (f). (G) and (h) show a state in which outside air is introduced into the right chamber by operating the slide damper after a certain period of time from the states of (e) and (f).
As in (c) and (d), this operation can create a state in which there is no unpurified harmful component in the right chamber.
By repeating the above four patterns, the heat energy is confined in the heating and purifying device by operating one slide damper, and the loss amount is very small.
It also means that harmful components are not discharged without purification. FIG. 2 shows the slide damper of this embodiment. (A) is the slide part 1 of the slide damper
2 and (b) shows the main body 13 of the slide damper. 14 is an opening of the slide portion, 16 is a gas inflow channel,
Reference numeral 17 denotes an outside air atmosphere, and reference numeral 18 denotes a gas outflow passage. The state shown in FIG. 2C corresponds to the state shown in FIGS. The opening of the left chamber of the purifier main body communicates with the gas inflow channel, and the right chamber communicates with the gas outflow channel. (D), (e), and (f) in FIG. 2 correspond to the states of (c), (d), (e), (f), (g), and (h) in FIG. 1, respectively. That is, by operating the slide portion of the slide damper with one drive system, the gas flow can be reversed inside the purification device main body, and a pattern for introducing outside air can be incorporated to discharge unpurified gas. There is no.

【0017】本実施例における有害成分の浄化効果と熱
効率を測定した結果を(表1)に示す。
Table 1 shows the results of measuring the effect of purifying harmful components and the thermal efficiency in this example.

【0018】[0018]

【表1】 [Table 1]

【0019】加熱浄化装置は、蓄熱体としてそれぞれの
室に粒状アルミナ(5〜10mmφ)のものは5リット
ル、触媒はハニカム状の白金触媒をそれぞれ1リット
ル、加熱装置はmax1kwのシーズーヒーターを用い60
0℃で温度調節を行った。ガスは100ppmのスチレン
ガスを含み、送風量500リットル/minとした。ガス
の浄化率はスチレンガスの触媒による分解率で示し、熱
効率は簡易的に排ガスが600℃まで昇温されたとして
600℃への昇温温度に対して出口温度と入口温度の差
を比較して算出した。外気導入時間は、2秒間とした。
The heating and purifying apparatus uses 5 liters of granular alumina (5 to 10 mmφ) as a heat storage body in each chamber, a catalyst of 1 liter of a platinum catalyst in a honeycomb form, and a heating apparatus using a Shizu heater of 1 kw max.
The temperature was adjusted at 0 ° C. The gas contained 100 ppm of styrene gas, and the blowing rate was 500 liter / min. The gas purification rate is indicated by the decomposition rate of styrene gas by the catalyst, and the thermal efficiency is calculated by simply comparing the difference between the outlet temperature and the inlet temperature with respect to the temperature rise to 600 ° C assuming that the exhaust gas is heated to 600 ° C. Was calculated. The outside air introduction time was 2 seconds.

【0020】この(表1)から明らかなように、本実施
例による加熱浄化装置は、90%以上のスチレンガス排
ガスの浄化を80%以上の熱交換効率で達成することが
できている。
As is clear from Table 1, the heating and purifying apparatus according to the present embodiment can achieve purification of styrene gas exhaust gas of 90% or more with heat exchange efficiency of 80% or more.

【0021】また本実施例では、蓄熱材としてアルミナ
を用いており耐腐食性に優れているため排ガス中に金属
を腐食するような成分(たとえば酸性ガス等)が含まれ
ていても十分使用に耐える。
Further, in this embodiment, alumina is used as a heat storage material and has excellent corrosion resistance. Therefore, even if a component (for example, acid gas or the like) that corrodes metal is contained in exhaust gas, it can be used sufficiently. Endure.

【0022】[0022]

【発明の効果】以上のように、本発明は浄化装置本体が
蓄熱体層を有した2室に別れ、開口する一端が同一面上
で1つの駆動系で制御できるスライドダンパーによっ
て、ガスの流入流路、流出流路または外気雰囲気とそれ
ぞれ相反して連通できる構造を有するとともに、閉じら
れた他端部分で互いに連通し加熱装置、触媒が設けられ
た構造で、1室の開口部から導入されたガスは、蓄熱体
層から熱エネルギーを供給されて、加熱装置、触媒で有
害成分を浄化された後、もう一方の室の蓄熱体層で熱交
換し冷却されて開口部からの流出流路に排出される。一
定時間の後スライドダンパーのスライドを移動させる事
により外気を導入する過程を経てガスの流れ方向を逆転
することができ、それぞれの室の蓄熱体層が逆の熱交換
作用を行うようにする。この操作を交互に繰り返すこと
により熱エネルギーのロスを最小限に抑え、かつ排ガス
中の有害成分をショートパスすることなく効率よく浄化
することができる有害成分加熱浄化装置を実現するもの
である。
As is evident from the foregoing description, the present invention is divided into two chambers that purification apparatus body having a heat storage layer, by a slide damper having one end which opening can be controlled by a single drive system on the same plane, the flow of gas It has a structure that can communicate with the flow path, the outflow flow path, or the outside air atmosphere, respectively, and has a heating device and a catalyst that communicate with each other at the closed other end portion. The heated gas is supplied with heat energy from the heat storage layer, and after purifying harmful components with a heating device and a catalyst, heat is exchanged in the heat storage layer of the other chamber and cooled, and the gas flows out of the opening. Is discharged. By moving the slide of the slide damper after a certain period of time, the flow direction of the gas can be reversed through the process of introducing outside air, so that the heat storage layers in the respective chambers perform the reverse heat exchange action. By repeating this operation alternately, it is possible to realize a harmful component heating and purifying apparatus capable of minimizing the loss of heat energy and efficiently purifying harmful components in exhaust gas without short-passing.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)本発明の第1の実施例における有害成分
加熱浄化装置の全体構成を示す図 (b)(a)のA−B線に沿った断面図 (c),(e),(g)はスライドダンパーの操作によ
って(a)のガスの流れを変化させた状態を示す図 (d),(f),(h)はそれぞれ(c),(e),
(g)のA−B線に沿った断面図
FIG. 1 (a) is a diagram showing the entire configuration of a harmful component heating / purifying apparatus according to a first embodiment of the present invention. FIG. 1 (b) is a cross-sectional view taken along line AB in FIG. 1 (a). , (G) show the state of changing the gas flow of (a) by operating the slide damper. (D), (f), (h) show (c), (e),
Sectional view along line AB in (g).

【図2】(a)本発明の同一面上に配置されたスライド
ダンパーのスライド部を示す図 (b)スライドダンパーの本体部を示す図 (c),(d),(e),(f)はスライドダンパーと
本体部の重なりによる開口部の状態を示す図
2 (a) illustrates a main portion of FIG. (B) a slide damper showing a sliding portion of the slide <br/> damper disposed on the same surface of the present invention (c), (d), (e (F) shows the state of the opening due to the overlap between the slide damper and the main body.

【図3】(a)従来の触媒浄化装置本体の構成を示す図 (b)熱交換機も含めた従来の触媒浄化システム全体の
構成を示す図
FIG. 3 (a) is a diagram showing a configuration of a conventional catalyst purification device main body. (B) is a diagram showing a configuration of an entire conventional catalyst purification system including a heat exchanger.

【図4】(a)従来の蓄熱型浄化装置本体の構成を示す
図 (b)排ガスの流れを逆転した状態を示す図
FIG. 4A is a diagram showing a configuration of a conventional thermal storage purifying device main body. FIG. 4B is a diagram showing a state in which the flow of exhaust gas is reversed.

【符号の説明】[Explanation of symbols]

6 蓄熱体層 9 触媒 10 加熱装置 12 スライドダンパーのスライド部 13 スライドダンパーの本体部 31 同一面上に配置された開口部Reference Signs List 6 heat storage layer 9 catalyst 10 heating device 12 slide portion of slide damper 13 body portion of slide damper 31 opening portion arranged on the same surface

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 一端が開口し端が閉じているとともに
その部分で互いに連通した2室に分けられた本体を有
し、2室を分割する分割壁を介して対称位置に、それぞ
れの室の開口部側に蓄熱体層を配置し、閉じられた側に
加熱装置と触媒を配置するとともに、それぞれの室が開
口部を同一面上に配置され、その開口部に相当する位置
にスライド部の開口を有し1つの駆動系で制御できるス
ライドダンパーにより有害成分を含んだガスの流入流
路、浄化されたガスの流出流路または外気雰囲気と連通
してなる有害成分加熱浄化装置。
1. A one has a body which is divided into two chambers communicating with each other at the portion with the closed open other end, the symmetrical position via a dividing wall which divides the two chambers, each chamber The heat storage layer is arranged on the side of the opening, the heating device and the catalyst are arranged on the closed side, and the respective chambers are arranged with the opening on the same plane, and the position corresponding to the opening
With a slide section opening that can be controlled by one drive system .
The ride damper communicates with the inflow passage of gas containing harmful components, the outflow passage of purified gas or the outside atmosphere
A harmful component heating and purifying device.
【請求項2】 請求項1の有害成分加熱浄化装置におい
て、次のパターンで浄化操作を交互に繰り返す浄化方
法。 1パターン……有害成分を含んだガスは流入流路から一
方の室に流入し蓄熱体及び加熱装置、触媒により加熱浄
化されもう一方の室の蓄熱体層で冷却されガス流出流路
に排出される。 2パターン……1つの駆動系で動作するスライドダンパ
ーによりガスの流入流路と連通していた室の開口部を外
気雰囲気と連通するように切り替え、外気がこの室に導
入され蓄熱体層、加熱装置、触媒を経て一方の室の蓄熱
体層で冷却されガス流出流路に排出される。 3パターン……スライドダンパーにより浄化装置本体内
のガスの流れがそれぞれの室で前記1パターンと逆転す
るように切り替え、有害成分は加熱、浄化、冷却過程を
経て排出される。 4パターン……スライドダンパーによりガスの流入流路
と連通していた室の開口部を外気雰囲気と連通するよう
に切り替え外気がこの室に導入され、蓄熱体層、加熱装
置、触媒を経てもう一方の室の蓄熱体層で冷却されガス
流出流路に排出される。
2. The harmful component heating and purifying apparatus according to claim 1.
Cleaning method that repeats the cleaning operation alternately in the following pattern
Law. One pattern: A gas containing harmful components flows into one chamber from an inflow channel, is heated and purified by a heat storage unit, a heating device, and a catalyst, is cooled by a heat storage layer in the other room, and is discharged to a gas outflow channel. You. Two patterns: The opening of the chamber that has been in communication with the gas inflow passage is switched to be in communication with the outside air atmosphere by the slide damper that operates with one drive system, and the outside air is introduced into this chamber. After passing through the heat storage layer, the heating device, and the catalyst, it is cooled by the heat storage layer in one chamber and discharged to the gas outflow passage. The three patterns are switched by the slide damper so that the gas flow in the purifier main body is reversed in the respective chambers in the respective chambers, and the harmful components are discharged through heating, purification and cooling processes. Four patterns: The opening of the chamber, which had been in communication with the gas inflow passage by the slide damper, was switched so as to communicate with the outside air atmosphere. The outside air was introduced into this chamber, and the other passed through the heat storage layer, the heating device, and the catalyst. Is cooled by the heat storage layer in the chamber and discharged to the gas outflow passage.
JP3156472A 1991-06-27 1991-06-27 Harmful component heating purification device and purification method Expired - Lifetime JP2616516B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3156472A JP2616516B2 (en) 1991-06-27 1991-06-27 Harmful component heating purification device and purification method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3156472A JP2616516B2 (en) 1991-06-27 1991-06-27 Harmful component heating purification device and purification method

Publications (2)

Publication Number Publication Date
JPH054026A JPH054026A (en) 1993-01-14
JP2616516B2 true JP2616516B2 (en) 1997-06-04

Family

ID=15628502

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2616516B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3662650B2 (en) * 1995-03-17 2005-06-22 農工大ティー・エル・オー株式会社 Catalyst structure and gas combustion decomposition apparatus using the same
JP3679187B2 (en) * 1996-03-29 2005-08-03 株式会社キャタラー Thermal storage exhaust gas purification system
DE19716877C1 (en) * 1997-04-22 1998-12-10 Schedler Johannes Thermally-efficient incinerator plant for cost-effective destruction of volatile organic compounds contaminating air
JP5041781B2 (en) * 2006-10-24 2012-10-03 Jx日鉱日石エネルギー株式会社 Method and fuel cell system for reducing carbon monoxide concentration
KR101154855B1 (en) * 2010-03-11 2012-06-18 주식회사 이엠따블유에너지 Air purification module
JP2016121859A (en) * 2014-12-25 2016-07-07 株式会社島川製作所 Harmful component heating and purifying device
JP6814494B1 (en) * 2020-03-06 2021-01-20 株式会社島川製作所 Hazardous component heating purification device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5249424B2 (en) * 1973-01-20 1977-12-17

Also Published As

Publication number Publication date
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