JP2612085B2 - Cleaning device and cleaning method for gas laser device - Google Patents
Cleaning device and cleaning method for gas laser deviceInfo
- Publication number
- JP2612085B2 JP2612085B2 JP2123043A JP12304390A JP2612085B2 JP 2612085 B2 JP2612085 B2 JP 2612085B2 JP 2123043 A JP2123043 A JP 2123043A JP 12304390 A JP12304390 A JP 12304390A JP 2612085 B2 JP2612085 B2 JP 2612085B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaning liquid
- sealed container
- time
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Description
【発明の詳細な説明】 〔発明の目的〕 （産業上の利用分野） 本発明はガスレーザ装置内部の洗浄装置および洗浄方
法に関する。Description: Object of the Invention (Industrial application field) The present invention relates to a cleaning apparatus and a cleaning method for the inside of a gas laser device.
（従来の技術） ガスレーザ装置の開発および実用化が進むにつれてレ
ーザの発振を繰り返し行なうと装置内に細かなゴミが徐
々に蓄積し、レーザの発振を防げることがわかってき
た。したがって、操作が簡単で効果のある洗浄装置が要
望されているが、かかる要望を実現する洗浄装置は知ら
れていない。(Prior Art) As the development and commercialization of a gas laser device have progressed, it has been found that when laser oscillation is repeated, fine dust gradually accumulates in the device and laser oscillation can be prevented. Therefore, there is a demand for a cleaning device that is simple and effective, but a cleaning device that achieves the demand is not known.
（発明が解決しようとする課題） 現在、ガスレーザ装置内で発生するゴミを洗浄するた
めの方法として、最適と考えられる方法は確立されてい
ない。本発明は、簡単な構成でガススレーザ装置内を効
率的に洗浄することを可能にする装置を提供するもので
ある。(Problems to be Solved by the Invention) Currently, a method considered to be optimal as a method for cleaning dust generated in the gas laser device has not been established. SUMMARY OF THE INVENTION The present invention provides an apparatus capable of efficiently cleaning the inside of a gas laser apparatus with a simple configuration.
（課題を解決するための手段） 請求項１記載の本発明においては、ガスが封入される
密封容器と、この密封容器内に配設されレーザ発振時に
ガス流を発生させるファンと、密封容器に設けられる洗
浄液吹出し口挿入用フランジと、この洗浄液吹出し口挿
入用フランジに洗浄時に取付けられ洗浄時に洗浄液を吹
出させる洗浄液吹出し口と、密封容器に設けられ洗浄時
に密封容器内に注入された洗浄液から成る廃液を排出さ
せる排出口とを有することを特徴とするガスレーザ装置
の洗浄装置を提供し、さらに請求項２記載の本発明にお
いては、請求項１記載の密封容器内には洗浄時に洗浄液
中に浮遊しているゴミを除去するゴミ取りネットが設け
られて成ることを特徴とするガスレーザ装置の洗浄装置
を提供し、請求項３記載の本発明においては、ガスレー
ザ装置の洗浄装置において、排出口を閉じたまま洗浄液
吹出し口より洗浄液を注入して密封容器内を洗浄液で満
たし、その後にファンを回転させて洗浄液を密閉容器内
で循環させて洗浄を行なうことを特徴とするガスレーザ
装置の洗浄方法を提供する。(Means for Solving the Problems) According to the present invention described in claim 1, a sealed container in which gas is sealed, a fan disposed in the sealed container to generate a gas flow at the time of laser oscillation, and a sealed container. A cleaning liquid outlet insertion flange provided, a cleaning liquid outlet attached to the cleaning liquid outlet insertion flange at the time of cleaning and for discharging the cleaning liquid at the time of cleaning, and a cleaning liquid provided in a sealed container and injected into the sealed container at the time of cleaning. A cleaning device for a gas laser device having a discharge port for discharging waste liquid is provided. In the present invention according to claim 2, the cleaning device floats in the cleaning liquid during cleaning in the sealed container according to claim 1. A cleaning device for a gas laser device is provided, which is provided with a dust removal net that removes dust that is generated. In a cleaning apparatus of a gas laser device, a cleaning liquid is injected from a cleaning liquid outlet while a discharge port is closed, and the inside of a sealed container is filled with the cleaning liquid. A method for cleaning a gas laser device is provided.
（作用） このような構成のガスレーザ装置においてレーザの発
振を繰り返すことによりゴミが増加し、レーザの発振に
支障が出てきた場合に洗浄を行なう。まず排出口を開
け、吹出し口より洗浄液を装置各部に勢いよく吹付ける
ことにより装置内のゴミは装置の底に流されて排出口よ
り装置の外に排出される。ゴミの流出がなくなったら、
洗浄液を止め、内部に残った洗浄液を排出した後に排出
口を閉じて洗浄が完了する。(Operation) In the gas laser device having such a configuration, dust is increased by repeating laser oscillation, and cleaning is performed when trouble occurs in laser oscillation. First, the discharge port is opened, and the cleaning liquid is vigorously blown to each part of the apparatus from the discharge port, whereby dust in the apparatus flows to the bottom of the apparatus and is discharged from the apparatus through the discharge port. When the garbage is no longer flowing,
After the cleaning liquid is stopped and the cleaning liquid remaining inside is discharged, the discharge port is closed to complete the cleaning.
（実施例） 以下本発明の一実施例を図面によって説明する。第１
図は吹出し口６と排出口７を有するガスレーザ装置の基
本的な構造を示している。密封容器１にはガスが封入さ
れる。レーザ発振時にはファン３により発生しがガス流
が風ガイド５を通り、熱交換器４により冷却された後、
電極２に導かれる。この時装置内部で発生したゴミは高
速のガス流により飛散し、レーザ発振時以外は容器の底
や各部品の上に堆積する。したがって、これらのゴミを
洗浄するには、まずバルブ９を開き各部品ごとに設置し
た洗浄液吹出し口６より洗浄液を勢いよく吹付ける。洗
浄液は各部に堆積したゴミを吹飛ばし、密閉容器の内面
や風ガイドに沿って排出口７へ流されて密閉容器外へ排
出される。各種のガスレーザ装置の中でもエキシマレー
ザ装置内で発生するゴミは、装置を構成する金属部材お
よび絶縁物の細かな破片と、金属部材が使用するハロゲ
ンガスにより腐食されて生成する腐食生成物からなる。
これは、発明者が実際に発振実験を繰り返し行なったエ
キシマレーザ装置内を調査して確認したものである。特
に、ハロゲン元素として塩素を使用する場合に生成する
腐食生成物は装置内部に使用している金属部材の塩化物
（FeCl2，NiCl2，AlCl2等）である。これらは一般に吸
湿性があり水分があると吸湿して部品表面や壁面に固着
する傾向がある。しかし金属塩化物は水またはメチルア
ルコール，エチルアルコール等炭素数10以下のアルコー
ル類，アセトン等炭素数10以下のケトン類，ジメチルエ
ーテル等炭素数10以下のエーテル類に容易に溶ける性質
があり、洗浄液としてこれらの液体を使用すれば固着し
た腐食生成物も簡単に溶解し洗い流せる。また、ハロゲ
ン元素としてフッ素を使用する場合に生成する腐食生成
物は装置内部に使用している金属部材のフッ化物（Fe
F2，NiF2，AlF2等）である。これらのフッ化物は吸湿し
て固着するようなことはほとんどないため、洗浄液を吹
付けるだけで容易に洗い流すことができる。このとき使
用する洗浄液は、メチルアルコール，エチルアルコール
等金属塩化物の洗浄液以外にも、ガスレーザ装置内のガ
スを交換するために一度減圧にする際の圧力（0.1Tor
r）や送風ファンを回転させてガスを流す際に温度が上
昇する範囲（室温〜60℃）で沸騰する液体を使用するこ
とにより、容器内部に残った洗浄液はガスの入替えや送
風するというガスレーザ装置の基本的な操作で簡単に気
化し、装置外部に排気できるため、再びレーザを発振す
るまでの時間を短縮することができる。(Embodiment) An embodiment of the present invention will be described below with reference to the drawings. First
The figure shows a basic structure of a gas laser device having an outlet 6 and an outlet 7. Gas is sealed in the sealed container 1. At the time of laser oscillation, the gas flow generated by the fan 3 passes through the wind guide 5 and is cooled by the heat exchanger 4.
It is led to the electrode 2. At this time, dust generated inside the apparatus is scattered by the high-speed gas flow, and accumulates on the bottom of the container and on each component except during laser oscillation. Therefore, in order to clean these dusts, first, the valve 9 is opened and the cleaning liquid is vigorously sprayed from the cleaning liquid outlet 6 provided for each part. The cleaning liquid blows off the dust accumulated on each part, flows to the discharge port 7 along the inner surface of the sealed container or the wind guide, and is discharged out of the sealed container. Among various types of gas laser devices, dust generated in an excimer laser device is composed of fine pieces of a metal member and an insulator constituting the device, and corrosion products generated by being corroded by a halogen gas used by the metal member.
This was confirmed by investigating the inside of the excimer laser device where the oscillation experiment was actually repeated by the inventor. In particular, corrosion products generated when chlorine is used as a halogen element are chlorides (FeCl 2 , NiCl 2 , AlCl 2, etc.) of metal members used inside the apparatus. These are generally hygroscopic and tend to stick to the surface or wall of the component when moisture is present. However, metal chlorides have the property of easily dissolving in water or alcohols having 10 or less carbon atoms such as methyl alcohol and ethyl alcohol, ketones having 10 or less carbon atoms such as acetone, and ethers having 10 or less carbon atoms such as dimethyl ether. The use of these liquids makes it possible to easily dissolve and wash away the stuck corrosion products. In addition, the corrosion product generated when fluorine is used as a halogen element is a fluoride (Fe) of a metal member used inside the apparatus.
F 2 , NiF 2 , AlF 2, etc.). Since these fluorides hardly absorb and stick to moisture, they can be easily washed away only by spraying a cleaning solution. The cleaning liquid used at this time is not limited to the cleaning liquid for metal chlorides such as methyl alcohol and ethyl alcohol, and the pressure (0.1 Torr) for once reducing the pressure in order to exchange the gas in the gas laser device.
r) and a gas laser that uses a liquid that boils in a range where the temperature rises (room temperature to 60 ° C) when the gas flows by rotating the blower fan. Since the gas can be easily vaporized by the basic operation of the device and exhausted to the outside of the device, the time until the laser oscillates again can be reduced.
次に、部品形状に適した吹出し口の一実施例を図面に
よって説明する。第２図は電極等の幅の広い部品用の洗
浄液吹出し口であり、電極２や電極支持台８に均等に洗
浄液を吹付けることができ、この吹出し口一本で幅の広
い部品をむらなく洗浄できる。第３図は送風ファン等回
転部品用の洗浄液吹出し口である。ファン３等の回転体
を洗浄する場合、低速で回転させながら洗浄液を吹付け
れば、一本の洗浄液吹出し口で全体で洗浄でき、第３図
に示すように吹出口６の先端が小さく形成された構造の
吹出し口６を用いることによりファン３が破損すること
もない。Next, an embodiment of an outlet suitable for a component shape will be described with reference to the drawings. FIG. 2 shows a cleaning liquid outlet for a wide component such as an electrode. The cleaning liquid can be sprayed evenly on the electrode 2 and the electrode support base 8. Can be washed. FIG. 3 shows a cleaning liquid outlet for rotating parts such as a blower fan. When cleaning the rotating body such as the fan 3, if the cleaning liquid is sprayed while rotating at a low speed, the entire cleaning can be performed with one cleaning liquid outlet, and the tip of the outlet 6 is formed small as shown in FIG. By using the outlet 6 having the bent structure, the fan 3 is not damaged.
以上に本発明の一実施例の洗浄時について説明した
が、さらに、この一実施例のレーザ発振時において以下
第５図を参照して説明する。The cleaning operation of one embodiment of the present invention has been described above. Further, the laser oscillation of this embodiment will be further described with reference to FIG.
第５図に示すように、レーザ発振時においては洗浄液
吹出し口６が取り外され、当該部分は洗浄液吹出し口挿
入用フランジ12によって閉止されている。As shown in FIG. 5, the cleaning liquid outlet 6 is removed at the time of laser oscillation, and the portion is closed by the cleaning liquid outlet insertion flange 12.
よって、レーザ発振時にはガスの流れを乱す吹出し口
等の突起物がなくなり、レーザの発振への影響を防ぐこ
とができる。Therefore, at the time of laser oscillation, there is no protrusion such as an outlet which disturbs the flow of gas, and the influence on laser oscillation can be prevented.
また、他の一実施例を第４図によって説明する。密閉
容器１の容量が小さい場合や熱交換器４等の部品が複雑
な構造をしていたり、他の部品の影になり洗浄液を吹付
けにくい場合に、排出口７を閉じたまま洗浄液吹出し口
６より洗浄液を密閉容器１がほぼ一杯になるまで入れ、
ファン３を回転させ洗浄液を循環させることによって装
置内部を洗浄できる。またゴミ取りネット11により、洗
浄液を循環させている間に洗浄液中に浮遊しているゴミ
を除去することができる。次にファン３を停止し、排出
口７を開けて洗浄液を排出し、ゴミ取りネット11に捕捉
されていたゴミを除去すれば装置を分解せずに洗浄がで
きる。Another embodiment will be described with reference to FIG. When the capacity of the closed vessel 1 is small, or when the components such as the heat exchanger 4 have a complicated structure, or when it is difficult to spray the cleaning liquid due to the shadow of other parts, the cleaning liquid outlet with the discharge port 7 closed. 6. Fill the closed container 1 with the washing liquid until it is almost full.
The inside of the apparatus can be cleaned by rotating the fan 3 and circulating the cleaning liquid. Further, the dust removal net 11 can remove dust floating in the cleaning liquid while circulating the cleaning liquid. Next, the fan 3 is stopped, the discharge port 7 is opened, the cleaning liquid is discharged, and if the dust trapped in the dust collecting net 11 is removed, the washing can be performed without disassembling the apparatus.
以上詳述したように、請求項１記載の本発明において
は、密封容器に設けられる洗浄液吹出し口挿入用フラン
ジと、この洗浄液吹出し口挿入用フランジに洗浄時に取
付けられ洗浄時に洗浄液を吹出させる洗浄液吹出し口を
有しているので、レーザ発振時にガスの流れを乱す突起
物がなくなり、レーザの発振に影響を与えずに装置内部
の洗浄を行なうことができる。As described in detail above, according to the present invention, the cleaning liquid outlet insertion flange provided in the sealed container, and the cleaning liquid outlet attached to the cleaning liquid outlet insertion flange at the time of cleaning and discharging the cleaning liquid at the time of cleaning. With the opening, there is no protrusion that disturbs the gas flow during laser oscillation, and the inside of the apparatus can be cleaned without affecting the laser oscillation.
さらに、請求項２記載の本発明においては、密封容器
内に洗浄時に洗浄液中に浮遊しているゴミを除去するゴ
ミ取りネットを設けたので、洗浄を行なう時にゴミ取り
ネットによって効率よくゴミを除去することができる。Furthermore, in the present invention according to claim 2, since a dust removing net for removing dust floating in the washing liquid at the time of washing is provided in the sealed container, dust is efficiently removed by the dust removing net at the time of washing. can do.
また、請求項３記載の本発明においては、排出口を閉
じたまま洗浄液吹出し口より洗浄液を注入して密閉容器
内を洗浄液で満たし、その後にファンを回転させて洗浄
液を密閉容器内で循環させて洗浄を行なうので、部品が
複雑な構造である場合においても確実に洗浄を行なうこ
とができる。In the third aspect of the present invention, the cleaning liquid is injected from the cleaning liquid outlet while the discharge port is closed, and the inside of the closed container is filled with the cleaning liquid. Thereafter, the fan is rotated to circulate the cleaning liquid in the closed container. Cleaning can be performed reliably even when the component has a complicated structure.
第１図は本発明の基本的な構成図、第２図は幅の広い部
品用洗浄液吹出し口の構成図、第３図はファン用洗浄液
吹出し口の構成項、第４図は洗浄液を循環させて洗浄す
る場合の構成図、第５図は洗浄時だけ洗浄液吹出し口を
挿入する場合の構成図である。 １……密閉容器、２……電極 ３……ファン、４……熱交換器 ５……風ガイド、６……洗浄液吹出し口 ７……排出口、８……電極支持台 11……ゴミ取りネット 12……洗浄液吹出し口挿入用フランジFIG. 1 is a basic structural view of the present invention, FIG. 2 is a structural view of a cleaning liquid outlet for a wide component, FIG. 3 is a structural item of a cleaning liquid outlet for a fan, and FIG. 4 circulates a cleaning liquid. FIG. 5 is a configuration diagram in the case where the cleaning liquid outlet is inserted only at the time of cleaning. DESCRIPTION OF SYMBOLS 1 ... Closed container, 2 ... Electrode 3 ... Fan, 4 ... Heat exchanger 5 ... Wind guide, 6 ... Cleaning liquid outlet 7 ... Discharge port, 8 ... Electrode support stand 11 ... Dust removal Net 12 …… Flange for inserting cleaning liquid outlet
Claims (3)
器内に配設されレーザ発振時にガス流を発生させるファ
ンと、前記密封容器に設けられる洗浄液吹出し口挿入用
フランジと、この洗浄液吹出し口挿入用フランジに洗浄
時に取付けられ洗浄時に洗浄液を吹出させる洗浄液吹出
し口と、前記密封容器に設けられ洗浄時に密封容器内に
注入された洗浄液から成る廃液を排出させる排出口とを
有することを特徴とするガスレーザ装置の洗浄装置。1. A sealed container in which a gas is sealed, a fan disposed in the sealed container to generate a gas flow at the time of laser oscillation, a cleaning liquid outlet insertion flange provided in the sealed container, and a cleaning liquid outlet. It has a cleaning liquid outlet attached to the mouth insertion flange at the time of cleaning to discharge the cleaning liquid at the time of cleaning, and a discharge port provided in the sealed container and discharging a waste liquid composed of the cleaning liquid injected into the sealed container at the time of cleaning. Cleaning device for gas laser device.
遊しているゴミを除去するゴミ取りネットが設けられて
成ることを特徴とする請求項１記載のガスレーザ装置の
洗浄装置。2. The cleaning apparatus for a gas laser device according to claim 1, wherein a dust removing net for removing dust floating in the washing liquid at the time of washing is provided in the sealed container.
において、排出口を閉じたまま洗浄液滴出し口より洗浄
液を注入して密閉容器内を洗浄液で満たし、その後にフ
ァンを回転させて洗浄液を密閉容器内で循環させて洗浄
を行なうことを特徴とするガスレーザ装置の洗浄方法。3. The cleaning apparatus for a gas laser device according to claim 1, wherein the cleaning liquid is injected from the cleaning liquid drop outlet while the discharge port is closed, and the inside of the sealed container is filled with the cleaning liquid. A method for cleaning a gas laser device, wherein the cleaning is performed by circulating in a closed container.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2123043A JP2612085B2 (en) | 1990-05-15 | 1990-05-15 | Cleaning device and cleaning method for gas laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2123043A JP2612085B2 (en) | 1990-05-15 | 1990-05-15 | Cleaning device and cleaning method for gas laser device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0423376A JPH0423376A (en) | 1992-01-27 |
| JP2612085B2 true JP2612085B2 (en) | 1997-05-21 |
Family
ID=14850797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2123043A Expired - Lifetime JP2612085B2 (en) | 1990-05-15 | 1990-05-15 | Cleaning device and cleaning method for gas laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2612085B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04177886A (en) * | 1990-11-13 | 1992-06-25 | Fanuc Ltd | Gas laser device |
| KR101525966B1 (en) * | 2015-02-10 | 2015-06-05 | 홍진석 | Method for cleaning gas laser apparatus |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01129856U (en) * | 1988-02-26 | 1989-09-04 |
-
1990
- 1990-05-15 JP JP2123043A patent/JP2612085B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0423376A (en) | 1992-01-27 |
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