JPH0423376A - Device and method for cleaning gas laser apparatus - Google Patents
Device and method for cleaning gas laser apparatusInfo
- Publication number
- JPH0423376A JPH0423376A JP12304390A JP12304390A JPH0423376A JP H0423376 A JPH0423376 A JP H0423376A JP 12304390 A JP12304390 A JP 12304390A JP 12304390 A JP12304390 A JP 12304390A JP H0423376 A JPH0423376 A JP H0423376A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning liquid
- gas laser
- cleaning
- laser device
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 61
- 238000000034 method Methods 0.000 title claims abstract description 7
- 239000007788 liquid Substances 0.000 claims abstract description 43
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 235000019441 ethanol Nutrition 0.000 claims description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 4
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 claims description 4
- 238000003780 insertion Methods 0.000 claims description 2
- 230000037431 insertion Effects 0.000 claims description 2
- 150000002576 ketones Chemical class 0.000 claims description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- 238000009835 boiling Methods 0.000 claims 1
- 239000002699 waste material Substances 0.000 claims 1
- 230000010355 oscillation Effects 0.000 abstract description 14
- 239000000428 dust Substances 0.000 description 14
- 238000010586 diagram Methods 0.000 description 10
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 239000012530 fluid Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 229910001510 metal chloride Inorganic materials 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910003322 NiCu Inorganic materials 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- FZGIHSNZYGFUGM-UHFFFAOYSA-L iron(ii) fluoride Chemical compound [F-].[F-].[Fe+2] FZGIHSNZYGFUGM-UHFFFAOYSA-L 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の目的〕
（産業上の利用分野）
本発明はガスレーザ装置内部の洗浄装置および洗浄方法
に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a cleaning device and a cleaning method for the inside of a gas laser device.
（従来の技術）
ガスレーザ装置の開発および実用化が進むにつれてレー
ザの発振を繰り返し行なうと装置内に細かなゴミが徐々
に蓄積し、レーザの発振を妨げることがわかってきた。(Prior Art) As the development and practical use of gas laser devices progresses, it has been found that repeated laser oscillations gradually accumulate fine dust inside the device, which impedes laser oscillation.
したがって、操作が簡単で効果のある洗浄装置が要望さ
れているが、かかる要望を実現する洗浄装置は知られて
いない。Therefore, there is a need for a cleaning device that is easy to operate and effective, but no cleaning device is known that satisfies this demand.
（発明が解決しようとする課題）
現在、ガスレーザ装置内で発生するゴミを洗浄するため
の方法として、最適と考えられる方法は確立されていな
い０本発明は、簡単な構成でガスレーザ装置内を効率的
に洗浄することを可能にする装置を提供するものである
。(Problems to be Solved by the Invention) Currently, there is no established method that is considered to be optimal for cleaning dust generated within a gas laser device. The purpose of this invention is to provide a device that enables cleaning.
（課題を解決するための手段）
ガスレーザ装置内で発生したゴミは、レーザ発振時に高
速のガス流によって飛散し、洗浄の際には装置の底や内
部の部品の上に大部分のゴミが堆積する。そこで装置各
部に洗浄液の吹出し口を設置し、洗浄液を勢いよく吹付
けることにより装置の底や部品に堆積したゴミを洗い流
し、装置の底に設けた排出口より装置内部のゴミを装置
の外に排出する。このような構成にすることにより、装
置を分解せずにゴミの除去と内部の部品の洗浄ができる
０本発明はこのような観点からガスレーザ発振装置に洗
浄液の吹出し口と排出口を設置したことを特徴とするも
のである。(Means for solving the problem) Dust generated inside the gas laser device is scattered by the high-speed gas flow during laser oscillation, and most of the dust is deposited on the bottom of the device and internal parts during cleaning. do. Therefore, a cleaning liquid outlet is installed in each part of the device, and by vigorously spraying the cleaning liquid, the dirt accumulated on the bottom of the device and parts is washed away, and the dirt inside the device is removed from the device through the outlet provided at the bottom of the device. Discharge. With such a configuration, it is possible to remove dust and clean internal parts without disassembling the device.From this point of view, the present invention provides a gas laser oscillation device with a cleaning liquid outlet and a discharge port. It is characterized by:
（作用）
このような構成のガスレーザ装置においてレーザの発振
を繰り返すことによりゴミが増加し、レーザの発振に支
障が出てきた場合に洗浄を行なう。まず排出口を開け、
吹出し口より洗浄液を装置各部に勢いよく吹付けること
により装置内のゴミは装置の底に流されて排出口より装
置の外に排出される。ゴミの流出がなくなったら、洗浄
液を止め、内部に残った洗浄液を排出した後に排出口を
閉じて洗浄が完了する。(Function) In a gas laser device having such a configuration, when the amount of dust increases due to repeated laser oscillations and the laser oscillations become obstructed, cleaning is performed. First, open the outlet,
By vigorously spraying the cleaning liquid onto each part of the device from the blow-off port, the dust inside the device is swept to the bottom of the device and is discharged from the device through the discharge port. Once the dust has stopped flowing out, stop the cleaning solution, drain the remaining cleaning solution inside, and close the outlet to complete cleaning.
（実施例）
以下本発明の一実施例を図面によって説明する。第１図
は吹出し口６と排出ロアを有するガスレーザ装置の基本
的な構造を示している。密封容器１にはガスが封入され
る。レーザ発振時にはファン３により発生したガス流が
風ガイド５を通り、熱交換器４により冷却された後、電
極２に導かれる。この時装置内部で発生したゴミは高速
のガス流により飛散し、レーザ発振時以外は容器の底や
各部品の上に堆積する。したがって、これらのゴミを洗
浄するには、まずバルブ９を開き各部品ごとに設置した
洗浄液吹出し口６より洗浄液を勢いよく吹付ける。洗浄
液は各部に堆積したゴミを吹飛ばし、密閉容器の内面や
風ガイドに沿って排出ロアへ流されて密閉容器外へ排出
される。各種のガスレーザ装置の中でもエキシマレーザ
装置内で発生するゴミは、装置を構成する金属部材およ
び絶縁物の細かな破片と、金属部材が使用するハロゲン
ガスにより腐食されて生成する腐食生成物からなる。こ
れは、発明者が実際に発振実験を繰り返し行なったエキ
シマレーザ装置内を調査して確認したものである。特に
、ハロゲン元素として塩素を使用する場合に生成する腐
食生成物は装置内部に使用している金属部材の塩化物（
Ｆｅｌ、 、ＮｉＣｕ、 。(Example) An example of the present invention will be described below with reference to the drawings. FIG. 1 shows the basic structure of a gas laser device having an outlet 6 and a discharge lower. The sealed container 1 is filled with gas. During laser oscillation, a gas flow generated by the fan 3 passes through the wind guide 5, is cooled by the heat exchanger 4, and is then guided to the electrode 2. At this time, the dust generated inside the device is scattered by the high-speed gas flow, and deposits on the bottom of the container and on each component except during laser oscillation. Therefore, in order to clean these dusts, first the valve 9 is opened and the cleaning liquid is vigorously sprayed from the cleaning liquid outlet 6 installed for each part. The cleaning liquid blows away the dirt that has accumulated in various parts, flows along the inner surface of the sealed container and the wind guide to the discharge lower, and is discharged outside the sealed container. Among various gas laser devices, dust generated in an excimer laser device consists of fine fragments of metal members and insulators that constitute the device, and corrosion products generated when the metal members are corroded by the halogen gas used. This was confirmed by the inventor by actually investigating the interior of an excimer laser device in which oscillation experiments were repeatedly conducted. In particular, corrosion products generated when chlorine is used as a halogen element are chlorides (
Fel, , NiCu, .
ＡｊｌＣら等）である、これらは一般に吸湿性があり水
分があると吸湿して部品表面や壁面に固着する傾向があ
る。しかし金属塩化物は水またはメチルアルコール、エ
チルアルコール等炭素数１０以下のアルコール類、アセ
トン等炭素数ｌＯ以下のケトン類。These are generally hygroscopic and tend to absorb moisture and stick to the surfaces of parts and walls when there is moisture. However, metal chlorides include water, alcohols with 10 or less carbon atoms such as methyl alcohol and ethyl alcohol, and ketones with 10 or less carbon atoms such as acetone.
ジメチルエーテル等炭素数１０以下のエーテル類に容易
に溶ける性質があり、洗浄液としてこれらの液体を使用
すれば固着した腐食生成物も簡単に溶解し洗い流せる。It has the property of being easily soluble in ethers having carbon atoms of 10 or less, such as dimethyl ether, and if these liquids are used as cleaning liquids, fixed corrosion products can be easily dissolved and washed away.
また、ハロゲン元素としてフッ素を使用する場合に生成
する腐食生成物は装置内部に使用している金属部材のフ
ッ化物（ＦｅＦ２゜ＮｉＦ、、 Ａｌ２Ｆ、等）である
、これらのフッ化物は吸湿して固着するようなことはほ
とんどないため、洗浄液を吹付けるだけで容易に洗い流
すことができる。このとき使用する洗浄液は、メチルア
ルコール、エチルアルコール等金属塩化物の洗浄液以外
にも、ガスレーザ装置内のガスを交換するために一度減
圧にする際の圧力（０，１Ｔｏｒｒ）や送風ファンを回
転させてガスを流す際に温度が上昇する範囲（室温〜６
０℃）で沸騰する液体を使用することにより、容器内部
に残った洗浄液はガスの入替えや送風するというガスレ
ーザ装置の基本的な操作で簡単に気化し、装置外部に排
気できるため、再びレーザを発振するまでの時間を短縮
することができる。In addition, when using fluorine as a halogen element, the corrosion products that are generated are fluorides (FeF2゜NiF, Al2F, etc.) of the metal parts used inside the equipment.These fluorides absorb moisture. Since it rarely sticks, it can be easily washed off by simply spraying cleaning liquid on it. The cleaning liquid used at this time is not only metal chloride cleaning liquids such as methyl alcohol and ethyl alcohol, but also the pressure (0.1 Torr) used to reduce the pressure once to replace the gas in the gas laser device, and the pressure used to rotate the blower fan. The range in which the temperature rises when gas is flowed (room temperature to 6
By using a liquid that boils at 0℃), the cleaning liquid remaining inside the container can be easily vaporized by the basic operations of gas laser equipment such as replacing the gas and blowing air, and can be exhausted outside the equipment, making it easy to use the laser again. The time until oscillation can be shortened.
次に、部品形状に適した吹出し口の一実施例を図面によ
って説明する。第２図は電極等の幅の広い部品用の洗浄
液吹出し口であり、電極２や電極支持台８に均等に洗浄
液を吹付けることができ、この吹出しロー本で幅の広い
部品をむらなく洗浄できる。第３図は送風ファン等回転
部品用の洗浄液吹出し口である。ファン３等の回転体を
洗浄する場合、低速で回転させながら洗浄液を吹付けれ
ば、−本の洗浄液吹出し口で全体で洗浄でき、第３図に
示すように吹出口６の先端が小さく形成された構造の吹
出し口６を用いることによりファン３が破損することも
ない。Next, an embodiment of the air outlet suitable for the shape of the part will be described with reference to the drawings. Figure 2 shows a cleaning liquid outlet for wide parts such as electrodes, and the cleaning liquid can be sprayed evenly onto the electrode 2 and electrode support 8, and the wide parts can be cleaned evenly with this blower. can. FIG. 3 shows a cleaning liquid outlet for rotating parts such as a blower fan. When cleaning a rotating body such as the fan 3, by spraying the cleaning liquid while rotating at a low speed, the entire body can be cleaned with one cleaning liquid outlet, and as shown in Fig. 3, the tip of the outlet 6 is formed small. By using the outlet 6 having a similar structure, the fan 3 will not be damaged.
また、他の一実施例を第４図によって説明する。Another embodiment will be explained with reference to FIG.
密閉容器１の容量が小さい場合や熱交換器４等の部品が
複雑な構造をしていたり、他の部品の影になり洗浄液を
吹付けにくい場合に、排出ロアを閉じたまま洗浄液吹出
し口６より洗浄液を密閉容器１がほぼ一杯になるまで入
れ、ファン３を回転させ洗浄液を循環させることによっ
て装置内部を洗浄できる。またゴミ取りネット１１によ
り、洗浄液を循環させている間に洗浄液中に浮遊してい
るゴミを除去することができる０次にファン３を停止し
、排出ロアを開けて洗浄液を排出し、ゴミ取りネット１
１に捕捉されていたゴミを除去すれば装置を分解せずに
洗浄ができる。When the capacity of the airtight container 1 is small, when parts such as the heat exchanger 4 have a complicated structure, or when it is difficult to spray the cleaning liquid because it is in the shadow of other parts, the cleaning liquid outlet 6 can be opened while the discharge lower is closed. The inside of the apparatus can be cleaned by filling the closed container 1 with cleaning liquid until it is almost full and rotating the fan 3 to circulate the cleaning liquid. In addition, the dust removal net 11 can remove dust floating in the cleaning liquid while the cleaning liquid is being circulated. Next, stop the fan 3, open the discharge lower to discharge the cleaning liquid, and remove the dust. net 1
If the dust trapped in 1 is removed, the device can be cleaned without disassembling it.
また他の一実施例を第５図によって説明する。Another embodiment will be explained with reference to FIG.
この実施例は密閉容器１の各部に洗浄液吹出し口挿入用
フランジ１２を設け、洗浄時にだけ装置内部に洗浄液吹
出し口６を挿入して洗浄する。このような構成にした場
合、レーザ発振時にガスの流れを乱す突起物がなくなり
、レーザの発振に影響を与えずに装置内部の洗浄が可能
になる。In this embodiment, a cleaning liquid outlet insertion flange 12 is provided at each part of the closed container 1, and the cleaning liquid outlet 6 is inserted into the inside of the apparatus only during cleaning. With this configuration, there are no protrusions that disturb the flow of gas during laser oscillation, and the inside of the device can be cleaned without affecting laser oscillation.
以上詳述したように本発明によれば、ガスレーザ装置の
洗浄液の吹出し口の排出口を設けることにより、装置を
分解せずに短時間で装置内部の洗浄をすることができる
。As described in detail above, according to the present invention, by providing an outlet for the cleaning liquid outlet of the gas laser device, the inside of the device can be cleaned in a short time without disassembling the device.
第１図は本発明の基本的な構成図、第２図は幅の広い部
品用洗浄液吹出し口の構成図、第３図はファン用洗浄液
吹出し口の構成項、第４図は洗浄液を循環させて洗浄す
る場合の構成図、第５図は洗浄時だけ洗浄液吹出し口を
挿入する場合の構成図である。
１・・・密閉容器 ２・・・電極第
図
第
図
第
図
第
図Figure 1 is a basic configuration diagram of the present invention, Figure 2 is a configuration diagram of a cleaning fluid outlet for wide parts, Figure 3 is a configuration diagram of a cleaning fluid outlet for a fan, and Figure 4 shows how cleaning fluid is circulated. FIG. 5 is a diagram showing the configuration when the cleaning liquid outlet is inserted only during cleaning. 1... Airtight container 2... Electrode diagram diagram diagram diagram diagram diagram
Claims (1)
排出口とを設けてなる洗浄機構を有するガスレーザ装置
。 ２、ガスレーザ装置内部のファン、電極、熱交換器等の
部品ごとに洗浄液吹出し口を設けた請求項（１）記載の
ガスレーザ装置。 ３、洗浄液として、メチルアルコール、エチルアルコー
ル等炭素数１０以下のアルコール類、アセトン等炭素数
１０以下のケトン類、ジメチルエーテル等炭素数１０以
下のエーテル類を使用する請求項（１）記載のガスレー
ザ装置の洗浄方法。 ４、０．１Ｔｏｒｒの圧力で沸点が６０℃以下の液体を
洗浄液として使用する請求項（１）記載のガスレーザ装
置の洗浄方法。 ５、ガスレーザ装置内に洗浄液を満たし、ファンを回転
させて洗浄液を循環させることにより、ガスレーザ装置
内部を洗浄する請求項（１）記載のガスレーザ装置の洗
浄方法。 ６、洗浄液吹出し口の挿入口を有する請求項（１）記載
のガスレーザ装置。[Scope of Claims] 1. A gas laser device having a cleaning mechanism in which a cleaning liquid outlet and a waste liquid discharge port are provided in the gas laser device. 2. The gas laser device according to claim 1, wherein a cleaning liquid outlet is provided for each component such as a fan, an electrode, and a heat exchanger inside the gas laser device. 3. The gas laser device according to claim (1), wherein the cleaning liquid is an alcohol having 10 or less carbon atoms such as methyl alcohol or ethyl alcohol, a ketone having 10 or less carbon atoms such as acetone, or an ether having 10 or less carbon atoms such as dimethyl ether. cleaning method. 4. The method for cleaning a gas laser device according to claim 1, wherein a liquid having a boiling point of 60° C. or less at a pressure of 0.1 Torr is used as the cleaning liquid. 5. The method for cleaning a gas laser device according to claim 1, wherein the inside of the gas laser device is cleaned by filling the gas laser device with a cleaning liquid and rotating a fan to circulate the cleaning liquid. 6. The gas laser device according to claim 1, further comprising an insertion port for a cleaning liquid outlet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2123043A JP2612085B2 (en) | 1990-05-15 | 1990-05-15 | Cleaning device and cleaning method for gas laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2123043A JP2612085B2 (en) | 1990-05-15 | 1990-05-15 | Cleaning device and cleaning method for gas laser device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0423376A true JPH0423376A (en) | 1992-01-27 |
| JP2612085B2 JP2612085B2 (en) | 1997-05-21 |
Family
ID=14850797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2123043A Expired - Lifetime JP2612085B2 (en) | 1990-05-15 | 1990-05-15 | Cleaning device and cleaning method for gas laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2612085B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04177886A (en) * | 1990-11-13 | 1992-06-25 | Fanuc Ltd | Gas laser device |
| KR101525966B1 (en) * | 2015-02-10 | 2015-06-05 | 홍진석 | Method for cleaning gas laser apparatus |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01129856U (en) * | 1988-02-26 | 1989-09-04 |
-
1990
- 1990-05-15 JP JP2123043A patent/JP2612085B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01129856U (en) * | 1988-02-26 | 1989-09-04 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04177886A (en) * | 1990-11-13 | 1992-06-25 | Fanuc Ltd | Gas laser device |
| KR101525966B1 (en) * | 2015-02-10 | 2015-06-05 | 홍진석 | Method for cleaning gas laser apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2612085B2 (en) | 1997-05-21 |
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