JP2607528B2 - Method of manufacturing magnetoresistive element - Google Patents

Method of manufacturing magnetoresistive element

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Publication number
JP2607528B2
JP2607528B2 JP62183471A JP18347187A JP2607528B2 JP 2607528 B2 JP2607528 B2 JP 2607528B2 JP 62183471 A JP62183471 A JP 62183471A JP 18347187 A JP18347187 A JP 18347187A JP 2607528 B2 JP2607528 B2 JP 2607528B2
Authority
JP
Japan
Prior art keywords
magnetoresistive element
substrate
protective resin
resin
solder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62183471A
Other languages
Japanese (ja)
Other versions
JPS6428976A (en
Inventor
博一 後藤
修三 安彦
光男 中橋
秀人 佐野
久範 林
毅 大里
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Electronics Inc
Original Assignee
Canon Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Electronics Inc filed Critical Canon Electronics Inc
Priority to JP62183471A priority Critical patent/JP2607528B2/en
Publication of JPS6428976A publication Critical patent/JPS6428976A/en
Application granted granted Critical
Publication of JP2607528B2 publication Critical patent/JP2607528B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は磁界の強弱を電気抵抗の変化として取り出す
磁気抵抗素子の製造方法に関するものである。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a magnetoresistive element for extracting the strength of a magnetic field as a change in electric resistance.

[従来の技術] 磁気抵抗素子の従来の製造方法による製造工程を第2
図(A)〜(F)を参照して説明する。
[Prior Art] A manufacturing process according to a conventional manufacturing method of a magnetoresistive element is described as a second example.
This will be described with reference to FIGS.

従来の製造工程では、まず磁気抵抗素子を形成するた
めの基板としてガラス等の非磁性材から第2図(A)に
示すように、例えば矩形の平板状に形成した基板1を用
意する。
In the conventional manufacturing process, first, as shown in FIG. 2 (A), a substrate 1 formed from a non-magnetic material such as glass is formed into a rectangular flat plate as a substrate for forming a magnetoresistive element.

次に、基板1上にNiFe又はNiCo等から磁気抵抗効果を
有するように構成した磁性膜を蒸着やスパッタリング等
の方法で300〜2000Åの厚さに成膜し、さらにこの磁性
膜を第2図(B)に示すようにエッチングして磁気抵抗
素子の本体としての所定パターン(以下磁性膜パターン
と呼ぶ)2を多数形成する。
Next, a magnetic film composed of NiFe or NiCo or the like having a magnetoresistive effect is formed on the substrate 1 to a thickness of 300 to 2000 mm by a method such as vapor deposition or sputtering. As shown in FIG. 2B, a large number of predetermined patterns (hereinafter referred to as magnetic film patterns) 2 as the main body of the magnetoresistive element are formed by etching.

次に第2図(C)に示すように基板1上で各磁性膜パ
ターン2において後で接続端子を接続する端部の電極部
2aを除いて各パターン2を覆うようにSiO等から成る絶
縁性で無機質の保護膜3をマスク蒸着等で成膜する。膜
厚は1〜30μmとする。
Next, as shown in FIG. 2 (C), an electrode portion at an end for connecting a connection terminal later on each magnetic film pattern 2 on the substrate 1
An insulating and inorganic protective film 3 made of SiO or the like is formed by mask evaporation or the like so as to cover each pattern 2 except for 2a. The film thickness is 1 to 30 μm.

次にダイシング等により基板1を第2図(D)に示す
ように磁気抵抗素子の1単位ごとに切断する。
Next, the substrate 1 is cut by dicing or the like for each unit of the magnetoresistive element as shown in FIG. 2 (D).

次に第2図(E)に示すように、ハンダ4により接続
端子5を磁性膜パターン2の電極部2aにハンダ付する。
Next, as shown in FIG. 2E, the connection terminal 5 is soldered to the electrode portion 2a of the magnetic film pattern 2 by the solder 4.

最後に、第2図(F)に符号6で示す保護用の樹脂
(以下保護樹脂と呼ぶ)を基板1上の接続端子5の接続
部分を除く全体に塗布し、全体をコーティング、被覆し
て磁気抵抗素子が完成する。
Finally, a protective resin (hereinafter referred to as a protective resin) indicated by reference numeral 6 in FIG. 2 (F) is applied to the entire surface of the substrate 1 except for the connection portion of the connection terminal 5, and the entire surface is coated and covered. The magnetoresistive element is completed.

[発明が解決しようとする問題点] このような従来の製造工程では、保護樹脂6のコーテ
ィングは接続端子5のハンダ付を考慮して切断前の基板
1に一括して行なうのではなく、基板1を個々の素子単
位ごとに切断し、接続端子5のハンダ付を行なった後に
個々の素子ごとに行なっている。
[Problems to be Solved by the Invention] In such a conventional manufacturing process, the coating of the protective resin 6 is not performed collectively on the substrate 1 before cutting in consideration of the soldering of the connection terminal 5, 1 is cut for each element, soldering of the connection terminal 5 is performed, and then, for each element.

ところが個々の素子ごとに保護樹脂6のコーティング
を行なうと、コーティング工程の多くの手間と時間を要
しそのぶんコストがかかる。
However, if the protective resin 6 is coated for each element, much time and effort are required for the coating process, and the cost is accordingly increased.

又各素子ごとにコーティングを行なうと、第2図
(F)に符号6aで示すように素子の端部の所で保護樹脂
6が表面張力により盛り上がってしまい、そこの所だけ
保護樹脂6が厚くなりすぎてしまう。
When coating is performed for each element, as shown by reference numeral 6a in FIG. 2 (F), the protective resin 6 rises due to surface tension at the end of the element, and the protective resin 6 becomes thicker only there. It becomes too much.

一方、従来の方法で保護樹脂6を個々の素子ごとにコ
ーティングするのではなく、切断前の基板1に一括して
行なう方法がある。それは接続端子5のハンダ付を考慮
して磁性膜パターン2の電極部2aに保護樹脂6が付着し
ないように、印刷法やフォトリソパターニングにより保
護樹脂6をコーティングする方法である。
On the other hand, there is a method in which the protection resin 6 is not coated on each element by a conventional method, but is collectively applied to the substrate 1 before cutting. This is a method of coating the protective resin 6 by a printing method or photolithography patterning so that the protective resin 6 does not adhere to the electrode portion 2a of the magnetic film pattern 2 in consideration of soldering of the connection terminal 5.

しかし、この方法では用いられる保護樹脂6が印刷又
はフォトリソパターニングが出来るものに限られ、保護
樹脂6の選択の自由度が制限されてしまう。また、保護
樹脂6として磁気抵抗素子の信頼性を保証できる特性を
有することと、上記の印刷法又はフォトリソパターニン
グが出来ることが両立しない場合もある。
However, according to this method, the protective resin 6 used is limited to one that can be printed or photolithographically patterned, and the degree of freedom in selecting the protective resin 6 is limited. Further, in some cases, it is not compatible with the protective resin 6 that it has characteristics that can guarantee the reliability of the magnetoresistive element and that the above-described printing method or photolithographic patterning can be performed.

[問題点を解決するための手段] このような問題点を解決するため、本発明による磁気
抵抗素子の製造方法においては、基板上に磁気抵抗素子
の本体としての磁性膜の所定パターンを多数形成する工
程と、該工程後に前記パターンの接続端子を接続する電
極部にハンダを溶着する工程と、該工程後に前記基板の
前記パターン形成面の全体を保護用の樹脂で被覆する工
程と、該工程後に前記基板を磁気抵抗素子の1単位毎に
切断する工程と、該工程後に前記樹脂の前記ハンダ上の
部分を除去し、露出したハンダを介して前記電極部に接
続端子をハンダ付する工程を有する構成を採用した。
[Means for Solving the Problems] In order to solve such problems, in the method of manufacturing a magnetoresistive element according to the present invention, a plurality of predetermined patterns of a magnetic film as a main body of the magnetoresistive element are formed on a substrate. Performing soldering on the electrode portion connecting the connection terminals of the pattern after the step; covering the entire pattern forming surface of the substrate with a protective resin after the step; A step of cutting the substrate for each unit of the magnetoresistive element, and a step of removing a portion of the resin on the solder after the step and soldering a connection terminal to the electrode portion through the exposed solder. A configuration having

[作用] このような構成によれば保護用の樹脂の被覆は接続端
子のハンダ付の前で上記の基板を磁気抵抗素子の1単位
ごとに切断する前に一括して行なわれ、簡単に短時間で
安価に行なえる。また、保護用の樹脂の被覆を一括して
切断前の基板全面に行なうため、前述した従来例のよう
な表面張力による保護用の樹脂の盛り上がりを防ぐこと
ができ、樹脂を適度な厚さで被覆できる。また、用いら
れる保護用の樹脂が印刷法又はフォトリソパターニング
が行なえるものに限定されず、選択の自由度が増す。
[Operation] According to such a configuration, the coating of the protective resin is performed at a time before the connection terminals are soldered and before the substrate is cut for each unit of the magnetoresistive element. It can be done cheaply in time. In addition, since the protective resin is collectively coated on the entire surface of the substrate before cutting, it is possible to prevent the protective resin from rising due to surface tension as in the above-described conventional example, and to reduce the resin to an appropriate thickness. Can be coated. Further, the protective resin to be used is not limited to a resin that can be subjected to a printing method or photolithographic patterning, and the degree of freedom of selection increases.

[実施例] 以下、第1図(A)〜(H)を参照して本発明の実施
例の詳細を説明する。なお、第1図(A)〜(H)は本
発明方法の実施例による磁気抵抗素子の製造工程を説明
するもので、これらの図において従来例の第2図(A)
〜(F)中のものと同一もしくは相当する部分には同一
符号を付しその説明は省略ないしは簡単にふれるだけに
する。また、本実施例の工程の一部は従来例と同様であ
りその部分についても簡単にふれるだけにする。
[Example] Hereinafter, an example of the present invention will be described in detail with reference to FIGS. 1 (A) to 1 (H). 1 (A) to 1 (H) illustrate the steps of manufacturing a magnetoresistive element according to an embodiment of the method of the present invention.
The same or corresponding parts as those in (F) to (F) are denoted by the same reference numerals, and the description thereof will be omitted or simply referred to. Further, a part of the steps of the present embodiment is the same as the conventional example, and the part is simply touched.

本実施例の工程では、まず従来の工程と同様にして第
1図(A)の基板1上に第1図(B)に示すように磁気
抵抗素子の本体としての磁性膜パターン2を多数形成
し、さらに第1図(C)に示すように磁性膜パターン2
の電極部2a以外を覆うようにして、SiO等から成る絶縁
性の無機質の保護膜3を成膜する。
In the process of this embodiment, a large number of magnetic film patterns 2 are formed on the substrate 1 of FIG. 1A as shown in FIG. 1B in the same manner as in the conventional process. Then, as shown in FIG.
An insulating inorganic protective film 3 made of SiO or the like is formed so as to cover portions other than the electrode portion 2a.

次に、本実施例では従来と異なる点として、第1図
(D)と共に第1図(E)に拡大して示すように、ハン
ダ7を各磁性膜パターン2の電極部2a上に盛り上げて溶
着する。
Next, the present embodiment is different from the prior art in that the solder 7 is raised on the electrode portions 2a of the respective magnetic film patterns 2 as shown in FIG. Weld.

次に、第1図(F)に示すように基板1の磁性膜パタ
ーン2の形成面全体に保護樹脂6を塗布し、基板1上の
全面をコーティングする。保護樹脂6の塗布方法はスピ
ナーコーティング、引き上げコーティング、スプレーコ
ーティング又は印刷コーティング等による。
Next, as shown in FIG. 1 (F), a protective resin 6 is applied to the entire surface of the substrate 1 on which the magnetic film pattern 2 is formed, and the entire surface of the substrate 1 is coated. The method of applying the protective resin 6 is spinner coating, pull-up coating, spray coating, print coating, or the like.

次に第1図(F)に符号8で示す切断線に沿って基板
1を切断し、基板1を第1図(G)に示すように磁気抵
抗素子の1単位ごとに切断する。
Next, the substrate 1 is cut along a cutting line indicated by reference numeral 8 in FIG. 1 (F), and the substrate 1 is cut for each unit of the magnetoresistive element as shown in FIG. 1 (G).

次に、第1図(H)に示すように保護樹脂6のハンダ
7上の部分を除去し、露出したハンダ7を介して接続端
子5を磁性膜パターン2の電極部2aにハンダ付する。な
お、この際に必要に応じてハンダを追加する。ここで保
護樹脂6のハンダ7上部分を除去するにあたって、ハン
ダ7の部分は基板1上の他の部分より高く、その上の保
護樹脂6は膜厚が薄くなっているため、熱又は振動、あ
るいはその両方により容易にハンダ7上の保護樹脂6の
被膜を破壊、除去でき、接続端子5のハンダ付を行なえ
る。例えばハンダごての先端を超音波振動させることに
より、熱と振動を同時に加えることができる。
Next, as shown in FIG. 1H, the portion of the protective resin 6 on the solder 7 is removed, and the connection terminal 5 is soldered to the electrode portion 2a of the magnetic film pattern 2 via the exposed solder 7. At this time, solder is added as necessary. Here, when removing the portion of the protective resin 6 above the solder 7, the portion of the solder 7 is higher than other portions on the substrate 1, and the thickness of the protective resin 6 thereon is small, so that heat, vibration, Alternatively, the coating of the protective resin 6 on the solder 7 can be easily broken or removed by using both of them, and the connection terminal 5 can be soldered. For example, heat and vibration can be applied simultaneously by ultrasonically vibrating the tip of the soldering iron.

次に、図示していないが必要に応じて接続端子5のハ
ンダ付部分をハンダ保護用の樹脂でコーティングして、
磁気抵抗素子が完成する。
Next, although not shown, the soldered portion of the connection terminal 5 is coated with a resin for solder protection as necessary,
The magnetoresistive element is completed.

以上のように本実施例の工程によれば、保護樹脂6の
コーティングは接続端子5のハンダ付を行なう前で基板
1を磁気抵抗素子の1単位ごとに切断する前に一括して
行なわれる。すなわち、保護樹脂6のコーティングは一
括して簡単に短時間で安価に行なえる。その分素子の製
造コストを低減できる。また、保護樹脂6が切断前の基
板1の全体にコーティングされるため、従来のような表
面張力による保護樹脂6の盛り上がりを防ぐことがで
き、保護樹脂6を適度な厚さで被覆でき、磁気抵抗素子
の特性を向上できる。
As described above, according to the steps of the present embodiment, the coating of the protective resin 6 is performed collectively before the connection terminal 5 is soldered and before the substrate 1 is cut for each unit of the magnetoresistive element. In other words, the coating of the protective resin 6 can be performed collectively, easily, in a short time and at low cost. The manufacturing cost of the element can be reduced accordingly. Further, since the protective resin 6 is coated on the entire substrate 1 before cutting, the swelling of the protective resin 6 due to the surface tension as in the related art can be prevented, and the protective resin 6 can be covered with an appropriate thickness. The characteristics of the resistance element can be improved.

又、本実施例によれば保持樹脂6のコーティングは磁
性膜パターンの電極部2aをよけて行なうわけではないの
で、保護樹脂6に用いられる樹脂は印刷法やフォトリソ
パターニングが行なえるものに限定されない。保護樹脂
6の選択の自由度が増し、特性の優れたものを用いるこ
とができ、磁気抵抗素子の信頼性を向上できる。
Further, according to the present embodiment, the coating of the holding resin 6 is not performed over the electrode portion 2a of the magnetic film pattern, so that the resin used for the protective resin 6 is limited to a resin that can be printed or photolithographically patterned. Not done. The degree of freedom in selecting the protective resin 6 is increased, a material having excellent characteristics can be used, and the reliability of the magnetoresistive element can be improved.

なお、第1図(G)の状態でハンダ7とその上の保護
樹脂6の密着が良すぎると、ハンダごての熱や振動でも
保護樹脂の被膜をうまく破壊、除去できない場合があ
る。これを防ぐためには保護樹脂6をコーティングする
前にハンダ7上に離形剤ないし剥離剤をあらかじめ塗布
しておく。これによりハンダ7と保護樹脂6の密着度が
下がるため、熱及び振動等により保護樹脂6の被膜を容
易に破壊、除去できる。
If the solder 7 and the protective resin 6 thereon are too tight in the state shown in FIG. 1 (G), the protective resin film may not be successfully destroyed or removed even by the heat or vibration of the soldering iron. To prevent this, a release agent or a release agent is applied on the solder 7 before coating the protective resin 6. This reduces the degree of adhesion between the solder 7 and the protective resin 6, so that the coating of the protective resin 6 can be easily broken and removed by heat, vibration, and the like.

[発明の効果] 以上の説明から明らかなように本発明による磁気抵抗
素子の製造方法においては、基板上に磁気抵抗素子の本
体としての磁性膜の所定パターンを多数形成する工程
と、該工程後に前記パターンの接続端子を接続する電極
部にハンダを溶着する工程と、該工程後に前記基板の前
記パターン形成面の全体を保護用の樹脂で被覆する工程
と、該工程後に前記基板を磁気抵抗素子の1単位毎に切
断する工程と、該工程後に前記樹脂の前記ハンダ上の部
分を除去し、露出したハンダを介して前記電極部に接続
端子をハンダ付する工程を有する構成を採用したので、
特に保護用の樹脂の被覆工程に関して工程を簡略化で
き、コストダウンが図れる。また、保護用の樹脂の選択
の自由度が増し、特性の優れたものを用いて磁気抵抗素
子の信頼性を向上できる。さらに保護用の樹脂のコーテ
ィングの厚さを適当に設定でき、磁気抵抗素子の特性を
向上できる等の優れた効果が得られる。
[Effects of the Invention] As is clear from the above description, in the method of manufacturing a magnetoresistive element according to the present invention, a step of forming a plurality of predetermined patterns of a magnetic film as a main body of the magnetoresistive element on a substrate, and after the step, A step of welding solder to an electrode portion connecting the connection terminals of the pattern; a step of covering the entire pattern forming surface of the substrate with a protective resin after the step; and a step of attaching the substrate to the magnetoresistive element after the step. And a step of cutting the unit of the resin and removing a portion of the resin on the solder after the step, and soldering a connection terminal to the electrode portion through the exposed solder.
In particular, the step of covering the protective resin can be simplified, and the cost can be reduced. Further, the degree of freedom in selecting a protective resin is increased, and the reliability of the magnetoresistive element can be improved by using a resin having excellent characteristics. Further, the thickness of the coating of the protective resin can be appropriately set, and excellent effects such as improvement of the characteristics of the magnetoresistive element can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

第1図(A)〜(H)は本発明方法の実施例による磁気
抵抗素子の製造工程の説明図、第2図(A)〜(F)は
従来の磁気抵抗素子の製造工程の説明図である。 1……基板、2……磁性膜パターン 2a……電極部、3……保護膜 5……接続端子、6……保護樹脂 7……ハンダ
1 (A) to 1 (H) are explanatory views of a manufacturing process of a magnetoresistive element according to an embodiment of the method of the present invention, and FIGS. 2 (A) to 2 (F) are explanatory views of a manufacturing process of a conventional magnetoresistive element. It is. DESCRIPTION OF SYMBOLS 1 ... Substrate 2, ... Magnetic film pattern 2a ... Electrode part, 3 ... Protective film 5 ... Connection terminal, 6 ... Protective resin 7 ... Solder

───────────────────────────────────────────────────── フロントページの続き (72)発明者 佐野 秀人 埼玉県秩父市大字下影森1248番地 キヤ ノン電子株式会社内 (72)発明者 林 久範 埼玉県秩父市大字下影森1248番地 キヤ ノン電子株式会社内 (72)発明者 大里 毅 埼玉県秩父市大字下影森1248番地 キヤ ノン電子株式会社内 ──────────────────────────────────────────────────の Continuing on the front page (72) Inventor Hideto Sano 1248 Shimokagemori, Chiba-shi, Saitama Prefecture Within Canon Electronics Co., Ltd. (72) Inventor Hisanori Hayashi 1248 Shimogaemori, Chichibu-shi, Saitama Within the company (72) Inventor Takeshi Osato 1248 Shimokagemori, Chichibu City, Saitama Prefecture Within Canon Electronics Co., Ltd.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】基板上に磁気抵抗素子の本体としての磁性
膜の所定パターンを多数形成する工程と、該工程後に前
記パターンの接続端子を接続する電極部にハンダを溶着
する工程と、該工程後に前記基板の前記パターン形成面
の全体を保護用の樹脂で被覆する工程と、該工程後に前
記基板を磁気抵抗素子の1単位毎に切断する工程と、該
工程後に前記樹脂の前記ハンダ上の部分を除去し、露出
したハンダを介して前記電極部に接続端子をハンダ付け
する工程を有することを特徴とする磁気抵抗素子の製造
方法。
A step of forming a large number of predetermined patterns of a magnetic film as a main body of a magnetoresistive element on a substrate; a step of welding solder to an electrode portion connecting the connection terminals of the pattern after the step; A step of covering the whole of the pattern forming surface of the substrate with a protective resin, a step of cutting the substrate for each unit of the magnetoresistive element after the step, and a step of cutting the resin on the solder after the step. A method for manufacturing a magnetoresistive element, comprising a step of removing a portion and soldering a connection terminal to the electrode portion via exposed solder.
JP62183471A 1987-07-24 1987-07-24 Method of manufacturing magnetoresistive element Expired - Lifetime JP2607528B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62183471A JP2607528B2 (en) 1987-07-24 1987-07-24 Method of manufacturing magnetoresistive element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62183471A JP2607528B2 (en) 1987-07-24 1987-07-24 Method of manufacturing magnetoresistive element

Publications (2)

Publication Number Publication Date
JPS6428976A JPS6428976A (en) 1989-01-31
JP2607528B2 true JP2607528B2 (en) 1997-05-07

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP62183471A Expired - Lifetime JP2607528B2 (en) 1987-07-24 1987-07-24 Method of manufacturing magnetoresistive element

Country Status (1)

Country Link
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Also Published As

Publication number Publication date
JPS6428976A (en) 1989-01-31

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