JP2578521C - - Google Patents

Info

Publication number

JP2578521C

JP2578521C JP2578521C JP 2578521 C JP2578521 C JP 2578521C JP 2578521 C JP2578521 C JP 2578521C

Authority

JP

Japan

Prior art keywords

foil

aluminum foil

surface layer

etching

ppm

Prior art date

1998-11-25

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired - Lifetime

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• 239000011888 foil Substances 0.000 claims description 45
• 229910052782 aluminium Inorganic materials 0.000 claims description 27
• XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 27
• 239000002344 surface layer Substances 0.000 claims description 18
• 239000003990 capacitor Substances 0.000 claims description 7
• 239000012535 impurity Substances 0.000 claims description 3
• 238000005530 etching Methods 0.000 description 17
• 230000000694 effects Effects 0.000 description 6
• 238000000137 annealing Methods 0.000 description 5
• VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
• MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
• 238000004519 manufacturing process Methods 0.000 description 3
• 238000005096 rolling process Methods 0.000 description 3
• QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
• 239000010953 base metal Substances 0.000 description 2
• 229910052797 bismuth Inorganic materials 0.000 description 2
• 238000005266 casting Methods 0.000 description 2
• 238000005097 cold rolling Methods 0.000 description 2
• 230000007547 defect Effects 0.000 description 2
• 238000009826 distribution Methods 0.000 description 2
• 238000010438 heat treatment Methods 0.000 description 2
• 238000005098 hot rolling Methods 0.000 description 2
• 229910052738 indium Inorganic materials 0.000 description 2
• 229910052745 lead Inorganic materials 0.000 description 2
• 239000007788 liquid Substances 0.000 description 2
• 238000002844 melting Methods 0.000 description 2
• 230000008018 melting Effects 0.000 description 2
• 238000000034 method Methods 0.000 description 2
• 239000004115 Sodium Silicate Substances 0.000 description 1
• 239000010405 anode material Substances 0.000 description 1
• 230000000052 comparative effect Effects 0.000 description 1
• 150000001875 compounds Chemical class 0.000 description 1
• 238000007796 conventional method Methods 0.000 description 1
• 230000007797 corrosion Effects 0.000 description 1
• 238000005260 corrosion Methods 0.000 description 1
• 239000013078 crystal Substances 0.000 description 1
• 238000009792 diffusion process Methods 0.000 description 1
• 238000004090 dissolution Methods 0.000 description 1
• 239000007772 electrode material Substances 0.000 description 1
• 238000000866 electrolytic etching Methods 0.000 description 1
• 238000007654 immersion Methods 0.000 description 1
• 229910052751 metal Inorganic materials 0.000 description 1
• 239000002184 metal Substances 0.000 description 1
• 150000002739 metals Chemical class 0.000 description 1
• 235000006408 oxalic acid Nutrition 0.000 description 1
• RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
• 235000012239 silicon dioxide Nutrition 0.000 description 1
• NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
• 229910052911 sodium silicate Inorganic materials 0.000 description 1