JP2520592Y2 - 減圧排気装置 - Google Patents

減圧排気装置

Info

Publication number
JP2520592Y2
JP2520592Y2 JP1989046776U JP4677689U JP2520592Y2 JP 2520592 Y2 JP2520592 Y2 JP 2520592Y2 JP 1989046776 U JP1989046776 U JP 1989046776U JP 4677689 U JP4677689 U JP 4677689U JP 2520592 Y2 JP2520592 Y2 JP 2520592Y2
Authority
JP
Japan
Prior art keywords
exhaust
pump
air
valve
decompression
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1989046776U
Other languages
English (en)
Japanese (ja)
Other versions
JPH02140971U (US20100012521A1-20100121-C00001.png
Inventor
久晴 清田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP1989046776U priority Critical patent/JP2520592Y2/ja
Publication of JPH02140971U publication Critical patent/JPH02140971U/ja
Application granted granted Critical
Publication of JP2520592Y2 publication Critical patent/JP2520592Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP1989046776U 1989-04-20 1989-04-20 減圧排気装置 Expired - Lifetime JP2520592Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989046776U JP2520592Y2 (ja) 1989-04-20 1989-04-20 減圧排気装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989046776U JP2520592Y2 (ja) 1989-04-20 1989-04-20 減圧排気装置

Publications (2)

Publication Number Publication Date
JPH02140971U JPH02140971U (US20100012521A1-20100121-C00001.png) 1990-11-26
JP2520592Y2 true JP2520592Y2 (ja) 1996-12-18

Family

ID=31562144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989046776U Expired - Lifetime JP2520592Y2 (ja) 1989-04-20 1989-04-20 減圧排気装置

Country Status (1)

Country Link
JP (1) JP2520592Y2 (US20100012521A1-20100121-C00001.png)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100498467B1 (ko) * 2002-12-05 2005-07-01 삼성전자주식회사 배기 경로에서의 파우더 생성을 방지할 수 있는 원자층증착 장비
JP5504107B2 (ja) * 2010-09-06 2014-05-28 エドワーズ株式会社 逆流防止システム及び該逆流防止システムを備えた真空ポンプ
JP6685204B2 (ja) * 2016-08-26 2020-04-22 東京エレクトロン株式会社 安全装置、安全システム及び燃焼除害装置の安全化方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6024057U (ja) * 1983-07-27 1985-02-19 日本電子株式会社 電子顕微鏡等の排気装置
JPS63141893U (US20100012521A1-20100121-C00001.png) * 1987-03-10 1988-09-19
JPH01134782U (US20100012521A1-20100121-C00001.png) * 1988-03-07 1989-09-14

Also Published As

Publication number Publication date
JPH02140971U (US20100012521A1-20100121-C00001.png) 1990-11-26

Similar Documents

Publication Publication Date Title
US7278831B2 (en) Apparatus and method for control, pumping and abatement for vacuum process chambers
JP5996834B2 (ja) 真空排気装置
JP3486821B2 (ja) 処理装置及び処理装置内の被処理体の搬送方法
KR100271758B1 (ko) 반도체장치 제조설비 및 이의 구동방법
JPH0864578A (ja) 半導体製造装置及び半導体製造装置のクリーニング方法
JP2010504847A5 (US20100012521A1-20100121-C00001.png)
KR100384907B1 (ko) 진공 장치
US5714011A (en) Diluted nitrogen trifluoride thermal cleaning process
JPH0339198B2 (US20100012521A1-20100121-C00001.png)
JP2520592Y2 (ja) 減圧排気装置
US20080295867A1 (en) Method of cleaning turbo pump and chamber/turbo pump clean process
JPH04100222A (ja) 真空処理方法
JP2849255B2 (ja) 高性能半導体製造用の排気システムおよびその制御方法
JP3079077B2 (ja) 有機金属気相成長装置
KR100992128B1 (ko) 액정 표시 장치용 처리 시스템
US6544488B1 (en) Method for decomposing a cleaning gas for cleaning a film deposition chamber
JPH0715131Y2 (ja) 有機金属気相成長装置
JPS63285924A (ja) 半導体製造装置
KR970003595Y1 (ko) 역류방지장치가 구비된 플라즈마 화학기상증착장비
KR200165747Y1 (ko) 반도체소자 제조를 위한 저압화학기상증착 프로세스용 공정가스 퍼지 시스템
JPS62222630A (ja) 気相反応処理装置
KR0156320B1 (ko) 반도체 저압 화학기상증착 방법
JPH07249617A (ja) 化学気相成長方法及びそれに用いる化学気相成長装置
CN112460285A (zh) 真空压力计的寿命提升装置和方法
KR20070008301A (ko) 배기 가스 처리 시스템

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term