JP2518283Y2 - 排気ガス処理装置 - Google Patents
排気ガス処理装置Info
- Publication number
- JP2518283Y2 JP2518283Y2 JP4132589U JP4132589U JP2518283Y2 JP 2518283 Y2 JP2518283 Y2 JP 2518283Y2 JP 4132589 U JP4132589 U JP 4132589U JP 4132589 U JP4132589 U JP 4132589U JP 2518283 Y2 JP2518283 Y2 JP 2518283Y2
- Authority
- JP
- Japan
- Prior art keywords
- exhaust gas
- exhaust
- pump
- reaction furnace
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000012545 processing Methods 0.000 claims description 48
- 238000006243 chemical reaction Methods 0.000 claims description 45
- 238000005229 chemical vapour deposition Methods 0.000 claims description 7
- 230000006837 decompression Effects 0.000 claims description 5
- 238000011144 upstream manufacturing Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 84
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 18
- 208000037998 chronic venous disease Diseases 0.000 description 17
- 239000000126 substance Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- 239000011550 stock solution Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000005587 bubbling Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010129 solution processing Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4132589U JP2518283Y2 (ja) | 1989-04-08 | 1989-04-08 | 排気ガス処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4132589U JP2518283Y2 (ja) | 1989-04-08 | 1989-04-08 | 排気ガス処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02132658U JPH02132658U (https=) | 1990-11-05 |
| JP2518283Y2 true JP2518283Y2 (ja) | 1996-11-27 |
Family
ID=31551894
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4132589U Expired - Lifetime JP2518283Y2 (ja) | 1989-04-08 | 1989-04-08 | 排気ガス処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2518283Y2 (https=) |
-
1989
- 1989-04-08 JP JP4132589U patent/JP2518283Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02132658U (https=) | 1990-11-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6468490B1 (en) | Abatement of fluorine gas from effluent | |
| FI117980B (fi) | Menetelmä ohutkalvon kasvattamiseksi alustalle | |
| US20010015133A1 (en) | Gas recovery system and gas recovery method | |
| CN107868944A (zh) | 一种氮化钛原子层沉积装置及其沉积方法 | |
| JP2001323374A (ja) | 気相反応物を反応室内へ供給するための方法および装置 | |
| JPWO2000009258A1 (ja) | フッ素含有化合物を含む排ガスの処理方法及び装置 | |
| CN112458435A (zh) | 原子层沉积设备及清洗方法 | |
| US20090314626A1 (en) | Method for treating effluents containing fluorocompounds like pfc and hfc | |
| JP3214698B2 (ja) | ガス状水素化物の除去方法 | |
| CN104066989B (zh) | 用于排空腔室并净化从所述腔室抽取的气体的装置和方法 | |
| JP2518283Y2 (ja) | 排気ガス処理装置 | |
| JPH08261400A (ja) | 汚染および粒状物を最小限にして、超高純度ガスを分配供給する方法 | |
| KR101957440B1 (ko) | 플라즈마 반응을 이용한 유해가스 처리기를 구비하는 배관 장치 및 이를 포함하는 유해가스 처리설비 | |
| JPS6235807B2 (https=) | ||
| CN215112011U (zh) | 一种用于氟氪氖激光混合气的配置系统 | |
| JP6829649B2 (ja) | 堆積物の除去方法、及び堆積物の除去装置 | |
| JP3554390B2 (ja) | デカボランガスの酸化処理法 | |
| US20070128358A1 (en) | Chemical vapour deposition apparatus | |
| CN111826637A (zh) | 气体输送系统、半导体设备和气体输送方法 | |
| JPH0686661B2 (ja) | 気相成長装置 | |
| JP3617575B2 (ja) | 真空排気システム | |
| CN111304633A (zh) | 气相沉积设备以及气相沉积方法 | |
| JPS5950165A (ja) | 減圧反応装置 | |
| JP2000319433A (ja) | フッ素ガスを用いる表面処理装置 | |
| WO2001020221A1 (en) | Dewatering method for gas supply systems |