JP2507592B2 - Optical recording medium - Google Patents

Optical recording medium

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Publication number
JP2507592B2
JP2507592B2 JP1104576A JP10457689A JP2507592B2 JP 2507592 B2 JP2507592 B2 JP 2507592B2 JP 1104576 A JP1104576 A JP 1104576A JP 10457689 A JP10457689 A JP 10457689A JP 2507592 B2 JP2507592 B2 JP 2507592B2
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JP
Japan
Prior art keywords
layer
optical recording
metal film
recording medium
examples
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP1104576A
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Japanese (ja)
Other versions
JPH02285533A (en
Inventor
昌彦 関谷
潔 千葉
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Teijin Ltd
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Teijin Ltd
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Description

【発明の詳細な説明】 [利用分野] 本発明は、レーザ等の光により情報の記録・再生・消
去等を行う光記録媒体に関する。更に詳細には、保護層
又は/及び反射層として金属膜を有する光記録媒体に関
する。
TECHNICAL FIELD The present invention relates to an optical recording medium for recording / reproducing / erasing information by using light from a laser or the like. More specifically, it relates to an optical recording medium having a metal film as a protective layer and / or a reflective layer.

[従来技術] 光記録媒体は高密度・大容量の情報記録媒体として種
々の研究が行なわれている。特に情報の書き換え可能な
光磁気記録媒体は応用分野が広く種々の材料・システム
が発表されておりその実用化が待望されている。
[Prior Art] Various studies have been conducted on optical recording media as high-density, large-capacity information recording media. In particular, information rewritable magneto-optical recording media have a wide range of application fields and various materials and systems have been announced, and their practical application is expected.

上述の光磁気記録材料としては、例えば特開昭52−31
703号公報記載のTbFe,特開昭58−73746号公報記載のTbF
eCo,DyFeCo等、既に多くの提案がある。しかし、これら
の光磁気記録媒体の実用化には、記録再生特性及び耐久
性のより一層の向上が必要と言われている。
As the above-mentioned magneto-optical recording material, for example, JP-A-52-31
TbFe described in JP 703, TbF described in JP-A-58-73746
There are already many proposals such as eCo and DyFeCo. However, in order to put these magneto-optical recording media into practical use, it is said that further improvement in recording / reproducing characteristics and durability is required.

この解決策として、記録・再生特性向上のためには、
透明基板と記録層の間に透明な誘電体層を設ける方法、
及びまたは記録層の裏面に反射層を設ける方法等が検討
されている。これらは、エンハンスメント効果により、
見かけの磁気光学効果を高め、CN比の向上をはかるとい
うものである。反射層としては、現在各種の検討が行わ
れているが再生CN比を高めるためには、性能指数√R・
θk(R:反射率,θk:Kerr回転角)を高める必要があ
り、そのためには反射率の高いAl,Cu,Ag,Au等を反射膜
として用いるのが好ましいとされている。ところが、こ
れらの材料は熱伝導率が高いためにレーザー光で加熱し
てビットを記録する際の熱の拡散が大きく、ビット形状
の乱れを生じ、CN比が低下してしまうという欠点があ
る。
As a solution to this, in order to improve the recording / playback characteristics,
A method of providing a transparent dielectric layer between the transparent substrate and the recording layer,
And / or a method of providing a reflective layer on the back surface of the recording layer has been studied. These are due to the enhancement effect
It is intended to enhance the apparent magneto-optical effect and improve the CN ratio. Various studies are currently being conducted on the reflective layer, but in order to increase the reproduction CN ratio, a performance index √R ·
It is necessary to increase θk (R: reflectance, θk: Kerr rotation angle), and for that purpose, it is said that it is preferable to use Al, Cu, Ag, Au or the like having high reflectance as the reflective film. However, since these materials have high thermal conductivity, there is a drawback in that the heat is diffused greatly when the bit is recorded by heating with a laser beam, the bit shape is disturbed, and the CN ratio is lowered.

また、この金属反射層に、記録層の腐食を防止するた
めの保護層としての役割も兼ね備えさせると構成が簡単
になるが、前述のAl,Cu,Ag,Au等は耐環境性試験による
ピンホールの発生の問題があり、また更に一層の耐久性
の向上のためその上に有機保護層を設けた場合にはその
樹脂中に残存する塩素や酸による記録層及び/または金
属層自身の劣化等の問題があり、かかる金属層のより一
層の改良が必要であることがわかった。
In addition, if this metal reflective layer also serves as a protective layer for preventing corrosion of the recording layer, the structure will be simple, but the above-mentioned Al, Cu, Ag, Au, etc. will There is a problem of generation of holes, and when an organic protective layer is further provided to further improve durability, the recording layer and / or the metal layer itself is deteriorated by chlorine and acid remaining in the resin. However, it has been found that further improvement of such a metal layer is necessary.

[発明の目的] 本発明はかかる現状に鑑みなされたもので、前記の保
護層又は/及び反射層として金属膜が設けられた光記録
媒体、中でも光磁気記録媒体の記録・再生特性及び耐久
性の一層の向上を目的とするものである。具体的には、
該金属膜の耐湿性,耐酸性を改良して媒体全体の耐久性
を向上させること、該金属膜を反射率が実用上十分で熱
伝導性の低いものに改良することにより、記録ビット形
状を安定化すると同時に再生信号の反射光量を高めるこ
とで記録・再生特性の向上をはかることである。
[Object of the Invention] The present invention has been made in view of the above circumstances, and is the recording / reproducing characteristics and durability of an optical recording medium provided with a metal film as the protective layer and / or the reflective layer, particularly, the magneto-optical recording medium. The purpose is to further improve. In particular,
By improving the moisture resistance and acid resistance of the metal film to improve the durability of the entire medium, and improving the metal film to have a practically sufficient reflectance and low thermal conductivity, the recording bit shape can be improved. It is intended to improve the recording / reproducing characteristics by stabilizing and stabilizing the amount of reflected light of the reproduced signal.

[発明の構成・作用] 上述の目的は、以下の本発明により達成される。[Structure / Operation of the Invention] The above-mentioned object is achieved by the present invention described below.

即ち、本発明は保護層又は/及び反射層として金属膜
を有する光記録媒体において、該金属膜が、Al,Cu,Ag,A
uからなる群から選ばれた少なくとも1種の金属元素M
とReとの合金からなることを特徴とする光記録媒体であ
る。
That is, the present invention provides an optical recording medium having a metal film as a protective layer and / or a reflective layer, wherein the metal film is Al, Cu, Ag, A
at least one metal element M selected from the group consisting of u
It is an optical recording medium characterized by comprising an alloy of Re and Re.

上述の本発明は以下のようにしてなされたものであ
る。すなわち前述の反射性能の良いAl,Cu,Ag,Auの金属
膜の欠点解消を他の元素の添加に着目し種々を検討した
ところ、Reの添加によりAl,Cu,Ag,Auのみからなる反射
膜を用いる場合に比べ、ビット記録時の感度、ならびに
CN比が向上すると共に媒体の耐久性も大幅に改善される
ことを見出し、なされたものである。なおかかる改善
は、Reを添加することにより、金属膜の熱伝導率が低減
され、ビット記録時の熱の拡散が抑えられるため、ビッ
ト形状の安定化が実現されたこと並びに膜自体の耐湿
性,耐酸性が改善されたことによるものと考えられる。
The present invention described above has been made as follows. That is, various investigations were performed by focusing on the addition of other elements to solve the drawbacks of the metal film of Al, Cu, Ag, and Au with good reflection performance described above, and by adding Re, reflection consisting of only Al, Cu, Ag, Au Sensitivity at the time of bit recording, and
It was made by finding that the CN ratio is improved and the durability of the medium is also greatly improved. The improvement is that the addition of Re reduces the thermal conductivity of the metal film and suppresses the diffusion of heat during bit recording, thus stabilizing the bit shape and improving the moisture resistance of the film itself. It is thought that this is due to the improved acid resistance.

上述の点より本発明の金属膜は、反射性能の良いAl,C
u,Ag,Auよりなる群より選ばれた少なくとも1種の金属
元素MとReとの合金M100-xRex(xは原子%)からなる
ものである。この合金膜中のRe含有量xは、記録時の熱
拡散を抑え且つ膜自身及び媒体全体の耐久性を高める点
から1at(原子)%以上である。そして、保護層として
の耐久性向上面からReは多いほど好ましいが、コスト等
の実用面から保護層としては、95at%以下が好ましい。
又Reが多過ぎると反射率が低下するため反射層として用
いる場合には80at%以下が好ましい。更にReが高価であ
ることを考えるといずれの場合もReの含有量xは、50at
%以下が特に好ましい。
From the above points, the metal film of the present invention, Al, C with good reflection performance
It is composed of an alloy M 100-x Re x (x is atomic%) of at least one metal element M selected from the group consisting of u, Ag and Au and Re. The Re content x in this alloy film is 1 at (atom)% or more from the viewpoint of suppressing thermal diffusion during recording and enhancing durability of the film itself and the entire medium. From the viewpoint of improving the durability of the protective layer, the larger Re is, the more preferable. However, from the practical viewpoint of cost and the like, the protective layer is preferably 95 at% or less.
Further, if the content of Re is too large, the reflectance decreases, so that when used as a reflective layer, it is preferably 80 at% or less. Furthermore, considering that Re is expensive, the Re content x is 50 at in both cases.
% Or less is particularly preferable.

また、本発明の金属膜の特性から、光磁気記録媒体等
の透明基板と記録層との間に該金属膜を設けることによ
り、特にプラスチックス基板を用いた場合の、基板から
記録層への水分,酸素,塩素等の拡散を抑え、耐酸化
性,耐透湿性の向上を実現でき、また、中でも透明誘電
体層と記録層の間に設けることにより、誘電体層から記
録層への水分,酸素,塩素等の拡散が抑えられ、媒体全
体の耐久性を向上できる。
Further, from the characteristics of the metal film of the present invention, by providing the metal film between the transparent substrate such as a magneto-optical recording medium and the recording layer, particularly when a plastic substrate is used, the substrate to the recording layer is changed. The diffusion of moisture, oxygen, chlorine, etc. can be suppressed, and the oxidation resistance and moisture permeability can be improved. In particular, by providing the transparent dielectric layer and the recording layer, the moisture from the dielectric layer to the recording layer can be improved. The diffusion of oxygen, chlorine, etc. is suppressed, and the durability of the entire medium can be improved.

この金属膜の膜厚は、基板側からの記録・再生の面か
ら50Å以下であることが必要で、特に媒体のCN比を高め
るという点から20Å以下が好ましい。一方反射層として
用いる場合の前記金属膜の膜厚は、500Å以上であれば
充分である。
The thickness of this metal film needs to be 50 Å or less from the viewpoint of recording / reproducing from the substrate side, and particularly 20 Å or less from the viewpoint of increasing the CN ratio of the medium. On the other hand, when the metal film is used as the reflective layer, the film thickness of 500 Å or more is sufficient.

ところで、前述の合金M100-xRexよりなる金属膜に、
更にCr,Ti,Ta,Zrの群より選ばれた1種以上の添加元素
Nを添加することにより、金属膜の保護性能具体的には
耐酸性,耐透湿性をさらに向上させることができ、媒体
の耐久性を一層向上させることができる。その組成はこ
の合金膜の元素組成を一般式(M100-xRex100-yNy(x,
yは原子%)と表わしたとき、金属元素Mの含有量xは
前述の通りである。また、添加元素Nの含有量yの範囲
は添加量を増すことで耐久性を向上することは可能であ
るが合金膜自身の反射率が低下しすぎないように設定す
る必要があり好ましくは50at%以下さらに好ましくは30
at%以下である。
By the way, in the metal film made of the above-mentioned alloy M 100-x Re x ,
Furthermore, by adding at least one additive element N selected from the group consisting of Cr, Ti, Ta, and Zr, it is possible to further improve the protective performance of the metal film, specifically, acid resistance and moisture permeability. The durability of the medium can be further improved. Its composition is the elemental composition of this alloy film expressed by the general formula (M 100-x Re x ) 100-y N y (x,
When y is expressed in atomic%), the content x of the metal element M is as described above. Further, the range of the content y of the additional element N can be improved by increasing the addition amount, but it is necessary to set it so that the reflectance of the alloy film itself is not excessively lowered, and preferably 50 at % Or less, more preferably 30
It is at% or less.

本発明における前記金属膜の製造方法としては、公知
の真空蒸着法、スパッタリング法等の物理蒸着(PVD)
法等の薄膜形成法で作られるが、高温高湿耐環境性試験
で生じる剥離・亀裂を生じさせないために、界面での接
着性が大きい膜を作製することが好ましく、この為には
スパッタリング法が好ましい。
As a method for producing the metal film in the present invention, known vacuum vapor deposition method, physical vapor deposition (PVD) such as sputtering method, etc.
Although it is formed by a thin film forming method such as a sputtering method, it is preferable to form a film with high adhesiveness at the interface in order to prevent peeling and cracking that occur in the high temperature and high humidity environment resistance test. For this purpose, the sputtering method is used. Is preferred.

本発明の光記録媒体の記録層としては、公知のコンパ
クトディスクのピット方式,光磁気記録方式,相変化記
録方式等全て適用できるが、中でも前述の問題を有する
光磁気記録方式に効果的に適用できる。かかる光磁気記
録方式の記録層としては光磁気効果により記録・再生で
きるものであればよく、公知の膜面に垂直な方向に磁化
容易方向を有し、任意の反転磁区を作ることにより光磁
気効果に基いて情報の記録・再生が可能な磁性金属薄
膜、例えば公知のTbFeCo合金,GdTbFe合金,NdDyFeCo合
金,NdFe合金,PrFe合金,CeFe合金等が適用できる。これ
らは公知の真空蒸着法,スパッタリング法等で作製でき
る。
As the recording layer of the optical recording medium of the present invention, all known pit systems of compact discs, magneto-optical recording systems, phase change recording systems and the like can be applied, but among them, it is effectively applied to the magneto-optical recording system having the above-mentioned problems. it can. The recording layer of such a magneto-optical recording system may be any layer capable of recording / reproducing by the magneto-optical effect, and it has a direction of easy magnetization in a direction perpendicular to a known film surface, and a magneto-optical layer is formed by forming an arbitrary inversion domain. A magnetic metal thin film capable of recording / reproducing information based on the effect, for example, a known TbFeCo alloy, GdTbFe alloy, NdDyFeCo alloy, NdFe alloy, PrFe alloy, CeFe alloy or the like can be applied. These can be produced by a known vacuum vapor deposition method, sputtering method or the like.

本発明の光記録媒体の透明基板としてはポリカーボネ
ート樹脂,アクリル樹脂,エポキシ樹脂,4−メチル−ペ
ンテン樹脂などまたそれらの共重合体による合成樹脂基
板またはガラス基板などが適用できるが、機械強度,耐
候性,耐熱性,透湿性,コストの点でポリカーボネート
樹脂基板が好ましい。
As the transparent substrate of the optical recording medium of the present invention, a polycarbonate resin, an acrylic resin, an epoxy resin, a 4-methyl-pentene resin, or the like, or a synthetic resin substrate or a glass substrate made of a copolymer thereof can be applied. A polycarbonate resin substrate is preferable in terms of heat resistance, heat resistance, moisture permeability, and cost.

本発明の光記録媒体において干渉によるエンハンス効
果を得るため記録層と基板との間に設ける透明誘電体層
及び/または、記録層の基板と反対側に設ける透明誘電
体層としては、外界から記録層への酸素,水分,塩素等
の侵入を防ぐため、亀裂・ピンホールの少ない物質が好
ましくAIN,MgF2,ZnS,CeF3 AlF3 3NaF,SiN4,SiO,SiO2,Ti
O2,ZrO3,InO3,SnO2,AlO3,TaO5,BiO3などの窒化物,弗化
物,酸化物,硫化物、またはこれらの複合体などが適用
できる。これらは公知の真空蒸着法、スパッタリング法
等で作製できる。
In the optical recording medium of the present invention, the transparent dielectric layer provided between the recording layer and the substrate and / or the transparent dielectric layer provided on the opposite side of the recording layer from the substrate in order to obtain an enhancing effect due to interference is recorded from the outside. In order to prevent oxygen, moisture, chlorine, etc. from entering the layer, a material with few cracks and pinholes is preferred. AIN, MgF 2 , ZnS, CeF 3 AlF 3 3NaF, SiN 4 , SiO, SiO 2 , Ti
O 2, ZrO 3, InO 3 , SnO 2, AlO 3, TaO 5, nitrides such as BiO 3, fluorides, oxides, can be applied, such as sulfides, or complexes thereof. These can be produced by a known vacuum vapor deposition method, sputtering method, or the like.

上述の本発明の作用効果は以下の通りである。 The effects of the present invention described above are as follows.

透明基板上に、保護層又は/及び反射層として金属膜
を有する光記録媒体において、前述の通り金属層として
代表的な公知のAl,Cu,Ag,Au等の金属もしくはこれらの
合金を用いてディスクを構成した場合、これらの材料は
熱伝導率が大きいために、レーザー光で加熱してビット
を記録する際に、加熱部分から前記金属層への熱の拡散
が大きく、記録ビット形状が乱れ、CN比も低下してしま
う。これに対して本発明による、Al,Cu,Ag,Auの群から
選ばれた少なくとも1種の金属元素とRe金属との合金膜
を用いた光記録媒体では後述の実施例の通り記録ビット
形状の乱れがなく、CN比も向上できる。これは、該合金
膜の熱伝導率が小さいために、レーザー光による加熱部
分からの熱拡散が少なく、ビット形状が安定化されたた
めであると考えられる。
In an optical recording medium having a metal film as a protective layer and / or a reflective layer on a transparent substrate, a known metal such as Al, Cu, Ag, Au or an alloy thereof is used as a metal layer as described above. When a disk is constructed, since these materials have high thermal conductivity, when the bit is recorded by heating with a laser beam, the heat is largely diffused from the heated portion to the metal layer, and the recording bit shape is disturbed. , CN ratio will also decrease. On the other hand, according to the present invention, an optical recording medium using an alloy film of at least one kind of metal element selected from the group of Al, Cu, Ag, and Au and Re metal has a recording bit shape as described later in Examples. There is no disturbance and the CN ratio can be improved. It is considered that this is because the thermal conductivity of the alloy film was small, so that the thermal diffusion from the heated portion by the laser light was small and the bit shape was stabilized.

また、前記Reの合金膜を用いた光記録媒体は、Al,Cu,
Ag,Au等の金属もしくはこれらの合金のみからなる金属
膜を用いた場合に比べ、後述の実施例の通り高温高湿雰
囲気下での加速劣化試験における耐久性が大幅に向上す
る。これは、Re金属を添加することにより、膜自身の耐
酸性,耐透湿性が向上したためと考えられる。この効果
は、通常の環境下での長期安定性に対し特に有効とな
る。この点は後述の実施例で本発明のReの合金膜を用い
たディスクでは、光磁気記録層の酸化等によるピンホー
ルの発生は全く見られなかったことからも首肯できる。
Further, the optical recording medium using the Re alloy film, Al, Cu,
As compared with the case where a metal film made of a metal such as Ag or Au or an alloy thereof is used, the durability in the accelerated deterioration test under a high temperature and high humidity atmosphere is significantly improved as in the examples described later. This is considered to be because the addition of the Re metal improved the acid resistance and moisture permeability of the film itself. This effect is particularly effective for long-term stability under normal environment. This point can be confirmed by the fact that no pinholes due to oxidation of the magneto-optical recording layer were found in the disk using the Re alloy film of the present invention in Examples described later.

また、本発明のReの合金膜を、基板と光記録層との間
に設けることにより、基板及び/または透明誘電体層か
らの酸素・塩素・水分等、劣化をひき起こす因子が記録
層に侵入するのを防止することができる。
Further, by providing the Re alloy film of the present invention between the substrate and the optical recording layer, factors causing deterioration such as oxygen, chlorine, and moisture from the substrate and / or the transparent dielectric layer are recorded in the recording layer. It is possible to prevent intrusion.

更に、本発明の前述のReの合金膜に、Cr,Ti,Ta,Zrの
群より選ばれた1種以上の元素を添加することにより、
媒体の耐久性を一層向上させることができる。
Furthermore, by adding one or more elements selected from the group consisting of Cr, Ti, Ta, and Zr to the aforementioned Re alloy film of the present invention,
The durability of the medium can be further improved.

以上の通り、本発明は保護層又は/及び反射層として
金属膜を有する光記録媒体において、該金属層が、Al,C
u,Ag,Auからなる群から選ばれた少なくとも1種の金属
元素とReとの合金膜であること、さらにはこの合金膜に
更にCr,Ti,Ta,Zrの群より選ばれた1種以上の金属を添
加した合金膜であること特徴とし、高記録感度,高CN比
を有し、且つ耐環境性に優れた光記録媒体を実現したも
のであり、工業上大きな寄与をなすものである。
As described above, the present invention is an optical recording medium having a metal film as a protective layer and / or a reflective layer, wherein the metal layer is Al, C
It is an alloy film of Re with at least one metal element selected from the group consisting of u, Ag, and Au, and this alloy film is further selected from the group of Cr, Ti, Ta, and Zr. It is an alloy film containing the above metals added, and has realized an optical recording medium with high recording sensitivity, high CN ratio, and excellent environmental resistance, which makes a great contribution to industry. is there.

以下、本発明を光磁気記録媒体に適用した実施例を説
明する。なお、本発明はかかる実施例に限定されるもの
ではない。
Examples in which the present invention is applied to a magneto-optical recording medium will be described below. The present invention is not limited to this embodiment.

[実施例1〜8] 以下のようにして第1図に示す構成の光磁気記録媒体
を作成し評価した。
Examples 1 to 8 The magneto-optical recording medium having the structure shown in FIG. 1 was prepared and evaluated as follows.

直径130mm,厚さ1.2mmの円盤で、1.6μmピッチのグル
ープを有するポリカーボネート樹脂(PC)のディスク基
板1を、3ターゲットの高周波マグネトロンスパッタ装
置(アネルバ(株)製、SPF−430H型)の真空層内に固
定し、4×10-7Torr以下になるまで排気する。なお、膜
形成においては基板1は15rpmで基板中心点回りに回転
させた。
A polycarbonate resin (PC) disk substrate 1 having a diameter of 130 mm and a thickness of 1.2 mm and having a group of 1.6 μm pitch is used as a vacuum for a 3-target high-frequency magnetron sputtering device (SPF-430H type manufactured by Anerva Co., Ltd.). Fix in the bed and evacuate to below 4 × 10 -7 Torr. In the film formation, the substrate 1 was rotated at 15 rpm around the substrate center point.

次に、Ar/N2混合ガス(N2含有量:30Vol%)を真空槽
内に導入し、圧力5mTorrになるようにAr/N2混合ガスの
流量を調整した。ターゲットとしては、直径100mm,厚さ
5mmで、Al50Si50(添数字は組成(原子%)を示す)の
焼結体からなる円盤を用い、放電電力100W,放電周波数1
3.56MHzの放電条件で高周波スパッタリングを行い、誘
電体層2としてAlSiNを約800Å堆積した。
Next, an Ar / N 2 mixed gas (N 2 content: 30 Vol%) was introduced into the vacuum chamber, and the flow rate of the Ar / N 2 mixed gas was adjusted so that the pressure was 5 mTorr. The target is 100mm in diameter and thickness
A disc made of a sintered body of 5 mm and having an Al 50 Si 50 ratio (subscripts indicate composition (atomic%)) was used. Discharge power was 100 W and discharge frequency was 1
High frequency sputtering was performed under a discharge condition of 3.56 MHz to deposit about 800 Å AlSiN as the dielectric layer 2.

続いて前面保護層3として、ターゲットを、Alの円盤
上に、表1の各サンプルの金属膜に対応してRe,Cr,Ti,T
a,Zrの各チップ(5×5×1mmt)を適宜配置したものに
変え、Arガス(5N)を真空槽内に導入し、前述と同じ放
電条件で前面保護層3の金属膜を約15Å堆積した。膜組
成は、表1の実施例1〜8の各サンプルの金属膜組成の
欄に示した値となるようチップの数を調整した。
Then, as the front surface protective layer 3, the target was placed on the Al disk and was made of Re, Cr, Ti, T corresponding to the metal film of each sample in Table 1.
Each chip of a and Zr (5x5x1mmt) was changed to the one arranged appropriately, Ar gas (5N) was introduced into the vacuum chamber, and the metal film of the front surface protective layer 3 was about 15Å under the same discharge conditions as above. Deposited. The number of chips was adjusted so that the film composition was the value shown in the column of the metal film composition of each sample of Examples 1 to 8 in Table 1.

次に、光磁気記録層4として、ターゲットをTb23Fe69
CO8合金(添数字は組成(原子%)を示す)の円盤に変
え、前述の前面保護層3と同じスパッタ条件でTbFeCo合
金膜を約400Å堆積した。
Next, as the magneto-optical recording layer 4, the target was Tb 23 Fe 69
A disk of CO 8 alloy (subscripts indicate composition (atomic%)) was used, and a TbFeCo alloy film of about 400 Å was deposited under the same sputtering conditions as the front protective layer 3 described above.

続いで保護層を兼ねた反射層5としてターゲットを前
述の前面保護層3のターゲットすなわちAlの円盤上に表
1の金属膜に対応してRe,Cr,Ti,Ta,Zrの各チップを配置
したものに戻し、前面保護層3と同じスパッタ条件で前
面保護層3と同じ金属膜を約500Å堆積した。
Next, as the reflective layer 5 which also serves as a protective layer, the target is placed on the target of the front protective layer 3, that is, the disk of Al, and the chips of Re, Cr, Ti, Ta, and Zr are arranged corresponding to the metal film of Table 1. Then, the same metal film as that of the front surface protective layer 3 was deposited under the same sputtering condition as that of the front surface protective layer 3 by about 500Å.

以上の手順で積層構成が第1図に示すところの、PC/A
lSiN/前面保護層/TbFeCo/反射層で、前面保護層3及び
反射層5が表1の金属膜からなる光磁気記録ディスクの
各サンプルを得た。
PC / A whose laminated structure is shown in Fig. 1 by the above procedure
Each sample of the magneto-optical recording disk was prepared in which the front protective layer 3 and the reflective layer 5 were made of the metal film shown in Table 1 in the order of lSiN / front protective layer / TbFeCo / reflection layer.

この各サンプルのCN比(carrier to noise ratio),
及び記録感度の測定には、光磁気記録再生装置(ナカミ
チOMS−1000TypeIII)を用い、1800rpmでディスクを回
転させ、2.0MHzの信号を半導体レーザーで記録したの
ち、0.8mWの半導体レーザー光で再生を行った。記録・
消去時の印加磁界は500エルステッドである。記録時の
最適レーザーパワーは、再生信号の1次高調波と2次高
調波との差が最大となる値とし、これをもって各サンプ
ルの記録感度の比較を行った。測定結果を表1の実施例
1〜8に示す。
CN ratio (carrier to noise ratio) of each sample,
For the measurement of recording sensitivity, a magneto-optical recording / reproducing device (Nakamichi OMS-1000TypeIII) was used, the disc was rotated at 1800 rpm, a 2.0 MHz signal was recorded by a semiconductor laser, and then reproduced by a 0.8 mW semiconductor laser beam. went. Record
The applied magnetic field during erasing is 500 Oersted. The optimum laser power during recording was set to a value that maximizes the difference between the first harmonic and the second harmonic of the reproduced signal, and the recording sensitivity of each sample was compared with this value. The measurement results are shown in Examples 1 to 8 in Table 1.

又各サンプルの表面を目視により観察したところ、ピ
ンホールは観察されなかった。次にこの各サンプルを加
速劣化テスト具体的には80℃85%RHの高温高湿下に500
時間放置した。そしてテスト後のCN比、記録感度を測定
した。結果を表1の実施例1〜8に示す。
When the surface of each sample was visually observed, no pinhole was observed. Next, each of these samples was subjected to an accelerated deterioration test, specifically, 500 at 80 ° C and 85% RH under high temperature and high humidity.
Left for hours. After the test, the CN ratio and recording sensitivity were measured. The results are shown in Examples 1 to 8 in Table 1.

また加速劣化テスト後の各サンプルの表面もピンホー
ルの発生は全く見られなかった。
No pinholes were found on the surface of each sample after the accelerated deterioration test.

[実施例9〜16] 実施例1〜8と全く同じようにしてその前面保護層3
及び反射層5を表1の実施例9〜16に示す組成の金属膜
とする以外は全く同じ構成の第1図に示すPC/AlSiN/前
面保護層/TbFeCo/反射層からなる光磁気ディスクの各サ
ンプルを作成し、評価した。
[Examples 9 to 16] The front protective layer 3 was prepared in the same manner as in Examples 1 to 8.
And a magneto-optical disk composed of PC / AlSiN / front protective layer / TbFeCo / reflective layer shown in FIG. 1 having exactly the same configuration except that the reflective layer 5 is a metal film having the composition shown in Examples 9 to 16 of Table 1. Each sample was prepared and evaluated.

なお、前面保護層3,及び反射層5もターゲットをAgの
円盤上に表1の実施例9〜16の各組成に対応するRe,Cr,
Ti,Ta,Zrの各チップを配置したものを用いる以外は実施
例1〜8と全く同じ条件及び同じ厚さで各金属膜を堆積
した。得られた各サンプルの加速劣化テスト並びにその
前後のCN比、及び記録感度の測定も実施例1〜8と同じ
ようにして行なった。結果を表1の実施例9〜16に示
す。また各サンプルの表面を観察したところ、実施例1
〜8と同様加速劣化テストの前後共にピンホールは観察
されなかった。
The front protective layer 3 and the reflective layer 5 were also prepared by placing the target on a disk of Ag and using Re, Cr, and Corresponding to each composition of Examples 9 to 16 in Table 1.
Each metal film was deposited under exactly the same conditions and the same thickness as in Examples 1 to 8 except that one in which Ti, Ta, and Zr chips were arranged was used. The accelerated deterioration test of each of the obtained samples, the CN ratio before and after the accelerated deterioration test, and the recording sensitivity were measured in the same manner as in Examples 1 to 8. The results are shown in Examples 9 to 16 in Table 1. Further, when the surface of each sample was observed, Example 1
Similar to ~ 8, no pinhole was observed before and after the accelerated deterioration test.

[比較例1,2] 実施例1〜8と全く同じようにしてその前面保護層3
及び反射層5を表1の比較例1,2に示す組成の金属膜と
する以外は全く同じ構成の第1図に示すPC/AlSiN/前面
保護層/TbFeCo/反射層からなる光磁気ディスクの各サン
プルを作成し、評価した。
[Comparative Examples 1 and 2] The front surface protective layer 3 was prepared in the same manner as in Examples 1 to 8.
And a magneto-optical disk composed of PC / AlSiN / front protective layer / TbFeCo / reflection layer shown in FIG. 1 having exactly the same configuration except that the reflection layer 5 is a metal film having the composition shown in Comparative Examples 1 and 2 of Table 1. Each sample was prepared and evaluated.

なお、前面保護層3,及び反射層5もターゲットにAl,A
gの各円盤ターゲットを用いる以外は実施例1〜8と全
く同じ条件及び同じ厚さで各金属膜を堆積した。
The front protective layer 3 and the reflective layer 5 are also used as targets for Al, A
Each metal film was deposited under the same conditions and the same thickness as in Examples 1 to 8 except that each disk target of g was used.

この各サンプルのCN比、及び記録感度を実施例1〜8
と同じ条件で測定した。結果を表1の比較例1,2に示
す。
The CN ratio and the recording sensitivity of each sample are shown in Examples 1 to 8.
It measured on the same conditions as. The results are shown in Comparative Examples 1 and 2 in Table 1.

又各サンプルの表面を観察したところ、ピンホール等
の欠陥は見られなかった。次のこの各サンプルに実施例
1〜8と同じ加速劣化テストをしたところ、サンプルの
前面にわたって腐食が発生しており、CN比、記録感度の
測定はできなかった。
When the surface of each sample was observed, no defects such as pinholes were found. When each of the following samples was subjected to the same accelerated deterioration test as in Examples 1 to 8, corrosion occurred on the front surface of the sample, and the CN ratio and recording sensitivity could not be measured.

[実施例17〜24] 実施例1〜8と全く同じようにしてその前面保護層3
及び反射層5を表2の実施例17〜24に示す組成の金属膜
とする以外は全く同じ構成の第1図に示すPC/AlSiN/前
面保護層/TbFeCo/反射層からなる光磁気ディスクの各サ
ンプルを作成し、評価した。
[Examples 17 to 24] The front protective layer 3 was prepared in the same manner as in Examples 1 to 8.
And a magneto-optical disk composed of PC / AlSiN / front surface protective layer / TbFeCo / reflection layer shown in FIG. 1 having exactly the same configuration except that the reflection layer 5 is a metal film having the composition shown in Examples 17 to 24 of Table 2. Each sample was prepared and evaluated.

なお、前面保護層3,及び反射層5もターゲットをCuの
円盤上に表2の実施例17〜24の各組成に対応するRe,Cr,
Ti,Ta,Zrの各チップを配置したものを用いる以外は実施
例1〜8と全く同じ条件及び同じ厚さで各金属膜を堆積
した。得られた各サンプルの加速劣化テスト並びにその
前後のCN比、及び記録感度の測定も実施例1〜8と同じ
ようにして行なった。結果を表2の実施例17〜24に示
す。また各サンプルの表面を観察したところ、実施例1
〜8と同様加速劣化テストの前後共にピンホールは観察
されなかった。
The front protective layer 3 and the reflective layer 5 were also prepared by placing a target on a Cu disk on the basis of Re, Cr, corresponding to each composition of Examples 17 to 24 in Table 2.
Each metal film was deposited under exactly the same conditions and the same thickness as in Examples 1 to 8 except that one in which Ti, Ta, and Zr chips were arranged was used. The accelerated deterioration test of each of the obtained samples, the CN ratio before and after the accelerated deterioration test, and the recording sensitivity were measured in the same manner as in Examples 1 to 8. The results are shown in Examples 17 to 24 in Table 2. Further, when the surface of each sample was observed, Example 1
Similar to ~ 8, no pinhole was observed before and after the accelerated deterioration test.

[実施例25〜32] 実施例1〜8と全く同じようにしてその前面保護層3
及び反射層5を表2の比較例25〜32に示す組成の金属膜
とする以外は全く同じ構成の第1図に示すPC/AlSiN/前
面保護層/TbFeCo/反射層からなる光磁気ディスクの各サ
ンプルを作成し、評価した。
[Examples 25 to 32] The front protective layer 3 was prepared in the same manner as in Examples 1 to 8.
Of the magneto-optical disk composed of PC / AlSiN / front protective layer / TbFeCo / reflection layer shown in FIG. 1 having exactly the same configuration except that the reflection layer 5 is a metal film having the composition shown in Comparative Examples 25 to 32 of Table 2. Each sample was prepared and evaluated.

なお、前面保護層3,及び反射層5もターゲットにAuの
各円盤に表2の実施例25〜32の各組成に対応するRe,Cr,
Ti,Ta,Zrの各チップを配置したものを用いる以外は実施
例1〜8と全く同じ条件及び同じ厚さで各金属膜を堆積
した。得られた各サンプルの加速劣化テスト並びにその
前後のCN比、及び記録感度の測定も実施例1〜8と同じ
ようにして行なった。結果を表2の実施例25〜32に示
す。また各サンプルの表面を観察したところ、実施例1
〜8と同様加速劣化テストの前後共にピンホールは観察
されなかった。
The front protective layer 3 and the reflective layer 5 were also used as targets for each disk of Au, Re, Cr, corresponding to each composition of Examples 25 to 32 in Table 2.
Each metal film was deposited under exactly the same conditions and the same thickness as in Examples 1 to 8 except that one in which Ti, Ta, and Zr chips were arranged was used. The accelerated deterioration test of each of the obtained samples, the CN ratio before and after the accelerated deterioration test, and the recording sensitivity were measured in the same manner as in Examples 1 to 8. The results are shown in Examples 25 to 32 in Table 2. Further, when the surface of each sample was observed, Example 1
Similar to ~ 8, no pinhole was observed before and after the accelerated deterioration test.

[比較例3,4] 実施例1〜8と全く同じようにしてその前面保護層3
及び反射層5を表2の比較例3,4に示す組成の金属膜と
する以外は全く同じ構成の第1図に示すPC/AlSiN/前面
保護層/TbFeCo/反射層からなる光磁気ディスクの各サン
プルを作成し、評価した。
[Comparative Examples 3 and 4] The front protective layer 3 was prepared in the same manner as in Examples 1 to 8.
And a magneto-optical disk comprising PC / AlSiN / front protective layer / TbFeCo / reflection layer shown in FIG. 1 having the same structure except that the reflection layer 5 is a metal film having the composition shown in Comparative Examples 3 and 4 of Table 2. Each sample was prepared and evaluated.

なお、前面保護層3,及び反射層5もターゲットにCu,A
uの各円盤ターゲットを用いる以外は実施例1〜8と全
く同じ条件及び同じ厚さで各金属膜を堆積した。
In addition, the front surface protective layer 3 and the reflective layer 5 are also made of Cu, A as a target.
Each metal film was deposited under exactly the same conditions and thicknesses as in Examples 1 to 8 except that each disk target of u was used.

この各サンプルのCN比、及び記録感度を実施例1〜8
と同じ条件で測定した。結果を表2の比較例3,4に示
す。
The CN ratio and the recording sensitivity of each sample are shown in Examples 1 to 8.
It measured on the same conditions as. The results are shown in Comparative Examples 3 and 4 in Table 2.

又各サンプルの表面を観察したところ、ピンホール等
の欠陥は見られなかった。次にこの各サンプルに実施例
1〜8と同じ加速劣化テストをしたところ、サンプルの
前面にわたって腐食が発生しており、CN比、記録感度の
測定はできなかった。
When the surface of each sample was observed, no defects such as pinholes were found. Next, when each sample was subjected to the same accelerated deterioration test as in Examples 1 to 8, corrosion was generated over the front surface of the sample, and the CN ratio and recording sensitivity could not be measured.

以上の結果から、本発明のAl,Cu,Ag,Auの群から選ば
れた金属元素と金属Reとの合金膜からなる金属膜を保護
層又は/及び反射層とした光記録媒体は、Reを含有しな
い金属膜に比べ、媒体のCN比、記録感度、耐久性の向上
が可能であることがわかった。更にReに加え、Cr,Ti,T
a,Zrの群より選ばれた1種以上の元素を添加することに
より、耐久性をさらに向上できることがわかった。
From the above results, the optical recording medium having a protective layer and / or a reflective layer of a metal film made of an alloy film of a metal element selected from the group consisting of Al, Cu, Ag, and Au of the present invention and metal Re is Re It was found that the CN ratio, recording sensitivity, and durability of the medium can be improved as compared with a metal film not containing. In addition to Re, Cr, Ti, T
It was found that the durability can be further improved by adding one or more elements selected from the group of a and Zr.

【図面の簡単な説明】[Brief description of drawings]

第1図は実施例の光磁気ディスクの積層構成の説明図で
ある。 1:基板,2:誘電体層,3:前面保護層, 4:光磁気記録層,5:反射層
FIG. 1 is an explanatory diagram of a laminated structure of the magneto-optical disk of the embodiment. 1: Substrate, 2: Dielectric layer, 3: Front protective layer, 4: Magneto-optical recording layer, 5: Reflective layer

Claims (6)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】保護層又は/及び反射層として金属膜を有
する光記録媒体において、該金属膜がAl,Cu,Ag,Auから
なる群より選ばれた少なくとも1種の金属元素とReとの
合金膜からなることを特徴とする光記録媒体。
1. An optical recording medium having a metal film as a protective layer and / or a reflective layer, wherein the metal film comprises at least one metal element selected from the group consisting of Al, Cu, Ag and Au and Re. An optical recording medium comprising an alloy film.
【請求項2】前記金属膜が保護層であり、そのRe含有量
が1〜95at%の範囲である請求項第1項記載の光記録媒
体。
2. The optical recording medium according to claim 1, wherein the metal film is a protective layer, and the Re content is in the range of 1 to 95 at%.
【請求項3】前記金属膜が反射層であり、そのRe含有量
が1〜80at%の範囲である請求項第1項又は第2項記載
の光記録媒体。
3. The optical recording medium according to claim 1, wherein the metal film is a reflective layer, and the Re content is in the range of 1 to 80 at%.
【請求項4】前記金属膜が、前記合金にCr,Ti,Ta,Zrの
群より選ばれた少なくとも1種の添加元素が添加された
合金である請求項第1項〜第3項記載のいずれかの光記
録媒体。
4. The alloy according to claim 1, wherein the metal film is an alloy in which at least one additive element selected from the group of Cr, Ti, Ta and Zr is added to the alloy. Any optical recording medium.
【請求項5】前記添加元素の含有量が50at%以下である
請求項第4項記載の光記録媒体。
5. The optical recording medium according to claim 4, wherein the content of the additional element is 50 at% or less.
【請求項6】光記録層が光磁気記録層である請求項第1
項〜第5項記載のいずれかの光記録媒体。
6. The optical recording layer is a magneto-optical recording layer.
Item 5. The optical recording medium according to any one of items 5.
JP1104576A 1989-04-26 1989-04-26 Optical recording medium Expired - Lifetime JP2507592B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1104576A JP2507592B2 (en) 1989-04-26 1989-04-26 Optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1104576A JP2507592B2 (en) 1989-04-26 1989-04-26 Optical recording medium

Publications (2)

Publication Number Publication Date
JPH02285533A JPH02285533A (en) 1990-11-22
JP2507592B2 true JP2507592B2 (en) 1996-06-12

Family

ID=14384264

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
JP (1) JP2507592B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2811743B2 (en) * 1989-05-08 1998-10-15 日本電気株式会社 Optical memory
JP2960824B2 (en) * 1992-09-30 1999-10-12 ティーディーケイ株式会社 Magneto-optical recording medium

Also Published As

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