JP2025518518A5 - - Google Patents
Info
- Publication number
- JP2025518518A5 JP2025518518A5 JP2024568172A JP2024568172A JP2025518518A5 JP 2025518518 A5 JP2025518518 A5 JP 2025518518A5 JP 2024568172 A JP2024568172 A JP 2024568172A JP 2024568172 A JP2024568172 A JP 2024568172A JP 2025518518 A5 JP2025518518 A5 JP 2025518518A5
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- voltage waveform
- pulse
- substrate
- bias
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202263343082P | 2022-05-17 | 2022-05-17 | |
| US63/343,082 | 2022-05-17 | ||
| PCT/US2023/022436 WO2023225033A1 (en) | 2022-05-17 | 2023-05-16 | Ion energy distribution control over substrate edge with non-sinusoidal voltage source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2025518518A JP2025518518A (ja) | 2025-06-17 |
| JP2025518518A5 true JP2025518518A5 (enExample) | 2026-05-21 |
Family
ID=88836035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024568172A Pending JP2025518518A (ja) | 2022-05-17 | 2023-05-16 | 非正弦波電圧源による基板エッジに対するイオンエネルギー分布制御 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20250323018A1 (enExample) |
| JP (1) | JP2025518518A (enExample) |
| KR (1) | KR20250010069A (enExample) |
| CN (1) | CN119213527A (enExample) |
| TW (1) | TW202410126A (enExample) |
| WO (1) | WO2023225033A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025187456A1 (ja) * | 2024-03-07 | 2025-09-12 | 東京エレクトロン株式会社 | プラズマ処理装置、バイアス電源システム、及びプラズマ処理方法 |
| US20250364211A1 (en) * | 2024-05-24 | 2025-11-27 | Tokyo Electron Limited | System and method for plasma process |
| CN119517722B (zh) * | 2025-01-21 | 2025-05-13 | 中微半导体设备(上海)股份有限公司 | 一种下电极组件、等离子体处理设备及其电压控制方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100782370B1 (ko) * | 2006-08-04 | 2007-12-07 | 삼성전자주식회사 | 지연 전기장을 이용한 이온 에너지 분포 분석기에 근거한이온 분석 시스템 |
| US9595424B2 (en) * | 2015-03-02 | 2017-03-14 | Lam Research Corporation | Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes |
| JP2018006299A (ja) * | 2016-07-08 | 2018-01-11 | 東芝メモリ株式会社 | プラズマ処理装置用処理対象支持台、プラズマ処理装置及びプラズマ処理方法 |
| US11955314B2 (en) * | 2019-01-09 | 2024-04-09 | Tokyo Electron Limited | Plasma processing apparatus |
| US11848176B2 (en) * | 2020-07-31 | 2023-12-19 | Applied Materials, Inc. | Plasma processing using pulsed-voltage and radio-frequency power |
-
2023
- 2023-05-16 JP JP2024568172A patent/JP2025518518A/ja active Pending
- 2023-05-16 US US18/866,009 patent/US20250323018A1/en active Pending
- 2023-05-16 WO PCT/US2023/022436 patent/WO2023225033A1/en not_active Ceased
- 2023-05-16 KR KR1020247041326A patent/KR20250010069A/ko active Pending
- 2023-05-16 TW TW112118040A patent/TW202410126A/zh unknown
- 2023-05-16 CN CN202380041223.XA patent/CN119213527A/zh active Pending
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