JP2025509903A - 磁気材料を含む集積デバイス及び集積受動デバイス - Google Patents
磁気材料を含む集積デバイス及び集積受動デバイス Download PDFInfo
- Publication number
- JP2025509903A JP2025509903A JP2024555980A JP2024555980A JP2025509903A JP 2025509903 A JP2025509903 A JP 2025509903A JP 2024555980 A JP2024555980 A JP 2024555980A JP 2024555980 A JP2024555980 A JP 2024555980A JP 2025509903 A JP2025509903 A JP 2025509903A
- Authority
- JP
- Japan
- Prior art keywords
- die
- interconnect
- interconnects
- magnetic layer
- metallization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
- H10W20/495—Capacitive arrangements or effects of, or between wiring layers
- H10W20/496—Capacitor integral with wiring layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/20—Inductors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
- H10W20/41—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
- H10W20/42—Vias, e.g. via plugs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
- H10W20/45—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their insulating parts
- H10W20/47—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their insulating parts comprising two or more dielectric layers having different properties, e.g. different dielectric constants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
- H10W20/45—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their insulating parts
- H10W20/48—Insulating materials thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
- H10W20/495—Capacitive arrangements or effects of, or between wiring layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
- H10W20/497—Inductive arrangements or effects of, or between, wiring layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/705,041 US12142561B2 (en) | 2022-03-25 | 2022-03-25 | Integrated device and integrated passive device comprising magnetic material |
| US17/705,041 | 2022-03-25 | ||
| PCT/US2023/064058 WO2023183722A1 (en) | 2022-03-25 | 2023-03-09 | Integrated device and integrated passive device comprising magnetic material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2025509903A true JP2025509903A (ja) | 2025-04-11 |
| JP2025509903A5 JP2025509903A5 (enExample) | 2026-03-03 |
Family
ID=85979732
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024555980A Pending JP2025509903A (ja) | 2022-03-25 | 2023-03-09 | 磁気材料を含む集積デバイス及び集積受動デバイス |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US12142561B2 (enExample) |
| EP (1) | EP4500593A1 (enExample) |
| JP (1) | JP2025509903A (enExample) |
| KR (1) | KR20240163616A (enExample) |
| CN (1) | CN118805252A (enExample) |
| TW (1) | TW202401725A (enExample) |
| WO (1) | WO2023183722A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240355728A1 (en) * | 2023-04-21 | 2024-10-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor structure |
| US20250037923A1 (en) * | 2023-07-27 | 2025-01-30 | Qualcomm Incorporated | Package comprising a substrate with inductors and a magnetic layer |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7319599B2 (en) * | 2003-10-01 | 2008-01-15 | Matsushita Electric Industrial Co., Ltd. | Module incorporating a capacitor, method for manufacturing the same, and capacitor used therefor |
| US8044755B2 (en) | 2008-04-09 | 2011-10-25 | National Semiconductor Corporation | MEMS power inductor |
| US20150340422A1 (en) * | 2014-05-23 | 2015-11-26 | Texas Instruments Incorporated | Method of manufacturing a micro-fabricated wafer level integrated inductor or transformer for high frequency switch mode power supplies |
| US10354950B2 (en) | 2016-02-25 | 2019-07-16 | Ferric Inc. | Systems and methods for microelectronics fabrication and packaging using a magnetic polymer |
| US10064277B2 (en) * | 2016-03-29 | 2018-08-28 | Ferric, Inc. | Integrated passive devices and assemblies including same |
| US12424543B2 (en) | 2019-11-26 | 2025-09-23 | Intel Corporation | Selective interconnects in back-end-of-line metallization stacks of integrated circuitry |
-
2022
- 2022-03-25 US US17/705,041 patent/US12142561B2/en active Active
-
2023
- 2023-03-09 KR KR1020247028946A patent/KR20240163616A/ko active Pending
- 2023-03-09 EP EP23716102.1A patent/EP4500593A1/en active Pending
- 2023-03-09 WO PCT/US2023/064058 patent/WO2023183722A1/en not_active Ceased
- 2023-03-09 TW TW112108686A patent/TW202401725A/zh unknown
- 2023-03-09 CN CN202380024768.XA patent/CN118805252A/zh active Pending
- 2023-03-09 JP JP2024555980A patent/JP2025509903A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR20240163616A (ko) | 2024-11-19 |
| CN118805252A (zh) | 2024-10-18 |
| EP4500593A1 (en) | 2025-02-05 |
| WO2023183722A1 (en) | 2023-09-28 |
| US12142561B2 (en) | 2024-11-12 |
| US20230307355A1 (en) | 2023-09-28 |
| TW202401725A (zh) | 2024-01-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20260220 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20260220 |