JP2025506745A5 - - Google Patents
Info
- Publication number
- JP2025506745A5 JP2025506745A5 JP2024549448A JP2024549448A JP2025506745A5 JP 2025506745 A5 JP2025506745 A5 JP 2025506745A5 JP 2024549448 A JP2024549448 A JP 2024549448A JP 2024549448 A JP2024549448 A JP 2024549448A JP 2025506745 A5 JP2025506745 A5 JP 2025506745A5
- Authority
- JP
- Japan
- Prior art keywords
- light beam
- measurement light
- scanning
- wafer
- scanning mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102022104416.5A DE102022104416A1 (de) | 2022-02-24 | 2022-02-24 | Vorrichtung und Verfahren zum Vermessen von Wafern |
| DE102022104416.5 | 2022-02-24 | ||
| PCT/EP2023/051736 WO2023160928A1 (de) | 2022-02-24 | 2023-01-25 | Vorrichtung und verfahren zum vermessen von wafern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2025506745A JP2025506745A (ja) | 2025-03-13 |
| JP2025506745A5 true JP2025506745A5 (enExample) | 2025-12-02 |
Family
ID=85122276
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024550134A Pending JP2025506804A (ja) | 2022-02-24 | 2023-01-25 | ウェハ測定用の装置及び方法 |
| JP2024549448A Pending JP2025506745A (ja) | 2022-02-24 | 2023-01-25 | ウェハ測定用の装置及び方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024550134A Pending JP2025506804A (ja) | 2022-02-24 | 2023-01-25 | ウェハ測定用の装置及び方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (3) | US20250189299A1 (enExample) |
| EP (3) | EP4722639A3 (enExample) |
| JP (2) | JP2025506804A (enExample) |
| KR (2) | KR20240162506A (enExample) |
| CN (2) | CN118786323A (enExample) |
| DE (1) | DE102022104416A1 (enExample) |
| ES (1) | ES3063702T3 (enExample) |
| PL (1) | PL4483131T3 (enExample) |
| WO (2) | WO2023160928A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102022120069A1 (de) | 2022-08-09 | 2024-02-15 | Precitec Optronik Gmbh | Vorrichtung zum Messen von Abständen an mehreren Messpunkten auf einem Werkstück |
| DE102024113613A1 (de) * | 2023-05-25 | 2024-11-28 | Precitec Optronik Gmbh | Vorrichtung und Verfahren zum Vermessen von Wafern |
| DE102023135850A1 (de) * | 2023-12-19 | 2025-06-26 | Precitec Optronik Gmbh | Vorrichtung und Verfahren zum Messen von Oberflächen- und Dickenprofilen eingetauchter Werkstücke |
| DE102024111194B4 (de) | 2024-04-22 | 2026-04-30 | Precitec Optronik Gmbh | Vorrichtung zur optischen Messung der Dicke eines intransparenten Objekts sowie Verfahren zum Kalibrieren einer solchen Vorrichtung |
| DE102024115438A1 (de) * | 2024-06-04 | 2025-12-04 | Precitec Optronik Gmbh | Verfahren und Vorrichtung zur Detektion von Hohlräumen in gebondeten Wafern |
| DE102024118277A1 (de) | 2024-06-27 | 2025-12-31 | Precitec Optronik Gmbh | Verfahren und Vorrichtung zur Abstands- und Dickenmessung |
| DE102024120424A1 (de) | 2024-07-18 | 2026-01-22 | Precitec Optronik Gmbh | Vorrichtung und Verfahren zum Vermessen von Wafern |
| DE102024120426A1 (de) | 2024-07-18 | 2026-01-22 | Precitec Optronik Gmbh | Verfahren und Vorrichtung zur Abstands- und Dickenmessung |
| DE102024132847A1 (de) | 2024-11-11 | 2026-05-13 | Precitec Optronik Gmbh | Verfahren und Vorrichtung zur Vermessung transparenter mehrschichtiger Objekte mit einem Kohärenztomographen |
| DE102024132825B3 (de) | 2024-11-11 | 2026-01-15 | Precitec Optronik Gmbh | Verfahren und Vorrichtung zum berührungslosen Vermessen eines Objekts |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5321501A (en) | 1991-04-29 | 1994-06-14 | Massachusetts Institute Of Technology | Method and apparatus for optical imaging with means for controlling the longitudinal range of the sample |
| US5648865A (en) * | 1993-12-27 | 1997-07-15 | Asahi Kogaku Kogyo Kabushiki Kaisha | Scanning optical system |
| FR2836215B1 (fr) * | 2002-02-21 | 2004-11-05 | Yodea | Systeme et procede de modelisation et de restitution tridimensionnelle d'un objet |
| US6927860B2 (en) | 2003-05-19 | 2005-08-09 | Oti Ophthalmic Technologies Inc. | Optical mapping apparatus with optimized OCT configuration |
| JP4522253B2 (ja) * | 2004-12-24 | 2010-08-11 | キヤノン株式会社 | 光走査装置及びそれを用いた画像表示装置 |
| GB2429522A (en) | 2005-08-26 | 2007-02-28 | Univ Kent Canterbury | Optical mapping apparatus |
| WO2010017954A2 (de) * | 2008-08-12 | 2010-02-18 | Carl Zeiss Meditec Ag | Tiefenauflösende optische kohärenzreflektrometrie |
| KR20120081419A (ko) * | 2011-01-11 | 2012-07-19 | 삼성전기주식회사 | 다층 박막 특성 측정 장치 및 방법 |
| US8489225B2 (en) * | 2011-03-08 | 2013-07-16 | International Business Machines Corporation | Wafer alignment system with optical coherence tomography |
| US9714825B2 (en) | 2011-04-08 | 2017-07-25 | Rudolph Technologies, Inc. | Wafer shape thickness and trench measurement |
| ES2391510B1 (es) | 2011-04-29 | 2013-11-11 | Consejo Superior De Investigaciones Científicas (Csic) | Procedimiento de calibracion y correccion de la distorsion de barrido de un sistema de tomografia de coherencia optica |
| DE102011051146B3 (de) * | 2011-06-17 | 2012-10-04 | Precitec Optronik Gmbh | Prüfverfahren zum Prüfen einer Verbindungsschicht zwischen waferförmigen Proben |
| US9757817B2 (en) | 2013-03-13 | 2017-09-12 | Queen's University At Kingston | Methods and systems for characterizing laser machining properties by measuring keyhole dynamics using interferometry |
| DE102016120523B4 (de) * | 2016-10-27 | 2026-06-11 | Raylase Gmbh | Ablenkeinheit |
| US10234265B2 (en) | 2016-12-12 | 2019-03-19 | Precitec Optronik Gmbh | Distance measuring device and method for measuring distances |
| WO2018221034A1 (ja) * | 2017-06-02 | 2018-12-06 | ソニー株式会社 | フォーカス制御装置、フォーカス制御方法、プログラムおよび撮像装置 |
| DE102017118776B4 (de) * | 2017-08-17 | 2020-11-12 | Blickfeld GmbH | Scaneinheit mit mindestens zwei Stützelementen und einem freistehenden Umlenkelement und Verfahren zum Scannen von Licht |
| KR102145381B1 (ko) | 2018-05-21 | 2020-08-19 | 주식회사 고영테크놀러지 | Oct 시스템, oct 영상 생성 방법 및 저장 매체 |
| US11061223B2 (en) * | 2019-02-28 | 2021-07-13 | Facebook Technologies, Llc | Distortion controlled projector for scanning systems |
| CN113740998B (zh) * | 2020-05-30 | 2022-11-22 | 华为技术有限公司 | 光学镜头、摄像模组及电子设备 |
| US12403548B2 (en) | 2020-08-19 | 2025-09-02 | Panasonic Intellectual Property Management Co., Ltd. | Laser processing apparatus and laser processing method |
| US11644419B2 (en) * | 2021-01-28 | 2023-05-09 | Kla Corporation | Measurement of properties of patterned photoresist |
-
2022
- 2022-02-24 DE DE102022104416.5A patent/DE102022104416A1/de active Pending
-
2023
- 2023-01-25 JP JP2024550134A patent/JP2025506804A/ja active Pending
- 2023-01-25 EP EP26151440.0A patent/EP4722639A3/de active Pending
- 2023-01-25 KR KR1020247031575A patent/KR20240162506A/ko active Pending
- 2023-01-25 ES ES23702257T patent/ES3063702T3/es active Active
- 2023-01-25 EP EP23702257.9A patent/EP4483131B1/de active Active
- 2023-01-25 KR KR1020247031573A patent/KR20240161654A/ko active Pending
- 2023-01-25 JP JP2024549448A patent/JP2025506745A/ja active Pending
- 2023-01-25 CN CN202380023524.XA patent/CN118786323A/zh active Pending
- 2023-01-25 WO PCT/EP2023/051736 patent/WO2023160928A1/de not_active Ceased
- 2023-01-25 WO PCT/EP2023/051737 patent/WO2023160929A1/de not_active Ceased
- 2023-01-25 CN CN202380023554.0A patent/CN118749058A/zh active Pending
- 2023-01-25 EP EP23702256.1A patent/EP4483130A1/de active Pending
- 2023-01-25 US US18/840,843 patent/US20250189299A1/en active Pending
- 2023-01-25 PL PL23702257.9T patent/PL4483131T3/pl unknown
-
2024
- 2024-05-23 US US18/673,052 patent/US12264914B2/en active Active
-
2025
- 2025-02-28 US US19/067,381 patent/US20250198743A1/en active Pending
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