JP2025502916A5 - - Google Patents

Info

Publication number
JP2025502916A5
JP2025502916A5 JP2024529848A JP2024529848A JP2025502916A5 JP 2025502916 A5 JP2025502916 A5 JP 2025502916A5 JP 2024529848 A JP2024529848 A JP 2024529848A JP 2024529848 A JP2024529848 A JP 2024529848A JP 2025502916 A5 JP2025502916 A5 JP 2025502916A5
Authority
JP
Japan
Prior art keywords
wall
region
generating apparatus
aerosol
aerosol generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024529848A
Other languages
English (en)
Japanese (ja)
Other versions
JP2025502916A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2023/052161 external-priority patent/WO2023144373A1/en
Publication of JP2025502916A publication Critical patent/JP2025502916A/ja
Publication of JP2025502916A5 publication Critical patent/JP2025502916A5/ja
Pending legal-status Critical Current

Links

JP2024529848A 2022-01-31 2023-01-30 断熱チャンバを有するエアロゾル発生装置 Pending JP2025502916A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP22154345 2022-01-31
EP22154345.7 2022-01-31
PCT/EP2023/052161 WO2023144373A1 (en) 2022-01-31 2023-01-30 An aerosol generating device with an insulating chamber

Publications (2)

Publication Number Publication Date
JP2025502916A JP2025502916A (ja) 2025-01-30
JP2025502916A5 true JP2025502916A5 (cg-RX-API-DMAC10.html) 2025-06-20

Family

ID=80118987

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024529848A Pending JP2025502916A (ja) 2022-01-31 2023-01-30 断熱チャンバを有するエアロゾル発生装置

Country Status (6)

Country Link
US (1) US20250134168A1 (cg-RX-API-DMAC10.html)
EP (1) EP4472447A1 (cg-RX-API-DMAC10.html)
JP (1) JP2025502916A (cg-RX-API-DMAC10.html)
KR (1) KR20240138538A (cg-RX-API-DMAC10.html)
CN (1) CN118660647A (cg-RX-API-DMAC10.html)
WO (1) WO2023144373A1 (cg-RX-API-DMAC10.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20260130427A1 (en) * 2024-11-14 2026-05-14 Kt&G Corporation Heater assembly and aerosol generating device comprising the same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240130835A (ko) * 2015-09-01 2024-08-29 에이와이알 리미티드 전자 기화기 시스템
KR102881210B1 (ko) * 2018-10-12 2025-11-04 제이티 인터내셔널 소시에떼 아노님 에어로졸 생성 디바이스 및 에어로졸 생성 디바이스를 위한 가열 챔버
US12089637B2 (en) * 2018-12-07 2024-09-17 Philip Morris Products S.A. Aerosol generating system and cartridge with leakage protection
US12075833B2 (en) * 2019-03-11 2024-09-03 Nicoventures Trading Limited Aerosol generating device
CN210054653U (zh) * 2019-05-16 2020-02-14 深圳市你我网络科技有限公司 加热仓组件和电子烟
CN113080521A (zh) * 2019-12-23 2021-07-09 深圳市合元科技有限公司 加热器以及包含该加热器的烟具
KR102471061B1 (ko) * 2020-06-03 2022-11-25 주식회사 케이티앤지 히터 모듈 및 히터 모듈의 제조 방법과 히터 모듈을 포함한 에어로졸 생성 장치
CN213486873U (zh) * 2020-08-31 2021-06-22 深圳市赛尔美电子科技有限公司 一种雾化芯结构及电子烟

Similar Documents

Publication Publication Date Title
KR102761242B1 (ko) 저온 베이킹 흡연 도구
TWI828686B (zh) 用於基座的射頻(rf)接地配置
JP2019102638A5 (cg-RX-API-DMAC10.html)
TWI758669B (zh) 電容耦合電漿蝕刻設備
TWI802774B (zh) 電容耦合電漿蝕刻設備
CN111326389B (zh) 一种电容耦合等离子体刻蚀设备
JP6292977B2 (ja) 静電チャック及び半導体・液晶製造装置
KR102498784B1 (ko) 고온 rf 애플리케이션들을 위한 정전 척
JP2001148378A5 (cg-RX-API-DMAC10.html)
JPWO2019082821A1 (ja) ウエハ載置台及びその製法
JPWO2019244700A5 (cg-RX-API-DMAC10.html)
JP2016540110A5 (cg-RX-API-DMAC10.html)
JP7719860B2 (ja) プラズマ処理装置及び基板処理方法
JP4993694B2 (ja) プラズマcvd装置、薄膜形成方法
JP6515253B1 (ja) イオン源及びイオン注入装置並びにイオン源の運転方法
JP4875527B2 (ja) プラズマ発生装置およびこれを用いた薄膜形成装置
JPH10289881A (ja) プラズマcvd装置
KR20240138538A (ko) 절연 챔버를 가진 에어로졸 생성 디바이스
JP6066799B2 (ja) 火炎検出センサ
KR100481312B1 (ko) 플라즈마 프로세스 챔버
ATE547543T1 (de) Vorrichtung zur plasmagestützten chemischen oberflächenbehandlung von substraten im vakuum
CN114504137B (zh) 一种多电极加热的烟具
CN105296957B (zh) 一种反应腔
JP5052537B2 (ja) プラズマ生成装置およびプラズマ生成方法
JP2025502921A5 (cg-RX-API-DMAC10.html)