JP2024539171A5 - - Google Patents
Info
- Publication number
- JP2024539171A5 JP2024539171A5 JP2024523716A JP2024523716A JP2024539171A5 JP 2024539171 A5 JP2024539171 A5 JP 2024539171A5 JP 2024523716 A JP2024523716 A JP 2024523716A JP 2024523716 A JP2024523716 A JP 2024523716A JP 2024539171 A5 JP2024539171 A5 JP 2024539171A5
- Authority
- JP
- Japan
- Prior art keywords
- coating
- substrate
- ions
- deposition
- pulses
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102021005266.8 | 2021-10-22 | ||
| DE102021005266 | 2021-10-22 | ||
| PCT/EP2022/000088 WO2023066510A1 (en) | 2021-10-22 | 2022-10-04 | Method for forming hard and ultra-smooth a-c by sputtering |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024539171A JP2024539171A (ja) | 2024-10-28 |
| JP2024539171A5 true JP2024539171A5 (https=) | 2025-05-09 |
Family
ID=84053083
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024523716A Pending JP2024539171A (ja) | 2021-10-22 | 2022-10-04 | スパッタリングによって高硬度かつ超平滑なａ－Ｃを形成するための方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20250230538A1 (https=) |
| EP (1) | EP4419726A1 (https=) |
| JP (1) | JP2024539171A (https=) |
| KR (1) | KR20240087818A (https=) |
| CN (1) | CN118234886A (https=) |
| MX (1) | MX2024004705A (https=) |
| WO (1) | WO2023066510A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116426860B (zh) * | 2023-06-12 | 2023-09-26 | 四川大学 | 基于hBN的硬密封控制阀用宽温域自润滑涂层制备方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3737291B2 (ja) * | 1998-10-12 | 2006-01-18 | 株式会社神戸製鋼所 | ダイヤモンドライクカーボン硬質多層膜成形体 |
| JP5305683B2 (ja) * | 2008-02-18 | 2013-10-02 | 株式会社神戸製鋼所 | 立方晶窒化硼素含有皮膜の形成方法 |
| DE202010001497U1 (de) * | 2010-01-29 | 2010-04-22 | Hauzer Techno-Coating B.V. | Beschichtungsvorrichtung mit einer HIPIMS-Leistungsquelle |
| JP2012071433A (ja) | 2010-09-28 | 2012-04-12 | Mitsubishi Plastics Inc | 離型フィルム |
| SE536285C2 (sv) | 2011-04-07 | 2013-07-30 | Ionautics Ab | Sputtringsprocess för att sputtra ett target av kol |
| EP2587518B1 (en) * | 2011-10-31 | 2018-12-19 | IHI Hauzer Techno Coating B.V. | Apparatus and Method for depositing Hydrogen-free ta C Layers on Workpieces and Workpiece |
| EP2759155B1 (en) | 2012-12-14 | 2016-09-14 | Huawei Technologies Co., Ltd. | Dynamically adjusting capabilities of modems, each modem associated with a different subscriber identity |
| JP6621401B2 (ja) | 2013-04-30 | 2019-12-18 | フラウンホッファー−ゲゼルシャフト・ツァー・フォデラング・デル・アンゲワンテン・フォーシュング・エー．ファウ． | 耐摩耗層を生産する方法およびその方法によって生産された耐摩耗層 |
| CZ306607B6 (cs) | 2016-02-05 | 2017-03-22 | Platit A.S. | Způsob nanášení otěruvzdorné DLC vrstvy |
| WO2017179233A1 (ja) * | 2016-04-14 | 2017-10-19 | 住友電気工業株式会社 | 硬質被膜および切削工具 |
| JP6948049B2 (ja) * | 2016-11-02 | 2021-10-13 | 神港精機株式会社 | 窒化炭素膜の形成方法 |
| WO2019025559A1 (en) | 2017-08-02 | 2019-02-07 | Oerlikon Surface Solutions Ag, Pfäffikon | COATING DEVICE FOR HIGHLY EFFICIENT LOW TEMPERATURE COATING |
-
2022
- 2022-10-04 WO PCT/EP2022/000088 patent/WO2023066510A1/en not_active Ceased
- 2022-10-04 US US18/703,218 patent/US20250230538A1/en active Pending
- 2022-10-04 MX MX2024004705A patent/MX2024004705A/es unknown
- 2022-10-04 KR KR1020247011650A patent/KR20240087818A/ko active Pending
- 2022-10-04 JP JP2024523716A patent/JP2024539171A/ja active Pending
- 2022-10-04 CN CN202280070795.6A patent/CN118234886A/zh active Pending
-
2024
- 2024-03-04 EP EP22799851.5A patent/EP4419726A1/en active Pending
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