JP2024518334A5 - - Google Patents
Info
- Publication number
- JP2024518334A5 JP2024518334A5 JP2023566410A JP2023566410A JP2024518334A5 JP 2024518334 A5 JP2024518334 A5 JP 2024518334A5 JP 2023566410 A JP2023566410 A JP 2023566410A JP 2023566410 A JP2023566410 A JP 2023566410A JP 2024518334 A5 JP2024518334 A5 JP 2024518334A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- opening
- transport direction
- wall
- processing area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP21171389.6 | 2021-04-29 | ||
| EP21171389.6A EP4084040A1 (en) | 2021-04-29 | 2021-04-29 | Method and devices for plasma treatment |
| PCT/EP2022/060433 WO2022228969A1 (en) | 2021-04-29 | 2022-04-20 | Method and devices for plasma treatment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024518334A JP2024518334A (ja) | 2024-05-01 |
| JP2024518334A5 true JP2024518334A5 (enExample) | 2025-05-15 |
Family
ID=75746365
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023566410A Pending JP2024518334A (ja) | 2021-04-29 | 2022-04-20 | プラズマ処理のための方法及び装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20240222088A1 (enExample) |
| EP (2) | EP4084040A1 (enExample) |
| JP (1) | JP2024518334A (enExample) |
| KR (1) | KR20240019088A (enExample) |
| CN (1) | CN117355921A (enExample) |
| WO (1) | WO2022228969A1 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4438765A1 (en) * | 2023-03-27 | 2024-10-02 | voestalpine Stahl GmbH | Method and device for plasma heating of the internal walls of a vacuum furnace |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2547692B1 (fr) * | 1983-06-15 | 1988-07-15 | Centre Nat Rech Scient | Procede et dispositif de production d'un plasma de grand volume homogene, de grande densite et de faible temperature electronique |
| US4996077A (en) * | 1988-10-07 | 1991-02-26 | Texas Instruments Incorporated | Distributed ECR remote plasma processing and apparatus |
| US5122251A (en) * | 1989-06-13 | 1992-06-16 | Plasma & Materials Technologies, Inc. | High density plasma deposition and etching apparatus |
| JPH076998A (ja) * | 1990-11-30 | 1995-01-10 | Ulvac Japan Ltd | マイクロ波プラズマ処理装置 |
| BE1009839A3 (fr) | 1995-12-20 | 1997-10-07 | Cockerill Rech & Dev | Procede et dispositif pour le nettoyage d'un substrat metallique. |
| EP1178134A1 (fr) | 2000-08-04 | 2002-02-06 | Cold Plasma Applications C.P.A. | Procédé et dispositif pour traiter des substrats métalliques au défilé par plasma |
| EP2053631A1 (fr) | 2007-10-22 | 2009-04-29 | Industrial Plasma Services & Technologies - IPST GmbH | Procédé et dispositif pour le traitement par plasma de substrats au défilé |
| BE1017852A3 (fr) * | 2007-11-19 | 2009-09-01 | Ind Plasma Services & Technologies Ipst Gmbh | Procede et installation de galvanisation par evaporation plasma. |
| US9458533B2 (en) * | 2007-12-21 | 2016-10-04 | Advanced Galvanisation Ag | Method and devices for controlling a vapour flow in vacuum evaporation |
| US9249502B2 (en) * | 2008-06-20 | 2016-02-02 | Sakti3, Inc. | Method for high volume manufacture of electrochemical cells using physical vapor deposition |
| US8436318B2 (en) | 2010-04-05 | 2013-05-07 | Varian Semiconductor Equipment Associates, Inc. | Apparatus for controlling the temperature of an RF ion source window |
| US10475626B2 (en) * | 2015-03-17 | 2019-11-12 | Applied Materials, Inc. | Ion-ion plasma atomic layer etch process and reactor |
| JP6948788B2 (ja) * | 2016-12-15 | 2021-10-13 | 東京エレクトロン株式会社 | プラズマ処理装置 |
-
2021
- 2021-04-29 EP EP21171389.6A patent/EP4084040A1/en not_active Withdrawn
-
2022
- 2022-04-20 JP JP2023566410A patent/JP2024518334A/ja active Pending
- 2022-04-20 WO PCT/EP2022/060433 patent/WO2022228969A1/en not_active Ceased
- 2022-04-20 CN CN202280031433.6A patent/CN117355921A/zh active Pending
- 2022-04-20 EP EP22724028.0A patent/EP4331003B1/en active Active
- 2022-04-20 US US18/557,382 patent/US20240222088A1/en active Pending
- 2022-04-20 KR KR1020237039637A patent/KR20240019088A/ko active Pending
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