JP2023553891A5 - - Google Patents

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Publication number
JP2023553891A5
JP2023553891A5 JP2023534662A JP2023534662A JP2023553891A5 JP 2023553891 A5 JP2023553891 A5 JP 2023553891A5 JP 2023534662 A JP2023534662 A JP 2023534662A JP 2023534662 A JP2023534662 A JP 2023534662A JP 2023553891 A5 JP2023553891 A5 JP 2023553891A5
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JP
Japan
Prior art keywords
lens
relay system
optical relay
positioner
optical
Prior art date
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Granted
Application number
JP2023534662A
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English (en)
Japanese (ja)
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JP2023553891A (ja
JP7832944B2 (ja
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Priority claimed from PCT/US2021/060478 external-priority patent/WO2022125305A1/en
Publication of JP2023553891A publication Critical patent/JP2023553891A/ja
Publication of JP2023553891A5 publication Critical patent/JP2023553891A5/ja
Application granted granted Critical
Publication of JP7832944B2 publication Critical patent/JP7832944B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2023534662A 2020-12-08 2021-11-23 光リレーシステム及びその使用方法及びその製造方法 Active JP7832944B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202063122573P 2020-12-08 2020-12-08
US63/122,573 2020-12-08
PCT/US2021/060478 WO2022125305A1 (en) 2020-12-08 2021-11-23 Optical relay system and methods of use and manufacture

Publications (3)

Publication Number Publication Date
JP2023553891A JP2023553891A (ja) 2023-12-26
JP2023553891A5 true JP2023553891A5 (https=) 2024-10-18
JP7832944B2 JP7832944B2 (ja) 2026-03-18

Family

ID=81973931

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023534662A Active JP7832944B2 (ja) 2020-12-08 2021-11-23 光リレーシステム及びその使用方法及びその製造方法

Country Status (7)

Country Link
US (1) US20230390866A1 (https=)
EP (1) EP4260131A4 (https=)
JP (1) JP7832944B2 (https=)
KR (1) KR20230113530A (https=)
CN (1) CN116348799A (https=)
TW (1) TW202227873A (https=)
WO (1) WO2022125305A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250370247A1 (en) * 2022-09-28 2025-12-04 Asml Netherlands B.V. Systems for path compensation with a moving objective
CN115972570B (zh) * 2022-12-19 2025-10-28 深圳市易造三维科技有限公司 一种直线扫描的光固化3d打印机
KR20260041686A (ko) * 2023-07-28 2026-03-27 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 이미지 위치 제어를 위한 배율-보상 릴레이
CN117031695B (zh) * 2023-08-21 2024-02-09 东莞锐视光电科技有限公司 光刻镜头装置
US12497899B1 (en) * 2024-06-14 2025-12-16 General Electric Company Preventing abnormal fan blade deflection or fan flutter with retroreflectors

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US5837962A (en) * 1996-07-15 1998-11-17 Overbeck; James W. Faster laser marker employing acousto-optic deflection
US6264328B1 (en) * 1999-10-21 2001-07-24 University Of Rochester Wavefront sensor with off-axis illumination
JP3751920B2 (ja) * 2002-08-23 2006-03-08 Ｎｅｃアクセステクニカ株式会社 読取モジュール
TWI348408B (en) * 2004-04-28 2011-09-11 Olympus Corp Laser processing device
US20080241425A1 (en) * 2007-03-30 2008-10-02 Matsushita Electric Industrial Co., Ltd. System and method to reduce redeposition of ablated material
JP5692969B2 (ja) * 2008-09-01 2015-04-01 浜松ホトニクス株式会社 収差補正方法、この収差補正方法を用いたレーザ加工方法、この収差補正方法を用いたレーザ照射方法、収差補正装置、及び、収差補正プログラム
JP5222088B2 (ja) 2008-10-21 2013-06-26 株式会社ディスコ 光学系、レーザ加工装置およびスキャン装置
US8680430B2 (en) * 2008-12-08 2014-03-25 Electro Scientific Industries, Inc. Controlling dynamic and thermal loads on laser beam positioning system to achieve high-throughput laser processing of workpiece features
TWI594828B (zh) 2009-05-28 2017-08-11 伊雷克托科學工業股份有限公司 應用於雷射處理工件中的特徵的聲光偏轉器及相關雷射處理方法
US9429742B1 (en) * 2011-01-04 2016-08-30 Nlight, Inc. High power laser imaging systems
EP2772922B1 (en) * 2011-10-25 2017-10-11 Eisuke Minehara Laser decontamination device
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JP6203022B2 (ja) * 2013-12-04 2017-09-27 オリンパス株式会社 走査型顕微鏡
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