JP2023545454A5 - - Google Patents
Info
- Publication number
- JP2023545454A5 JP2023545454A5 JP2023522754A JP2023522754A JP2023545454A5 JP 2023545454 A5 JP2023545454 A5 JP 2023545454A5 JP 2023522754 A JP2023522754 A JP 2023522754A JP 2023522754 A JP2023522754 A JP 2023522754A JP 2023545454 A5 JP2023545454 A5 JP 2023545454A5
- Authority
- JP
- Japan
- Prior art keywords
- volume
- sealing
- pressure
- conduit
- sealing portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/070,776 US20220112594A1 (en) | 2020-10-14 | 2020-10-14 | Device for sealing a vacuum chamber, vacuum processing system, and method of monitoring a load lock seal |
| US17/070,776 | 2020-10-14 | ||
| PCT/US2021/051549 WO2022081318A1 (en) | 2020-10-14 | 2021-09-22 | Device for sealing a vacuum chamber, vacuum processing system, and method of monitoring a load lock seal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2023545454A JP2023545454A (ja) | 2023-10-30 |
| JP2023545454A5 true JP2023545454A5 (https=) | 2024-10-01 |
Family
ID=81077536
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023522754A Pending JP2023545454A (ja) | 2020-10-14 | 2021-09-22 | 真空チャンバを封止するための装置、真空処理システム、及びロードロックシールを監視する方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20220112594A1 (https=) |
| EP (1) | EP4229228A4 (https=) |
| JP (1) | JP2023545454A (https=) |
| KR (1) | KR20230085188A (https=) |
| CN (1) | CN116324017A (https=) |
| TW (1) | TWI774570B (https=) |
| WO (1) | WO2022081318A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20230407469A1 (en) * | 2022-06-17 | 2023-12-21 | Raytheon Technologies Corporation | Continuous atmospheric pressure cvd tow coater process with in-situ air leak monitoring |
| CN116853873A (zh) * | 2023-08-01 | 2023-10-10 | 天齐卫蓝固锂新材料(湖州)有限公司 | 一种真空腔走带隔断机构及真空开卷设备 |
| CN119419141B (zh) * | 2024-11-07 | 2025-11-14 | 拓荆创益(沈阳)半导体设备有限公司 | 一种真空传输阀门、控制方法及半导体薄膜设备 |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3067907B2 (ja) * | 1992-10-07 | 2000-07-24 | キヤノン株式会社 | スパッタリング装置、スパッタリング方法、該スパッタリング方法によって形成された積層膜、真空処理装置、および該真空処理装置によって処理が施された基板 |
| US6174377B1 (en) * | 1997-03-03 | 2001-01-16 | Genus, Inc. | Processing chamber for atomic layer deposition processes |
| US6183564B1 (en) * | 1998-11-12 | 2001-02-06 | Tokyo Electron Limited | Buffer chamber for integrating physical and chemical vapor deposition chambers together in a processing system |
| DE50002987D1 (de) * | 2000-02-01 | 2003-08-28 | Emil Baechli | Einrichtung zur Oberflächenbehandlung und/oder Beschichtung bzw. zur Fertigung von Bauelementen, insbesondere flacher Bauelemente aus Glas, Glaslegierungen oder Metall, im Durchlaufverfahren |
| US6878207B2 (en) * | 2003-02-19 | 2005-04-12 | Energy Conversion Devices, Inc. | Gas gate for isolating regions of differing gaseous pressure |
| US7513141B2 (en) * | 2003-09-09 | 2009-04-07 | Applied Films Corporation | Method for differentially pumping endblock seal cavity |
| WO2007016592A2 (en) * | 2005-07-29 | 2007-02-08 | Aviza Technology, Inc. | Gas manifold valve cluster |
| US7845618B2 (en) * | 2006-06-28 | 2010-12-07 | Applied Materials, Inc. | Valve door with ball coupling |
| DE602007002782D1 (de) * | 2007-02-28 | 2009-11-26 | Applied Materials Inc | Zugangsversperrsystem, Netzverarbeitungsanlage und Anwendungsverfahren dafür |
| KR20090118088A (ko) * | 2007-03-01 | 2009-11-17 | 어플라이드 머티어리얼스, 인코포레이티드 | 슬릿 도어 밀봉 압력의 제어 장치 및 방법 |
| WO2008151095A2 (en) * | 2007-05-30 | 2008-12-11 | Blueshift Technologies, Inc. | Vacuum substrate storage |
| JP2009179838A (ja) * | 2008-01-30 | 2009-08-13 | Fuji Electric Systems Co Ltd | 薄膜製造装置 |
| EP2374914B1 (en) * | 2010-04-07 | 2015-07-22 | Applied Materials, Inc. | A device for sealing a chamber inlet or a chamber outlet for a flexible substrate; substrate processing apparatus, and method for assembling such a device |
| JP2012081428A (ja) * | 2010-10-13 | 2012-04-26 | Tokyo Ohka Kogyo Co Ltd | 塗布装置及び塗布方法 |
| US20120211029A1 (en) * | 2011-02-22 | 2012-08-23 | Pandit Viraj S | Load lock assembly and method for particle reduction |
| JP5806827B2 (ja) * | 2011-03-18 | 2015-11-10 | 東京エレクトロン株式会社 | ゲートバルブ装置及び基板処理装置並びにその基板処理方法 |
| US9096934B1 (en) * | 2012-10-31 | 2015-08-04 | WD Media, LLC | Load lock with variable conductance valve |
| JP2015074810A (ja) * | 2013-10-10 | 2015-04-20 | 日東電工株式会社 | スパッタ装置およびスパッタ装置のフィルムロールの交換方法 |
| KR101593073B1 (ko) * | 2013-12-27 | 2016-02-11 | 엘아이지인베니아 주식회사 | 플렉시블 기판 처리장치 및 이를 이용한 플렉시블 기판 처리방법 |
| US9972740B2 (en) * | 2015-06-07 | 2018-05-15 | Tesla, Inc. | Chemical vapor deposition tool and process for fabrication of photovoltaic structures |
| WO2018039055A1 (en) * | 2016-08-22 | 2018-03-01 | Applied Materials, Inc. | Door seal for vacuum chamber |
| CN110234792A (zh) * | 2017-03-17 | 2019-09-13 | 应用材料公司 | 操作真空处理系统的方法 |
| US20200240008A1 (en) * | 2017-03-17 | 2020-07-30 | Sebastian Gunther ZANG | Apparatus for vacuum processing of a substrate, system for the manufacture of devices having organic materials, and method for sealing a processing vacuum chamber and a maintenance vacuum chamber from each other |
| US10627728B2 (en) * | 2017-06-14 | 2020-04-21 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for creating vacuum in load lock chamber |
| GB2573110A (en) * | 2018-04-23 | 2019-10-30 | Emerson & Renwick Ltd | Load Lock |
| TWI840362B (zh) * | 2018-06-04 | 2024-05-01 | 荷蘭商Asm Ip私人控股有限公司 | 水氣降低的晶圓處置腔室 |
| US11328943B2 (en) * | 2020-04-03 | 2022-05-10 | Applied Materials, Inc. | Dual gate and single actuator system |
-
2020
- 2020-10-14 US US17/070,776 patent/US20220112594A1/en not_active Abandoned
-
2021
- 2021-09-22 KR KR1020237016081A patent/KR20230085188A/ko active Pending
- 2021-09-22 WO PCT/US2021/051549 patent/WO2022081318A1/en not_active Ceased
- 2021-09-22 EP EP21880760.0A patent/EP4229228A4/en not_active Withdrawn
- 2021-09-22 CN CN202180067930.7A patent/CN116324017A/zh active Pending
- 2021-09-22 JP JP2023522754A patent/JP2023545454A/ja active Pending
- 2021-09-29 TW TW110136130A patent/TWI774570B/zh active
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