JP2023545454A5 - - Google Patents

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Publication number
JP2023545454A5
JP2023545454A5 JP2023522754A JP2023522754A JP2023545454A5 JP 2023545454 A5 JP2023545454 A5 JP 2023545454A5 JP 2023522754 A JP2023522754 A JP 2023522754A JP 2023522754 A JP2023522754 A JP 2023522754A JP 2023545454 A5 JP2023545454 A5 JP 2023545454A5
Authority
JP
Japan
Prior art keywords
volume
sealing
pressure
conduit
sealing portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023522754A
Other languages
English (en)
Japanese (ja)
Other versions
JP2023545454A (ja
Filing date
Publication date
Priority claimed from US17/070,776 external-priority patent/US20220112594A1/en
Application filed filed Critical
Publication of JP2023545454A publication Critical patent/JP2023545454A/ja
Publication of JP2023545454A5 publication Critical patent/JP2023545454A5/ja
Pending legal-status Critical Current

Links

JP2023522754A 2020-10-14 2021-09-22 真空チャンバを封止するための装置、真空処理システム、及びロードロックシールを監視する方法 Pending JP2023545454A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17/070,776 US20220112594A1 (en) 2020-10-14 2020-10-14 Device for sealing a vacuum chamber, vacuum processing system, and method of monitoring a load lock seal
US17/070,776 2020-10-14
PCT/US2021/051549 WO2022081318A1 (en) 2020-10-14 2021-09-22 Device for sealing a vacuum chamber, vacuum processing system, and method of monitoring a load lock seal

Publications (2)

Publication Number Publication Date
JP2023545454A JP2023545454A (ja) 2023-10-30
JP2023545454A5 true JP2023545454A5 (https=) 2024-10-01

Family

ID=81077536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023522754A Pending JP2023545454A (ja) 2020-10-14 2021-09-22 真空チャンバを封止するための装置、真空処理システム、及びロードロックシールを監視する方法

Country Status (7)

Country Link
US (1) US20220112594A1 (https=)
EP (1) EP4229228A4 (https=)
JP (1) JP2023545454A (https=)
KR (1) KR20230085188A (https=)
CN (1) CN116324017A (https=)
TW (1) TWI774570B (https=)
WO (1) WO2022081318A1 (https=)

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US20230407469A1 (en) * 2022-06-17 2023-12-21 Raytheon Technologies Corporation Continuous atmospheric pressure cvd tow coater process with in-situ air leak monitoring
CN116853873A (zh) * 2023-08-01 2023-10-10 天齐卫蓝固锂新材料(湖州)有限公司 一种真空腔走带隔断机构及真空开卷设备
CN119419141B (zh) * 2024-11-07 2025-11-14 拓荆创益(沈阳)半导体设备有限公司 一种真空传输阀门、控制方法及半导体薄膜设备

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JP3067907B2 (ja) * 1992-10-07 2000-07-24 キヤノン株式会社 スパッタリング装置、スパッタリング方法、該スパッタリング方法によって形成された積層膜、真空処理装置、および該真空処理装置によって処理が施された基板
US6174377B1 (en) * 1997-03-03 2001-01-16 Genus, Inc. Processing chamber for atomic layer deposition processes
US6183564B1 (en) * 1998-11-12 2001-02-06 Tokyo Electron Limited Buffer chamber for integrating physical and chemical vapor deposition chambers together in a processing system
DE50002987D1 (de) * 2000-02-01 2003-08-28 Emil Baechli Einrichtung zur Oberflächenbehandlung und/oder Beschichtung bzw. zur Fertigung von Bauelementen, insbesondere flacher Bauelemente aus Glas, Glaslegierungen oder Metall, im Durchlaufverfahren
US6878207B2 (en) * 2003-02-19 2005-04-12 Energy Conversion Devices, Inc. Gas gate for isolating regions of differing gaseous pressure
US7513141B2 (en) * 2003-09-09 2009-04-07 Applied Films Corporation Method for differentially pumping endblock seal cavity
WO2007016592A2 (en) * 2005-07-29 2007-02-08 Aviza Technology, Inc. Gas manifold valve cluster
US7845618B2 (en) * 2006-06-28 2010-12-07 Applied Materials, Inc. Valve door with ball coupling
DE602007002782D1 (de) * 2007-02-28 2009-11-26 Applied Materials Inc Zugangsversperrsystem, Netzverarbeitungsanlage und Anwendungsverfahren dafür
KR20090118088A (ko) * 2007-03-01 2009-11-17 어플라이드 머티어리얼스, 인코포레이티드 슬릿 도어 밀봉 압력의 제어 장치 및 방법
WO2008151095A2 (en) * 2007-05-30 2008-12-11 Blueshift Technologies, Inc. Vacuum substrate storage
JP2009179838A (ja) * 2008-01-30 2009-08-13 Fuji Electric Systems Co Ltd 薄膜製造装置
EP2374914B1 (en) * 2010-04-07 2015-07-22 Applied Materials, Inc. A device for sealing a chamber inlet or a chamber outlet for a flexible substrate; substrate processing apparatus, and method for assembling such a device
JP2012081428A (ja) * 2010-10-13 2012-04-26 Tokyo Ohka Kogyo Co Ltd 塗布装置及び塗布方法
US20120211029A1 (en) * 2011-02-22 2012-08-23 Pandit Viraj S Load lock assembly and method for particle reduction
JP5806827B2 (ja) * 2011-03-18 2015-11-10 東京エレクトロン株式会社 ゲートバルブ装置及び基板処理装置並びにその基板処理方法
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JP2015074810A (ja) * 2013-10-10 2015-04-20 日東電工株式会社 スパッタ装置およびスパッタ装置のフィルムロールの交換方法
KR101593073B1 (ko) * 2013-12-27 2016-02-11 엘아이지인베니아 주식회사 플렉시블 기판 처리장치 및 이를 이용한 플렉시블 기판 처리방법
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CN110234792A (zh) * 2017-03-17 2019-09-13 应用材料公司 操作真空处理系统的方法
US20200240008A1 (en) * 2017-03-17 2020-07-30 Sebastian Gunther ZANG Apparatus for vacuum processing of a substrate, system for the manufacture of devices having organic materials, and method for sealing a processing vacuum chamber and a maintenance vacuum chamber from each other
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