JP2023152629A5 - - Google Patents

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Publication number
JP2023152629A5
JP2023152629A5 JP2022180830A JP2022180830A JP2023152629A5 JP 2023152629 A5 JP2023152629 A5 JP 2023152629A5 JP 2022180830 A JP2022180830 A JP 2022180830A JP 2022180830 A JP2022180830 A JP 2022180830A JP 2023152629 A5 JP2023152629 A5 JP 2023152629A5
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JP
Japan
Prior art keywords
group
carbon atoms
propynyl
propenyl
butyl
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Pending
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JP2022180830A
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English (en)
Japanese (ja)
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JP2023152629A (ja
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Priority to US18/126,158 priority Critical patent/US20230314944A1/en
Priority to TW112111417A priority patent/TWI823806B/zh
Priority to KR1020230039669A priority patent/KR102712295B1/ko
Priority to CN202310311665.3A priority patent/CN116893576A/zh
Publication of JP2023152629A publication Critical patent/JP2023152629A/ja
Publication of JP2023152629A5 publication Critical patent/JP2023152629A5/ja
Pending legal-status Critical Current

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JP2022180830A 2022-03-30 2022-11-11 ポジ型レジスト材料及びパターン形成方法 Pending JP2023152629A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US18/126,158 US20230314944A1 (en) 2022-03-30 2023-03-24 Positive resist composition and pattern forming process
TW112111417A TWI823806B (zh) 2022-03-30 2023-03-27 正型阻劑材料及圖案形成方法
KR1020230039669A KR102712295B1 (ko) 2022-03-30 2023-03-27 포지티브형 레지스트 재료 및 패턴 형성 방법
CN202310311665.3A CN116893576A (zh) 2022-03-30 2023-03-28 正型抗蚀剂材料及图案形成方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022056309 2022-03-30
JP2022056309 2022-03-30

Publications (2)

Publication Number Publication Date
JP2023152629A JP2023152629A (ja) 2023-10-17
JP2023152629A5 true JP2023152629A5 (https=) 2024-01-25

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ID=88349419

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022180830A Pending JP2023152629A (ja) 2022-03-30 2022-11-11 ポジ型レジスト材料及びパターン形成方法

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JP (1) JP2023152629A (https=)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5655754B2 (ja) * 2011-10-03 2015-01-21 信越化学工業株式会社 ポジ型レジスト材料並びにこれを用いたパターン形成方法
JP7292150B2 (ja) * 2019-08-22 2023-06-16 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、高分子化合物及び化合物
WO2022024929A1 (ja) * 2020-07-27 2022-02-03 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
JP7333842B2 (ja) * 2022-01-21 2023-08-25 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、及び、化合物

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