JP2023077326A - Vacuum processing apparatus - Google Patents

Vacuum processing apparatus Download PDF

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JP2023077326A
JP2023077326A JP2021190594A JP2021190594A JP2023077326A JP 2023077326 A JP2023077326 A JP 2023077326A JP 2021190594 A JP2021190594 A JP 2021190594A JP 2021190594 A JP2021190594 A JP 2021190594A JP 2023077326 A JP2023077326 A JP 2023077326A
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axis direction
chamber
transport
tray
posture
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純一 永田
Junichi Nagata
雄一 吉田
Yuichi Yoshida
傑之 鈴木
Takayuki Suzuki
政司 梅原
Seiji Umehara
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Ulvac Inc
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Ulvac Inc
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Abstract

To provide a vacuum processing apparatus in which a transfer tray can be inserted into a transfer section or the transfer tray can be pulled out of the transfer section even when guiding movement in a non-contact pulled state with upper and lower parts of the transfer tray.SOLUTION: Each of a first chamber Pc and a second chamber Lc, which are connected with each other, comprises transfer means Tm for transferring a transfer tray Tr in an X-axis direction, and a freely tiltable tilt section 2 is provided in the first chamber, such that a posture of the transfer tray can be changed between a horizontal posture and a vertical posture. The transfer means comprises: a first guide section 4 for guiding movement in the X-axis direction in a state where an upper part of the transfer tray is pulled upward in a Z-axis direction with no contact; a second guide section 6 for guiding movement in the X-axis direction in a state where a lower part of the transfer tray is pulled upward in the Z-axis direction with no contact; and a transfer section 5 for transferring the transfer tray while supporting the transfer tray in contact therewith. Drive sections 72a and 72b are provided for moving a portion of the second guide section existing in the first chamber at least in a Y-axis direction.SELECTED DRAWING: Figure 3

Description

本発明は、一方の面に被処理基板が配置される搬送トレイを搬送しながら、被処理基板の処理面に対して所定の真空処理を施す真空処理装置に関し、より詳しくは、搬送トレイの姿勢変更を可能とする第1チャンバとこれに連設される第2チャンバとを備えるものに関する。 TECHNICAL FIELD The present invention relates to a vacuum processing apparatus that performs a predetermined vacuum process on a processing surface of a substrate to be processed while transporting a transport tray on one side of which a substrate to be processed is arranged, and more particularly to a posture of the transport tray. The present invention relates to a device comprising a changeable first chamber and a second chamber connected thereto.

上記種の真空処理装置は、例えば特許文献1で知られている。以下、搬送トレイの移動方向をX軸方向、X軸方向に直交する重力加速度方向をZ軸方向、X軸方向及びZ軸方向に直交する方向をY軸方向とし、また、被処理基板(以下、「基板」という)の処理面がZ軸方向上方を向く搬送トレイ(及び基板)の姿勢を水平姿勢、処理面がY軸方向一方を向く姿勢を起立姿勢として説明する。上記特許文献1記載のものは、例えば、大気雰囲気に存する処理前の基板を水平姿勢で搬送して搬送トレイに配置し、起立姿勢(Z軸に対して所定角度で搬送トレイが傾斜する姿勢を含む)に姿勢変更した後、起立姿勢の搬送トレイを真空雰囲気の各真空(処理)チャンバへと搬送するために、第1チャンバと第2チャンバとを備える。第1チャンバは、例えば、搬送トレイへの基板の着脱が実施される所謂ポジションチャンバと称されるものであり、その内部には、例えば、他方の面側から搬送トレイを保持した状態で傾動自在な傾動部と、傾動部をY軸方向左右に移動自在な移動部とが設けられている。 A vacuum processing apparatus of the above kind is known, for example, from US Pat. Hereinafter, the moving direction of the transport tray is defined as the X-axis direction, the gravitational acceleration direction orthogonal to the X-axis direction is defined as the Z-axis direction, the X-axis direction and the direction orthogonal to the Z-axis direction are defined as the Y-axis direction, and the substrate to be processed (hereinafter referred to as , "substrates") are oriented upward in the Z-axis direction as the horizontal orientation, and the orientation in which the processing surface faces one side in the Y-axis direction is the upright orientation. In the technique described in Patent Document 1, for example, a pre-processed substrate in an atmospheric atmosphere is transported in a horizontal posture and placed on a transport tray, and the standing posture (the posture in which the transport tray is tilted at a predetermined angle with respect to the Z-axis) is used. a first chamber and a second chamber for transferring the transfer tray in the upright position to each vacuum (processing) chamber in a vacuum atmosphere after the transfer tray has been changed to a different position. The first chamber is, for example, a so-called position chamber in which the substrate is attached to and detached from the carrier tray. and a movable portion capable of moving the tilting portion left and right in the Y-axis direction.

第1チャンバにて水平姿勢の搬送トレイに基板が配置されると、傾動部は、搬送トレイを持ち上げながら回転して搬送トレイを起立姿勢とし、移動部により後述の搬送部のZ軸方向上方の位置までY軸方向一方に移動した後、搬送トレイを差し込むように搬送部へと受け渡す。搬送部から処理済みの基板Swがある搬送トレイTrを受け取るときには、傾動部は、他方の面側から搬送トレイを保持し、Z軸方向上方に引き抜くように起立姿勢の搬送トレイを持ち上げた後、搬送トレイを持ち下げながら搬送トレイを回転させて水平姿勢に変更してY軸方向他方に所定位置まで移動し、搬送トレイからの処理済みの基板の回収が可能となる。 When the substrate is placed on the horizontal carrier tray in the first chamber, the tilting unit rotates while lifting the carrier tray to bring the carrier tray into an upright posture. After moving in one direction in the Y-axis direction to the position, the transfer tray is transferred to the transfer section so as to be inserted. When the transport tray Tr containing the processed substrates Sw is received from the transport unit, the tilting unit holds the transport tray from the other surface side and lifts the transport tray in the upright posture so as to pull it upward in the Z-axis direction. While lifting the carrier tray, the carrier tray is rotated to change to a horizontal posture and moved to a predetermined position in the other Y-axis direction, so that the processed substrate can be recovered from the carrier tray.

X軸方向にゲートバルブを介して連設される第2チャンバは所謂ロードロックチャンバと称されるものであり、その内部を大気雰囲気と真空雰囲気との切換えが可能なように真空ポンプや大気開放弁などが設けられ、例えば、真空雰囲気の各真空チャンバへの搬送トレイの搬送を可能としている。第1チャンバと第2チャンバとには、起立姿勢の搬送トレイをX軸方向に沿って搬送する搬送手段が設けられている。搬送手段は、搬送トレイの上部を非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する案内部(以下、「第1案内部」という)と、搬送トレイを接触支持して搬送する搬送部とを備える(例えば、特許文献2参照)。第1案内部としては、搬送トレイのZ軸方向上面に設けられる一方の磁石(以下、「第1磁石」という)、この第1磁石からZ軸方向上方に間隔を置いて、且つ、第1磁石と引き合うように第1チャンバ及び第2チャンバ内上部にX軸方向に沿って配置される他方の磁石(以下、「第2磁石」という)とを備えるものが一般に使用されている。 The second chamber connected in the X-axis direction via a gate valve is a so-called load-lock chamber, and a vacuum pump and an air vent are installed so that the inside thereof can be switched between an atmospheric atmosphere and a vacuum atmosphere. A valve or the like is provided to enable, for example, transfer of the transfer tray to each vacuum chamber in a vacuum atmosphere. The first chamber and the second chamber are provided with transport means for transporting the transport tray in the upright posture along the X-axis direction. The conveying means includes a guide portion (hereinafter referred to as a “first guide portion”) that guides movement in the X-axis direction while the upper portion of the conveying tray is pulled upward in the Z-axis direction in a non-contact manner, and supports the conveying tray in contact. and a conveying unit that conveys the sheet by pressing (see, for example, Patent Literature 2). As the first guide part, one magnet (hereinafter referred to as "first magnet") provided on the Z-axis direction upper surface of the transport tray is spaced upward in the Z-axis direction from the first magnet, and the first magnet A generally used magnet is provided with the other magnet (hereinafter referred to as "second magnet") arranged along the X-axis direction in the upper part of the first chamber and the second chamber so as to attract the magnet.

搬送部としては、搬送トレイのZ軸方向下面にX軸方向にのびるように設けた円筒状のレール部材に係合する、所定曲率で湾曲した凹溝を設けた搬送ローラとを備えるものが一般に使用されている。そして、各搬送ローラの回転により第1案内部でX軸方向に案内しながら第1チャンバと第2チャンバとの間で搬送トレイがX軸方向前後に搬送される。通常は、所謂スループットを高めるために、第1チャンバと第2チャンバとには、第1案内部と搬送部とを夫々設けた2つのレーン(行き搬送路と戻り搬送路)がY軸方向に間隔を置いて設けられ、第1チャンバと第2チャンバとの間で搬送トレイの同時搬送ができるようにしている。 The conveying unit generally includes a conveying roller provided with a concave groove curved with a predetermined curvature and engaged with a cylindrical rail member provided on the lower surface of the conveying tray in the Z-axis direction so as to extend in the X-axis direction. It is used. Then, the transport tray is transported back and forth in the X-axis direction between the first chamber and the second chamber while being guided in the X-axis direction by the first guide portion by the rotation of each transport roller. Usually, in order to increase the so-called throughput, two lanes (a forward transport path and a return transport path) each provided with a first guide section and a transport section are provided in the first chamber and the second chamber in the Y-axis direction. Spaced apart to allow simultaneous transport of the transport trays between the first and second chambers.

上記搬送手段の搬送部では、通常、摩耗粉(発塵)の抑制を目的として、第1案内部に搬送トレイの重量(基板が配置されている場合には、基板重量も含む)の一部を牽引させることで、搬送トレイの残余の重量を接触支持する搬送ローラに印加する面圧及び荷重を軽減させている。これと同時に、搬送部の搬送ローラと共にY軸方向の自由度等について制限する構成となっている。つまり、上記搬送手段によって搬送トレイを搬送する際、第1案内部が搬送トレイに対し、Z軸方向上下を軸にした回転(ヨー)、X軸方向前後を軸にした回転(ロール)やY軸方向の移動について、搬送トレイの上部においてその移動をある範囲に制限する(移動の自由度を制限する)構成となっており、同様に搬送ローラも搬送トレイの下部において、Z軸方向上下を軸にした回転(ヨー)、X軸方向前後を軸にした回転(ロール)やY軸方向の移動について、その移動をある範囲に制限する構成となっている。なお、Z軸方向の移動とY軸方向前後を軸にした回転(ピッチング)の自由度については、搬送ローラがその移動の制限する構成となっており、案内部は搬送ローラに印加する面圧ならびに荷重を軽減させる効果のみを奏する構成となっている。 In the transport section of the transport means, a part of the weight of the transport tray (including the weight of the substrate when the substrate is placed) is usually placed on the first guide portion for the purpose of suppressing abrasion powder (dust generation). to reduce the surface pressure and load applied to the transport rollers that contact and support the remaining weight of the transport tray. At the same time, it is configured to limit the degree of freedom in the Y-axis direction together with the transport rollers of the transport unit. That is, when the transport tray is transported by the transport means, the first guide part rotates (yaw) about the Z-axis direction up and down, rotates (rolls) about the X-axis direction front and back, and rotates the transport tray with respect to the transport tray. Regarding the movement in the axial direction, the movement in the upper part of the carrier tray is restricted to a certain range (the degree of freedom of movement is limited). Rotation (yaw) around an axis, rotation (roll) around the front and back in the X-axis direction, and movement in the Y-axis direction are restricted to a certain range. Regarding the degree of freedom of movement in the Z-axis direction and rotation (pitting) around the Y-axis direction, the movement is restricted by the transport rollers, and the guide portion applies surface pressure to the transport rollers. In addition, it is configured to exhibit only the effect of reducing the load.

上記搬送部の構成では、X軸或いはZ軸方向前後を軸にした搬送トレイの回転やY軸方向左右の移動の自由度に一定の制限を加えることができる(即ち、搬送トレイの下部の搬送ローラからの逸脱を防止することができる)が、搬送トレイ下部における移動の自由度の制限は、レール部材と搬送ローラの凹溝等による機械的な係合要素を用いる構成である。このため、搬送ローラの凹溝内では搬送トレイの移動に伴って係合部材がY軸方向左右に滑り移動する場合があり、このときの滑り摩擦に伴って係合部材と搬送ローラの回転に伴って凹溝内で摩耗粉を発生させてしまうという問題がある。特に、常時、Z軸方向に対して所定角度で搬送トレイを傾斜させて搬送させるような場合にはより顕著になる。 With the configuration of the transport section described above, it is possible to add a certain limit to the degree of freedom of rotation of the transport tray about the X-axis or Z-axis direction and left-right movement in the Y-axis direction (that is, the lower part of the transport tray can be transported). However, the freedom of movement in the lower part of the transport tray is limited by using a mechanical engaging element such as a groove between the rail member and the transport roller. For this reason, the engaging member may slide left and right in the Y-axis direction as the conveying tray moves within the concave groove of the conveying roller. Along with this, there is a problem that abrasion powder is generated in the concave groove. In particular, this becomes more pronounced when the transport tray is always transported while being tilted at a predetermined angle with respect to the Z-axis direction.

このような問題を解決するために、搬送トレイを接触支持する搬送部の部分を例えば球体などの転動体で構成してZ軸方向の自由度のみを制限する構成にすると共に、搬送トレイのZ軸方向下部にて非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する他の案内部(以下、「第2案内部」という)を設けることが提案される。第2案内部としては、上記第1案内部と同様に、搬送トレイのZ軸方向下部に設けた一方の磁石(以下、「第3磁石」という)と、この第3磁石からZ軸方向上方に間隔を置いて、且つ、第3磁石と引き合うようにして第1チャンバ及び第2チャンバ内に設けられる他方の磁石(以下、「第4磁石」という)とで構成することが考えられる。このような場合、第3磁石は、例えば、搬送トレイの他方の面側でその下端にY軸方向外方に延出させて支持板部を形成してそのZ軸方向上面に設け、第4磁石は、第1チャンバ及び第2チャンバ内に行き搬送路及び戻り搬送路に沿って搬送トレイの支持板部にZ軸方向に間隔を置いて対峙する水平壁部を持つ支持壁を夫々設け、この水平壁部のZ軸方向下面に設ければよい。 In order to solve such a problem, the portion of the transport section that contacts and supports the transport tray is configured with rolling elements such as spheres to limit only the degree of freedom in the Z-axis direction. It is proposed to provide another guide portion (hereinafter referred to as a “second guide portion”) that guides the movement in the X-axis direction while being pulled upward in the Z-axis direction without contact at the lower portion in the axial direction. Similar to the first guide portion, the second guide portion includes one magnet (hereinafter referred to as "third magnet") provided at the lower portion of the conveying tray in the Z-axis direction, and a magnet located above the third magnet in the Z-axis direction. and the other magnet (hereinafter referred to as the "fourth magnet") provided in the first chamber and the second chamber so as to be attracted to the third magnet. In such a case, for example, the third magnet may be provided on the Z-axis direction upper surface of the supporting plate portion extending outward in the Y-axis direction from the lower end of the other surface of the transport tray. the magnets respectively provide support walls having horizontal wall portions spaced apart from and opposed to the support plate portion of the transport tray along the transport path into the first and second chambers and the return transport path in the Z-axis direction; It may be provided on the lower surface of the horizontal wall portion in the Z-axis direction.

以上によれば、搬送トレイの上部にて第1案内部で案内しながら搬送トレイを搬送する際に、搬送トレイにX軸方向前後を軸にした搬送トレイの回転(ロール)やY軸方向左右の移動の自由度があっても、搬送部の部分では転がり摩擦しか発生しないため、上記従来例のような滑り摩擦に伴う摩耗粉の発生を可及的に抑制することができる。これに加えて、第2案内部により搬送部で接触支持される搬送トレイの残余の重量の一部もまた牽引されることで、搬送トレイを接触支持する搬送部の部分に加わる搬送トレイの荷重を軽減でき、その上、搬送トレイの下部におけるX軸方向前後を軸にした搬送トレイの回転(ロール)やY軸方向左右の移動の自由度を制限されることで、摩擦に伴う摩耗粉の発生を一層抑制することができる。なお、本発明において、搬送トレイの「Z軸方向下部」は、Z軸方向下端部のみを指すものではなく、搬送部で接触支持された搬送トレイの重心よりZ軸方向下方に位置する部分をいう。然し、上記のように第2案内部を設けると、互いに近接する第3磁石と第4磁石との干渉により搬送部への搬送トレイの差し込み動作や搬送部からの搬送トレイの引き抜き動作が阻害されるという問題を生じる。 According to the above, when the transport tray is transported while being guided by the first guide portion above the transport tray, the transport tray rotates (rolls) about the front and back in the X-axis direction and the left and right in the Y-axis direction. Even if there is a degree of freedom of movement, only rolling friction is generated in the portion of the conveying portion, so it is possible to suppress the generation of abrasion powder due to sliding friction as in the above conventional example as much as possible. In addition, part of the weight of the remaining portion of the transport tray contact-supported by the transport portion is also pulled by the second guide portion, so that the load of the transport tray applied to the portion of the transport portion contact-supporting the transport tray. In addition, the rotation (roll) of the transport tray around the X-axis direction and the degree of freedom of the Y-axis direction left and right movement in the lower part of the transport tray are restricted, so that the abrasion dust caused by friction is reduced. The occurrence can be further suppressed. In the present invention, the "lower part in the Z-axis direction" of the transport tray does not only refer to the lower end in the Z-axis direction, but also the part located below the center of gravity of the transport tray contacted and supported by the transport unit in the Z-axis direction. say. However, when the second guide portion is provided as described above, the operation of inserting the conveying tray into the conveying portion and the operation of pulling out the conveying tray from the conveying portion are hindered due to the interference between the third magnet and the fourth magnet which are close to each other. problem.

再表2012-140801号公報Table 2012-140801 特開2005-289556号公報JP 2005-289556 A

本発明は、以上の点に鑑み、滑り摩擦に伴う摩耗粉の発生を可及的に抑制するために、搬送トレイのZ軸方向上下部にて非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する構成を採用した場合でも、搬送部への搬送トレイの差し込みや搬送部からの搬送トレイの引き抜きを可能にした真空処理装置を提供することをその課題とするものである。 In view of the above points, in order to suppress the generation of abrasion powder due to sliding friction as much as possible, the present invention provides a state in which the conveying tray is pulled upward in the Z-axis direction without contact with the upper and lower parts in the Z-axis direction. It is an object of the present invention to provide a vacuum processing apparatus that enables insertion of a transfer tray into a transfer section and extraction of the transfer tray from a transfer section even when a configuration for guiding movement in the X-axis direction is adopted. is.

上記課題を解決するために、一方の面に被処理基板が配置される搬送トレイを搬送しながら、被処理基板の処理面に対して所定の真空処理を施す本発明の真空処理装置は、水平面内で互いに直交する二方向をX軸方向及びY軸方向、X軸方向及びY軸方向に直交する方向をZ軸方向と、被処理基板の処理面がZ軸方向上方を向く搬送トレイの姿勢を水平姿勢、処理面がY軸方向一方を向く姿勢を起立姿勢とし、X軸方向に互いに連結される第1チャンバと第2チャンバとを備え、第1チャンバと第2チャンバとに起立姿勢の搬送トレイをX軸方向に沿って搬送する搬送手段が設けられ、第1チャンバ内に、搬送トレイを保持した状態で傾動自在な傾動部を備えて水平姿勢と垂直姿勢との間で搬送トレイの姿勢を変更可能とし、搬送手段は、第1チャンバと第2チャンバとの内部に設けられて、搬送トレイの上部を非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する第1案内部と、搬送トレイの下部を非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する第2案内部と、搬送トレイを接触支持してX軸方向前後に搬送トレイを搬送する搬送部とを備え、第1チャンバ内に存する第2案内部の部分を少なくともY軸方向に移動させる駆動部を設けたことを特徴とする。 In order to solve the above problems, a vacuum processing apparatus according to the present invention performs a predetermined vacuum process on a processing surface of a substrate to be processed while transporting a transport tray on which the substrate to be processed is arranged. Two directions perpendicular to each other are the X-axis direction and the Y-axis direction, the direction perpendicular to the X-axis direction and the Y-axis direction is the Z-axis direction, and the processing surface of the substrate to be processed faces upward in the Z-axis direction. is a horizontal posture, and a posture in which the processing surface faces one side in the Y-axis direction is a standing posture, and a first chamber and a second chamber are connected to each other in the X-axis direction. A transport means is provided for transporting the transport tray along the X-axis direction, and a tilting portion is provided in the first chamber so that the transport tray can be tilted while holding the transport tray, and the transport tray is moved between the horizontal position and the vertical position. The posture can be changed, and the transport means is provided inside the first chamber and the second chamber, and guides the movement in the X-axis direction while pulling the upper part of the transport tray upward in the Z-axis direction without contact. a second guide portion that guides the movement in the X-axis direction while the lower portion of the carrier tray is pulled upward in the Z-axis direction without contact; and a driving section for moving the portion of the second guide section existing in the first chamber at least in the Y-axis direction.

本発明において、前記第1チャンバと前記第2チャンバとにY軸方向に間隔を存して第1案内部、搬送部及び第2案内部を夫々設けた第1及び第2の各搬送路が設けられる場合、前記第2案内部は、前記他方の面側で前記搬送トレイの下部に形成した支持板部のZ軸方向上面に設けた一方の磁石と、この一方の磁石とZ軸方向上方から引き合うように、第1チャンバ及び第2チャンバ内で各搬送路に沿って配置される支持壁のZ軸方向下面に設けた他方の磁石とを備え、各第2案内部の部分を他方の磁石を含む支持壁の可動部分とし、各可動部分を一体に前記駆動部によりY軸方向に移動させる構成を採用することができる。 In the present invention, first and second conveying paths are provided in which a first guide portion, a conveying portion, and a second guide portion are respectively provided in the first chamber and the second chamber with a space therebetween in the Y-axis direction. When provided, the second guide portion includes one magnet provided on the upper surface in the Z-axis direction of a support plate portion formed under the transport tray on the other surface side, and the one magnet and the Z-axis direction upper side. and the other magnet provided on the Z-axis direction lower surface of the support wall arranged along each transfer path in the first chamber and the second chamber so as to attract each other from the It is possible to employ a configuration in which the movable portions of the support wall including magnets are used and the respective movable portions are integrally moved in the Y-axis direction by the driving portion.

以上によれば、搬送部への搬送トレイの差し込みや搬送部からの搬送トレイの引き抜きの際には、駆動部により他の磁石を含む第2案内部の部分(他方の磁石を含む支持壁の可動部分)をY軸方向一方に退避させておけば、第2案内部としての一方の磁石と他方の磁石とが干渉して搬送トレイの差し込みや引き抜きが阻害されるといった不具合は生じない。この場合、上記部分をZ軸方向に移動させる他の駆動部を更に設け、例えば、搬送トレイを引き抜く際に傾動部で起立姿勢の搬送トレイを保持するの先立って上記部分をZ軸方向上方に移動退避させておけば、例えば、傾動部で搬送トレイを保持するときの振動で互いに近接する両磁石が接触してしまうといった不具合も生じない。しかも、独立して上記部分のみを移動させるだけであるため、スループットの低下を招くといった不具合も生じない。 According to the above, when the conveying tray is inserted into the conveying section or the conveying tray is pulled out from the conveying section, the portion of the second guide section containing the other magnet (the support wall containing the other magnet) is controlled by the driving section. If the movable portion is retracted to one side in the Y-axis direction, there will be no problem that one magnet and the other magnet serving as the second guide portion interfere with each other to hinder insertion and withdrawal of the conveying tray. In this case, another drive unit is further provided to move the above-mentioned portion in the Z-axis direction. By moving and retracting, for example, there is no problem that the adjacent magnets come into contact with each other due to vibration when the transport tray is held by the tilting portion. Moreover, since only the above-mentioned portions are independently moved, there is no problem of lowering the throughput.

なお、第2案内部の可動部分をY軸方向に退避させるときにこれが搬送部に干渉する虞があるときには、前記搬送部は、前記第1チャンバ及び第2チャンバ内で前記第1及び第2の各搬送路に沿って配置されて前記搬送トレイの下面に点接触する転動体を有し、第1チャンバ内に存する各転動体を一体にY軸方向及びZ軸方向の少なくとも一方に移動させる他の駆動部を設けることが好ましい。 When the movable part of the second guide part is retracted in the Y-axis direction, if there is a risk that it may interfere with the transport part, the transport part moves between the first and second chambers in the first and second chambers. and having rolling elements that point-contact the lower surface of the transfer tray, and move the rolling elements in the first chamber together in at least one of the Y-axis direction and the Z-axis direction. Preferably, another drive is provided.

本実施形態のインライン式の真空処理装置の縦断面図。1 is a longitudinal sectional view of an in-line vacuum processing apparatus according to this embodiment; FIG. 図1に示すインライン式の真空処理装置の横断面図。FIG. 2 is a cross-sectional view of the in-line vacuum processing apparatus shown in FIG. 1; 搬送トレイの搬送状態を示す部分拡大図。FIG. 4 is a partially enlarged view showing a conveying state of the conveying tray; (a)~(f)は、搬送部からの搬送トレイの受け取り、搬送部への搬送トレイの受け渡し操作を説明する図。4A to 4F are diagrams for explaining an operation of receiving a transport tray from a transport unit and transferring the transport tray to the transport unit; FIG.

以下、図面を参照して、被処理基板をフラットパネルディスプレイの製造に利用される大面積のガラス基板(以下、「基板Sw」という)とし、基板Swが配置される搬送トレイTrを真空チャンバ内で後述の搬送路Tp1,Tp2に沿って搬送しながら、基板Swの一方の面(処理面)に成膜処理、熱処理、エッチング処理といった各種の真空処理を施すインライン式のものを例に本発明の真空処理装置の実施形態を説明する。以下においては、搬送路Tp1,Tp2に沿った搬送トレイTrの移動方向をX軸方向、X軸方向に直交する重力加速度方向をZ軸方向、X軸方向及びZ軸方向に直交する方向をY軸方向とする。また、搬送トレイTrに配置された基板Swの処理面がZ軸方向上方を向く搬送トレイ(及び基板Sw)の姿勢を水平姿勢、基板Swの処理面がY軸方向一方を向く搬送トレイTr(及び基板Sw)の姿勢を起立姿勢(Z軸に対して所定角度で搬送トレイTrが傾斜する姿勢も含む)とする。 Hereinafter, with reference to the drawings, the substrate to be processed is a large glass substrate (hereinafter referred to as "substrate Sw") used for manufacturing flat panel displays, and the transport tray Tr on which the substrate Sw is placed is placed in a vacuum chamber. The present invention is an example of an in-line type in which various vacuum processes such as film formation, heat treatment, and etching are performed on one surface (process surface) of the substrate Sw while being transported along transport paths Tp1 and Tp2 described later. An embodiment of the vacuum processing apparatus will be described. In the following, the moving direction of the transport tray Tr along the transport paths Tp1 and Tp2 is the X-axis direction, the gravitational acceleration direction perpendicular to the X-axis direction is the Z-axis direction, and the direction perpendicular to the X-axis direction and the Z-axis direction is Y Axial direction. Further, the posture of the transport tray (and the substrate Sw) in which the processing surface of the substrate Sw placed on the transport tray Tr faces upward in the Z-axis direction is the horizontal posture, and the transport tray Tr (in which the processing surface of the substrate Sw faces one side in the Y-axis direction). and the substrate Sw) is assumed to be an upright posture (including a posture in which the transport tray Tr is inclined at a predetermined angle with respect to the Z axis).

図1~図3を参照して、真空処理装置VMは、図外の搬送ロボットにより処理前の基板Swを水平姿勢で搬送トレイTrの一方の面に配置し、または、水平姿勢の搬送トレイTrから処理済みの基板Swを取り出すためのポジションチャンバ(第1チャンバ)Pcを備える。搬送トレイTrは、基板Swより一回り大きな輪郭の板状体11で構成され、板状体11には、起立姿勢にしたときに基板Swの下辺が当接する基板受け部12と、板状体11に対して基板Swの縁部を局所的に押圧するクランプなどの押圧部(図示せず)とが設けられ、真空処理の間、起立姿勢の基板Swを搬送トレイTrに保持することができる。基板Swに対する真空処理によっては、マスクプレートが基板Swと共に取り付けられるようにしてもよい。このような搬送トレイTrとしては公知のものが利用できるため、これ以上の説明は省略する。 1 to 3, the vacuum processing apparatus VM arranges a substrate Sw before processing in a horizontal posture on one surface of a transport tray Tr by a transport robot (not shown), or places the substrate Sw in a horizontal posture on one side of the transport tray Tr. A position chamber (first chamber) Pc for taking out the processed substrate Sw from. The transport tray Tr is composed of a plate-like body 11 having an outline slightly larger than that of the substrate Sw. A pressing part (not shown) such as a clamp for locally pressing the edge of the substrate Sw against 11 is provided so that the substrate Sw in the upright posture can be held on the transport tray Tr during vacuum processing. . Depending on the vacuum processing on the substrate Sw, a mask plate may be attached together with the substrate Sw. As such a transport tray Tr, a known one can be used, so further explanation is omitted.

大気雰囲気に維持されるポジションチャンバPcには、他方の面側から搬送トレイTrを保持した状態で傾動自在な傾動部2が備えられ、水平姿勢と起立姿勢との間で搬送トレイTrの姿勢を変更することができる。傾動部2は保持板21を備え、保持板21の所定位置には、特に図示して説明しないが、バキュームチャックなどの保持機構が設けられ、搬送トレイTrを起立姿勢にしたときでも保持板21から基板Swが離脱しないようにしている。保持板21には、X軸方向に間隔を置いて立設されて、単軸ロボットなどの機構(図示せず)によりZ軸方向上下に同期して伸縮自在な2本のフレーム22に設けた回転軸23が連結され、モータMtにより回転軸23を一方向に回転駆動すると、保持板21が回転軸23回りに回転して搬送トレイTrを傾動するようにしている。各フレーム22の下端は、Y軸方向にのびるようにポジションチャンバPcに設けた単軸ロボットの移動機構24に連結され、Y軸方向左右に往復動自在となっている。 The position chamber Pc, which is maintained in the atmosphere, is provided with a tilting portion 2 that is capable of tilting while holding the transport tray Tr from the other side. can be changed. The tilting portion 2 is provided with a holding plate 21. A holding mechanism such as a vacuum chuck is provided at a predetermined position of the holding plate 21, although not shown and described, so that the holding plate 21 can be held even when the transport tray Tr is in the upright posture. The substrate Sw is prevented from being detached from. The holding plate 21 is provided on two frames 22 which are vertically spaced apart in the X-axis direction and vertically synchronously expandable in the Z-axis direction by a mechanism such as a single-axis robot (not shown). When the rotating shaft 23 is connected and driven to rotate in one direction by the motor Mt, the holding plate 21 rotates around the rotating shaft 23 to tilt the transport tray Tr. The lower end of each frame 22 is connected to a moving mechanism 24 of a single-axis robot provided in the position chamber Pc so as to extend in the Y-axis direction, and can reciprocate left and right in the Y-axis direction.

ポジションチャンバPcにて水平姿勢の搬送トレイTrに基板Swが配置されると、傾動部2は、搬送トレイTrを持ち上げながら回転して搬送トレイTrを起立姿勢とし、移動機構24により後述の搬送部のZ軸方向上方の位置までY軸方向一方に移動した後、搬送トレイTrを差し込むように搬送部へと受け渡す。一方、後述の搬送部から処理済みの基板Swがある搬送トレイTrを受け取るときには、傾動部2は、他方の面側から搬送トレイTrを保持した後、Z軸方向上方に引き抜くように起立姿勢の搬送トレイTrを持ち上げた後、搬送トレイTrを持ち下げながら搬送トレイTrを回転させて水平姿勢に変更してY軸方向他方に所定位置まで移動し、搬送トレイTrからの処理済みの基板Swの回収が可能となる。 When the substrate Sw is placed on the transport tray Tr in the horizontal posture in the position chamber Pc, the tilting unit 2 rotates while lifting the transport tray Tr to bring the transport tray Tr into the upright posture, and the moving mechanism 24 moves the transport unit (described later). After moving in one direction in the Y-axis direction to a position above in the Z-axis direction, the transport tray Tr is transferred to the transport section so as to be inserted. On the other hand, when receiving a transport tray Tr containing a processed substrate Sw from a transport unit, which will be described later, the tilting unit 2 holds the transport tray Tr from the other surface side, and then is pulled out upward in the Z-axis direction. After the transport tray Tr is lifted, the transport tray Tr is rotated while being lowered, changed to a horizontal posture, moved to a predetermined position in the other Y-axis direction, and the processed substrates Sw are removed from the transport tray Tr. recovery is possible.

ポジションチャンバPcのX軸方向前方には、ゲートバルブGv1を介してロードロックチャンバ(第2チャンバ)Lcが連設されている。ロードロックチャンバLcには、特に図示して説明しないが、真空ポンプからの排気管とベントガスを導入するベントガスラインとが夫々接続され、ロードロックチャンバLcを真空雰囲気と大気雰囲気とに適宜切り換えることができる。ロードロックチャンバLcのX軸方向前方には、基板Swの処理面に対して実施しようとする各種の真空処理に応じた数の処理チャンバVc1~VcnがゲートバルブGv2,Gvnを介して順次連設されている。各処理チャンバVc1,Vcnは、X軸方向に沿ってのびる隔離壁31によってY軸方向で左右2室に隔絶され、各室31a,31bには、例えば、スパッタリングカソードといった各種の真空処理の実施に必要な装置32が夫々設けられている。そして、基板Swの処理面がY軸方向左方(図2中、下方)を向く起立姿勢で搬送トレイTrが各真空処理チャンバVc1,Vcnの各室31a,31bを夫々通過する間に、基板Swの処理面に対し各種の真空処理が施される。X軸方向前方で最下流側に位置する処理チャンバVcnにはターンバックチャンバBcが連設されている。 A load lock chamber (second chamber) Lc is connected to the front of the position chamber Pc in the X-axis direction via a gate valve Gv1. An exhaust pipe from a vacuum pump and a vent gas line for introducing vent gas are connected to the load lock chamber Lc, although not shown and described, so that the load lock chamber Lc can be switched between a vacuum atmosphere and an atmospheric atmosphere as appropriate. can. In front of the load lock chamber Lc in the X-axis direction, the number of processing chambers Vc1 to Vcn corresponding to various types of vacuum processing to be performed on the processing surface of the substrate Sw are successively connected via gate valves Gv2 and Gvn. It is Each of the processing chambers Vc1 and Vcn is separated into two left and right chambers in the Y-axis direction by a partition wall 31 extending along the X-axis direction. Each necessary device 32 is provided. Then, while the transport tray Tr passes through the chambers 31a and 31b of the vacuum processing chambers Vc1 and Vcn in an upright posture in which the processing surface of the substrate Sw faces the left in the Y-axis direction (downward in FIG. 2), the substrate is Various vacuum treatments are applied to the treated surface of Sw. A turnback chamber Bc is connected to the processing chamber Vcn positioned on the most downstream side in the X-axis direction.

ターンバックチャンバBcには、上面に搬送ローラ41を設けたY軸方向左右に移動自在な移動ステージ4が設けられ、処理チャンバVcnのY軸方向左側の室31aから受け取った搬送トレイTrを再度処理チャンバPcnのY軸方向右側の室31bに戻すことができる。そして、ポジションチャンバPcとターンバックチャンバBcとの間でX軸方向にのびる2本の搬送路に沿って搬送トレイTrを起立姿勢で夫々搬送できるように搬送手段Tmが設けられている。以下において、互いにX軸方向に連設されたポジションチャンバPcからロードロックチャンバLc、各処理チャンバVc1,VcnのY軸方向左側の室31aを経てターンバックチャンバBcに通じる、搬送トレイTrがX軸方向前方(図1、2中、左側から右側)に搬送されるものを行き搬送路Tp1、逆に、ターンバックチャンバTcからY軸方向右側の室31b、ロードロックチャンバLcを経てポジションチャンバPcに通じる、搬送トレイTrがX軸方向後方(図1中、右側から左側)に搬送されるものを戻り搬送路Tp2とする。 The turnback chamber Bc is provided with a moving stage 4 which is movable in the left and right directions in the Y-axis direction and has a transfer roller 41 on its upper surface. It can be returned to the chamber 31b on the right side of the chamber Pcn in the Y-axis direction. A transport means Tm is provided so that the transport tray Tr can be transported in an upright posture along two transport paths extending in the X-axis direction between the position chamber Pc and the turnback chamber Bc. In the following description, the transfer tray Tr is connected to the turnback chamber Bc through the position chamber Pc connected to the X-axis direction, the load-lock chamber Lc, and the chambers 31a on the left side of the processing chambers Vc1 and Vcn in the Y-axis direction. Forward transport (from left to right in FIGS. 1 and 2) follows transport path Tp1, turns back chamber Tc to chamber 31b on the right side in the Y-axis direction, load lock chamber Lc, and then to position chamber Pc. The conveying tray Tr is conveyed rearward in the X-axis direction (from the right side to the left side in FIG. 1) is referred to as a return conveying path Tp2.

搬送手段Tmは、起立姿勢の搬送トレイTrを非接触でZ軸方向上方に牽引した状態で、X軸方向前方または後方への移動を案内する第1案内部4と、第1案内部4によりその重量の一部が牽引された搬送トレイTrの残余の重量を接触支持してX軸方向前方または後方に搬送トレイTrを搬送する搬送部5と、搬送トレイTrのZ軸方向下部にて非接触でZ軸方向上方に牽引した状態でX軸方向前方または後方への移動を案内する第2案内部6とを備える。第1案内部4は、搬送トレイTrの板状体11のZ軸方向上面にその上辺に沿って取り付けたX軸方向に長手の第1磁石41と、行き搬送路Tp1及び戻り搬送路Tp2に沿ってポジションチャンバPc、ロードロックチャンバLc及び各処理チャンバVc1,Vcn内のZ軸方向上部に夫々配置した第2磁石42とを備える。第1磁石41と第2磁石42とは、その対向面の極性が異なるように着磁され、これにより、搬送トレイTrを非接触でZ軸方向上方に牽引した状態でX軸方向前後への移動を夫々案内する。なお、第1磁石41と第2磁石42とはY軸方向に間隔を置いて複数例で設けることもでき、この場合には、第1磁石41と第2磁石42との互いに向かい合うものの極性を交互に変えることが好ましい。 The transport means Tm has a first guide portion 4 that guides the movement forward or backward in the X-axis direction in a state in which the transport tray Tr in the upright posture is pulled upward in the Z-axis direction in a non-contact manner. A transport unit 5 that transports the transport tray Tr forward or backward in the X-axis direction by contacting and supporting the remaining weight of the transport tray Tr from which part of the weight has been pulled, A second guide portion 6 is provided for guiding movement forward or backward in the X-axis direction while being pulled upward in the Z-axis direction by contact. The first guide portion 4 includes a first magnet 41 elongated in the X-axis direction attached to the upper surface of the plate-like body 11 of the transport tray Tr along the upper side in the Z-axis direction, and a forward transport path Tp1 and a return transport path Tp2. A position chamber Pc, a load lock chamber Lc, and second magnets 42 arranged in the upper part in the Z-axis direction in each of the processing chambers Vc1 and Vcn. The first magnet 41 and the second magnet 42 are magnetized so that the polarities of their facing surfaces are different, thereby allowing the transport tray Tr to move forward and backward in the X-axis direction while being pulled upward in the Z-axis direction without contact. Guide each movement. In addition, the first magnet 41 and the second magnet 42 can also be provided in a plurality of cases with a space in the Y-axis direction. Alternating is preferred.

搬送部5は、行き搬送路Tp1及び戻り搬送路Tp2に沿ってポジションチャンバPc、ロードロックチャンバLc及び各処理チャンバVc1,Vcn内の下部にX軸方向に間隔を置いて設けられる転動体としての搬送コロ51を備える。各搬送コロ51は、ポジションチャンバPc、ロードロックチャンバLc及び各処理チャンバVc1,Vcn内の所定位置に夫々軸支される軸体51aと、各軸体51aに夫々外嵌されて搬送トレイTrのZ軸方向下面に接触する車輪部51bとで構成される。この場合、単一の軸体51aには、Y軸方向に間隔を置いて少なくとも2個の車輪部51bが取り付けられ、車輪部51bの先端はまた、径方向外方に向かって先細りである楕円状に形成され、車輪部51bが搬送トレイTrのZ軸方向の下面に点接触するようにしている。本実施形態では、各搬送コロ51が、Z軸方向の自由度のみを制限した状態で搬送トレイTrを接触支持する搬送部5の部分を構成する。特に図示して説明しないが、各搬送コロ51の軸体51aには、プーリー、歯車、駆動ベルトやモータといった公知の動力伝達機構が連結され、行き搬送路Tp1及び戻り搬送路Tp2毎に各搬送コロ51が同期して同方向に回転駆動される。 The transport unit 5 is provided as a rolling element spaced apart in the X-axis direction in the lower part of the position chamber Pc, the load lock chamber Lc, and the processing chambers Vc1 and Vcn along the outgoing transport path Tp1 and the return transport path Tp2. A conveying roller 51 is provided. Each transport roller 51 has shafts 51a that are pivotally supported at predetermined positions in the position chamber Pc, the load lock chamber Lc, and the processing chambers Vc1 and Vcn. and a wheel portion 51b that contacts the lower surface in the Z-axis direction. In this case, at least two wheel portions 51b are attached to a single shaft 51a spaced apart in the Y-axis direction, and the tips of the wheel portions 51b are also elliptical, tapering radially outward. The wheel portion 51b is in point contact with the lower surface of the transport tray Tr in the Z-axis direction. In this embodiment, each of the transport rollers 51 constitutes the part of the transport section 5 that contacts and supports the transport tray Tr in a state where only the degree of freedom in the Z-axis direction is restricted. Although not shown and described in particular, the shaft 51a of each transport roller 51 is connected to a known power transmission mechanism such as a pulley, a gear, a drive belt, or a motor, and each transport is performed for each forward transport path Tp1 and return transport path Tp2. The rollers 51 are synchronously driven to rotate in the same direction.

第2案内部6は、搬送トレイTrのZ軸方向下部に設けた第3磁石(一方の磁石)61と、行き搬送路Tp1及び戻り搬送路Tp2に沿ってポジションチャンバPc、ロードロックチャンバLc及び各処理チャンバVc1,Vcn内の下部に夫々配置した第4磁石62とを備える。搬送トレイTrの板状体11には、基板Swが配置される一方の面に背向する他方の面側(図3中、左側)でその下端にその外方に向けて延出させて支持板部13が形成され、支持板部13のZ軸方向上面に第3磁石61が設けられている。他方、行き搬送路Tp1及び戻り搬送路Tp2に沿ってポジションチャンバPc、ロードロックチャンバLc及び各処理チャンバVc1,Vcn内のZ軸方向下部には、搬送トレイTrの支持板部13にZ軸方向に間隔を置いて対峙する水平壁部63aを持つ支持壁63がX軸方向に沿ってのびるように夫々設けられ、水平壁部63aの下面に第4磁石62が設けられている。第3磁石61と第4磁石62とは、その対向面の極性が異なるように着磁され、これにより、搬送トレイTrのZ軸方向下部を非接触でZ軸方向上方に牽引した状態でX軸方向前後への移動を夫々案内する。なお、第3磁石61と第4磁石62とは、上記同様、Y軸方向に間隔を置いて複数列で設けることもでき、この場合には、第3磁石61と第4磁石62との互いに向かい合うものの極性を交互に変えることが好ましい。 The second guide part 6 includes a third magnet (one magnet) 61 provided at the bottom of the transport tray Tr in the Z-axis direction, and a position chamber Pc, a load lock chamber Lc, and a position chamber Pc along the forward transport path Tp1 and the return transport path Tp2. and a fourth magnet 62 positioned at the bottom of each processing chamber Vc1, Vcn. The plate-like body 11 of the transport tray Tr is supported by extending outward from its lower end on the other surface side (the left side in FIG. 3) opposite to the one surface on which the substrate Sw is arranged. A plate portion 13 is formed, and a third magnet 61 is provided on the upper surface of the support plate portion 13 in the Z-axis direction. On the other hand, along the forward transport path Tp1 and the return transport path Tp2, the Z-axis direction lower part of the position chamber Pc, the load lock chamber Lc, and each of the processing chambers Vc1 and Vcn is provided on the support plate portion 13 of the transport tray Tr in the Z-axis direction. Support walls 63 having horizontal wall portions 63a opposed to each other with a space therebetween are provided so as to extend along the X-axis direction, and a fourth magnet 62 is provided on the lower surface of the horizontal wall portion 63a. The third magnet 61 and the fourth magnet 62 are magnetized so that their opposing surfaces have different polarities, thereby pulling the Z-axis direction lower portion of the transport tray Tr upward in the Z-axis direction without contact. They guide axial forward and backward movement, respectively. Note that the third magnets 61 and the fourth magnets 62 can be arranged in a plurality of rows at intervals in the Y-axis direction, in the same manner as described above. In this case, the third magnets 61 and the fourth magnets 62 It is preferred to alternate the polarity of the opposing ones.

以上の構成を採用すれば、搬送トレイTrをX軸方向前後に搬送する際、搬送トレイTrの下面と搬送部5の部分として、転動体である点接触の搬送コロ51を用いたことから、搬送トレイTr側の軌道面と転動体間の滑り摩擦が発生しないため、上記従来例のような滑り摩擦に伴う摩耗粉の発生を可及的に抑制することができる。しかも、第1案内部4によって搬送トレイTrの重量の一部が牽引されることに加えて、第2案内部6によって、搬送コロ51で接触支持される搬送トレイTrの残余の重量の一部もまた牽引されることで、各搬送コロ51に加わる搬送トレイTrの荷重をより一層軽減することができ、その上、第2案内部6によって搬送トレイTrの下部におけるX軸方向前後を軸にした搬送トレイTrの回転(ロール)やY軸方向左右の移動の自由度が制限されることで、摩擦に伴う摩耗粉の発生をより一層抑制することができる。但し、ポジションチャンバPcにて、搬送部5に対する搬送トレイTrの受け渡しまたは受け取りの際に、互いに近接する第3磁石61と第4磁石62との干渉により搬送コロ51への搬送トレイTrの差し込み動作や搬送コロ51からの搬送トレイTrの引き抜き動作が阻害されないように構成しておく必要がある。 With the above configuration, when the transport tray Tr is transported back and forth in the X-axis direction, the point-contact transport rollers 51, which are rolling bodies, are used as the parts of the transport unit 5 and the bottom surface of the transport tray Tr. Since there is no sliding friction between the track surface on the transport tray Tr side and the rolling elements, it is possible to suppress the generation of abrasion powder caused by the sliding friction as in the conventional example. Moreover, in addition to part of the weight of the transport tray Tr being towed by the first guide part 4 , part of the remaining weight of the transport tray Tr that is contacted and supported by the transport rollers 51 is caused by the second guide part 6 . By also pulling the transport tray Tr, the load of the transport tray Tr applied to each transport roller 51 can be further reduced. By restricting the rotation (roll) of the transport tray Tr and the degree of freedom of movement in the Y-axis direction left and right, it is possible to further suppress the generation of abrasion powder due to friction. However, when the transport tray Tr is transferred to or received from the transport unit 5 in the position chamber Pc, the interference between the third magnet 61 and the fourth magnet 62, which are close to each other, causes the transport tray Tr to be inserted into the transport roller 51. It is necessary to configure such that the pullout operation of the transport tray Tr from the transport roller 51 is not hindered.

本実施形態では、両支持壁63のポジションチャンバPc内に存する部分がY軸方向左右及びZ軸方向上下に移動自在な可動部分63L,63Rとして夫々構成されている。各可動部分63L,63Rは、ポジションチャンバPc内に設けた共通の第1の可動ベース71に夫々立設されている。第1の可動ベース71には、これをY軸方向左右及びZ軸方向上下に所定のストローク長で夫々移動できる(第1の)駆動部72a,72bが連結されている。駆動部72a,72bとしては、エアシリンダや直動モータなどの公知のものが利用できる。加えて、ポジションチャンバPc内に存する各搬送コロ51の軸体51aには、図示省略の軸受を備える支持ロッド52a,52bが連結され、各支持ロッド52a,52bのZ軸方向下端がポジションチャンバPc内に設けた共通の第2の可動ベース73に夫々取り付けられている。第2の可動ベース73には、これをY軸方向左右及びZ軸方向上下に所定のストローク長で夫々独立して移動できる(第2の)駆動部74a,74bが連結されている。第2の駆動部74a,74bとしては、上記同様、エアシリンダや直動モータなどの公知のものが利用できる。なお、次の搬送トレイTrを行き搬送路Tp1に受け渡すのに際し、第1の可動ベース71をY軸方向左側に移動させたときに、戻り搬送路Tp2側の可動部分63Rと行き搬送路Tp1側の搬送用コロ51とが干渉する場合には、これを避けるために、(第3の)駆動部75を更に設け、行き搬送路Tp1側の可動部分63LのみをY軸方向左右に更に移動自在に構成してもよい。以下に、図4を参照して、ポジションチャンバPcにて、戻り搬送路Tp2から搬送トレイTrを受け取り、行き搬送路Tp1に搬送トレイTrを受け渡す操作について説明する。 In this embodiment, the portions of both support walls 63 that are present in the position chamber Pc are configured as movable portions 63L and 63R that can move left and right in the Y-axis direction and up and down in the Z-axis direction, respectively. Each movable portion 63L, 63R is erected on a common first movable base 71 provided in the position chamber Pc. The first movable base 71 is connected to (first) drive units 72a and 72b capable of moving the base 71 horizontally in the Y-axis direction and vertically in the Z-axis direction with a predetermined stroke length. As the drive units 72a and 72b, well-known units such as air cylinders and direct-acting motors can be used. In addition, support rods 52a and 52b having bearings (not shown) are connected to the shafts 51a of the transport rollers 51 in the position chamber Pc. Each is attached to a common second movable base 73 provided inside. The second movable base 73 is connected to (second) drive units 74a and 74b capable of independently moving the base 73 horizontally in the Y-axis direction and vertically in the Z-axis direction with a predetermined stroke length. As the second drive portions 74a and 74b, known devices such as air cylinders and direct-acting motors can be used as described above. When the next transport tray Tr is transferred to the forward transport path Tp1, when the first movable base 71 is moved to the left in the Y-axis direction, the movable portion 63R on the return transport path Tp2 side and the forward transport path Tp1 are separated from each other. In order to avoid interference with the transport rollers 51 on the side, a (third) driving unit 75 is further provided to further move only the movable portion 63L on the forward transport path Tp1 side left and right in the Y-axis direction. You can configure it freely. An operation of receiving the transport tray Tr from the return transport path Tp2 and delivering the transport tray Tr to the forward transport path Tp1 in the position chamber Pc will be described below with reference to FIG.

ポジションチャンバPc内で戻り搬送路Tp2の受取位置まで搬送トレイTrが搬送されてくると(図4(a)参照)、傾動部2により他方の面側から搬送トレイTrを保持した後(以降、この搬送トレイTrのZ軸方向における位置を「保持位置」という)、一方の第1の駆動部72aにより第1の可動ベース71、ひいては、両支持壁63L,63RをZ軸方向に上昇させ、一方の第2の駆動部74aにより第2の可動ベース73、ひいては、各搬送コロ51をZ軸方向に下降させる(図4(b)参照)。次に、他方の第1の駆動部72bにより第1の可動ベース71を、また、他方の第2の駆動部74bにより第2の可動ベース73を同期させてY軸方向左側に移動させる(図4(c)参照)。なお、第1の可動ベース71をY軸方向左側に移動させたときに、戻り搬送路Tp2側の可動部分63Rと行き搬送路Tp1側の搬送用コロ51とが干渉しないような場合には、第2の可動ベース73の移動は不要にできる。そして、処理済みの基板Swがある搬送トレイTrをZ軸方向上方に引き抜くように保持位置から持上げられて戻り搬送路Tp2上から取り去れる。その後、特に図示して説明しないが、保持板21を回転させて水平姿勢に戻され、ポジションチャンバpcにて水平姿勢の搬送トレイTrに対する処理後の基板Swと処理前の基板Swとが交換される。 When the transport tray Tr is transported to the receiving position of the return transport path Tp2 in the position chamber Pc (see FIG. 4A), the transport tray Tr is held from the other side by the tilting portion 2 (hereinafter referred to as The position of the transport tray Tr in the Z-axis direction is referred to as a "holding position"), the first driving portion 72a moves the first movable base 71 and, in turn, the support walls 63L and 63R upward in the Z-axis direction, One of the second drive portions 74a lowers the second movable base 73 and, in turn, the conveying rollers 51 in the Z-axis direction (see FIG. 4B). Next, the first movable base 71 is synchronously moved by the other first driving section 72b, and the second movable base 73 is synchronously moved to the left in the Y-axis direction by the other second driving section 74b (Fig. 4(c)). When the first movable base 71 is moved to the left in the Y-axis direction, if the movable portion 63R on the return transport path Tp2 does not interfere with the transport rollers 51 on the forward transport path Tp1, Movement of the second movable base 73 can be made unnecessary. Then, the transport tray Tr with the processed substrates Sw is lifted from the holding position so as to be pulled upward in the Z-axis direction and removed from the return transport path Tp2. After that, although not particularly illustrated and described, the holding plate 21 is rotated to return to the horizontal posture, and the substrate Sw after processing and the substrate Sw before processing are exchanged with respect to the transport tray Tr in the horizontal posture in the position chamber pc. be.

次に、他方の第1及び第2の各駆動部72b,74bにより第1及び第2の各可動ベース71,73を元の位置までY軸方向右側に移動させ、第3の駆動部75により可動部分63LをY軸方向左側に移動させ、この状態で、傾動部2により行き搬送路Tp1の搬送部5に起立姿勢の搬送トレイTrを保持位置まで移動して待機させる(図4(d)参照)。そして、一方の第2の駆動部74aにより第2の可動ベース73を元の位置までZ軸方向に上昇させて各搬送コロ51で搬送トレイTrを接触支持させる(図4(e)参照)。最後に、第3の駆動部75により可動部分63Lを元の位置までY軸方向右側に移動させ、一方の第1の駆動部72aにより第1の可動ベース71を元の位置までZ軸方向に下降させた後、傾動部2を離脱させる(図4(f)参照)。これにより、ポジションチャンバPcとロードロックチャンバLcとの間で搬送トレイTrの同時搬送が可能な状態となる。 Next, the first and second movable bases 71 and 73 are moved to the right in the Y-axis direction to their original positions by the other first and second driving portions 72b and 74b, and the third driving portion 75 The movable portion 63L is moved to the left in the Y-axis direction, and in this state, the transport tray Tr in the upright posture is moved to the holding position by the transport unit 5 of the forward transport path Tp1 by the tilting unit 2 (FIG. 4D). reference). Then, the second movable base 73 is lifted to the original position in the Z-axis direction by one of the second drive portions 74a, and the transport rollers 51 contact and support the transport tray Tr (see FIG. 4E). Finally, the third driving section 75 moves the movable portion 63L to the original position to the right in the Y-axis direction, and the first driving section 72a moves the first movable base 71 to the original position in the Z-axis direction. After being lowered, the tilting portion 2 is removed (see FIG. 4(f)). As a result, the transport tray Tr can be simultaneously transported between the position chamber Pc and the load lock chamber Lc.

以上の実施形態によれば、搬送部5への搬送トレイTrの差し込みや搬送部5からの搬送トレイTrの引き抜きの際には、第2案内部6としての第3磁石61と第4磁石62とが干渉して搬送トレイTrの差し込み動作や引き抜き動作が阻害されるといった不具合は生じない。しかも、可動部分63L,63Rを事前にZ軸方向上方に移動退避させているため、傾動部2で搬送トレイTrを保持するときの振動で互いに近接する第3及び第4の両磁石61,62が接触してしまうといった不具合も生じない。その上、ポジションチャンバPc内の可動部分63L,63Rと搬送コロ51のみを移動させるだけであるため、スループットの低下を招くといった不具合も生じない。 According to the above embodiment, when the transport tray Tr is inserted into the transport unit 5 or pulled out from the transport unit 5, the third magnet 61 and the fourth magnet 62 as the second guide unit 6 There is no problem that the operation of inserting or pulling out the transport tray Tr is hindered due to interference between the two. Moreover, since the movable portions 63L and 63R are moved upward in the Z-axis direction in advance, the third and fourth magnets 61 and 62 approach each other due to vibration when the transport tray Tr is held by the tilting portion 2. There is no problem that the contacts come into contact with each other. Moreover, since only the movable parts 63L and 63R and the transport roller 51 in the position chamber Pc are moved, there is no problem of lowering the throughput.

以上、本発明の実施形態について説明したが、本発明の技術思想の範囲を逸脱しない限り、種々の変形が可能である。上記実施形態では、傾動部2により他方の面側から搬送トレイTrを保持するものを例に説明したが、搬送トレイTrを起立姿勢にしたときでも保持板21から基板Swが離脱しないように搬送トレイTrを保持できるものであれば、その形態は問わない。また、上記実施形態では、搬送部5として、搬送トレイTrのZ軸方向の下面に点接触して支持する搬送コロ51を備えるものを例に説明したが、Z軸方向の自由度のみを制限した状態で搬送トレイTrを接触支持できるものであれば、これに限定されるものではく、例えば、球体(図示せず)で接触支持するようにしてもよい。 Although the embodiments of the present invention have been described above, various modifications are possible without departing from the scope of the technical idea of the present invention. In the above embodiment, the transport tray Tr is held from the other side by the tilting portion 2. However, even when the transport tray Tr is in the upright position, the substrate Sw is transported so as not to separate from the holding plate 21. Any shape can be used as long as it can hold the tray Tr. Further, in the above-described embodiment, the conveying unit 5 is provided with the conveying rollers 51 that are supported in point contact with the lower surface of the conveying tray Tr in the Z-axis direction, but only the freedom in the Z-axis direction is limited. As long as it can contact and support the transport tray Tr in a state where it is held in place, it is not limited to this.

また、上記実施形態では、第1案内部4と第2案内部6として、互いに引き合うように配置した一対の磁石41,42,61,62を備えるものを例に説明したが、第1案内部4として、搬送トレイTrの重量(基板Sw重量も含む)の大半を牽引できると共に、少なくともX軸方向の自由度、Z軸方向上下の移動とY軸方向左右を軸とした回転(ピッチング)の自由度がある程度制限できるものであれば、これに限定されるものではない。特に図示して説明しないが、例えば、ポジションチャンバPc、ロードロックチャンバLc及び各処理チャンバVc1,Vcn内上部にレール部材を設け、このレール部材に摺動自在に係合するスライダに設け、スライダにX軸方向に間隔を置いて吊設した複数本のワイヤで搬送トレイTrを牽引した状態で案内するようにしてもよい。他方、第2案内部6もまた、特に、X軸方向前後を軸にした搬送トレイTrの回転(ロール)やY軸方向左右の移動の自由度がある程度制限できるものであれば、これに限定されるものではなく、上記第1案内部と同様の構成を採用するようにしてもよい。 Further, in the above embodiment, the first guide portion 4 and the second guide portion 6 are provided with a pair of magnets 41, 42, 61, 62 arranged so as to attract each other. 4, most of the weight of the transport tray Tr (including the weight of the substrate Sw) can be towed, and at least the degree of freedom in the X-axis direction, vertical movement in the Z-axis direction, and rotation (pitting) about the horizontal axis in the Y-axis direction. As long as the degree of freedom can be limited to some extent, it is not limited to this. Although not shown and described, for example, a rail member is provided in the upper part of the position chamber Pc, the load lock chamber Lc, and the processing chambers Vc1 and Vcn. The transport tray Tr may be pulled and guided by a plurality of wires hung at intervals in the X-axis direction. On the other hand, the second guide part 6 is also limited to this if the degree of freedom of the rotation (roll) of the transport tray Tr about the X-axis direction and the Y-axis direction left/right movement can be restricted to some extent. Instead, a configuration similar to that of the first guide section may be adopted.

更に、上記実施形態では、搬送部5に備わる転動体として単一の軸体51aに少なくとも2個の車輪部51bを設けた搬送コロ51を例に説明したが、これに限定されるものでなく、1個の車輪部とした構成でも不都合はない。また、搬送トレイTrのZ軸方向の自由度を制限すると共に搬送トレイTrへX軸方向の駆動力を転がり接触による摩擦力にて伝達されるように構成されるのであれば不都合はない。つまり、滑り接触ではなく転がり接触で駆動可能となるための垂直抗力が第1案内部4によりその重量の一部が牽引された搬送トレイTrの残余の重量として確保され、これに必要な安全率を付与した構成とすれば理想的な実施形態となる。更に、上記実施形態では、車輪部51bの先端が搬送トレイTrのZ軸方向の下面に点接触するようにし、その点接触部位は、軸体51aを経由して回転駆動力が伝達される機構としたが、この車輪部と軸体との嵌合部に例えば等速ジョイントを用いれば、確実に転がり接触によって搬送トレイTrへ駆動力を伝達することもできる。 Furthermore, in the above-described embodiment, the conveying roller 51 in which at least two wheel portions 51b are provided on a single shaft 51a has been described as an example of the rolling elements provided in the conveying portion 5, but the present invention is not limited to this. , there is no problem even if it is configured as one wheel portion. Further, if the freedom of the transport tray Tr in the Z-axis direction is restricted and the driving force in the X-axis direction is transmitted to the transport tray Tr by frictional force due to rolling contact, there is no problem. In other words, the normal force for enabling driving by rolling contact instead of sliding contact is secured as the remaining weight of the transport tray Tr after a part of its weight is pulled by the first guide portion 4, and the safety factor required for this is ensured. It is an ideal embodiment if the configuration is given. Furthermore, in the above embodiment, the tip of the wheel portion 51b is in point contact with the lower surface of the transport tray Tr in the Z-axis direction, and the point contact portion is a mechanism through which the rotational driving force is transmitted via the shaft 51a. However, if, for example, a constant velocity joint is used in the fitting portion between the wheel portion and the shaft body, the driving force can be reliably transmitted to the transport tray Tr by rolling contact.

また、上記実施形態では、第1チャンバをポジションチャンバPc、第2チャンバをロードロックチャンバとしたものを例に説明したが、これに限定されるものではない。例えば、ロードロックチャンバに水平姿勢の基板を搬送し、ロードロックチャンバ内が所定圧力まで真空排気されると、ロードロックチャンバに連設されたポジションチャンバに搬送して水平姿勢の基板を搬送トレイに配置した後、起立姿勢に変更し、この状態で例えば処理チャンバに搬送するものにおいて、第1チャンバとしてのポジションチャンバと第2チャンバとしての処理チャンバとの間で搬送トレイを搬送するものにも本発明は適用することができる。 In the above embodiment, the first chamber is the position chamber Pc, and the second chamber is the load lock chamber. However, the present invention is not limited to this. For example, a horizontally oriented substrate is transported to a load lock chamber, and when the inside of the load lock chamber is evacuated to a predetermined pressure, it is transported to a position chamber connected to the load lock chamber, and the horizontally oriented substrate is placed on a transport tray. After arranging it, it is changed to an upright posture, and in this state it is transported to, for example, a processing chamber. The invention can be applied.

VM…真空処理装置、Sw…基板(被処理基板)、Tr…搬送トレイ、13…支持板部、Pc…ポジションチャンバ(第1チャンバ)、Lc…ロードロックチャンバ(第2チャンバ)、Vc1,Vcn…処理チャンバ(第2チャンバ)、Tm…搬送手段、2…傾動部、4…第1案内部、5…搬送部、51…搬送コロ(転動体)、6…第2案内部、Tp1…行き搬送路(第1搬送路)、Tp2…戻り搬送路(第2搬送路)、61…第3磁石(一方の磁石)、62…第4磁石(他方の磁石)、63…支持壁、63L,63R…支持壁の可動部分、72a,72b…駆動部、74a,74b…第2の駆動部(他の駆動部)。 VM: vacuum processing apparatus, Sw: substrate (substrate to be processed), Tr: transfer tray, 13: support plate portion, Pc: position chamber (first chamber), Lc: load lock chamber (second chamber), Vc1, Vcn Processing chamber (second chamber) Tm Conveying means 2 Tilting section 4 First guide section 5 Conveying section 51 Conveying roller (rolling element) 6 Second guide section Tp1 Going Transport path (first transport path), Tp2... Return transport path (second transport path), 61... Third magnet (one magnet), 62... Fourth magnet (other magnet), 63... Support wall, 63L, 63R... Movable portion of the support wall, 72a, 72b... Drive section, 74a, 74b... Second drive section (another drive section).

Claims (3)

一方の面に被処理基板が配置される搬送トレイを搬送しながら、被処理基板の処理面に対して所定の真空処理を施す真空処理装置であって、
水平面内で互いに直交する二方向をX軸方向及びY軸方向、X軸方向及びY軸方向に直交する方向をZ軸方向と、被処理基板の処理面がZ軸方向上方を向く搬送トレイの姿勢を水平姿勢、処理面がY軸方向一方を向く姿勢を起立姿勢とし、
X軸方向に互いに連結される第1チャンバと第2チャンバとを備え、第1チャンバと第2チャンバとに起立姿勢の搬送トレイをX軸方向に沿って搬送する搬送手段が設けられ、第1チャンバ内に、搬送トレイを保持した状態で傾動自在な傾動部を備えて水平姿勢と垂直姿勢との間で搬送トレイの姿勢を変更可能としたものにおいて、
搬送手段は、第1チャンバと第2チャンバとの内部に設けられて、搬送トレイの上部を非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する第1案内部と、搬送トレイの下部を非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する第2案内部と、搬送トレイを接触支持してX軸方向前後に搬送トレイを搬送する搬送部とを備え、第1チャンバ内に存する第2案内部の部分を少なくともY軸方向に移動させる駆動部を設けたことを特徴とする真空処理装置。
A vacuum processing apparatus that performs a predetermined vacuum process on a processing surface of a substrate to be processed while transporting a transport tray having a substrate to be processed arranged on one surface,
Two directions perpendicular to each other in the horizontal plane are the X-axis direction and the Y-axis direction, the direction perpendicular to the X-axis direction and the Y-axis direction is the Z-axis direction, and the processing surface of the substrate to be processed faces upward in the Z-axis direction. The horizontal posture is the posture, and the standing posture is the posture in which the processing surface faces one side in the Y-axis direction,
A first chamber and a second chamber are provided which are connected to each other in the X-axis direction, and a transport means is provided for transporting a transport tray in an upright posture in the first chamber and the second chamber along the X-axis direction, In a chamber in which a tilting part capable of tilting while holding a carrier tray is provided so that the posture of the carrier tray can be changed between a horizontal posture and a vertical posture,
The conveying means is provided inside the first chamber and the second chamber, and includes a first guide portion that guides the movement in the X-axis direction while pulling the upper part of the conveying tray upward in the Z-axis direction without contact. a second guide portion that guides movement in the X-axis direction while pulling the lower portion of the carrier tray upward in the Z-axis direction without contact; A vacuum processing apparatus, comprising: a transfer section; and a drive section for moving a portion of the second guide section existing in the first chamber at least in the Y-axis direction.
請求項1記載の真空処理装置であって、前記第1チャンバと前記第2チャンバとにY軸方向に間隔を存して第1案内部、搬送部及び第2案内部を夫々設けた第1搬送路と第2搬送路とが設けられるものにおいて、
前記第2案内部は、前記他方の面側で前記搬送トレイの下部に形成した支持板部のZ軸方向上面に設けた一方の磁石と、この一方の磁石とZ軸方向上方から引き合うように、第1チャンバ及び第2チャンバ内で第1搬送路及び第2搬送路に沿って配置される支持壁のZ軸方向下面に設けた他方の磁石とを備え、各第2案内部の部分を他方の磁石を含む支持壁の可動部分とし、各可動部分を前記駆動部により一体にY軸方向に移動させるように構成したことを特徴とする真空処理装置。
2. The vacuum processing apparatus according to claim 1, wherein said first chamber and said second chamber are provided with a first guide portion, a transfer portion, and a second guide portion spaced apart in the Y-axis direction, respectively. In the one provided with the transport path and the second transport path,
The second guide portion is configured to attract one magnet provided on the upper surface in the Z-axis direction of a support plate portion formed under the conveying tray on the other side so as to attract the one magnet from above in the Z-axis direction. , and the other magnet provided on the Z-axis direction lower surface of the support wall arranged along the first transfer path and the second transfer path in the first chamber and the second chamber, and the second guide part is provided with A vacuum processing apparatus, wherein the movable portion of the support wall includes the other magnet, and the movable portions are integrally moved in the Y-axis direction by the driving portion.
前記搬送部は、前記第1チャンバ及び第2チャンバ内で前記第1及び第2の各搬送路に沿って配置されて前記搬送トレイの下面に点接触する転動体を有し、第1チャンバ内に存する各転動体を一体にY軸方向及びZ軸方向の少なくとも一方に移動させる他の駆動部を設けたことを特徴とする請求項2記載の真空処理装置。

The transport unit has rolling elements that are arranged along the first and second transport paths in the first and second chambers and are in point contact with the lower surface of the transport tray. 3. The vacuum processing apparatus according to claim 2, further comprising another drive unit for moving the rolling elements in at least one of the Y-axis direction and the Z-axis direction together.

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