JP2023046873A - 保護膜の形成方法、半導体チップの製造方法及び塗布液の調製方法 - Google Patents

保護膜の形成方法、半導体チップの製造方法及び塗布液の調製方法 Download PDF

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Publication number
JP2023046873A
JP2023046873A JP2021155706A JP2021155706A JP2023046873A JP 2023046873 A JP2023046873 A JP 2023046873A JP 2021155706 A JP2021155706 A JP 2021155706A JP 2021155706 A JP2021155706 A JP 2021155706A JP 2023046873 A JP2023046873 A JP 2023046873A
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Japan
Prior art keywords
protective film
forming
semiconductor wafer
forming agent
coating liquid
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Pending
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JP2021155706A
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English (en)
Japanese (ja)
Inventor
明日香 大久保
Asuka Okubo
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Tokyo Ohka Kogyo Co Ltd
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Tokyo Ohka Kogyo Co Ltd
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Priority to JP2021155706A priority Critical patent/JP2023046873A/ja
Priority to TW111127523A priority patent/TW202313872A/zh
Priority to CN202210884323.6A priority patent/CN115850744A/zh
Publication of JP2023046873A publication Critical patent/JP2023046873A/ja
Pending legal-status Critical Current

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JP2021155706A 2021-09-24 2021-09-24 保護膜の形成方法、半導体チップの製造方法及び塗布液の調製方法 Pending JP2023046873A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2021155706A JP2023046873A (ja) 2021-09-24 2021-09-24 保護膜の形成方法、半導体チップの製造方法及び塗布液の調製方法
TW111127523A TW202313872A (zh) 2021-09-24 2022-07-22 保護膜之形成方法、半導體晶片之製造方法及塗布液之調製方法
CN202210884323.6A CN115850744A (zh) 2021-09-24 2022-07-25 保护膜的形成方法、半导体芯片的制造方法及涂布液的制备方法

Applications Claiming Priority (1)

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JP2021155706A JP2023046873A (ja) 2021-09-24 2021-09-24 保護膜の形成方法、半導体チップの製造方法及び塗布液の調製方法

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JP2023046873A true JP2023046873A (ja) 2023-04-05

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JP2021155706A Pending JP2023046873A (ja) 2021-09-24 2021-09-24 保護膜の形成方法、半導体チップの製造方法及び塗布液の調製方法

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JP (1) JP2023046873A (zh)
CN (1) CN115850744A (zh)
TW (1) TW202313872A (zh)

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Publication number Publication date
CN115850744A (zh) 2023-03-28
TW202313872A (zh) 2023-04-01

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