JP2023041623A5 - - Google Patents
Info
- Publication number
- JP2023041623A5 JP2023041623A5 JP2022129475A JP2022129475A JP2023041623A5 JP 2023041623 A5 JP2023041623 A5 JP 2023041623A5 JP 2022129475 A JP2022129475 A JP 2022129475A JP 2022129475 A JP2022129475 A JP 2022129475A JP 2023041623 A5 JP2023041623 A5 JP 2023041623A5
- Authority
- JP
- Japan
- Prior art keywords
- mask
- contour
- contours
- images
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/473,342 US12400314B2 (en) | 2021-09-13 | 2021-09-13 | Mask inspection for semiconductor specimen fabrication |
| US17/473,342 | 2021-09-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2023041623A JP2023041623A (ja) | 2023-03-24 |
| JP2023041623A5 true JP2023041623A5 (https=) | 2025-08-22 |
Family
ID=85431320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022129475A Pending JP2023041623A (ja) | 2021-09-13 | 2022-08-16 | 半導体試料製造のためのマスク検査 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12400314B2 (https=) |
| JP (1) | JP2023041623A (https=) |
| KR (1) | KR102922494B1 (https=) |
| CN (1) | CN115797249A (https=) |
| TW (1) | TW202312099A (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102951001B1 (ko) * | 2021-08-23 | 2026-04-09 | 삼성전자주식회사 | 웨이퍼 불량 검사 장치, 웨이퍼 불량 검사 시스템, 웨이퍼 검사 방법 및 웨이퍼 제조 방법 |
| US20250308032A1 (en) * | 2024-04-02 | 2025-10-02 | Applied Materials Israel Ltd. | Edge detection for greyscale images |
| CN119797274B (zh) * | 2025-03-13 | 2025-07-15 | 中北大学 | 一种n型SiC耐高温欧姆接触电极结构的制备方法 |
| CN120599588B (zh) * | 2025-08-06 | 2025-09-30 | 昆山大洋电路板有限公司 | 一种基于机器视觉的装配式印刷电路板检测系统 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5795688A (en) * | 1996-08-14 | 1998-08-18 | Micron Technology, Inc. | Process for detecting defects in photomasks through aerial image comparisons |
| US7155052B2 (en) * | 2002-06-10 | 2006-12-26 | Tokyo Seimitsu (Israel) Ltd | Method for pattern inspection |
| KR100474571B1 (ko) * | 2002-09-23 | 2005-03-10 | 삼성전자주식회사 | 웨이퍼의 패턴 검사용 기준 이미지 설정 방법과 이 설정방법을 이용한 패턴 검사 방법 및 장치 |
| JP4862031B2 (ja) * | 2008-10-20 | 2012-01-25 | 株式会社ニューフレアテクノロジー | マスク欠陥レビュー方法及びマスク欠陥レビュー装置 |
| JP5498189B2 (ja) * | 2010-02-08 | 2014-05-21 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法及びその装置 |
| KR20120068128A (ko) * | 2010-12-17 | 2012-06-27 | 삼성전자주식회사 | 패턴의 결함 검출 방법 및 이를 수행하기 위한 결함 검출 장치 |
| US9367911B2 (en) * | 2012-06-13 | 2016-06-14 | Applied Materials Israel, Ltd. | Apparatus and method for defect detection including patch-to-patch comparisons |
| JP5478681B2 (ja) * | 2012-08-24 | 2014-04-23 | 株式会社日立ハイテクノロジーズ | 半導体欠陥検査装置ならびにその方法 |
| WO2015027198A1 (en) * | 2013-08-23 | 2015-02-26 | Kla-Tencor Corporation | Block-to-block reticle inspection |
| US9747518B2 (en) * | 2014-05-06 | 2017-08-29 | Kla-Tencor Corporation | Automatic calibration sample selection for die-to-database photomask inspection |
| JP2017009379A (ja) * | 2015-06-19 | 2017-01-12 | 株式会社ニューフレアテクノロジー | 検査装置および検査方法 |
| WO2017203554A1 (ja) * | 2016-05-23 | 2017-11-30 | 株式会社日立ハイテクノロジーズ | 検査用情報生成装置、検査用情報生成方法、及び欠陥検査装置 |
| US11263496B2 (en) * | 2019-02-25 | 2022-03-01 | D2S, Inc. | Methods and systems to classify features in electronic designs |
| CN113454533B (zh) * | 2019-02-25 | 2025-04-01 | Asml荷兰有限公司 | 用于确定印刷图案的随机变化的方法 |
| US12243237B2 (en) * | 2020-01-10 | 2025-03-04 | Tasmit, Inc. | Pattern-edge detection method, pattern-edge detection apparatus, and storage medium storing program for causing a computer to perform pattern-edge detection |
-
2021
- 2021-09-13 US US17/473,342 patent/US12400314B2/en active Active
-
2022
- 2022-06-22 TW TW111123186A patent/TW202312099A/zh unknown
- 2022-07-08 CN CN202210805808.1A patent/CN115797249A/zh active Pending
- 2022-08-16 JP JP2022129475A patent/JP2023041623A/ja active Pending
- 2022-09-07 KR KR1020220113367A patent/KR102922494B1/ko active Active
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