JP2023010640A - 基板処理装置及び基板処理方法 - Google Patents
基板処理装置及び基板処理方法 Download PDFInfo
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Abstract
Description
基板を前記第1工程チャンバまたは前記第2工程チャンバに搬入する基板ローディング段階、基板を第1速度で回転させながら基板上に現像液を供給する現像液供給段階、基板上に現像液の供給を中止して基板を一定時間停止または前記第1速度より低い第2速度で基板を回転させるパドル段階、そして、前記第1工程チャンバまたは前記第2工程チャンバから基板を搬出する基板アンローディング段階を含むが、前記第1工程チャンバで前記基板に対して前記パドル段階を進行する時、前記経路が開放されるように前記ドアを制御する制御機をさらに含むことができる。
本発明の効果が上述した効果らに限定されるものではなくて、言及されない効果らは本明細書及び添付した図面から本発明が属する技術分野で通常の知識を有した者に明確に理解されることができるであろう。
20 処理モジュール
50 インターフェースモジュール
280 工程チャンバ
3000 排気ユニット
3200 統合排気ライン
3400 排気ライン
3600 排気バルブ
3800 干渉緩和ユニット
Claims (20)
- 基板を処理する装置において、
内部に第1処理空間を有する第1工程チャンバと、
内部に第2処理空間を有する第2工程チャンバと、及び
前記第1処理空間及び前記第2処理空間の雰囲気を排気する排気ユニットを含むが、
前記排気ユニットは、
減圧ユニットが設置された統合排気ラインと、
前記第1工程チャンバと前記統合排気ラインの第1支点を連結する第1排気ラインと、
前記第2工程チャンバと前記統合排気ラインの第2支点を連結する第2排気ラインと、及び
前記第1工程チャンバと前記第2工程チャンバの間の排気干渉を緩和する干渉緩和ユニットと、を含む基板処理装置。 - 前記干渉緩和ユニットは、
前記統合排気ラインのうちで前記第1排気ラインが連結される前記第1支点と前記第2排気ラインが連結される前記第2支点の間に位置されて前記統合排気ライン内の気流の一部を前記統合排気ラインの外部に排出する排出部を含むことを特徴とする請求項1に記載の基板処理装置。 - 前記排出部は、
前記統合排気ライン内の気流の一部を大気上に排出するように提供されることを特徴とする請求項2に記載の基板処理装置。 - 前記排出部は、
前記統合排気ラインで大気に気流が排出される経路を開閉するドアをさらに有することを特徴とする請求項3に記載の基板処理装置。 - 前記第1工程チャンバと前記第2工程チャンバはそれぞれ基板に対して現像工程(developing process)を遂行するように提供され、
前記現像工程は、
基板を前記第1工程チャンバまたは前記第2工程チャンバに搬入する基板ローディング段階、基板を第1速度で回転させながら基板上に現像液を供給する現像液供給段階、基板上に現像液の供給を中止して基板を一定時間停止または前記第1速度より低い第2速度で基板を回転させるパドル段階、そして、前記第1工程チャンバまたは前記第2工程チャンバから基板を搬出する基板アンローディング段階を含むが、
前記第1工程チャンバで前記基板に対して前記パドル段階を進行する時、前記経路が開放されるように前記ドアを制御する制御機をさらに含むことを特徴とする請求項4に記載の基板処理装置。 - 前記基板ローディング段階は、
基板を下の方向に移動させる過程を含むが、
前記制御機は、
前記第2工程チャンバに前記基板ローディング段階を進行する時、前記経路が開放されるように前記ドアを制御することを特徴とする請求項5に記載の基板処理装置。 - 前記第1工程チャンバと前記第2工程チャンバは、それぞれ基板に対して現像工程(developing process)を遂行するように提供され、
前記現像工程は、
基板を前記第1工程チャンバまたは前記第2工程チャンバに搬入する基板ローディング段階、基板を第1速度で回転させながら基板上に現像液を供給する現像液供給段階、基板上に現像液の供給を中止して基板を一定時間停止または前記第1速度より低い第2速度で基板を回転させるパドル段階、そして、前記第1工程チャンバまたは前記第2工程チャンバから基板を搬出する基板アンローディング段階を含むが、
前記第1工程チャンバで前記基板に対して前記パドル段階を進行して前記第2工程チャンバで前記基板ローディング段階を進行する時、前記経路が開放されるように前記ドアを制御する制御機をさらに含むことを特徴とする請求項4に記載の基板処理装置。 - 前記排気ユニットは、
前記第1排気ラインを開閉するか、または排気流量を調節する第1バルブと、及び
前記第2排気ラインを開閉するか、または排気流量を調節する第2バルブをさらに含むが、
前記制御機は、
前記第1工程チャンバで前記基板に対して前記パドル段階を進行する時の前記第1バルブの開放率が前記現像液供給段階を進行する時の前記第1バルブの開放率より小さいように前記第1バルブを制御することを特徴とする請求項5乃至請求項7のうちで何れか一つに記載の基板処理装置。 - 前記排出部は、
前記第1排気ラインの前記第1支点と隣接するように位置する第1排出部と、及び
前記第2排気ラインの前記第2支点と隣接するように位置する第2排出部を含むことを特徴とする請求項2乃至請求項7のうちで何れか一つに記載の基板処理装置。 - 前記排出部は、
一端が前記統合排気ラインと連結される干渉緩和ラインと、及び
前記干渉緩和ラインに連結され、前記統合排気ラインから前記干渉緩和ラインを通じて排出される気流がとどまるバッファー空間を提供するバッファー部材を含むことを特徴とする請求項2に記載の基板処理装置。 - 基板を処理する装置において、
第1処理空間を有する第1工程チャンバと、
第2処理空間を有する第2工程チャンバと、
前記第1工程チャンバまたは前記第2工程チャンバに基板を返送する返送ロボットと、及び
前記第1処理空間及び前記第2処理空間の雰囲気を排気する排気ユニットを含むが、
前記第1工程チャンバは、
前記第1処理空間を提供する第1処理容器と、
前記第1処理空間で基板を支持して回転させる第1支持ユニットと、及び
基板上に現像液を供給する第1現像液供給ユニットを含み、
前記第2工程チャンバは、
前記第2処理空間を提供する第2処理容器と、
前記第2処理空間で基板を支持して回転させる第2支持ユニットと、及び
基板上に現像液を供給する第2現像液供給ユニットを含み、
前記排気ユニットは、
減圧ユニットが設置された統合排気ラインと、
前記第1工程チャンバと前記統合排気ラインの第1支点を連結する第1排気ラインと、
前記第2工程チャンバと前記統合排気ラインの第2支点を連結する第2排気ラインと、及び
前記統合排気ライン内の気流の一部を前記統合排気ラインの外部に排出して前記第1工程チャンバと前記第2工程チャンバとの間の排気干渉を緩和する干渉緩和ユニットを含むが、
前記干渉緩和ユニットは、
前記統合排気ラインのうちで前記第1排気ラインが連結される前記第1支点と前記第2排気ラインが連結される前記第2支点との間に位置することを特徴とする基板処理装置。 - 前記干渉緩和ユニットは、
前記統合排気ラインで大気に気流が排出される経路を開閉するドアをさらに有することを特徴とする請求項11に記載の基板処理装置。 - 前記第1工程チャンバと前記第2工程チャンバはそれぞれ基板に対して現像工程(developing process)を遂行するように提供され、
前記現像工程は、
基板を前記第1工程チャンバまたは前記第2工程チャンバに搬入する基板ローディング段階、基板を第1速度で回転させながら基板上に現像液を供給する現像液供給段階、基板上に現像液の供給を中止して基板を一定時間停止または前記第1速度より低い第2速度で基板を回転させるパドル段階、そして、前記第1工程チャンバまたは前記第2工程チャンバから基板を搬出する基板アンローディング段階を含み、
前記基板ローディング段階は、
基板を下の方向に移動させる過程を含むが、
前記第1工程チャンバで前記基板に対して前記パドル段階を進行して前記第2工程チャンバで前記基板ローディング段階を進行する時、前記経路が開放されるように前記ドアを制御する制御機をさらに含むことを特徴とする請求項12に記載の基板処理装置。 - 前記干渉緩和ユニットは、
一端が前記統合排気ラインと連結される干渉緩和ラインと、及び
前記干渉緩和ラインに連結され、前記統合排気ラインから前記干渉緩和ラインを通じて排出される気流がとどまるバッファー空間を提供するバッファー部材を含むことを特徴とする請求項11に記載の基板処理装置。 - 複数の工程チャンバらのそれぞれの処理空間内の雰囲気を等しい統合排気ラインを通じて排気しながら、それぞれの前記処理空間で基板に対して現像工程(developing process)を遂行するが、
前記現像工程は、
基板を下の方向に移動させて基板を支持ユニットに下ろす基板ローディング段階、基板上に現像液を供給する現像液供給段階、基板に現像液供給を中止して一定時間基板を前記支持ユニットに維持するパドル段階、そして、基板を上の方向に移動させて基板を支持ユニットから持ち上げる基板アンローディング段階を含み、
前記現像工程を進行する間に前記工程チャンバらのうちで一つである第1工程チャンバで前記工程チャンバらのうちで他のひとつの第2工程チャンバに向けて流れる気流をお互いに隣接する前記第1工程チャンバと前記第2工程チャンバとの間で前記統合排気ラインの外部に流れるようにして前記第1工程チャンバの処理空間で気流の変化が前記第2工程チャンバの処理空間の圧力に対して干渉することを緩和する基板処理方法。 - 前記第1工程チャンバと前記第2工程チャンバとの間で前記統合排気ライン内の気流の一部を大気上に放出することを特徴とする請求項15に記載の基板処理方法。
- 前記第1工程チャンバと前記第2工程チャンバとの間で前記統合排気ライン内の気流の一部を前記統合排気ラインに連結されたバッファー部材に放出することを特徴とする請求項15に記載の基板処理方法。
- 前記統合排気ラインと前記第1工程チャンバが連結される第1支点と前記統合排気ラインと前記第2工程チャンバが連結される第2支点との間で前記統合排気ライン内の気流を大気に放出する開口を開閉するドアを提供し、
前記第1工程チャンバで前記パドル段階を進行する時、前記開口を開放することを特徴とする請求項15に記載の基板処理方法。 - 前記統合排気ラインと前記第1工程チャンバが連結される第1支点と前記統合排気ラインと前記第2工程チャンバが連結される第2支点との間で前記統合排気ライン内の気流を大気に放出する開口を開閉するドアを提供し、
前記第2工程チャンバで前記基板ローディング段階を進行する時、前記開口を開放することを特徴とする請求項15に記載の基板処理方法。 - 前記統合排気ラインと前記第1工程チャンバが連結される第1支点と前記統合排気ラインと前記第2工程チャンバが連結される第2支点との間で前記統合排気ライン内の気流を大気に放出する開口を開閉するドアを提供し、
前記第1工程チャンバで前記パドル段階を進行し、前記第2工程チャンバで前記基板ローディング段階を進行する時、前記開口を開放することを特徴とする請求項15に記載の基板処理方法。
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JPH10137662A (ja) * | 1996-11-13 | 1998-05-26 | Dainippon Screen Mfg Co Ltd | 回転式基板処理装置 |
JP2000156341A (ja) * | 1998-11-18 | 2000-06-06 | Tokyo Electron Ltd | 液処理システム及び液処理方法 |
JP2010045185A (ja) * | 2008-08-12 | 2010-02-25 | Tokyo Electron Ltd | 液処理装置及び液処理方法並びに記憶媒体 |
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US20200395229A1 (en) * | 2019-06-13 | 2020-12-17 | Semes Co., Ltd. | Apparatus and method for treating substrate |
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