JP2022521531A5 - - Google Patents
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- Publication number
- JP2022521531A5 JP2022521531A5 JP2021549215A JP2021549215A JP2022521531A5 JP 2022521531 A5 JP2022521531 A5 JP 2022521531A5 JP 2021549215 A JP2021549215 A JP 2021549215A JP 2021549215 A JP2021549215 A JP 2021549215A JP 2022521531 A5 JP2022521531 A5 JP 2022521531A5
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962809072P | 2019-02-22 | 2019-02-22 | |
| US62/809,072 | 2019-02-22 | ||
| PCT/EP2020/054421 WO2020169702A1 (en) | 2019-02-22 | 2020-02-20 | Spin-on compositions comprising an inorganic oxide component and an alkynyloxy substituted spin-on carbon component useful as hard masks and filling materials with improved shelf life |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2022521531A JP2022521531A (ja) | 2022-04-08 |
| JPWO2020169702A5 JPWO2020169702A5 (https=) | 2023-02-24 |
| JP2022521531A5 true JP2022521531A5 (https=) | 2023-02-24 |
| JP7610518B2 JP7610518B2 (ja) | 2025-01-08 |
Family
ID=69699858
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021549215A Active JP7610518B2 (ja) | 2019-02-22 | 2020-02-20 | 改善された貯蔵寿命を有するハードマスク及び充填材料として有用な無機酸化物成分及びアルキニルオキシ置換スピンオン炭素成分を含むスピンオン組成物 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11767398B2 (https=) |
| EP (1) | EP3928348B1 (https=) |
| JP (1) | JP7610518B2 (https=) |
| KR (1) | KR102843498B1 (https=) |
| CN (1) | CN113412533A (https=) |
| SG (1) | SG11202106923XA (https=) |
| TW (1) | TWI833908B (https=) |
| WO (1) | WO2020169702A1 (https=) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102907251B1 (ko) * | 2022-05-03 | 2026-01-02 | (주)휴넷플러스 | 유기중합체, 이를 포함하는 반도체 하드마스크 조성물 및 이를 이용한 패턴화 방법 |
| JP7805883B2 (ja) | 2022-07-08 | 2026-01-26 | 信越化学工業株式会社 | 金属酸化膜形成用組成物、パターン形成方法、及び金属酸化膜形成方法 |
| IL305619A (en) | 2022-09-14 | 2024-04-01 | Shinetsu Chemical Co | Compound for forming a metal-containing layer, composition for forming a metal-containing layer, printing method, and semiconductor masking sensitizer |
| JP2024068637A (ja) * | 2022-11-08 | 2024-05-20 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| JP2024089633A (ja) | 2022-12-21 | 2024-07-03 | 信越化学工業株式会社 | 金属含有膜形成用重合体、金属含有膜形成用組成物、及びパターン形成方法 |
| JP2024091495A (ja) * | 2022-12-22 | 2024-07-04 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| JP2024097388A (ja) * | 2023-01-06 | 2024-07-19 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| JP7802711B2 (ja) * | 2023-01-06 | 2026-01-20 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| KR102795114B1 (ko) * | 2023-02-14 | 2025-04-10 | 삼성에스디아이 주식회사 | 하드마스크 조성물, 하드마스크 층 및 패턴 형성 방법 |
| JP7802029B2 (ja) | 2023-02-15 | 2026-01-19 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、パターン形成方法 |
| JP2024122656A (ja) * | 2023-02-28 | 2024-09-09 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| EP4435516A1 (en) * | 2023-03-16 | 2024-09-25 | Shin-Etsu Chemical Co., Ltd. | Method for forming resist underlayer film and patterning process |
| JP7839127B2 (ja) * | 2023-06-07 | 2026-04-01 | 信越化学工業株式会社 | 金属含有膜形成用組成物及びパターン形成方法 |
| JP2025032887A (ja) | 2023-08-28 | 2025-03-12 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| JP2025032875A (ja) | 2023-08-28 | 2025-03-12 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| JP2025099570A (ja) | 2023-12-22 | 2025-07-03 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、パターン形成方法 |
| JP2025099887A (ja) | 2023-12-22 | 2025-07-03 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、パターン形成方法 |
| JP2025101957A (ja) * | 2023-12-26 | 2025-07-08 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、パターン形成方法 |
| JP2025102051A (ja) * | 2023-12-26 | 2025-07-08 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、パターン形成方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3474054A (en) | 1966-09-13 | 1969-10-21 | Permalac Corp The | Surface coating compositions containing pyridine salts or aromatic sulfonic acids |
| US4200729A (en) | 1978-05-22 | 1980-04-29 | King Industries, Inc | Curing amino resins with aromatic sulfonic acid oxa-azacyclopentane adducts |
| US4251665A (en) | 1978-05-22 | 1981-02-17 | King Industries, Inc. | Aromatic sulfonic acid oxa-azacyclopentane adducts |
| US5187019A (en) | 1991-09-06 | 1993-02-16 | King Industries, Inc. | Latent catalysts |
| US20100040838A1 (en) * | 2008-08-15 | 2010-02-18 | Abdallah David J | Hardmask Process for Forming a Reverse Tone Image |
| US8906590B2 (en) * | 2011-03-30 | 2014-12-09 | Az Electronic Materials Usa Corp. | Antireflective coating composition and process thereof |
| WO2012145330A1 (en) * | 2011-04-18 | 2012-10-26 | The University Of British Columbia | Fluorene-9-bisphenol compounds and methods for their use |
| US9365510B2 (en) * | 2012-04-16 | 2016-06-14 | British Columbia Cancer Agency Branch | Aziridine bisphenol ethers and related compounds and methods for their use |
| US9315636B2 (en) * | 2012-12-07 | 2016-04-19 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds, their compositions and methods |
| US9152051B2 (en) * | 2013-06-13 | 2015-10-06 | Az Electronics Materials (Luxembourg) S.A.R.L. | Antireflective coating composition and process thereof |
| US9296922B2 (en) * | 2013-08-30 | 2016-03-29 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds as hardmasks and filling materials, their compositions and methods of use |
| US9274426B2 (en) * | 2014-04-29 | 2016-03-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Antireflective coating compositions and processes thereof |
| US9499698B2 (en) * | 2015-02-11 | 2016-11-22 | Az Electronic Materials (Luxembourg)S.A.R.L. | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates |
| JP6641879B2 (ja) * | 2015-03-03 | 2020-02-05 | Jsr株式会社 | レジスト下層膜形成用組成物、レジスト下層膜及びパターニングされた基板の製造方法 |
| US9958781B2 (en) * | 2015-04-24 | 2018-05-01 | Jsr Corporation | Method for film formation, and pattern-forming method |
| JP6712188B2 (ja) * | 2015-07-13 | 2020-06-17 | 信越化学工業株式会社 | レジスト下層膜形成用組成物及びこれを用いたパターン形成方法 |
| JP6625934B2 (ja) * | 2015-07-14 | 2019-12-25 | 信越化学工業株式会社 | レジスト下層膜材料、パターン形成方法、及び化合物 |
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2020
- 2020-02-20 KR KR1020217028140A patent/KR102843498B1/ko active Active
- 2020-02-20 EP EP20707036.8A patent/EP3928348B1/en active Active
- 2020-02-20 JP JP2021549215A patent/JP7610518B2/ja active Active
- 2020-02-20 TW TW109105433A patent/TWI833908B/zh active
- 2020-02-20 WO PCT/EP2020/054421 patent/WO2020169702A1/en not_active Ceased
- 2020-02-20 CN CN202080013446.1A patent/CN113412533A/zh active Pending
- 2020-02-20 SG SG11202106923XA patent/SG11202106923XA/en unknown
- 2020-02-20 US US17/423,528 patent/US11767398B2/en active Active