JP2022509213A - 1-メチル-1-イソ-プロポキシ-シラシクロアルカン及びそれから製造される緻密有機シリカ膜 - Google Patents
1-メチル-1-イソ-プロポキシ-シラシクロアルカン及びそれから製造される緻密有機シリカ膜 Download PDFInfo
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Abstract
【選択図】図1
Description
本特許出願は、2018年11月27日に提出された米国仮特許出願第62/771933号及び2019年7月26日に提出された仮特許出願第62/878850号の通常の特許出願であり、それらの全体は参照によって本明細書に組み込まれる。
表1:DEMS(登録商標)ベースの膜特性に対するO2流の影響
表2:MIPSCPベースの膜特性に対するO2流の影響
Claims (23)
- 改善された機械特性を有する緻密有機シリカ膜を製造するための方法であって、
反応チャンバー中に基材を提供する工程;
前記反応チャンバー中に1-メチル-1-イソ-プロポキシ-シラシクロペンタン及び1-メチル-1-イソ-プロポキシ-シラシクロブタンからなる群から選択される1つ又は複数を含むガス状組成物を導入する工程;並びに
前記反応チャンバー中で前記ガス状組成物にエネルギーを適用して、前記ガス状組成物の反応を誘起して、それによって前記基材に有機シリカ膜を堆積する工程であって、前記有機シリカ膜が2.80~3.00の誘電率と、11~18GPaの弾性率とを有する適用工程
を含む方法。 - 前記ガス状組成物が硬化添加剤を有しない、請求項1に記載の方法。
- 化学気相堆積方法である、請求項1に記載の方法。
- プラズマ強化化学気相堆積方法である、請求項1に記載の方法。
- 前記ガス状組成物が、O2、N2O、NO、NO2、CO2、水、H2O2、オゾン及びそれらの組み合わせからなる群から選択される少なくとも1つの酸化剤を含む、請求項1に記載の方法。
- 前記ガス状組成物がO2を含み、かつ前記ガス状組成物の反応の間に32sccm以下の速度で導入される、請求項1に記載の方法。
- 前記ガス状組成物が酸化剤を含まない、請求項1に記載の方法。
- 前記適用工程における前記反応チャンバーが、He、Ar、N2、Kr、Xe、CO2及びCOからなる群から選択される少なくとも1つのガスを含む、請求項1に記載の方法。
- 前記有機シリカ膜が632nmにおいて1.44~1.49の屈折率(RI)と、XPSによって測定した場合に25at%~31at%の炭素とを有する、請求項1に記載の方法。
- 前記有機シリカ膜が41nm/min~80nm/minの速度で堆積される、請求項1に記載の方法。
- 前記有機シリカ膜が17~19のSiCH2Si/SiOX×104のIR比を有する、請求項8に記載の方法。
- 改善された機械特性を有する緻密有機シリカ膜を製造するための方法であって、
反応チャンバー中に基材を提供する工程;
前記反応チャンバー中に1-メチル-1-イソ-プロポキシ-シラシクロペンタン及び1-メチル-1-イソ-プロポキシ-シラシクロブタンからなる群から選択される1つ又は複数を含むガス状組成物を導入する工程;並びに
前記反応チャンバー中で前記ガス状組成物にエネルギーを適用して、前記ガス状組成物の反応を誘起して、それによって前記基材に有機シリカ膜を堆積する工程であって、前記有機シリカ膜が2.80~3.10の誘電率と、11~20GPaの弾性率と、XPSによって測定した場合に12~31at%の炭素とを有する適用工程
を含む方法。 - 前記ガス状組成物が硬化添加剤を有しない、請求項11に記載の方法。
- 化学気相堆積方法である、請求項11に記載の方法。
- プラズマ強化化学気相堆積方法である、請求項11に記載の方法。
- 前記ガス状組成物が、O2、N2O、NO、NO2、CO2、水、H2O2、オゾン及びそれらの組み合わせからなる群から選択される少なくとも1つの酸化剤を含む、請求項11に記載の方法。
- 前記ガス状組成物がO2を含み、かつ前記ガス状組成物の反応の間に32sccm以下の速度で導入される、請求項16に記載の方法。
- 前記ガス状組成物が酸化剤を含まない、請求項11に記載の方法。
- 前記適用工程における前記反応チャンバーが、He、Ar、N2、Kr、Xe、CO2及びCOからなる群から選択される少なくとも1つのガスを含む、請求項11に記載の方法。
- 前記有機シリカ膜が632nmにおいて1.443~1.488の屈折率(RI)を有する、請求項11に記載の方法。
- 前記有機シリカ膜が41nm/min~80nm/minの速度で堆積される、請求項11に記載の方法。
- 前記有機シリカ膜が17~19のSiCH2Si/SiOX×104のIR比を有する、請求項18に記載の方法。
- 改善された機械特性を有する緻密有機シリカ膜を製造するための方法であって、
反応チャンバー中に基材を提供する工程;
前記反応チャンバー中に1-メチル-1-イソ-プロポキシ-シラシクロペンタン又は1-メチル-1-イソ-プロポキシ-シラシクロブタンを含むガス状組成物を導入する工程;及び
前記反応チャンバー中で前記ガス状組成物にエネルギーを適用して、前記ガス状組成物の反応を誘起して、それによって前記基材に有機シリカ膜を堆積する工程であって、前記有機シリカ膜が2.70~3.20の誘電率と、11~25GPaの弾性率とを有する適用工程
を含む方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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US201862771933P | 2018-11-27 | 2018-11-27 | |
US62/771,933 | 2018-11-27 | ||
US201962878850P | 2019-07-26 | 2019-07-26 | |
US62/878,850 | 2019-07-26 | ||
PCT/US2019/063264 WO2020112782A1 (en) | 2018-11-27 | 2019-11-26 | 1-methyl-1-iso-propoxy-silacycloalkanes and dense organosilica films made therefrom |
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US (1) | US20200165727A1 (ja) |
EP (1) | EP3887566A4 (ja) |
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CN (1) | CN113166937A (ja) |
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JP2007221039A (ja) * | 2006-02-20 | 2007-08-30 | National Institute For Materials Science | 絶縁膜および絶縁膜材料 |
JP2008511987A (ja) * | 2004-09-01 | 2008-04-17 | 東京エレクトロン株式会社 | ソフトデチャックシーケンス |
JP2016005001A (ja) * | 2014-06-16 | 2016-01-12 | エア プロダクツ アンド ケミカルズ インコーポレイテッドAir Products And Chemicals Incorporated | アルキルアルコキシシラ環状化合物及びそれを用いた膜の堆積方法 |
JP2016042576A (ja) * | 2014-08-14 | 2016-03-31 | エア プロダクツ アンド ケミカルズ インコーポレイテッドAir Products And Chemicals Incorporated | 多孔質低誘電率膜上に細孔封止層を設けるための方法及び組成物 |
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- 2019-11-26 CN CN201980078017.XA patent/CN113166937A/zh active Pending
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SG11202105522QA (en) | 2021-06-29 |
JP7274578B2 (ja) | 2023-05-16 |
CN113166937A (zh) | 2021-07-23 |
TW202024390A (zh) | 2020-07-01 |
EP3887566A1 (en) | 2021-10-06 |
US20200165727A1 (en) | 2020-05-28 |
WO2020112782A1 (en) | 2020-06-04 |
EP3887566A4 (en) | 2022-08-24 |
TWI744727B (zh) | 2021-11-01 |
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