JP2022162654A - ペリクル - Google Patents
ペリクル Download PDFInfo
- Publication number
- JP2022162654A JP2022162654A JP2021067563A JP2021067563A JP2022162654A JP 2022162654 A JP2022162654 A JP 2022162654A JP 2021067563 A JP2021067563 A JP 2021067563A JP 2021067563 A JP2021067563 A JP 2021067563A JP 2022162654 A JP2022162654 A JP 2022162654A
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- film
- frame
- tensile strain
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000012528 membrane Substances 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 8
- 230000003014 reinforcing effect Effects 0.000 claims description 8
- 230000010355 oscillation Effects 0.000 abstract 1
- 239000012790 adhesive layer Substances 0.000 description 16
- 230000007246 mechanism Effects 0.000 description 15
- 239000000758 substrate Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 239000010410 layer Substances 0.000 description 8
- 230000037303 wrinkles Effects 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 239000000428 dust Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 238000007665 sagging Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- DQEFEBPAPFSJLV-UHFFFAOYSA-N Cellulose propionate Chemical compound CCC(=O)OCC1OC(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C1OC1C(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C(COC(=O)CC)O1 DQEFEBPAPFSJLV-UHFFFAOYSA-N 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- 229920006218 cellulose propionate Polymers 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000013464 silicone adhesive Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- -1 LSI and VLSI Substances 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
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- 229920006351 engineering plastic Polymers 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000008733 trauma Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/48—Protective coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Packaging Frangible Articles (AREA)
Abstract
Description
さらに、本発明は、上記ペリクルをフォトマスクに装着してなるペリクル付きフォトマスク、該ペリクル付きフォトマスクを用いて露光することを特徴とする露光方法、及び該ペリクル付きフォトマスクを用いて露光する工程を有するフラットパネルディスプレイ用パネルの製造方法である。
引張歪み(%)=歪み量(引張量)(mm) / 歪む前の引張方向のペリクル膜の外寸(mm) × 100
平滑に研磨した石英、低膨張ガラスなどからなる基板上にスピンコート法、スリットコート法などの公知の塗工手段によりペリクル膜材料の溶液を塗布し、オーブン、ホットプレート、IRランプなどの加熱手段により完全に溶媒を蒸発させ、基板上に乾燥したペリクル膜の層を得る。
12 ペリクル膜接着層
13 ペリクル膜
14 マスク粘着層
15 フォトマスク
41 ペリクルフレーム
42 ペリクル膜接着層
43 ペリクル膜
50 支持枠
51 外枠
52 膜支持体
53 引張機構
54 ペリクル膜
55 基板
71 レール
72 スライダ
73 メスねじ部
74 オスねじ部
75 膜接着層
80 ペリクル
81 ペリクルフレーム
82 凹み孔
83 溝(短辺)
84 溝(長辺)
85 通気孔
86 フィルタ
87 マスク粘着層
88 ペリクル膜接着層
89 ペリクル膜
91 フォトマスク
92 露光パターン
93 ペリクルフレーム
94 通気孔
95 フィルタ
96 マスク粘着層
97 ペリクル膜接着層
98 ペリクル膜
99 ペリクル
100 支持枠
101 ペリクル膜
A 長軸方向中心
B 膜揺れ量の大きい領域(凹)
C 膜揺れ量の大きい領域(凸)
a 引張方向(長軸方向)
b 引張方向(短軸方向)
c 引張方向
d 引張方向に対する直交方向
x ペリクル膜の自重撓み量
y ペリクル膜の頂点(中心)
Claims (10)
- 少なくとも1つの辺長が1000mmを超えるペリクルフレームと、その一方の枠状面に接着されたペリクル膜とを含んで構成されるペリクルであって、互いに平行且つ線対称である一対のペリクルフレーム辺に平行な方向に1%以上2.5%以下の引張歪みをペリクル膜に付与していることを特徴とするペリクル。
- 前記一対のペリクルフレーム辺に垂直な方向に0.5%以上2%以下の引張歪みをペリクル膜に付与していることを特徴とする請求項1に記載のペリクル。
- 前記ペリクルフレームは矩形であり、前記一対のペリクルフレーム辺が前記矩形の長辺であることを特徴とする請求項1に記載のペリクル。
- 前記矩形の長辺に垂直な方向に0.5%以上2%以下の引張歪みをペリクル膜に付与していることを特徴とする請求項3に記載のペリクル。
- 太さが最大でも100μmである、少なくとも一本の線状補強体が、前記ペリクル膜に接合されて、前記ペリクルフレームの互いに対向する二辺間に張設されていることを特徴とする請求項3又は4に記載のペリクル。
- 太さが最大でも100μmである二本の線状補強体が、前記ペリクル膜に接合されて、前記ペリクルフレームの対角線に沿って張設されていることを特徴とする請求項3又は4に記載のペリクル。
- 前記ペリクル膜の材質が非晶質フッ素系樹脂であることを特徴とする請求項1~6のいずれか1項に記載のペリクル。
- 請求項1~7のいずれか1項に記載のペリクルをフォトマスクに装着してなるペリクル付きフォトマスク。
- 請求項8に記載のペリクル付きフォトマスクを用いて露光することを特徴とする露光方法。
- 請求項8に記載のペリクル付きフォトマスクを用いて露光する工程を有するフラットパネルディスプレイ用パネルの製造方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021067563A JP2022162654A (ja) | 2021-04-13 | 2021-04-13 | ペリクル |
KR1020220044481A KR20220141754A (ko) | 2021-04-13 | 2022-04-11 | 펠리클 |
TW111203664U TWM637276U (zh) | 2021-04-13 | 2022-04-12 | 帶護膜的光掩模、曝光系統及平板顯示器用屏的製造系統 |
CN202210376691.XA CN115202148A (zh) | 2021-04-13 | 2022-04-12 | 护膜、曝光方法及平板显示器用屏的制造方法 |
CN202220827623.6U CN217787599U (zh) | 2021-04-13 | 2022-04-12 | 带护膜的光掩模、曝光系统及平板显示器用屏的制造系统 |
TW111113810A TW202248748A (zh) | 2021-04-13 | 2022-04-12 | 護膜、曝光方法及平板顯示器用屏的製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021067563A JP2022162654A (ja) | 2021-04-13 | 2021-04-13 | ペリクル |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2022162654A true JP2022162654A (ja) | 2022-10-25 |
Family
ID=83575132
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021067563A Pending JP2022162654A (ja) | 2021-04-13 | 2021-04-13 | ペリクル |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2022162654A (ja) |
KR (1) | KR20220141754A (ja) |
CN (2) | CN217787599U (ja) |
TW (2) | TW202248748A (ja) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5445186A (en) | 1977-09-16 | 1979-04-10 | Hokushin Electric Works | Pressure receiving capsule |
-
2021
- 2021-04-13 JP JP2021067563A patent/JP2022162654A/ja active Pending
-
2022
- 2022-04-11 KR KR1020220044481A patent/KR20220141754A/ko unknown
- 2022-04-12 TW TW111113810A patent/TW202248748A/zh unknown
- 2022-04-12 CN CN202220827623.6U patent/CN217787599U/zh active Active
- 2022-04-12 CN CN202210376691.XA patent/CN115202148A/zh active Pending
- 2022-04-12 TW TW111203664U patent/TWM637276U/zh unknown
Also Published As
Publication number | Publication date |
---|---|
TW202248748A (zh) | 2022-12-16 |
TWM637276U (zh) | 2023-02-11 |
CN115202148A (zh) | 2022-10-18 |
CN217787599U (zh) | 2022-11-11 |
KR20220141754A (ko) | 2022-10-20 |
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