JP2022145478A5 - - Google Patents
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- JP2022145478A5 JP2022145478A5 JP2021204585A JP2021204585A JP2022145478A5 JP 2022145478 A5 JP2022145478 A5 JP 2022145478A5 JP 2021204585 A JP2021204585 A JP 2021204585A JP 2021204585 A JP2021204585 A JP 2021204585A JP 2022145478 A5 JP2022145478 A5 JP 2022145478A5
- Authority
- JP
- Japan
- Prior art keywords
- resin
- examples
- plasma irradiation
- irradiation time
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17/696,361 US12257641B2 (en) | 2021-03-18 | 2022-03-16 | Work processing apparatus |
CN202210263158.2A CN115116817A (zh) | 2021-03-18 | 2022-03-17 | 工件加工装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021044350 | 2021-03-18 | ||
JP2021044350 | 2021-03-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022145478A JP2022145478A (ja) | 2022-10-04 |
JP2022145478A5 true JP2022145478A5 (enrdf_load_stackoverflow) | 2024-11-12 |
Family
ID=83460385
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021204585A Pending JP2022145478A (ja) | 2021-03-18 | 2021-12-16 | ワーク加工装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2022145478A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2025062269A (ja) * | 2023-10-02 | 2025-04-14 | 株式会社ジェイテックコーポレーション | プラズマ援用研磨方法及びその装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05226258A (ja) * | 1992-02-13 | 1993-09-03 | Applied Materials Japan Kk | プラズマ発生装置 |
US5238532A (en) * | 1992-02-27 | 1993-08-24 | Hughes Aircraft Company | Method and apparatus for removal of subsurface damage in semiconductor materials by plasma etching |
US5372674A (en) * | 1993-05-14 | 1994-12-13 | Hughes Aircraft Company | Electrode for use in a plasma assisted chemical etching process |
JP2000058521A (ja) * | 1998-08-08 | 2000-02-25 | Tokyo Electron Ltd | プラズマ研磨装置 |
JP2002103207A (ja) * | 2000-09-27 | 2002-04-09 | Hitachi Ltd | 乾式化学機械研磨方法 |
JP5614677B2 (ja) * | 2010-02-25 | 2014-10-29 | 国立大学法人大阪大学 | 難加工材料の精密加工方法及びその装置 |
-
2021
- 2021-12-16 JP JP2021204585A patent/JP2022145478A/ja active Pending
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