JP2022096107A - Liquid crystal device and electronic apparatus - Google Patents

Abstract

To provide a liquid crystal device that prevents the occurrence of corner stains and has high display characteristics.SOLUTION: A liquid crystal device 100 comprises a liquid crystal layer 15 between an element substrate 10 and a counter substrate 20. The counter substrate 20 includes: a substrate 20a as a first substrate; an insulating layer 33 arranged between the first substrate 20a and the liquid crystal layer 15; and a counter electrode 31 arranged between the insulating layer 33 and the liquid crystal layer 15. The element substrate 10 includes: a substrate 10a as a second substrate; a plurality of pixel electrodes 27 arranged between the second substrate 10a and the liquid crystal layer 15; and wiring layers 41 arranged at positions overlapping between the pixel electrode 27 and the pixel electrode 27 adjacent to each other in plan view among the plurality of pixel electrodes 27. The counter electrode 31 of the counter substrate 20 has concave parts 60 as first concave parts recessed toward the first substrate 20a at positions overlapping the wiring layers 41 in plan view, and the depth of the concave parts 60 is 100 Å or more and less than 1,500 Å.SELECTED DRAWING: Figure 12

Description

The present invention relates to a liquid crystal display and an electronic device.

As a liquid crystal device, an active drive type liquid crystal device having a switching element in a pixel is known. Such a liquid crystal device is used, for example, as a light bulb of a projector as an electronic device.

When a liquid crystal device is irradiated with strong light from, for example, a laser light source of a projector, liquid crystal molecules contained in the liquid crystal layer may be decomposed and ionic impurities may be generated in the liquid crystal layer. This ionic impurity aggregates at the corners of the image display area and burns, causing so-called corner spots that are visually recognized as spots, which is a factor that deteriorates the display characteristics of the liquid crystal display.

For the purpose of suppressing deterioration of display characteristics due to such ionic impurities, in Patent Document 1, a recess having a depth of 150 nm or more is formed in a pixel electrode or a counter electrode of a liquid crystal device. A technique is disclosed in which the formation of recesses inhibits the flow of liquid crystal molecules and diffuses ionic impurities so as not to affect the display.

Further, in Patent Document 2, a liquid crystal storage portion having a recess having a depth of about several 100 μm is provided on the facing substrate of the liquid crystal device. A technique is disclosed in which the liquid crystal display storage portion is provided to increase the encapsulation amount of the liquid crystal in addition to the optical modulation region and prolong the time until the entire liquid crystal is deteriorated.

Japanese Unexamined Patent Publication No. 2013-3286 Japanese Unexamined Patent Publication No. 2007-139926

However, in the liquid crystal displays of Patent Document 1 and Patent Document 2, since the depth of the formed recess is as deep as 150 nm or more or several hundred μm, this step is oriented toward the side surface and the bottom of the inner surface of the recess. It is difficult to form a film. For this reason, there is a problem that the formation of the concave portion causes the liquid crystal to be misaligned and deteriorates the display characteristics of the liquid crystal device.

The liquid crystal device is a liquid crystal device provided with a liquid crystal layer between the element substrate and the facing substrate, and the facing substrate is an insulating layer arranged between the first substrate and the first substrate and the liquid crystal layer. And a counter electrode arranged between the insulating layer and the liquid crystal layer, and the element substrate includes a second substrate and a plurality of electrodes arranged between the second substrate and the liquid crystal layer. A pixel electrode and a wiring layer arranged at a position overlapping between the pixel electrodes adjacent to each other in a plan view among the plurality of pixel electrodes are provided, and the counter electrode of the facing substrate is viewed in a plan view. The first recess is recessed toward the first substrate side at a position overlapping the wiring layer, and the depth of the first recess is 100 Å or more and less than 1500 Å.

The electronic device includes the above-mentioned liquid crystal device.

The plan view which shows the structure of the liquid crystal apparatus of 1st Embodiment. FIG. 2 is a cross-sectional view taken along the line HH of the liquid crystal display shown in FIG. An equivalent circuit diagram showing the electrical configuration of a liquid crystal display. The cross-sectional view which shows the concrete structure of the liquid crystal apparatus. The schematic plan view which shows the structure of the display area E of an element substrate. FIG. 5 is a cross-sectional view taken along the line AA of FIG. The schematic plan view which shows the structure of the display area E of the facing substrate. FIG. 7 is a cross-sectional view taken along the line BB of FIG. FIG. 8 is a partial cross-sectional view showing a portion C in FIG. Sectional drawing which shows the state of an orthorhombic vapor-deposited film. Sectional drawing which shows the orientation state and velocity distribution of a liquid crystal molecule. A partial cross-sectional view showing a plurality of facing recesses. The schematic diagram which shows the structure of the projector as the electronic device of 2nd Embodiment.

1. 1. First Embodiment 1-1. Schematic Structure of Liquid Crystal Display 100 The liquid crystal display 100 according to the present embodiment will be described with reference to FIGS. 1 and 2.
The liquid crystal display 100 of the present embodiment includes a liquid crystal layer 15 between the element substrate 10, the opposed substrate 20 arranged to face the element substrate 10, and the pair of element substrates 10 and the opposed substrate 20. A quartz substrate or a glass substrate can be used as the substrate 10a as the second substrate constituting the element substrate 10 and the substrate 20a as the first substrate constituting the facing substrate 20. In this embodiment, it is composed of a quartz substrate.

The element substrate 10 and the facing substrate 20 are joined via a sealing material 14 arranged along the outer periphery of the facing substrate 20. A liquid crystal having positive or negative dielectric anisotropy is enclosed between the element substrate 10 and the opposed substrate 20 bonded to each other to form a liquid crystal layer 15.

As the sealing material 14, for example, an adhesive such as a thermosetting or ultraviolet curable epoxy resin is adopted. A spacer for keeping the distance between the pair of substrates constant is mixed in the sealing material 14.

The liquid crystal display 100 is provided with a display area E in which a plurality of pixels P contributing to display are arranged inside the sealing material 14 arranged. Around the display area E, a peripheral area E1 provided with a peripheral circuit or the like that does not contribute to the display is arranged.

The element substrate 10 is larger than the facing substrate 20 in a plan view, and one side thereof protrudes. A data line drive circuit 22 is provided between the sealing material 14 provided on one side of the element substrate 10 and one side.

Further, an inspection circuit 25 is provided between the sealing material 14 along the other side portion facing the one side portion and the display area E. Further, a scanning line drive circuit 24 is provided between the sealing material 14 and the display area E along the other two sides that are orthogonal to one side and face each other. A plurality of wirings 29 for connecting the two scanning line drive circuits 24 are provided between the sealing material 14 and the inspection circuit 25 along the other side portion facing the one side portion.

A light-shielding film 18 is also provided in the shape of a frame inside the sealing material 14 arranged in the shape of a frame on the side of the facing substrate 20. The light-shielding film 18 is made of, for example, a light-reflecting metal or a metal oxide, and the inside of the light-shielding film 18 is a display region E having a plurality of pixels P. As the light-shielding film 18, for example, tungsten silicide (WSi) can be used.

The wiring connected to the data line drive circuit 22 and the scanning line drive circuit 24 is connected to a plurality of external connection terminals 70 arranged along one side. Hereinafter, the direction along one side portion will be referred to as the X direction, and the direction along the other two side portions orthogonal to the one side portion and facing each other will be described as the Y direction. Also, viewing an object from the Z direction is called a plan view.

As shown in FIG. 2, the element substrate 10 includes a plurality of pixel electrodes 27 arranged between the substrate 10a and the liquid crystal layer 15, a plurality of thin film films 30 which are switching elements, and data lines (not shown). A first alignment film 28 is arranged to cover the surface. The element substrate 10 includes the substrate 10a to the first alignment film 28.

The pixel electrode 27 is provided for each pixel P between the substrate 10a and the liquid crystal layer 15. Further, the pixel electrode 27 has electrical conductivity and is formed of, for example, a transparent conductive film such as ITO (Indium Tin Oxide).

The facing substrate 20 includes a light-shielding film 18, an insulating layer 33 formed to cover the light-shielding film 18, and a facing electrode 31 provided to cover the insulating layer 33 on the surface of the substrate 20a on the liquid crystal layer 15 side. A second alignment film 32 that covers the counter electrode 31 is provided. The facing substrate 20 includes the substrate 20a to the second alignment film 32.

As shown in FIG. 1, the light-shielding film 18 surrounds the display area E and is provided at a position where it planely overlaps with the scanning line drive circuit 24 and the inspection circuit 25. As a result, the light incident on the peripheral circuits including these drive circuits is shielded from the opposite board 20 side, and the peripheral circuits are prevented from malfunctioning due to the light. Further, the display area E is shielded from light so that unnecessary stray light does not enter the display area E, thereby ensuring high contrast in the display of the display area E.

The insulating layer 33 is made of, for example, an inorganic material such as silicon oxide having light transmittance, and is arranged between the substrate 20a and the liquid crystal layer 15.
Although not shown, a microlens array 34 formed of a SiON film is formed between the insulating layer 33 and the substrate 20a. The microlens array 34 is composed of a plurality of convex lenses (see FIG. 8) corresponding to the plurality of pixels P, and collects the light transmitted through each pixel P.

A counter electrode 31 is arranged between the insulating layer 33 and the liquid crystal layer 15. The counter electrode 31 is made of a transparent conductive film such as ITO, covers the insulating layer 33, and is electrically connected to the wiring on the element substrate 10 side by the vertical conductive portions 26 provided at the four corners of the counter substrate 20 shown in FIG. It is connected to the.

The first alignment film 28 that covers the pixel electrode 27 and the second alignment film 32 that covers the counter electrode 31 are selected based on the optical design of the liquid crystal device 100. As the first alignment film 28 and the second alignment film 32, an inorganic material such as SiOx (silicon oxide) is formed into a film by using a vapor phase growth method, and the first alignment film 28 and the second alignment film 32 are abbreviated with respect to liquid crystal molecules having negative dielectric anisotropy. Examples thereof include a vertically oriented inorganic alignment film.

Such a liquid crystal device 100 is a transmissive type, and the transmittance of the pixel P when no voltage is applied is larger than the transmittance when the voltage is applied. A normally black mode optical design is adopted in which the rate is smaller than the transmittance when a voltage is applied. Polarizing elements are arranged and used on the incident side and the emitted side of light according to the optical design.

1-2. Equivalent Circuit of Liquid Crystal Device 100 An equivalent circuit showing the electrical configuration of the liquid crystal device 100 will be described with reference to FIG.
The liquid crystal display 100 has a plurality of scanning lines 3a and a plurality of data lines 6a isolated from each other and orthogonal to each other at least in the display region E, and a capacitance line 3b. For example, the scanning line 3a extends along the X direction and the data line 6a extends along the Y direction.

A pixel electrode 27, a thin film film 30 and a capacitance element 16 are provided in a region divided by the signal lines of the scanning line 3a, the data line 6a, and the capacitance line 3b, and these signal lines and the like. The pixel circuit of the pixel P is configured by the above.

The scanning line 3a is electrically connected to the gate of the thin film-30, and the data line 6a is electrically connected to the source region of the thin film-30. The pixel electrode 27 is electrically connected to the drain region of the thin film-30.

The data line 6a is connected to the data line drive circuit 22 (see FIG. 1), and supplies the image signals D1, D2, ..., Dn supplied from the data line drive circuit 22 to the pixel P. The scanning line 3a is connected to the scanning line driving circuit 24 (see FIG. 1), and supplies scanning signals SC1, SC2, ..., SCm supplied from the scanning line driving circuit 24 to each pixel P.

The image signals D1 to Dn supplied from the data line drive circuit 22 to the data lines 6a may be supplied in this order in a line-sequential manner, or may be supplied in groups to a plurality of data lines 6a adjacent to each other. good. The scanning line drive circuit 24 sequentially supplies the scanning signals SC1 to SCm to the scanning line 3a in a pulsed manner at a predetermined timing.

In the liquid crystal display device 100, the thin film film 30 as a switching element is turned on for a certain period of time by inputting the scanning signals SC1 to SCm, so that the image signals D1 to Dn supplied from the data line 6a are pixels at a predetermined timing. It is configured to be written on the electrode 27. Then, the predetermined level image signals D1 to Dn written in the liquid crystal layer 15 via the pixel electrode 27 are held between the pixel electrodes 27 and the facing electrodes 31 which are opposed to each other via the liquid crystal layer 15 for a certain period of time. To.

In order to prevent the held image signals D1 to Dn from leaking, the capacitance element 16 is connected in parallel with the liquid crystal capacitance formed between the pixel electrode 27 and the counter electrode 31. The capacitive element 16 has a dielectric layer as a capacitive film between two capacitive electrodes.

1-3. Laminated Structure of Display Region E and Peripheral Region E1 The laminated structure of the display region E and the peripheral region E1 of the liquid crystal device 100 will be described with reference to FIG.
The liquid crystal display 100 includes an element substrate 10 and a facing substrate 20 arranged to face the element substrate 10. The element substrate 10 includes a wiring insulating layer 40, a wiring layer 41, a pixel electrode 27, and a first alignment film 28 on the liquid crystal layer 15 side of the substrate 10a.

The wiring insulating layer 40 arranged between the substrate 10a and the pixel electrode 27 is made of, for example, silicon oxide, and includes a first insulating layer 40a, a second insulating layer 40b, and a third insulating layer 40c. It has a fourth insulating layer 40d, a fifth insulating layer 40e, a sixth insulating layer 40f, a seventh insulating layer 40g, and an eighth insulating layer 40h. A light-shielding film 42 formed in a rectangular frame shape in a plan view is arranged between the first insulating layer 40a and the second insulating layer 40b.

The wiring layer 41 includes a light-shielding film 43 that also serves as a scanning line, a thin film film 30, a scanning line 3a, a capacitance line 3b, a data line 6a, and other relay electrodes, and is a light-shielding region. The wiring layer 41 is provided at a position where it overlaps between the pixel electrodes 27 and the pixel electrodes 27 that are adjacent to each other in a plan view.
Since the light-shielding film 43 is provided at a position overlapping with the thin film-30, it has a role of blocking light L incident on the thin-film 30 from the substrate 10a side and preventing the thin film-30 from malfunctioning due to the light L. I'm playing.

A pixel electrode 27 is arranged on the opposite substrate 20 side of the wiring insulation layer 40. On the facing substrate 20 side of the pixel electrode 27, an inorganic material such as silicon oxide was vapor-deposited vertically with respect to the pixel electrode surface, and further, an inorganic material was deposited on the vertical vapor deposition film from an oblique direction with respect to the pixel electrode surface. A first alignment film 28 having a two-layer structure in which an oblique thin-film film is laminated is provided. On the facing substrate 20 side of the first alignment film 28, a liquid crystal layer 15 in which a liquid crystal or the like is enclosed is arranged in a region surrounded by the sealing material 14.

On the other hand, the facing substrate 20 includes an insulating layer 33, a facing electrode 31, and a second alignment film 32 on the liquid crystal layer 15 side of the substrate 20a. The counter electrode 31 is made of, for example, a transparent conductive film such as ITO. Similar to the first alignment film 28, the second alignment film 32 is a vertical vapor deposition film in which an inorganic material such as silicon oxide is vapor-deposited from the vertical direction with respect to the pixel electrode surface, and further, with respect to the pixel electrode surface. It has a two-layer structure in which diagonal vapor deposition films vapor-deposited from an oblique direction are laminated.

The liquid crystal layer 15 takes a predetermined alignment state by the first alignment film 28 and the second alignment film 32 in a state where no electric field is generated between the pixel electrode 27 and the counter electrode 31. The light L of the projector 1000, which will be described later, is incident from the element substrate 10 side.

Further, in the display area E of the liquid crystal device 100, a recess 50 (not shown) is formed in the wiring insulating layer 40, and a recess 60 (not shown) is formed in the insulating layer 33. The recesses 50 and 60 function as ion traps in which ionic impurities generated in the liquid crystal layer 15 are aggregated.

1-4. Configuration of Recesses Next, the recesses 50 and the recesses 60 provided in the display area E will be described with reference to FIGS. 5 to 9.
First, the configuration of the display area E of the element substrate 10 will be described. FIG. 5 is a schematic plan view of the element substrate 10 as viewed from the liquid crystal layer 15 side, and FIG. 6 is a sectional view taken along line AA of FIG. In FIGS. 5 and 6, the first alignment film 28 is not shown.
As shown in FIG. 5, in the display area E of the element substrate 10, a plurality of pixel electrodes 27 constituting the pixels P are provided, and contact holes 27c are formed at the corners of the pixel electrodes 27. A wiring layer 41 (not shown) and a recess 50 as a second recess are arranged between the adjacent pixel electrodes 27 and the pixel electrodes 27. The recess 50 is formed so as to have a substantially L-shape in a plan view at a position avoiding the contact hole 27c.

As shown in FIG. 6, the eighth insulating layer 40h is a laminated film of an insulating layer 40h1 which is a TEOS (Tetraethoxysilane) film and an insulating layer 40h2 which is a BSG (Borosilicate Glass) film. The recess 50 provided between the adjacent pixel electrodes 27 and the pixel electrodes 27 is formed in the insulating layer 40h1 of the eighth insulating layer 40h.

As a method for manufacturing the recess 50, for example, after forming the insulating layer 40h1 which is a TEOS film, the recess 501 is formed in the insulating layer 40h1 by photolithography. After that, the insulating layer 40h2, which is a BSG film, is formed on the insulating layer 40h1 to form the recess 50. The pixel electrode 27 is formed by photolithography or the like after forming an ITO film on the insulating layer 40h2.
The depth H1 of the recess 50 formed in the BSG film may be, for example, 100 Å or more, preferably 1000 Å. Further, the width W1 of the recess 50 between the pixel electrodes 27 is preferably, for example, 0.5 μm to 0.8 μm.

Next, the configuration of the display area E of the facing substrate 20 will be described. FIG. 7 is a schematic plan view of the facing substrate 20 as viewed from the liquid crystal layer 15 side. 8 is a sectional view taken along line BB of FIG. 7, and FIG. 9 is a partial sectional view showing a portion C of FIG. In FIG. 8, the second alignment film 32 is not shown.

As shown in FIG. 7, the facing substrate 20 is provided with a facing electrode 31 and a recess 60 as a first recess. The recesses 60 are formed in a grid pattern on the insulating layer 33 at a position overlapping the light-shielding film 43 in a plan view, and are connected to one.

As shown in FIG. 8, the insulating layer 33 includes an insulating layer 331 as a first insulating layer and an insulating layer 332 as a second insulating layer laminated on the insulating layer 331 and provided with a recess 60.

As a method for manufacturing the concave portion 60, for example, an insulating layer 33 composed of two layers is formed on the surface of the microlens array 34 formed of a SiON film on the convex lens side. The two layers of the insulating layer 33 have different film densities due to the different amount of oxygen added. Examples of the method for forming the insulating layer 33 include a method of forming a film by using a plasma CVD (Chemical Vapor Deposition) method or the like. Specifically, the insulating layer 332, which is a silicon dioxide: SiO ₂ film, is formed by high-density plasma on the surface on which the insulating layer 331, which is a SiO film, is formed. In the insulating layer 331, a void 33a, which is a space containing air, is formed in a portion overlapping between the convex lenses of the microlens array 34. Further, the insulating layer 33 may be a plurality of layers having three or more layers.

After that, the recess 60 is formed in the insulating layer 332. The recess 60 can be formed by photolithography or the like. The depth H2 of the recess 60 formed in the insulating layer 332 may be, for example, 100 Å or more and less than 1500 Å, preferably about 1000 Å. Further, the width W2 of the recess 60 is preferably 0.8 μm, for example. An ITO film is formed on the surface of the insulating layer 332 on which the recess 60 is formed, and the counter electrode 31 is formed. The film thickness of the ITO film is about 10 to 140 nm, and the film is formed along the shape of the recess 60 formed in the insulating layer 332.

Further, as shown in FIG. 9, the facing substrate 20 is provided with a second alignment film 32 between the facing electrode 31 and the liquid crystal layer 15. The second alignment film 32 is composed of a vertical thin-film deposition film (not shown) and an orthorhombic thin-film deposition film, and is a portion between the recess 60 and the liquid crystal layer 15 that becomes a shadow in the vapor-film deposition direction when the orthorhombic vapor deposition is performed. There is a portion N without an orthorhombic vapor film.
In the recess 60, the second alignment film 32 is formed on the facing electrode 31 on the bottom surface of the recess 60, but on the side surface N of the recess 60, the second alignment film 32 is not formed on one side surface portion. .. This is the portion N without the orthorhombic vapor film.

1-5. Orthal vapor deposition film Next, the orthorhombic vapor deposition film will be described with reference to FIGS. 10 and 11.
As shown in FIG. 10, vertical vapor deposition of silicon oxide on the facing surfaces of the element substrate 10 and the facing substrate 20 from the vertical direction of the substrate surface by, for example, a vacuum vapor deposition method which is an example of a physical vapor deposition method. A first alignment film 28 and a second alignment film 32 having a two-layer structure of a film (not shown) and an oblique vapor deposition film deposited from an oblique direction with respect to the substrate surface are formed on the vertical vapor deposition film.

The oblique vapor deposition film formed as the first alignment film 28 and the second alignment film 32 is composed of a plurality of columnar structures inclined in the first direction. The vapor deposition angle θb for orthorhombic vapor deposition is, for example, 45 °. By the vapor deposition, a crystal of silicon oxide inclined in the first direction grows in a columnar shape on the facing surface of the element substrate 10 and the facing substrate 20, and becomes a columnar structure. This columnar structure is referred to as columns 28a and 32a. The first alignment film 28 is an aggregate of columns 28a. The second alignment film 32 is an aggregate of columns 32a.

The growth angles θc of the columns 28a and 32a do not always match the vapor deposition angles θb, and are, for example, 70 °. On the surfaces of the first alignment film 28 and the second alignment film 32, the pretilt angle θp of the liquid crystal molecule LC that is substantially vertically oriented is, for example, 85 °. Further, the direction of pretilt of the liquid crystal molecule LC seen from the substrate surfaces of the element substrate 10 and the facing substrate 20, that is, the azimuth angle direction is the planar vapor deposition direction in the oblique vapor deposition of the first alignment film 28 and the second alignment film 32. Is the same as.

As shown in FIG. 11, when a driving voltage is applied between the pixel electrode 27 and the counter electrode 31 to drive the liquid crystal layer 15, the liquid crystal molecule LC collapses in the azimuth angle direction of the pretilt. When the liquid crystal layer 15 is repeatedly driven (ON / OFF), the liquid crystal molecule LC repeats the behavior of tilting in the azimuth direction of the pretilt and returning to the initial orientation state.

At this time, the liquid crystal molecule LC in the liquid crystal layer 15 is circulated by changing the direction of the liquid crystal molecule LC. Along with this circulation, the ionic impurities generated in the liquid crystal layer 15 can be dispersed over the entire display region E and trapped in the recesses 50 and 60.

As shown in FIG. 12, the element substrate 10 is provided with a recess 50 as a second recess between adjacent pixel electrodes 27 in the eighth insulating layer 40h of the wiring insulating layer 40, and the facing substrate 20 is provided with a recess 50. A recess 60 as a first recess is provided in the insulating layer 33 at a position overlapping the light-shielding film 43 in a plan view. The recess 50 and the recess 60 are arranged so as to face each other via the liquid crystal layer 15, and the light-shielding film 43, the recess 50, and the recess 60 are arranged so as to overlap each other in a plan view. In FIG. 12, the first alignment film 28 and the second alignment film 32 are not shown.

As described above, the liquid crystal display 100 of the first embodiment is a liquid crystal device including a liquid crystal layer 15 between the element substrate 10 and the facing substrate 20, and the substrate 20a as the first substrate constituting the facing substrate 20. The insulating layer 33 arranged between the insulating layer 33 and the liquid crystal layer 15, the counter electrode 31 arranged between the insulating layer 33 and the liquid crystal layer 15, the substrate 10a as the second substrate constituting the element substrate 10, and the liquid crystal display. A plurality of pixel electrodes 27 arranged between the layers 15, a light-shielding film 43 as a light-shielding region located between a plurality of adjacent pixel electrodes 27 in a plan view, and a position overlapping the light-shielding film 43 in a plan view. A recess 60 as a first recess provided in the insulating layer 33 is provided, and the depth H2 of the recess 60 is 100 Å or more and less than 1500 Å.

In such a liquid crystal device 100, the recess 50 is provided in the insulating layer 40h2 between the pixel electrode 27 and the pixel electrode 27, and the recess 60 is provided in the insulating layer 33. Therefore, the liquid crystal device 100 is generated from, for example, the liquid crystal layer 15. It is possible to retain the ionic impurities in the recesses 50 and 60. In other words, ionic impurities can be retained in the plurality of recesses 50 and 60 provided in the display area E. Therefore, it is possible to suppress the occurrence of display defects due to ionic impurities, in other words, the occurrence of angular stains, and it is possible to provide the liquid crystal apparatus 100 having high display characteristics.

Further, in the liquid crystal display device 100 of the above embodiment, since the depth H2 of the recess 60 is 100 Å or more and less than 1500 Å, it is easier to attach an alignment film to the inner surface of the recess 60 as compared with the depth of the conventional recess. Therefore, it is possible to reduce misalignment caused by the alignment film and improve the display characteristics.

Further, since there is a portion without the oblique vapor deposition film between the recess 50 or the recess 60 and the liquid crystal layer 15, it becomes easy to retain ionic impurities in the recesses 50 and 60, and corner stains occur. It is possible to obtain an effect that achieves both a reduction and a reduction in misalignment.

Further, since the recess 60 is provided in the insulating layer 332, the void 33a of the insulating layer 331 is not exposed by the recess 60. Therefore, it is possible to reduce the decrease in transmittance, contrast, and poor orientation due to the exposure of the void 33a. Further, since the insulating layer 332 made of silicon dioxide formed by high-density plasma adjusts the morphology of the counter electrode 31 made of an ITO film, it is possible to provide a liquid crystal device 100 having high transmittance and high display characteristics. ..

The recess 60 of the present invention is not limited to the above-mentioned form.
In the above-described embodiment, the insulating layer 33 is provided with one recess 60 connected in a groove shape, but the recess 60 may be a plurality of recesses 60 formed in a non-continuous groove shape. When there are a plurality of recesses 60, the surface area is larger than that of one recess 60, so that it becomes easier to retain ionic impurities and the occurrence of angular stains can be reduced.
Further, the recess 60 and the recess 50 may be provided without facing each other, or only the recess 60 may be provided. Even with such a configuration, the same effect can be obtained, so that it is possible to provide a liquid crystal device having high display characteristics.

2. 2. Second Embodiment The projector 1000 as an electronic device of the present embodiment will be described with reference to FIG.
The projector 1000 of the present embodiment includes a polarized lighting device 1100 arranged along the system optical axis L, two dichroic mirrors 1104, 1105 as optical separation elements, three reflection mirrors 1106, 1107, 1108, and five. It is equipped with two relay lenses 1201, 1202, 1203, 1204, 1205, transmissive liquid crystal light valves 1210, 1220, 1230 as three optical modulation means, a cross dichroic prism 1206 as a photosynthetic element, and a projection lens 1207. ing.

The polarized lighting device 1100 is roughly composed of a lamp unit 1101 as a light source composed of a white light source such as an ultra-high pressure mercury lamp or a halogen lamp, an integrator lens 1102, and a polarization conversion element 1103.

The dichroic mirror 1104 reflects the red light (R) of the polarized light flux emitted from the polarized lighting device 1100, and transmits the green light (G) and the blue light (B). The other dichroic mirror 1105 reflects the green light (G) transmitted through the dichroic mirror 1104 and transmits the blue light (B).

The red light (R) reflected by the dichroic mirror 1104 is reflected by the reflection mirror 1106 and then incident on the liquid crystal light valve 1210 via the relay lens 1205. The green light (G) reflected by the dichroic mirror 1105 is incident on the liquid crystal light bulb 1220 via the relay lens 1204. The blue light (B) transmitted through the dichroic mirror 1105 is incident on the liquid crystal light valve 1230 via a light guide system including three relay lenses 1201, 1202, 1203 and two reflection mirrors 1107, 1108.

The liquid crystal light bulbs 1210, 1220, and 1230 are arranged so as to face each of the incident surfaces of the cross dichroic prism 1206 for each color light. The colored light incident on the liquid crystal light bulbs 1210, 1220, 1230 is modulated based on the video information (video signal) and emitted toward the cross dichroic prism 1206.

In this prism, four right-angled prisms are bonded together, and a dielectric multilayer film that reflects red light and a dielectric multilayer film that reflects blue light are formed in a cross shape on the inner surface thereof. Three colored lights are combined by these dielectric multilayer films to synthesize light representing a color image. The combined light is projected onto the screen 1300 by the projection lens 1207, which is a projection optical system, and the image is enlarged and displayed.

The liquid crystal light bulbs 1210, 1220, and 1230 are to which the above-mentioned liquid crystal device 100 is applied. The liquid crystal display 100 is arranged with a gap between a pair of polarizing elements arranged on the cross Nicol on the incident side and the emitted side of the colored light.

In addition to the projector 1000, the electronic devices on which the liquid crystal device 100 is mounted include a head-up display (HUD), a head-mounted display (HMD), a smartphone, an EVF (Electrical View Finder), a mobile mini-projector, an electronic book, and a mobile phone. It can be used for telephones, mobile computers, digital cameras, digital video cameras, displays, in-vehicle devices, audio devices, exposure devices, lighting devices, and the like.

As described above, the projector 1000 of the present embodiment includes the liquid crystal device 100 of the above embodiment as the liquid crystal light bulbs 1210, 1220, 1230.

According to this configuration, since the liquid crystal device 100 described above is provided, it is possible to provide the projector 1000 capable of improving the display quality.

3a ... Scanning line, 3b ... Capacitive line, 6a ... Data line, 10 ... Element substrate, 10a ... Substrate, 14 ... Sealing material, 15 ... Liquid crystal layer, 16 ... Capacitive element, 18 ... Light-shielding film, 20 ... Opposing substrate, 20a ... Substrate, 22 ... Data line drive circuit, 24 ... Scan line drive circuit, 25 ... Inspection circuit, 26 ... Vertical conduction part, 27 ... Pixel electrode, 27c ... Contact hole, 28 ... First alignment film, 28a ... Column, 29 ... Wiring, 30 ... Thin film, 31 ... Counter electrode, 32 ... Second alignment film, 32a ... Column, 33 ... Insulation layer, 33a ... Void, 34 ... Microlens array, 40 ... Wiring insulation layer, 40a ... First insulation Layer, 40b ... 2nd insulating layer, 40c ... 3rd insulating layer, 40d ... 4th insulating layer, 40e ... 5th insulating layer, 40f ... 6th insulating layer, 40g ... 7th insulating layer, 40h ... 8th insulating layer , 40h1 ... Insulation layer, 40h2 ... Insulation layer, 41 ... Wiring layer, 42 ... Light-shielding film, 43 ... Light-shielding film, 50 ... Recessed, 60 ... Recessed, 70 ... External connection terminal, 100 ... Liquid crystal device, 331 ... Insulating layer , 332 ... Insulation layer, 501 ... Recessed, 1000 ... Projector, 1100 ... Polarized lighting device, 1101 ... Lamp unit, 1102 ... Integrator lens, 1103 ... Polarized conversion element, 1104 ... Dichroic mirror, 1105 ... Dichroic mirror, 1106 ... Reflective mirror 1,107 ... Reflective mirror, 1201 ... Relay lens, 1204 ... Relay lens, 1205 ... Relay lens, 1206 ... Cross dichroic prism, 1207 ... Projection lens, 1210 ... Liquid crystal light valve, 1220 ... Liquid crystal light valve, 1230 ... Liquid crystal light valve, 1300 ... screen, D1 ... image signal, E1 ... peripheral area, H1 ... depth, H2 ... depth, W1 ... width, W2 ... width.

Claims (6)

A liquid crystal device having a liquid crystal layer between an element substrate and a facing substrate.
The facing substrate is
With the first board
An insulating layer arranged between the first substrate and the liquid crystal layer,
A counter electrode disposed between the insulating layer and the liquid crystal layer is provided.
The element substrate is
With the second board
A plurality of pixel electrodes arranged between the second substrate and the liquid crystal layer,
Among the plurality of pixel electrodes, a wiring layer arranged at a position overlapping between the adjacent pixel electrodes and the pixel electrodes in a plan view is provided.
The facing electrode of the facing substrate has a first recess recessed toward the first substrate side at a position overlapping the wiring layer in a plan view.
The depth of the first recess is 100 Å or more and less than 1500 Å.
A liquid crystal display characterized by this. The liquid crystal display according to claim 1.
The facing substrate is
An orthorhombic thin-film film disposed between the counter electrode and the liquid crystal layer is provided.
A liquid crystal display characterized in that the first recess has a portion to which the oblique vapor deposition film is not attached. The liquid crystal display according to claim 1 or 2.
A liquid crystal display characterized in that the first recess is composed of a recess provided in the insulating layer and a counter electrode arranged along the recess. The liquid crystal display according to any one of claims 1 to 3.
The liquid crystal display is characterized in that the insulating layer is composed of a plurality of layers, and the insulating layer located closest to the counter electrode side among the plurality of layers is made of silicon dioxide. The liquid crystal display according to any one of claims 1 to 4.
The element substrate is
A second insulating layer arranged between the light-shielding layer and the pixel electrode is provided.
The second insulating layer has a second recess at a position overlapping between the pixel electrodes in a plan view.
A liquid crystal display characterized in that the first recess and the second recess overlap each other in a plan view. An electronic device comprising the liquid crystal display according to any one of claims 1 to 5.

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