JP2022091674A - 処理液供給ユニットを含む基板処理装置、及び基板処理方法 - Google Patents
処理液供給ユニットを含む基板処理装置、及び基板処理方法 Download PDFInfo
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- H—ELECTRICITY
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- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/001—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work incorporating means for heating or cooling the liquid or other fluent material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67184—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the presence of more than one transfer chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
Abstract
Description
2602 処理液供給ユニット
2670 ノズル
2671 移動部材
2678 吐出口
2672 アーム
2674 支持軸
2676 駆動器
2680 処理液供給部
2682 供給ライン
2684 処理液供給タンク
2686 バルブ
2690 冷却部
2692 管状部材
Claims (20)
- 基板を支持するための基板支持ユニット、及び
前記基板に向けて処理液を供給する処理液供給ユニットを含み、
前記処理液供給ユニットは、
基板上に処理液を供給するノズル、
前記ノズルに処理液を供給するための供給ラインを備える処理液供給部、及び
前記処理液を冷却させるための冷却部を含む、基板処理装置。 - 前記冷却部は、前記供給ラインの外部に冷却流体を供給することを特徴とする、請求項1に記載の基板処理装置。
- 前記冷却部は、前記供給ラインを覆うように提供される管状部材を含むことを特徴とする、請求項2に記載の基板処理装置。
- 前記管状部材は内部空間を含み、
前記冷却部は前記内部空間に冷却流体を供給することを特徴とする、請求項3に記載の基板処理装置。 - 前記冷却部によって前記処理液の体積が減少することを特徴とする、請求項1に記載の基板処理装置。
- 前記冷却部は、
前記処理液の種類に応じて、前記内部空間に供給される冷却流体の温度、供給流量、供給時間及び熱交換面積のうちの少なくとも一つを制御することを特徴とする、請求項4に記載の基板処理装置。 - 前記ノズルは、窒素を含む不活性ガスの供給部に連結され、
基板上に不活性ガスを吐出することができることを特徴とする、請求項1に記載の基板処理装置。 - 基板の収納されたキャリアが載置されるロードポート、
前記ロードポートに載置されたキャリアから前記基板を搬送するインデックスロボットが内部に提供されるインデックスチャンバー、及び
前記基板に対して液処理工程を行う液処理装置を備える工程処理部を含み、
前記液処理装置は、
基板を支持するための基板支持ユニット、及び
前記基板に向けて処理液を供給する処理液供給ユニットを含み、
前記処理液供給ユニットは、
基板上に処理液を供給するノズル、
前記ノズルに処理液を供給するための供給ラインを備える処理液供給部、及び
前記処理液を冷却させるための冷却部を含み、
前記冷却部は、
前記供給ラインを覆うように提供された管状部材を含む、基板処理設備。 - 前記冷却部は前記供給ラインの外部に冷却流体を供給することを特徴とする、請求項8に記載の基板処理設備。
- 前記管状部材は内部空間を含み、
前記冷却部は前記内部空間に冷却流体を供給することを特徴とする、請求項8に記載の基板処理設備。 - 前記冷却部によって前記処理液の体積が減少することを特徴とする、請求項8に記載の基板処理設備。
- 前記冷却部は、
前記処理液の種類に応じて、前記内部空間に供給される冷却流体の温度、供給流量、供給時間及び熱交換面積のうちの少なくとも一つを制御することを特徴とする、請求項10に記載の基板処理設備。 - 前記ノズルは、
窒素を含む不活性ガスの供給部に連結され、基板に向かって不活性ガスを吐出することができることを特徴とする、請求項8に記載の基板処理設備。 - 基板上に処理液または不活性ガスを吐出するノズル、及び前記ノズルに処理液を供給するための処理液の供給ラインを含む基板処理装置を用いた基板処理方法であって、
基板上に処理液を吐出する処理液供給ステップと、
前記処理液の供給を中断し、前記ノズルの内部に残存する処理液をサックバック(Suck Back)させるサックバックステップと、
前記基板上に不活性ガスを供給する不活性ガス供給ステップと、を含み、
前記サックバックステップと前記不活性ガス供給ステップは、前記処理液を冷却する冷却ステップを含む、基板処理方法。 - 前記冷却ステップによって前記処理液の体積が減少することを特徴とする、請求項14に記載の基板処理方法。
- 前記冷却ステップは、前記供給ラインの外部に冷却流体を供給するステップを含むことを特徴とする、請求項14に記載の基板処理方法。
- 前記サックバックステップで供給される冷却流体の量と、前記不活性ガス供給ステップに供給される冷却流体の量とは異なることを特徴とする、請求項16に記載の基板処理方法。
- 前記不活性ガス供給ステップが冷却ステップを含むことにより、前記ノズルから前記処理液がドロップしないことを特徴とする、請求項15に記載の基板処理方法。
- 前記冷却ステップでは、前記冷却流体の温度、流量、供給時間及び熱交換面積のうちの少なくとも一つが制御されることを特徴とする、請求項16に記載の基板処理方法。
- 前記冷却流体を制御することにより、処理液がサックバックされる体積または時間が制御されることを特徴とする、請求項19に記載の基板処理方法。
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KR1020200171186A KR102583555B1 (ko) | 2020-12-09 | 2020-12-09 | 처리액 공급 유닛을 포함하는 기판 처리 장치 및 기판 처리 방법 |
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Citations (6)
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WO2010035396A1 (ja) * | 2008-09-25 | 2010-04-01 | 大日本スクリーン製造株式会社 | 基板洗浄方法および基板洗浄装置 |
JP2012033961A (ja) * | 2007-09-19 | 2012-02-16 | Semes Co Ltd | 基板加工装置 |
JP2013251548A (ja) * | 2012-05-31 | 2013-12-12 | Semes Co Ltd | 基板洗浄装置及び基板洗浄方法 |
JP2015185644A (ja) * | 2014-03-24 | 2015-10-22 | 株式会社Screenホールディングス | 基板処理装置 |
JP2019081320A (ja) * | 2017-10-31 | 2019-05-30 | Towa株式会社 | ノズル、樹脂成形装置、樹脂成形品の製造方法 |
JP2019177581A (ja) * | 2018-03-30 | 2019-10-17 | Towa株式会社 | 樹脂成形装置、及び樹脂成形品の製造方法 |
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JP5009107B2 (ja) | 2007-09-12 | 2012-08-22 | サーパス工業株式会社 | サックバックバルブ |
KR101512100B1 (ko) * | 2012-05-31 | 2015-04-23 | 세메스 주식회사 | 기판 세정 장치 및 기판 세정 방법 |
JP6216274B2 (ja) * | 2014-03-17 | 2017-10-18 | 株式会社Screenホールディングス | 基板処理方法および基板処理装置 |
JP6706564B2 (ja) * | 2016-09-23 | 2020-06-10 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2012033961A (ja) * | 2007-09-19 | 2012-02-16 | Semes Co Ltd | 基板加工装置 |
WO2010035396A1 (ja) * | 2008-09-25 | 2010-04-01 | 大日本スクリーン製造株式会社 | 基板洗浄方法および基板洗浄装置 |
JP2013251548A (ja) * | 2012-05-31 | 2013-12-12 | Semes Co Ltd | 基板洗浄装置及び基板洗浄方法 |
JP2015185644A (ja) * | 2014-03-24 | 2015-10-22 | 株式会社Screenホールディングス | 基板処理装置 |
JP2019081320A (ja) * | 2017-10-31 | 2019-05-30 | Towa株式会社 | ノズル、樹脂成形装置、樹脂成形品の製造方法 |
JP2019177581A (ja) * | 2018-03-30 | 2019-10-17 | Towa株式会社 | 樹脂成形装置、及び樹脂成形品の製造方法 |
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US20220181169A1 (en) | 2022-06-09 |
TW202235169A (zh) | 2022-09-16 |
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KR20220081566A (ko) | 2022-06-16 |
CN114628278A (zh) | 2022-06-14 |
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