JP2021535626A5 - - Google Patents

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Publication number
JP2021535626A5
JP2021535626A5 JP2021535498A JP2021535498A JP2021535626A5 JP 2021535626 A5 JP2021535626 A5 JP 2021535626A5 JP 2021535498 A JP2021535498 A JP 2021535498A JP 2021535498 A JP2021535498 A JP 2021535498A JP 2021535626 A5 JP2021535626 A5 JP 2021535626A5
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JP
Japan
Prior art keywords
function
software
flow rate
output
emulator
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Application number
JP2021535498A
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English (en)
Japanese (ja)
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JP2021535626A (ja
JP7419378B2 (ja
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Priority claimed from US16/120,846 external-priority patent/US11429409B2/en
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Publication of JP2021535626A publication Critical patent/JP2021535626A/ja
Publication of JP2021535626A5 publication Critical patent/JP2021535626A5/ja
Application granted granted Critical
Publication of JP7419378B2 publication Critical patent/JP7419378B2/ja
Active legal-status Critical Current
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JP2021535498A 2018-09-04 2019-08-30 基板処理システムのガス供給システムにおけるハードウェア構成要素のためのソフトウェアエミュレータ Active JP7419378B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/120,846 US11429409B2 (en) 2018-09-04 2018-09-04 Software emulator for hardware components in a gas delivery system of substrate processing system
US16/120,846 2018-09-04
PCT/US2019/049055 WO2020051084A1 (en) 2018-09-04 2019-08-30 Software emulator for hardware components in a gas delivery system of substrate processing system

Publications (3)

Publication Number Publication Date
JP2021535626A JP2021535626A (ja) 2021-12-16
JP2021535626A5 true JP2021535626A5 (https=) 2022-10-14
JP7419378B2 JP7419378B2 (ja) 2024-01-22

Family

ID=69639902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021535498A Active JP7419378B2 (ja) 2018-09-04 2019-08-30 基板処理システムのガス供給システムにおけるハードウェア構成要素のためのソフトウェアエミュレータ

Country Status (6)

Country Link
US (1) US11429409B2 (https=)
JP (1) JP7419378B2 (https=)
KR (1) KR102929521B1 (https=)
CN (1) CN112654994A (https=)
TW (1) TWI816872B (https=)
WO (1) WO2020051084A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120752745A (zh) * 2023-09-21 2025-10-03 株式会社国际电气 基板处理装置、基板处理方法、半导体装置的制造方法、气体供给系统以及气体供给程序
CN117329448A (zh) * 2023-10-17 2024-01-02 江苏超微半导体科技有限公司 一种半导体制造用超纯气体输送系统集成方法

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US20060163220A1 (en) * 2005-01-27 2006-07-27 Brandt Aaron D Automatic gas control for a plasma arc torch
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JP2010161259A (ja) 2009-01-09 2010-07-22 Toshiba Corp プロセスシミュレーションプログラム、プロセスシミュレーション方法、プロセスシミュレータ
CN102096420B (zh) * 2009-12-15 2015-01-14 株式会社堀场Stec 质量流量控制器
JP4681082B1 (ja) * 2010-06-16 2011-05-11 株式会社システムブイ 装置パラメータ設定支援システム
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