JP2021530622A - 液体密封で完全な緻密性のある皮膜を作成するための一段階法 - Google Patents
液体密封で完全な緻密性のある皮膜を作成するための一段階法 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/129—Flame spraying
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
- B05B7/20—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed by flame or combustion
- B05B7/201—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed by flame or combustion downstream of the nozzle
- B05B7/205—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed by flame or combustion downstream of the nozzle the material to be sprayed being originally a particulate material
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- Coating By Spraying Or Casting (AREA)
Abstract
Description
本出願は、2018年8月10日に出願された米国特許出願第62/717,355号に対する優先権の利益を主張するものであり、その全体があらゆる目的で参照により本明細書に組み込まれる。
本発明は、一般に、様々な用途のための液体密封で完全な緻密性のある皮膜を作成するための、一段階高速酸素燃料(「HVOF」)法に関する。特に、HVOF法は、酸素を不活性ガスで制御して希釈して、火炎温度を低下させ、それによって、比較的小さい粒径の粉末原料を使用して、密封材を使用せずに、液体密封で完全な緻密性のある皮膜を作成することができる。
比較例1
比較例2
比較例3
比較例4
Claims (18)
- 成膜直後の状態の皮膜を封止することなく、薄く、液体密封で成膜直後の状態の皮膜を作成するための一段階法であり、
基材を提供する工程と、
1〜15マイクロメートルの範囲の粒径を有する粉末原料を提供する工程と、
熱溶射トーチを提供し、前記熱溶射トーチが、燃焼室の下流にノズルを含む燃焼室を備える工程と、
前記燃焼室に燃料を導入する工程と、
酸素ガスを不活性ガスと予備混合して希釈酸素ガスを生成し、前記予備混合は、前記酸素ガスが前記燃焼室に入る前に行われ、前記不活性ガスと前記酸素ガスとの流量比は、8:92〜50:50の範囲である工程と、
前記希釈酸素ガスを前記燃焼室に導入する工程と、
前記燃料を前記希釈酸素ガスで燃焼させて火炎を発生させる工程と、
前記粉末原料を前記ノズルに導入する工程と、
前記粉末原料を前記火炎と接触させて、実質的に溶融又は半溶融した液滴を生成する工程と、
前記実質的に溶融又は半溶融した液滴を前記基材に向ける工程とを含む、一段階法。 - 前記燃料が、炭化水素及び水素からなる群から選択される、請求項1に記載の一段階法。
- 前記酸素が、前記燃料を燃焼させるのに十分な流量で導入される、請求項1に記載の一段階法。
- 前記不活性ガスが、前記不活性ガスを用いずに発生した火炎温度と比較して低い火炎温度を燃焼室で生成するのに十分な流量で導入される、請求項1に記載の一段階法。
- 前記酸素ガス及び前記不活性ガスの全流量が500〜3000scfhである、請求項1に記載の一段階法。
- 前記粉末原料が、炭化タングステンベースの材料である、請求項1に記載の一段階法。
- 前記粉末原料が、約4〜12マイクロメートルの粒径を有する、請求項1に記載の一段階法。
- 前記粉末原料が、6〜10マイクロメートルの中央粒径を有する、請求項1に記載の一段階法。
- 成膜直後の状態の皮膜を封止することなく、薄く、液体密封で成膜直後の状態の皮膜を作成するための一段階法であり、
基材を提供する工程と、
1〜15マイクロメートルの範囲の粒径を有する粉末原料を提供する工程と、
熱溶射トーチを提供し、前記熱溶射トーチが、燃焼室を含み、前記トーチが、その中に囲まれた前記燃焼室の下流のノズルを更に含む工程と、
前記燃焼室に燃料を導入する工程と、
酸素ガスを不活性ガスと予備混合して、希釈酸素ガスを生成する工程と、
前記希釈酸素ガスを前記燃焼室に向ける工程と、
前記燃料を前記希釈酸素ガスで燃焼させて、前記燃焼室内に火炎を発生させる工程と、
前記燃焼室内の火炎温度を制御する工程と、
前記粉末原料を前記ノズルに導入する工程と、
前記粉末原料を加熱して、1〜15マイクロメートルの範囲の粒径を有する前記粉末原料を使用した従来の高速酸素燃料プロセスと比較して、酸化が低減された、実質的に溶融又は半溶融した液滴を生成する工程とを含む、一段階法。 - 前記酸素ガスと前記不活性ガスとの予備混合が、8:92〜50:50の範囲の前記不活性ガスと前記酸素ガスとの流量比をもたらす、請求項9に記載の一段階法。
- 前記酸素及び前記窒素の全流量が、500〜3000scfhである、請求項9に記載の一段階法。
- 前記粉末原料が、炭化タングステンベースの材料又は炭化クロムベースの系材料を含む、請求項9に記載の一段階法。
- 前記粉末原料が、放射状方向に前記ノズルに注入される、請求項9に記載の一段階法。
- 前記粉末原料が、6〜10マイクロメートルの中央粒径を有する、請求項9に記載の一段階法。
- 前記酸素ガスと前記不活性ガスとの予備混合が、10:90〜30:70の範囲の前記不活性ガスと前記酸素ガスとの流量比をもたらす、請求項9に記載の一段階法。
- 前記酸素ガスと前記不活性ガスとの予備混合が、12:88〜18:82の範囲の前記不活性ガスと前記酸素ガスとの流量比をもたらす、請求項9に記載の一段階法。
- 酸素希釈高速酸素燃料(「HVOF」)プロセスによって作成された、シーラーを使用しない、薄く、液体密封で成膜直後の状態の一段階熱溶射皮膜であり、前記皮膜は、1〜15マイクロメートルの範囲の粒径及び100マイクロメートル以下の皮膜の厚さを有する炭化タングステンベースの粉末組成物に由来し、前記液体密封性は、10,000psi以上の圧力で視覚的に検出可能な漏れがないこと、及び相互接続された細孔がないことによって定義された完全に緻密性のある構造を特徴とする、皮膜。
- 前記耐食性が、前記基材の腐食がないことを特徴とする、請求項17に記載の皮膜。
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US201862717355P | 2018-08-10 | 2018-08-10 | |
US62/717,355 | 2018-08-10 | ||
US16/531,533 US11965251B2 (en) | 2018-08-10 | 2019-08-05 | One-step methods for creating fluid-tight, fully dense coatings |
US16/531,533 | 2019-08-05 | ||
PCT/US2019/045189 WO2020033338A1 (en) | 2018-08-10 | 2019-08-06 | One-step methods for creating fluid-tight, fully dense coatings |
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CN106029937B (zh) * | 2014-10-02 | 2019-05-17 | 新日铁住金株式会社 | 炉底辊及其制造方法 |
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2019
- 2019-08-05 US US16/531,533 patent/US11965251B2/en active Active
- 2019-08-06 JP JP2021503015A patent/JP2021530622A/ja active Pending
- 2019-08-06 WO PCT/US2019/045189 patent/WO2020033338A1/en unknown
- 2019-08-06 CN CN201980045757.3A patent/CN112424388A/zh active Pending
- 2019-08-06 EP EP19755487.6A patent/EP3833796A1/en active Pending
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Patent Citations (3)
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JP2002506926A (ja) * | 1998-03-14 | 2002-03-05 | ダナ・コーポレイション | すべり軸受のライニングの形成 |
JP2005068457A (ja) * | 2003-08-28 | 2005-03-17 | Fujikoo:Kk | 溶射温度可変型の高速溶射装置 |
JP2012112012A (ja) * | 2010-11-26 | 2012-06-14 | Fujimi Inc | Hvaf溶射用粉末及び溶射皮膜の形成方法 |
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WO2020033338A1 (en) | 2020-02-13 |
US20200048753A1 (en) | 2020-02-13 |
US11965251B2 (en) | 2024-04-23 |
SG11202100155TA (en) | 2021-02-25 |
CN112424388A (zh) | 2021-02-26 |
EP3833796A1 (en) | 2021-06-16 |
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