JP2021528865A - 有機材料上に金属酸化物膜を堆積するための堆積ツールおよび方法 - Google Patents
有機材料上に金属酸化物膜を堆積するための堆積ツールおよび方法 Download PDFInfo
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- JP2021528865A JP2021528865A JP2020572887A JP2020572887A JP2021528865A JP 2021528865 A JP2021528865 A JP 2021528865A JP 2020572887 A JP2020572887 A JP 2020572887A JP 2020572887 A JP2020572887 A JP 2020572887A JP 2021528865 A JP2021528865 A JP 2021528865A
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- metal oxide
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- 229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 105
- 150000004706 metal oxides Chemical class 0.000 title claims abstract description 74
- 238000000034 method Methods 0.000 title claims description 90
- 238000000151 deposition Methods 0.000 title claims description 19
- 230000008021 deposition Effects 0.000 title description 5
- 239000011368 organic material Substances 0.000 title 1
- 238000000231 atomic layer deposition Methods 0.000 claims abstract description 131
- 239000002243 precursor Substances 0.000 claims abstract description 102
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 67
- 239000000758 substrate Substances 0.000 claims abstract description 66
- 238000000059 patterning Methods 0.000 claims abstract description 64
- 125000002524 organometallic group Chemical group 0.000 claims abstract description 35
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000001301 oxygen Substances 0.000 claims abstract description 17
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 17
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 35
- 229910052799 carbon Inorganic materials 0.000 claims description 35
- 125000006850 spacer group Chemical group 0.000 claims description 28
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 24
- 230000008569 process Effects 0.000 claims description 21
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical group O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 21
- 229910001887 tin oxide Inorganic materials 0.000 claims description 21
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 17
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 16
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 14
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 238000000206 photolithography Methods 0.000 claims description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 10
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims description 10
- 229920000642 polymer Polymers 0.000 claims description 7
- REAINNLDBYQFRM-UHFFFAOYSA-N CN(C)[Sn](C)C Chemical compound CN(C)[Sn](C)C REAINNLDBYQFRM-UHFFFAOYSA-N 0.000 claims description 6
- IFVSPCQTOMZHOP-UHFFFAOYSA-N n-ethyl-n-[tris(diethylamino)stannyl]ethanamine Chemical compound CCN(CC)[Sn](N(CC)CC)(N(CC)CC)N(CC)CC IFVSPCQTOMZHOP-UHFFFAOYSA-N 0.000 claims description 6
- HQFPMGPCIKGRON-UHFFFAOYSA-N n-methyl-n-trimethylstannylmethanamine Chemical compound CN(C)[Sn](C)(C)C HQFPMGPCIKGRON-UHFFFAOYSA-N 0.000 claims description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 5
- ZXDVQYBUEVYUCG-UHFFFAOYSA-N dibutyltin(2+);methanolate Chemical compound CCCC[Sn](OC)(OC)CCCC ZXDVQYBUEVYUCG-UHFFFAOYSA-N 0.000 claims description 5
- WHXTVQNIFGXMSB-UHFFFAOYSA-N n-methyl-n-[tris(dimethylamino)stannyl]methanamine Chemical compound CN(C)[Sn](N(C)C)(N(C)C)N(C)C WHXTVQNIFGXMSB-UHFFFAOYSA-N 0.000 claims description 5
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 5
- 239000004408 titanium dioxide Substances 0.000 claims description 5
- STFSECMHVCFKFX-UHFFFAOYSA-N aminotin Chemical compound [Sn]N STFSECMHVCFKFX-UHFFFAOYSA-N 0.000 claims description 4
- FANAUDUYRDVPHX-UHFFFAOYSA-N ethoxytin Chemical compound CCO[Sn] FANAUDUYRDVPHX-UHFFFAOYSA-N 0.000 claims description 4
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 4
- 230000000593 degrading effect Effects 0.000 claims description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 2
- 238000005530 etching Methods 0.000 abstract description 17
- 230000015556 catabolic process Effects 0.000 abstract description 5
- 238000006731 degradation reaction Methods 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 abstract description 5
- 230000001681 protective effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 81
- 239000010408 film Substances 0.000 description 15
- 239000004065 semiconductor Substances 0.000 description 13
- 210000002381 plasma Anatomy 0.000 description 12
- 238000004891 communication Methods 0.000 description 9
- 230000008901 benefit Effects 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 7
- 239000012044 organic layer Substances 0.000 description 6
- 239000012713 reactive precursor Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000003575 carbonaceous material Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 101000822633 Pseudomonas sp 3-succinoylsemialdehyde-pyridine dehydrogenase Proteins 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000012707 chemical precursor Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 125000001891 dimethoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 230000009291 secondary effect Effects 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- VXKWYPOMXBVZSJ-UHFFFAOYSA-N tetramethyltin Chemical compound C[Sn](C)(C)C VXKWYPOMXBVZSJ-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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Abstract
【選択図】図3
Description
本願は、2018年6月26日出願の米国仮出願第62/690,210号、および、2018年8月1日出願の米国仮出願第16/052,286号に基づく優先権の利益を主張し、これらの仮出願は両方とも、すべての目的に対して参照によって本明細書に組み込まれる。
(1)ALDサイクルの第1ハーフ(前半)において、第1前駆体が、シャワーヘッド14を介して処理チャンバ12に導入される。第1前駆体は、基板18と反応して、表面上に第1粒子の第1層を堆積する。次いで、処理チャンバ12は、パージされる。
(2)ALDサイクルの第2ハーフ(後半)において、第2前駆体が、処理チャンバに導入される。第2前駆体も、基板18と反応して、表面上に第2粒子の第2層を形成する。
(1)基板上の有機フォトレジスト層上に金属酸化物層を堆積するために、スズを含む高反応性の有機金属前駆体を用いる第1ハーフサイクル、および、
(2)酸素(O2)種を含む第2ハーフサイクル。しかしながら、酸素種の副次的な影響により、有機フォトレジストを分解する。
非排他的実施形態において、有機金属前駆体を用いて、炭素などの有機フォトレジスト上へ酸化スズ(SnO2)などの金属酸化物層を堆積するためのALDサイクルの第1ハーフサイクルおよび第2ハーフサイクルの例のための処理パラメータを、以下に提供する。
有機層上に金属酸化物を堆積できることで、(1)含まれる層の数と、(2)必要なリソグラフィ−エッチングサイクルの回数とを削減することによって、マルチパターニングを大幅に改善および単純化する機会が生まれる。これらの利点は、以前には上述したように不均一性の問題によって適していなかった金属酸化物から形成されたスペーサを導入または形成することによって実現される。
図4を参照すると、本発明の非排他的実施形態に従ったシステムコントローラ22のブロック図が示されている。システムコントローラ24は、堆積中、堆積後、および/または、その他の処理動作中に、ALD(またはPEALD)ツール10の動作全体を一般に制御し、処理条件を管理するために用いられる。
適用例1:
原子層堆積(ALD)ツールであって、有機金属前駆体を用いて基板上の有機フォトレジストの上に金属酸化物層を堆積するよう構成されている、ALDツール。
適用例2:
適用例1のALDツールであって、前記金属酸化物層は、1回または複数回のALDサイクル中に前記有機フォトレジストの上に堆積され、各ALDサイクルは、
前記基板上の前記有機フォトレジストの上に前記金属酸化物層を堆積するために前記有機金属前駆体を用いる第1ハーフサイクルと、
前記有機フォトレジストを分解する酸素種を含む第2ハーフサイクルと、
を備える、ALDツール。
適用例3:
適用例2のALDツールであって、前記有機金属前駆体は、3回以内の前記ALDサイクルで前記堆積された金属酸化物層によって前記有機フォトレジストをシールするのに十分な反応性を有する、ALDツール。
適用例4:
適用例2のALDツールであって、前記金属酸化物層は、ALDサイクル当たり1.0オングストローム以上の速度で堆積される、ALDツール。
適用例5:
適用例1のALDツールであって、前記有機金属前駆体は、金属有機スズ前駆体である、ALDツール。
適用例6:
適用例1のALDツールであって、前記有機金属前駆体は、アミノ10タイプの前駆体である、ALDツール。
適用例7:
適用例6のALDツールであって、前記アミノ10タイプの前駆体は、
(a)ジメチルアミノジメチルスズ(Me 2 Sn(NMe 2 ) 2 、
(b)ジメチルアミノトリメチルスズ(Me 3 Sn(MMe 2 )、
(c)テトラキス(ジメチルアミノ)スズ(Sn(Nme 2 ) 4 、
(d)テトラキス(ジエチルアミノ)スズ(Sn(Net 2 )) 4 、または、
(e)その他のアミノ金属有機スズ前駆体、
を含む群から選択される、ALDツール。
適用例8:
適用例1のALDツールであって、前記有機金属前駆体は、メトキシタイプの前駆体である、ALDツール。
適用例9:
適用例8のALDツールであって、前記メトキシタイプの前駆体は、
(a)ジブチルジメトキシスズ(Bu 2 Sn(OMe) 2 )、または、
(b)任意のメトキシまたはエトキシスズ前駆体、
を含む群から選択される、ALDツール。
適用例10:
適用例1のALDツールであって、前記有機フォトレジストは、炭素フォトレジストである、ALDツール。
適用例11:
適用例1のALDツールであって、前記有機フォトレジストは、ポリマフォトレジストである、ALDツール。
適用例12:
適用例1のALDツールであって、前記有機フォトレジストは、炭素マスク膜である、ALDツール。
適用例13:
適用例1のALDツールであって、前記有機フォトレジストは、反射防止層(ARL)である、ALDツール。
適用例14:
適用例1のALDツールであって、前記金属酸化物層は、酸化スズ(SnO 2 )であり、前記有機フォトレジストは、炭素フォトレジストである、ALD。
適用例15:
適用例1のALDツールであって、前記金属酸化物層は、酸化スズ(SnO 2 )であり、前記有機フォトレジストは、炭素反射防止層(ARL)である、ALD。
適用例16:
適用例2のALDツールであって、さらに、
処理チャンバと、
前記処理チャンバ内で前記基板を支持するための基板ペデスタルと、
を備え、
前記1回または複数回のALDサイクルは、前記処理チャンバ内で実行される、ALDツール。
適用例17:
適用例16のALDツールであって、前記ALDツールは、前記処理チャンバ内でプラズマを生成するためのRF源を備えたプラズマ強化ALDツール(PEALD)である、ALDツール。
適用例18:
適用例1のALDツールであって、前記堆積された金属酸化物層は、マルチパターニング処理フローの中で前記基板上にスペーサを形成するために用いられる、ALDツール。
適用例19:
基板に対して実行されるマルチパターニング方法であって、有機金属前駆体を用いて、前記基板上の有機フォトレジストの上に金属酸化物スペーサを形成する工程を備える、方法。
適用例20:
適用例19のマルチパターニング方法であって、前記金属酸化物スペーサを形成する工程は、さらに、
前記基板上にマンドレルを規定するために、フォトリソグラフィを用いて前記有機フォトレジストをパターニングする工程と、
前記基板上の前記マンドレルの上に金属酸化物の層を堆積する工程と、
前記金属酸化物の前記層の略水平面と、前記マンドレルとを前記基板から除去することにより、前記基板上に前記金属酸化物スペーサを形成する工程と、
を含む、方法。
適用例21:
適用例20のマルチパターニング方法であって、さらに、
前記基板上の前記金属酸化物スペーサの上に酸化シリコン(SiO 2 )層を形成する工程と、
前記酸化シリコン(SiO 2 )層の水平部分と、前記金属酸化物スペーサとを除去することにより、前記基板上にSiO 2 スペーサを形成する工程と、
を備える、方法。
適用例22:
適用例21のマルチパターニング方法であって、前記金属酸化物スペーサは、前記マンドレルよりも小さいピッチを有し、前記SiO 2 スペーサは、前記金属酸化物スペーサよりも小さいピッチを有する、方法。
適用例23:
適用例20のマルチパターニング方法であって、前記金属酸化物の層を堆積する工程は、さらに、3回以下の原子層堆積(ALD)サイクルを前記基板に実行する工程を備え、各ALDサイクルは、1.0オングストローム以上の厚さを有する金属酸化物膜をもたらす、方法。
適用例24:
適用例23のマルチパターニング方法であって、各ALDサイクルは、さらに、
第1ハーフサイクル中に、前記金属酸化物膜を堆積して、前記金属酸化物層を形成する工程と、
第2ハーフサイクル中に、前記基板を酸素種に暴露させる工程と、
を含み、
前記第1ハーフサイクル中に堆積された前記金属酸化物膜は、前記第2ハーフサイクル中に前記酸素種が前記マンドレルを分解することを防止するのに役立つ、方法。
適用例25:
適用例21のマルチパターニング方法であって、前記有機金属前駆体は、金属有機スズ前駆体である、方法。
適用例26:
適用例25のマルチパターニング方法であって、前記有機金属前駆体は、アミノ10タイプの前駆体である、方法。
適用例27:
適用例26のマルチパターニング方法であって、前記アミノ10タイプの前駆体は、
(a)ジメチルアミノジメチルスズ(Me 2 Sn(NMe 2 ) 2 、
(b)ジメチルアミノトリメチルスズ(Me 3 Sn(MMe 2 )、
(c)テトラキス(ジメチルアミノ)スズ Sn(Nme 2 ) 4 、
(d)テトラキス(ジエチルアミノ)スズ(Sn(Net 2 )4)、または、
(e)任意の金属有機アミノスズ前駆体、
を含む群から選択される、方法。
適用例28:
適用例21のマルチパターニング方法であって、前記有機金属前駆体は、メトキシタイプの前駆体である、方法。
適用例29:
適用例28のマルチパターニング方法であって、前記メトキシタイプの前駆体は、
(a)ジブチルジメトキシスズ(Bu 2 Sn(OMe) 2 )、
(b)任意のその他のメトキシまたはエトキシスズ前駆体、
を含む群から選択される、方法。
適用例30:
適用例21のマルチパターニング方法であって、前記有機フォトレジストは、
(a)炭素フォトレジスト、
(b)ポリマフォトレジスト、
(c)炭素マスク膜、または、
(d)炭素反射防止層(ARL)、
の内の1つである、方法。
適用例31:
適用例19のマルチパターニング方法であって、前記金属酸化物層は、酸化スズ(SnO 2 )であり、前記有機フォトレジストは、炭素フォトレジストである、方法。
適用例32:
適用例19のマルチパターニング方法であって、前記金属酸化物層は、酸化スズ(SnO 2 )であり、前記フォトレジストは、炭素反射防止層(ARL)である、方法。
適用例33:
適用例23のマルチパターニング方法であって、各ALDサイクルは、室温から125℃までの範囲の温度で実行される、方法。
適用例34:
適用例23のマルチパターニング方法であって、前記第1ハーフサイクル中に、前記金属酸化物膜を堆積する工程は、さらに、毎分0.1〜0.5リットルの範囲の流量で、有機金属前駆体を処理チャンバ内に導入する工程を含む、方法。
適用例35:
適用例34のマルチパターニング方法であって、さらに、前記第1ハーフサイクルの継続時間を1.0〜3.0秒の範囲で定める工程を含む、方法。
適用例36:
適用例1のALDツールであって、前記金属酸化物層は、
(a)酸化スズ、
(b)二酸化チタン、
(c)二酸化ハフニウム、
(d)二酸化ジルコニウム、または、
(e)酸化タンタル、
を含む群から選択される、ALDツール。
適用例37:
適用例19のマルチパターニング方法であって、前記金属酸化物スペーサは、
(a)酸化スズ、
(b)二酸化チタン、
(c)二酸化ハフニウム、
(d)二酸化ジルコニウム、または、
(e)酸化タンタル、
の内の1つを含む、方法。
Claims (37)
- 原子層堆積(ALD)ツールであって、有機金属前駆体を用いて基板上の有機フォトレジストの上に金属酸化物層を堆積するよう構成されている、ALDツール。
- 請求項1に記載のALDツールであって、前記金属酸化物層は、1回または複数回のALDサイクル中に前記有機フォトレジストの上に堆積され、各ALDサイクルは、
前記基板上の前記有機フォトレジストの上に前記金属酸化物層を堆積するために前記有機金属前駆体を用いる第1ハーフサイクルと、
前記有機フォトレジストを分解する酸素種を含む第2ハーフサイクルと、
を備える、ALDツール。 - 請求項2に記載のALDツールであって、前記有機金属前駆体は、3回以内の前記ALDサイクルで前記堆積された金属酸化物層によって前記有機フォトレジストをシールするのに十分な反応性を有する、ALDツール。
- 請求項2に記載のALDツールであって、前記金属酸化物層は、ALDサイクル当たり1.0オングストローム以上の速度で堆積される、ALDツール。
- 請求項1に記載のALDツールであって、前記有機金属前駆体は、金属有機スズ前駆体である、ALDツール。
- 請求項1に記載のALDツールであって、前記有機金属前駆体は、アミノ10タイプの前駆体である、ALDツール。
- 請求項6に記載のALDツールであって、前記アミノ10タイプの前駆体は、
(a)ジメチルアミノジメチルスズ(Me2Sn(NMe2)2、
(b)ジメチルアミノトリメチルスズ(Me3Sn(MMe2)、
(c)テトラキス(ジメチルアミノ)スズ(Sn(Nme2)4、
(d)テトラキス(ジエチルアミノ)スズ(Sn(Net2))4、または、
(e)その他のアミノ金属有機スズ前駆体、
を含む群から選択される、ALDツール。 - 請求項1に記載のALDツールであって、前記有機金属前駆体は、メトキシタイプの前駆体である、ALDツール。
- 請求項8に記載のALDツールであって、前記メトキシタイプの前駆体は、
(a)ジブチルジメトキシスズ(Bu2Sn(OMe)2)、または、
(b)任意のメトキシまたはエトキシスズ前駆体、
を含む群から選択される、ALDツール。 - 請求項1に記載のALDツールであって、前記有機フォトレジストは、炭素フォトレジストである、ALDツール。
- 請求項1に記載のALDツールであって、前記有機フォトレジストは、ポリマフォトレジストである、ALDツール。
- 請求項1に記載のALDツールであって、前記有機フォトレジストは、炭素マスク膜である、ALDツール。
- 請求項1に記載のALDツールであって、前記有機フォトレジストは、反射防止層(ARL)である、ALDツール。
- 請求項1に記載のALDツールであって、前記金属酸化物層は、酸化スズ(SnO2)であり、前記有機フォトレジストは、炭素フォトレジストである、ALD。
- 請求項1に記載のALDツールであって、前記金属酸化物層は、酸化スズ(SnO2)であり、前記有機フォトレジストは、炭素反射防止層(ARL)である、ALD。
- 請求項2に記載のALDツールであって、さらに、
処理チャンバと、
前記処理チャンバ内で前記基板を支持するための基板ペデスタルと、
を備え、
前記1回または複数回のALDサイクルは、前記処理チャンバ内で実行される、ALDツール。 - 請求項16に記載のALDツールであって、前記ALDツールは、前記処理チャンバ内でプラズマを生成するためのRF源を備えたプラズマ強化ALDツール(PEALD)である、ALDツール。
- 請求項1に記載のALDツールであって、前記堆積された金属酸化物層は、マルチパターニング処理フローの中で前記基板上にスペーサを形成するために用いられる、ALDツール。
- 基板に対して実行されるマルチパターニング方法であって、有機金属前駆体を用いて、前記基板上の有機フォトレジストの上に金属酸化物スペーサを形成する工程を備える、方法。
- 請求項19に記載のマルチパターニング方法であって、前記金属酸化物スペーサを形成する工程は、さらに、
前記基板上にマンドレルを規定するために、フォトリソグラフィを用いて前記有機フォトレジストをパターニングする工程と、
前記基板上の前記マンドレルの上に金属酸化物の層を堆積する工程と、
前記金属酸化物の前記層の略水平面と、前記マンドレルとを前記基板から除去することにより、前記基板上に前記金属酸化物スペーサを形成する工程と、
を含む、方法。 - 請求項20に記載のマルチパターニング方法であって、さらに、
前記基板上の前記金属酸化物スペーサの上に酸化シリコン(SiO2)層を形成する工程と、
前記酸化シリコン(SiO2)層の水平部分と、前記金属酸化物スペーサとを除去することにより、前記基板上にSiO2スペーサを形成する工程と、
を備える、方法。 - 請求項21に記載のマルチパターニング方法であって、前記金属酸化物スペーサは、前記マンドレルよりも小さいピッチを有し、前記SiO2スペーサは、前記金属酸化物スペーサよりも小さいピッチを有する、方法。
- 請求項20に記載のマルチパターニング方法であって、前記金属酸化物の層を堆積する工程は、さらに、3回以下の原子層堆積(ALD)サイクルを前記基板に実行する工程を備え、各ALDサイクルは、1.0オングストローム以上の厚さを有する金属酸化物膜をもたらす、方法。
- 請求項23に記載のマルチパターニング方法であって、各ALDサイクルは、さらに、
第1ハーフサイクル中に、前記金属酸化物膜を堆積して、前記金属酸化物層を形成する工程と、
第2ハーフサイクル中に、前記基板を酸素種に暴露させる工程と、
を含み、
前記第1ハーフサイクル中に堆積された前記金属酸化物膜は、前記第2ハーフサイクル中に前記酸素種が前記マンドレルを分解することを防止するのに役立つ、方法。 - 請求項21に記載のマルチパターニング方法であって、前記有機金属前駆体は、金属有機スズ前駆体である、方法。
- 請求項25に記載のマルチパターニング方法であって、前記有機金属前駆体は、アミノ10タイプの前駆体である、方法。
- 請求項26に記載のマルチパターニング方法であって、前記アミノ10タイプの前駆体は、
(a)ジメチルアミノジメチルスズ(Me2Sn(NMe2)2、
(b)ジメチルアミノトリメチルスズ(Me3Sn(MMe2)、
(c)テトラキス(ジメチルアミノ)スズ Sn(Nme2)4、
(d)テトラキス(ジエチルアミノ)スズ(Sn(Net2)4)、または、
(e)任意の金属有機アミノスズ前駆体、
を含む群から選択される、方法。 - 請求項21に記載のマルチパターニング方法であって、前記有機金属前駆体は、メトキシタイプの前駆体である、方法。
- 請求項28に記載のマルチパターニング方法であって、前記メトキシタイプの前駆体は、
(a)ジブチルジメトキシスズ(Bu2Sn(OMe)2)、
(b)任意のその他のメトキシまたはエトキシスズ前駆体、
を含む群から選択される、方法。 - 請求項21に記載のマルチパターニング方法であって、前記有機フォトレジストは、
(a)炭素フォトレジスト、
(b)ポリマフォトレジスト、
(c)炭素マスク膜、または、
(d)炭素反射防止層(ARL)、
の内の1つである、方法。 - 請求項19に記載のマルチパターニング方法であって、前記金属酸化物層は、酸化スズ(SnO2)であり、前記有機フォトレジストは、炭素フォトレジストである、方法。
- 請求項19に記載のマルチパターニング方法であって、前記金属酸化物層は、酸化スズ(SnO2)であり、前記フォトレジストは、炭素反射防止層(ARL)である、方法。
- 請求項23に記載のマルチパターニング方法であって、各ALDサイクルは、室温から125℃までの範囲の温度で実行される、方法。
- 請求項23に記載のマルチパターニング方法であって、前記第1ハーフサイクル中に、前記金属酸化物膜を堆積する工程は、さらに、毎分0.1〜0.5リットルの範囲の流量で、有機金属前駆体を処理チャンバ内に導入する工程を含む、方法。
- 請求項34に記載のマルチパターニング方法であって、さらに、前記第1ハーフサイクルの継続時間を1.0〜3.0秒の範囲で定める工程を含む、方法。
- 請求項1に記載のALDツールであって、前記金属酸化物層は、
(a)酸化スズ、
(b)二酸化チタン、
(c)二酸化ハフニウム、
(d)二酸化ジルコニウム、または、
(e)酸化タンタル、
を含む群から選択される、ALDツール。 - 請求項19に記載のマルチパターニング方法であって、前記金属酸化物スペーサは、
(a)酸化スズ、
(b)二酸化チタン、
(c)二酸化ハフニウム、
(d)二酸化ジルコニウム、または、
(e)酸化タンタル、
の内の1つを含む、方法。
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2019
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WO2020005487A1 (en) | 2020-01-02 |
US20200199751A1 (en) | 2020-06-25 |
CN112334598A (zh) | 2021-02-05 |
US11887846B2 (en) | 2024-01-30 |
US20190390341A1 (en) | 2019-12-26 |
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