JP2021506097A5 - - Google Patents

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Publication number
JP2021506097A5
JP2021506097A5 JP2020550915A JP2020550915A JP2021506097A5 JP 2021506097 A5 JP2021506097 A5 JP 2021506097A5 JP 2020550915 A JP2020550915 A JP 2020550915A JP 2020550915 A JP2020550915 A JP 2020550915A JP 2021506097 A5 JP2021506097 A5 JP 2021506097A5
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JP
Japan
Prior art keywords
layer
rotatable anode
target region
substrate
rotatable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2020550915A
Other languages
English (en)
Japanese (ja)
Other versions
JP2021506097A (ja
JP7309745B2 (ja
Filing date
Publication date
Priority claimed from EP17206337.2A external-priority patent/EP3496128A1/en
Application filed filed Critical
Publication of JP2021506097A publication Critical patent/JP2021506097A/ja
Publication of JP2021506097A5 publication Critical patent/JP2021506097A5/ja
Application granted granted Critical
Publication of JP7309745B2 publication Critical patent/JP7309745B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2020550915A 2017-12-11 2018-12-11 Ｘ線源のための回転式アノード Active JP7309745B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP17206337.2 2017-12-11
EP17206337.2A EP3496128A1 (en) 2017-12-11 2017-12-11 A rotary anode for an x-ray source
PCT/EP2018/084350 WO2019115519A1 (en) 2017-12-11 2018-12-11 A rotary anode for an x-ray source

Publications (3)

Publication Number Publication Date
JP2021506097A JP2021506097A (ja) 2021-02-18
JP2021506097A5 true JP2021506097A5 (cg-RX-API-DMAC7.html) 2023-05-29
JP7309745B2 JP7309745B2 (ja) 2023-07-18

Family

ID=60661807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020550915A Active JP7309745B2 (ja) 2017-12-11 2018-12-11 Ｘ線源のための回転式アノード

Country Status (5)

Country Link
US (1) US11469071B2 (cg-RX-API-DMAC7.html)
EP (2) EP3496128A1 (cg-RX-API-DMAC7.html)
JP (1) JP7309745B2 (cg-RX-API-DMAC7.html)
CN (1) CN111466008B (cg-RX-API-DMAC7.html)
WO (1) WO2019115519A1 (cg-RX-API-DMAC7.html)

Families Citing this family (10)

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Publication number Priority date Publication date Assignee Title
US10845491B2 (en) 2018-06-04 2020-11-24 Sigray, Inc. Energy-resolving x-ray detection system
GB2591630B (en) 2018-07-26 2023-05-24 Sigray Inc High brightness x-ray reflection source
DE112019004478T5 (de) 2018-09-07 2021-07-08 Sigray, Inc. System und verfahren zur röntgenanalyse mit wählbarer tiefe
US11152183B2 (en) 2019-07-15 2021-10-19 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure
CN111048380B (zh) * 2019-12-23 2022-11-04 西北核技术研究院 一种可旋转耐烧蚀强流二极管阳极靶
KR102826464B1 (ko) * 2021-12-22 2025-07-01 주식회사 쎄크 회전 애노드를 구비한 엑스레이 튜브
CN118541772A (zh) 2022-01-13 2024-08-23 斯格瑞公司 用于生成高通量低能量x射线的微焦x射线源
US12360067B2 (en) 2022-03-02 2025-07-15 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources
US12512289B2 (en) * 2023-09-07 2025-12-30 GE Precision Healthcare LLC X-ray tube anode with optimized area focal spot track

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US3982148A (en) 1975-05-07 1976-09-21 Ultramet Heat radiating coating and method of manufacture thereof
US4132916A (en) * 1977-02-16 1979-01-02 General Electric Company High thermal emittance coating for X-ray targets
JPS53102690A (en) * 1977-02-18 1978-09-07 Toshiba Corp Target for x-ray tube
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US4298816A (en) * 1980-01-02 1981-11-03 General Electric Company Molybdenum substrate for high power density tungsten focal track X-ray targets
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FR2593324B1 (fr) * 1986-01-17 1988-03-25 Thomson Cgr Anode tournante avec graphite pour tube radiogene
US5148463A (en) * 1991-11-04 1992-09-15 General Electric Company Adherent focal track structures for X-ray target anodes having diffusion barrier film therein and method of preparation thereof
US5577263A (en) 1995-03-22 1996-11-19 Alliedsignal Inc. Chemical vapor deposition of fine grained rhenium on carbon based substrates
JP2948163B2 (ja) * 1996-02-29 1999-09-13 株式会社東芝 Ｘ線装置
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