JP2021150288A5 - - Google Patents
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- Publication number
- JP2021150288A5 JP2021150288A5 JP2021043245A JP2021043245A JP2021150288A5 JP 2021150288 A5 JP2021150288 A5 JP 2021150288A5 JP 2021043245 A JP2021043245 A JP 2021043245A JP 2021043245 A JP2021043245 A JP 2021043245A JP 2021150288 A5 JP2021150288 A5 JP 2021150288A5
- Authority
- JP
- Japan
- Prior art keywords
- sample
- detection space
- gas
- plasma
- charged particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001514 detection method Methods 0.000 claims 19
- 239000002245 particle Substances 0.000 claims 16
- 238000000034 method Methods 0.000 claims 15
- 239000007789 gas Substances 0.000 claims 11
- 238000010894 electron beam technology Methods 0.000 claims 3
- 238000003384 imaging method Methods 0.000 claims 3
- 230000005684 electric field Effects 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/823,140 US11152189B2 (en) | 2020-03-18 | 2020-03-18 | Method and system for plasma assisted low vacuum charged-particle microscopy |
| US16/823,140 | 2020-03-18 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021150288A JP2021150288A (ja) | 2021-09-27 |
| JP2021150288A5 true JP2021150288A5 (enExample) | 2024-02-22 |
| JP7534050B2 JP7534050B2 (ja) | 2024-08-14 |
Family
ID=74884848
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021043245A Active JP7534050B2 (ja) | 2020-03-18 | 2021-03-17 | プラズマ支援低真空荷電粒子顕微鏡法のための方法およびシステム |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US11152189B2 (enExample) |
| EP (1) | EP3882950A1 (enExample) |
| JP (1) | JP7534050B2 (enExample) |
| CN (1) | CN113495083B (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7383536B2 (ja) * | 2020-03-18 | 2023-11-20 | 株式会社日立ハイテクサイエンス | 粒子ビーム装置及び複合ビーム装置 |
| US20250210303A1 (en) * | 2023-12-21 | 2025-06-26 | Fei Company | Mixed-gas species plasma source system |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4983253A (en) * | 1988-05-27 | 1991-01-08 | University Of Houston-University Park | Magnetically enhanced RIE process and apparatus |
| US5466929A (en) * | 1992-02-21 | 1995-11-14 | Hitachi, Ltd. | Apparatus and method for suppressing electrification of sample in charged beam irradiation apparatus |
| JPH11154479A (ja) * | 1997-11-20 | 1999-06-08 | Hitachi Ltd | ２次電子画像検出方法及びその装置並びに集束荷電粒子ビームによる処理方法及びその装置 |
| US6105589A (en) * | 1999-01-11 | 2000-08-22 | Vane; Ronald A. | Oxidative cleaning method and apparatus for electron microscopes using an air plasma as an oxygen radical source |
| EP2365512A3 (en) * | 2000-06-27 | 2012-01-04 | Ebara Corporation | Inspection system by charged particle beam |
| AU2003275028A1 (en) | 2002-09-18 | 2004-04-08 | Fei Company | Particle-optical device and detection means |
| CN101630623B (zh) * | 2003-05-09 | 2012-02-22 | 株式会社荏原制作所 | 基于带电粒子束的检查装置及采用了该检查装置的器件制造方法 |
| EP2002459B1 (en) * | 2006-03-31 | 2014-11-26 | Fei Company | Improved detector for charged particle beam instrument |
| JP2007280737A (ja) | 2006-04-05 | 2007-10-25 | Horon:Kk | 荷電粒子線検出装置 |
| JP5179253B2 (ja) * | 2008-05-16 | 2013-04-10 | 株式会社日立ハイテクノロジーズ | 電極ユニット、及び荷電粒子線装置 |
| KR101854287B1 (ko) * | 2010-04-07 | 2018-05-03 | 에프이아이 컴파니 | 레이저 및 하전 입자 빔 시스템 결합 |
| JP5890652B2 (ja) * | 2011-10-28 | 2016-03-22 | 株式会社荏原製作所 | 試料観察装置及び試料観察方法 |
| EP2708874A1 (en) * | 2012-09-12 | 2014-03-19 | Fei Company | Method of performing tomographic imaging of a sample in a charged-particle microscope |
| JP5875500B2 (ja) | 2012-10-31 | 2016-03-02 | 株式会社日立ハイテクノロジーズ | 電子ビーム顕微装置 |
| EP2959287A4 (en) | 2013-02-20 | 2016-10-19 | Nano Ltd B | scanning Electron Microscope |
| US10410828B2 (en) * | 2014-12-22 | 2019-09-10 | Carl Zeiss Microscopy, Llc | Charged particle beam system and methods |
| DE102015204091B4 (de) * | 2015-03-06 | 2023-06-07 | Carl Zeiss Microscopy Gmbh | Verfahren und Vorrichtungen zur Ladungskompensation |
| US20180095067A1 (en) * | 2015-04-03 | 2018-04-05 | Abbott Laboratories | Devices and methods for sample analysis |
| US9633816B2 (en) * | 2015-05-18 | 2017-04-25 | Fei Company | Electron beam microscope with improved imaging gas and method of use |
| US9666405B1 (en) * | 2016-02-18 | 2017-05-30 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | System for imaging a signal charged particle beam, method for imaging a signal charged particle beam, and charged particle beam device |
| CN106783493B (zh) | 2016-12-01 | 2018-07-10 | 聚束科技（北京）有限公司 | 一种真空气氛处理装置、样品观测系统及方法 |
| JP2019032940A (ja) | 2017-08-04 | 2019-02-28 | 住友重機械イオンテクノロジー株式会社 | イオン注入装置 |
| CN110006934A (zh) * | 2017-12-28 | 2019-07-12 | Fei 公司 | 通过等离子体聚焦离子束处理生物低温样品的方法、装置和系统 |
-
2020
- 2020-03-18 US US16/823,140 patent/US11152189B2/en active Active
-
2021
- 2021-03-16 EP EP21162792.2A patent/EP3882950A1/en active Pending
- 2021-03-17 CN CN202110285849.8A patent/CN113495083B/zh active Active
- 2021-03-17 JP JP2021043245A patent/JP7534050B2/ja active Active
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