JP2021091042A5 - - Google Patents

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Publication number
JP2021091042A5
JP2021091042A5 JP2019223026A JP2019223026A JP2021091042A5 JP 2021091042 A5 JP2021091042 A5 JP 2021091042A5 JP 2019223026 A JP2019223026 A JP 2019223026A JP 2019223026 A JP2019223026 A JP 2019223026A JP 2021091042 A5 JP2021091042 A5 JP 2021091042A5
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JP
Japan
Prior art keywords
polishing
polished
uneven shape
direction perpendicular
stage
Prior art date
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Application number
JP2019223026A
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Japanese (ja)
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JP7457913B2 (en
JP2021091042A (en
Filing date
Publication date
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Priority to JP2019223026A priority Critical patent/JP7457913B2/en
Priority claimed from JP2019223026A external-priority patent/JP7457913B2/en
Publication of JP2021091042A publication Critical patent/JP2021091042A/en
Publication of JP2021091042A5 publication Critical patent/JP2021091042A5/ja
Application granted granted Critical
Publication of JP7457913B2 publication Critical patent/JP7457913B2/en
Active legal-status Critical Current
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Claims (6)

フィルム状の基材表面に被研磨物を形成した部材を連続的に研磨する研磨装置であって、
被研磨物に作用するための回転可能な研磨工具と、
研磨スラリーを供給するスラリーノズルと、
前記研磨工具を前記被研磨物に押圧するための研磨ステージと、
前記研磨ステージと前記被研磨物との間に液体を噴射する噴射ノズルと、
を備え、
前記研磨ステージの表面には凹凸形状が付与され
前記凹凸形状は、前記研磨ステージの平面視において、前記凹凸形状の長辺が前記被研磨物の進行方向と垂直な方向に対して0°より大きく90°より小さい角度を有する、
研磨装置。
A polishing apparatus for continuously polishing a member having an object to be polished formed on the surface of a film-like base material,
a rotatable abrasive tool for acting on an object to be polished;
a slurry nozzle for supplying abrasive slurry;
a polishing stage for pressing the polishing tool against the object to be polished;
an injection nozzle for injecting a liquid between the polishing stage and the object to be polished;
with
The surface of the polishing stage is provided with an uneven shape ,
In the planar view of the polishing stage, the long side of the uneven shape has an angle of greater than 0° and less than 90° with respect to a direction perpendicular to the direction of movement of the object to be polished.
polishing equipment.
前記噴射ノズルは、前記凹凸形状の凹部にノズルが沿うようにして配置される、
請求項1に記載の研磨装置。
The injection nozzle is arranged so that the nozzle is aligned with the recessed portion of the uneven shape.
The polishing apparatus according to claim 1.
前記凹凸形状は、前記被研磨物の進行方向と垂直な方向に対して、前記凹凸形状の長辺が前記進行方向に垂直な方向となす鋭角の大きさは、前記凹凸形状の短辺が前記進行方向に垂直な方向となす鋭角の大きさより小さい、
請求項1または2に記載の研磨装置。
With respect to a direction perpendicular to the direction of movement of the object to be polished, the size of the acute angle formed by the long side of the uneven shape with the direction perpendicular to the direction of movement of the uneven shape is such that the short side of the uneven shape less than the magnitude of the acute angle made with the direction perpendicular to the direction of travel,
3. A polishing apparatus according to claim 1 or 2 .
前記凹凸形状は、長辺と短辺のうち、前記被研磨物の進行方向と垂直な方向に対して角度の小さい辺同士の間隔が、他方の辺同士の間隔より大きい、
請求項1からのいずれか一項に記載の研磨装置。
Among the long and short sides of the uneven shape, the interval between the sides having a small angle with respect to the direction perpendicular to the direction of movement of the object to be polished is larger than the interval between the other sides.
A polishing apparatus according to any one of claims 1 to 3 .
前記凹凸形状は、前記研磨ステージの端部側に比べ、前記研磨ステージの中央部側のほうが、前記凹凸形状の長辺が、前記被研磨物の進行方向と垂直な方向に対する角度が小さい、
請求項1からのいずれか一項に記載の研磨装置。
In the uneven shape, the long side of the uneven shape has a smaller angle with respect to the direction perpendicular to the traveling direction of the object to be polished on the central portion side of the polishing stage than on the end portion side of the polishing stage.
A polishing apparatus according to any one of claims 1 to 4 .
請求項1からのいずれか一項に記載の研磨装置を用いて、被研磨物の研磨を行う研磨方法。 A polishing method for polishing an object to be polished using the polishing apparatus according to any one of claims 1 to 5 .
JP2019223026A 2019-12-10 2019-12-10 Polishing equipment and polishing method Active JP7457913B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2019223026A JP7457913B2 (en) 2019-12-10 2019-12-10 Polishing equipment and polishing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019223026A JP7457913B2 (en) 2019-12-10 2019-12-10 Polishing equipment and polishing method

Publications (3)

Publication Number Publication Date
JP2021091042A JP2021091042A (en) 2021-06-17
JP2021091042A5 true JP2021091042A5 (en) 2022-12-01
JP7457913B2 JP7457913B2 (en) 2024-03-29

Family

ID=76311358

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019223026A Active JP7457913B2 (en) 2019-12-10 2019-12-10 Polishing equipment and polishing method

Country Status (1)

Country Link
JP (1) JP7457913B2 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002166342A (en) 2000-11-30 2002-06-11 Toppan Printing Co Ltd Lengthy metal sheet polishing device
US20100258173A1 (en) 2009-04-13 2010-10-14 Joseph Laia Polishing a thin metallic substrate for a solar cell

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