JP2020529940A - 印刷システム及びその書込みモジュール - Google Patents

印刷システム及びその書込みモジュール Download PDF

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Publication number
JP2020529940A
JP2020529940A JP2020507075A JP2020507075A JP2020529940A JP 2020529940 A JP2020529940 A JP 2020529940A JP 2020507075 A JP2020507075 A JP 2020507075A JP 2020507075 A JP2020507075 A JP 2020507075A JP 2020529940 A JP2020529940 A JP 2020529940A
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JP
Japan
Prior art keywords
printing system
polymer
imaging surface
light
light source
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Pending
Application number
JP2020507075A
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English (en)
Japanese (ja)
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JP2020529940A5 (enExample
Inventor
ルビン ベン ハイム ニル
ルビン ベン ハイム ニル
ナグラー マイケル
ナグラー マイケル
ケレン アブラハム
ケレン アブラハム
アクニン オフェル
アクニン オフェル
ランダ ベンジョン
ランダ ベンジョン
Original Assignee
ランダ ラブズ （２０１２） リミテッド
ランダ ラブズ （２０１２） リミテッド
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Application filed by ランダ ラブズ （２０１２） リミテッド, ランダ ラブズ （２０１２） リミテッド filed Critical ランダ ラブズ （２０１２） リミテッド
Publication of JP2020529940A publication Critical patent/JP2020529940A/ja
Publication of JP2020529940A5 publication Critical patent/JP2020529940A5/ja
Priority to JP2022148364A priority Critical patent/JP2022188090A/ja
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B29C64/264—Arrangements for irradiation
    • B29C64/268—Arrangements for irradiation using laser beams; using electron beams [EB]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/0057—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material where an intermediate transfer member receives the ink before transferring it on the printing material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/447—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/447—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
    • B41J2/45—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources using light-emitting diode [LED] or laser arrays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/447—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
    • B41J2/455—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources using laser arrays, the laser array being smaller than the medium to be recorded
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/025—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/025—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
    • B41M5/0256—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet the transferable ink pattern being obtained by means of a computer driven printer, e.g. an ink jet or laser printer, or by electrographic means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/025—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
    • B41M5/03—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet by pressure
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0087—Simple or compound lenses with index gradient
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/06—Simple or compound lenses with non-spherical faces with cylindrical or toric faces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/01—Apparatus for electrographic processes using a charge pattern for producing multicoloured copies
    • G03G15/0142—Structure of complete machines
    • G03G15/0178—Structure of complete machines using more than one reusable electrographic recording member, e.g. one for every monocolour image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/04—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material
    • G03G15/04036—Details of illuminating systems, e.g. lamps, reflectors
    • G03G15/04045—Details of illuminating systems, e.g. lamps, reflectors for exposing image information provided otherwise than by directly projecting the original image onto the photoconductive recording material, e.g. digital copiers
    • G03G15/04072—Details of illuminating systems, e.g. lamps, reflectors for exposing image information provided otherwise than by directly projecting the original image onto the photoconductive recording material, e.g. digital copiers by laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/06—Apparatus for electrographic processes using a charge pattern for developing
    • G03G15/10—Apparatus for electrographic processes using a charge pattern for developing using a liquid developer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/22—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20
    • G03G15/34—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the powder image is formed directly on the recording material, e.g. by using a liquid toner
    • G03G15/342—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the powder image is formed directly on the recording material, e.g. by using a liquid toner by forming a uniform powder layer and then removing the non-image areas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/024—Arrangements for thermal management
    • H01S5/02469—Passive cooling, e.g. where heat is removed by the housing as a whole or by a heat pipe without any active cooling element like a TEC
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H01S5/18322—Position of the structure
    • H01S5/1833—Position of the structure with more than one structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4018—Lasers electrically in series
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42—Arrays of surface emitting lasers
    • H01S5/423—Arrays of surface emitting lasers having a vertical cavity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42—Arrays of surface emitting lasers
    • H01S5/423—Arrays of surface emitting lasers having a vertical cavity
    • H01S5/426—Vertically stacked cavities
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18383—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] with periodic active regions at nodes or maxima of light intensity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18397—Plurality of active layers vertically stacked in a cavity for multi-wavelength emission

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Electronic Switches (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Printing Methods (AREA)
  • Semiconductor Lasers (AREA)
JP2020507075A 2017-08-08 2018-08-08 印刷システム及びその書込みモジュール Pending JP2020529940A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022148364A JP2022188090A (ja) 2017-08-08 2022-09-16 印刷システム及びその書込みモジュール

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB1712726.7A GB201712726D0 (en) 2017-08-08 2017-08-08 Electric current and heat mitigation in a printing machine writing module
GB1712726.7 2017-08-08
PCT/IB2018/055971 WO2019030694A1 (en) 2017-08-08 2018-08-08 PRINTING SYSTEM AND WRITING MODULE

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022148364A Division JP2022188090A (ja) 2017-08-08 2022-09-16 印刷システム及びその書込みモジュール

Publications (2)

Publication Number Publication Date
JP2020529940A true JP2020529940A (ja) 2020-10-15
JP2020529940A5 JP2020529940A5 (enExample) 2021-08-19

Family

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Family Applications (2)

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JP2020507075A Pending JP2020529940A (ja) 2017-08-08 2018-08-08 印刷システム及びその書込みモジュール
JP2022148364A Pending JP2022188090A (ja) 2017-08-08 2022-09-16 印刷システム及びその書込みモジュール

Family Applications After (1)

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JP2022148364A Pending JP2022188090A (ja) 2017-08-08 2022-09-16 印刷システム及びその書込みモジュール

Country Status (7)

Country Link
US (1) US11865782B2 (enExample)
EP (1) EP3665015B1 (enExample)
JP (2) JP2020529940A (enExample)
CN (1) CN110997330B (enExample)
ES (1) ES2902045T3 (enExample)
GB (1) GB201712726D0 (enExample)
WO (1) WO2019030694A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
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JP2023031262A (ja) * 2021-08-23 2023-03-08 パロ アルト リサーチ センター インコーポレイテッド 印刷システムのための半導体アレイイメージャー

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* Cited by examiner, † Cited by third party
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EP3842864B1 (en) * 2019-12-23 2022-08-03 Cubicure GmbH Systems and methods for lithography-based additive manufacturing three-dimensional (3d) structures
CN112531461A (zh) * 2020-12-30 2021-03-19 江西铭德半导体科技有限公司 一种可控横向光场的多结型半导体激光器及其制造方法
US12300969B2 (en) * 2021-01-20 2025-05-13 Sony Group Corporation Surface emitting laser, electronic device, and method for manufacturing surface emitting laser
FR3124030A1 (fr) * 2021-06-09 2022-12-16 Sidel Participations Emetteur laser pour station de chauffage
CN113591300B (zh) * 2021-07-29 2024-03-15 深圳市创想三维科技股份有限公司 3d打印文件的生成方法、装置、计算机设备和存储介质
US20230054034A1 (en) * 2021-08-23 2023-02-23 Palo Alto Research Center Incorporated 3d package for semiconductor thermal management
US11984701B2 (en) * 2021-08-23 2024-05-14 Xerox Corporation System for electronically controlling and driving independently addressable semiconductor lasers
US12366815B2 (en) * 2021-08-23 2025-07-22 Xerox Corporation Focusing optics for use with semiconductor lasers for imaging applications
US20230056905A1 (en) * 2021-08-23 2023-02-23 Palo Alto Research Center Incorporated Independently-addressable high power surface-emitting laser array with tight-pitch packing
TWI785780B (zh) 2021-09-06 2022-12-01 虹光精密工業股份有限公司 發光晶片打件偏差之調節方法及列印頭
CN113733546A (zh) * 2021-09-13 2021-12-03 数造科技(湖南)有限公司 一种3d发光字打印的自动化一体成型设备及方法
CN116277938A (zh) * 2023-02-09 2023-06-23 京东方科技集团股份有限公司 一种光固化3d打印机及打印方法
FR3149229B1 (fr) * 2023-05-31 2025-04-25 Sidel Participations Unité de traitement thermique de préformes comprenant des éléments de chauffage connectés en série
WO2025057054A1 (en) 2023-09-11 2025-03-20 Landa Labs (2012) Ltd Method and apparatus for 3d printing
GB2633405A (en) * 2023-09-11 2025-03-12 Landa Labs 2012 Ltd Method an apparatus for 3D printing

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61118273A (ja) * 1984-11-15 1986-06-05 Erumu:Kk レ−ザ−式インクジエツトプリンタ
JPH03114341U (enExample) * 1990-03-12 1991-11-25
US6493371B1 (en) * 1998-04-14 2002-12-10 Bandwidth9, Inc. Vertical cavity apparatus with tunnel junction
JP2004098685A (ja) * 2002-09-06 2004-04-02 Heidelberger Druckmas Ag 被印刷体に画像を印刷する方法、および印刷インキ担体にエネルギーを注入する装置
JP2004122512A (ja) * 2002-10-01 2004-04-22 Sanyo Electric Co Ltd プリントヘッド
JP2006351798A (ja) * 2005-06-15 2006-12-28 Fuji Xerox Co Ltd トンネル接合型面発光半導体レーザ装置およびその製造方法
JP2007158347A (ja) * 2005-12-05 2007-06-21 Osram Opto Semiconductors Gmbh 半導体素子およびレーザデバイス
JP2007251031A (ja) * 2006-03-17 2007-09-27 Furukawa Electric Co Ltd:The 半導体発光素子及びその製造方法
JP2009260205A (ja) * 2008-03-17 2009-11-05 Ricoh Co Ltd 光源装置、光走査装置及び画像形成装置
WO2016189510A1 (en) * 2015-05-27 2016-12-01 Landa Labs (2012) Ltd. Imaging device
JP2017501052A (ja) * 2013-12-17 2017-01-12 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． レーザ印刷システム

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5600363A (en) * 1988-12-28 1997-02-04 Kyocera Corporation Image forming apparatus having driving means at each end of array and power feeding substrate outside head housing
US5572540A (en) * 1992-08-11 1996-11-05 University Of New Mexico Two-dimensional opto-electronic switching arrays
AUPO799197A0 (en) 1997-07-15 1997-08-07 Silverbrook Research Pty Ltd Image processing method and apparatus (ART01)
FR2761537B1 (fr) 1997-04-01 1999-06-11 Thomson Csf Laser comprenant un empilement de diodes laser epitaxiees compris entre deux miroirs de bragg
US6487230B1 (en) * 1998-04-14 2002-11-26 Bandwidth 9, Inc Vertical cavity apparatus with tunnel junction
US6635861B1 (en) * 1998-10-22 2003-10-21 Wavefront Research, Inc. Relaxed tolerance optical interconnect system having a GRIN rod lens
US6863444B2 (en) * 2000-12-26 2005-03-08 Emcore Corporation Housing and mounting structure
US6799902B2 (en) * 2000-12-26 2004-10-05 Emcore Corporation Optoelectronic mounting structure
US20030057363A1 (en) * 2000-12-26 2003-03-27 Anderson Gene R. Optical power control system
GB0121308D0 (en) * 2001-09-03 2001-10-24 Thomas Swan & Company Ltd Optical processing
JP2003080761A (ja) * 2001-09-12 2003-03-19 Fuji Xerox Co Ltd 画像形成方法及び装置
US6771680B2 (en) * 2002-10-22 2004-08-03 Agilent Technologies, Inc Electrically-pumped, multiple active region vertical-cavity surface-emitting laser (VCSEL)
US7796885B2 (en) * 2002-11-05 2010-09-14 Lightfleet Corporation Distribution optical elements and compound collecting lenses for broadcast optical interconnect
US6936486B2 (en) 2002-11-19 2005-08-30 Jdsu Uniphase Corporation Low voltage multi-junction vertical cavity surface emitting laser
US7936953B2 (en) * 2005-07-15 2011-05-03 Xyratex Technology Limited Optical printed circuit board and manufacturing method
JP4697077B2 (ja) * 2006-07-12 2011-06-08 日立電線株式会社 光モジュール
JP5144243B2 (ja) * 2006-12-28 2013-02-13 富士フイルム株式会社 画像形成方法及び画像形成装置
CN101742980B (zh) * 2007-08-06 2014-04-16 花王株式会社 液体涂敷装置
DE602007011610D1 (de) * 2007-09-14 2011-02-10 Punch Graphix Int Nv Lichtemittierendes Array zum Drucken oder Kopieren
DE102008030818B4 (de) * 2008-06-30 2022-03-03 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Oberflächenemittierender Halbleiterlaser mit mehreren aktiven Zonen
CN102461340B (zh) 2009-05-14 2014-10-22 4233999加拿大股份有限公司 利用发光二极管单片阵列来提供高分辨率图像的系统和方法
US9160450B2 (en) * 2011-09-23 2015-10-13 Te Connectivity Nederland B.V. Multi-channel transceiver
JP2013165188A (ja) 2012-02-10 2013-08-22 Oki Data Corp 半導体発光装置、光源装置、画像形成装置及び画像表示装置
JP2015524756A (ja) * 2012-06-15 2015-08-27 ハイデルベルガー ドルツクマシーネン アクチエンゲゼルシヤフトＨｅｉｄｅｌｂｅｒｇｅｒ Ｄｒｕｃｋｍａｓｃｈｉｎｅｎ ＡＧ 印刷液を被印刷物に間接的に転写する方法
US9573360B2 (en) * 2013-09-09 2017-02-21 Xerox Corporation Thermally conductive aqueous transfix blanket
NZ727729A (en) * 2014-05-17 2017-11-24 Sun Tool Corp Roller transfer application method and application device for hot-melt adhesive
US20160072258A1 (en) 2014-09-10 2016-03-10 Princeton Optronics Inc. High Resolution Structured Light Source
JP2016078238A (ja) 2014-10-09 2016-05-16 株式会社リコー プリントヘッド及び画像形成装置
GB201509080D0 (en) * 2015-05-27 2015-07-08 Landa Labs 2012 Ltd Coating apparatus
IL255934B (en) 2015-05-27 2022-08-01 Landa Labs 2012 Ltd Method and apparatus for applying a polymer film to regions of the surface of a substrate
US10913835B2 (en) * 2016-11-30 2021-02-09 Landa Labs (2012) Ltd. Thermal transfer printing
US11125664B2 (en) 2017-12-04 2021-09-21 Montana Instruments Corporation Analytical instruments, methods, and components
US10509128B1 (en) * 2019-04-12 2019-12-17 K Laser Technology, Inc. Programmable pattern optical projector for depth detection

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61118273A (ja) * 1984-11-15 1986-06-05 Erumu:Kk レ−ザ−式インクジエツトプリンタ
JPH03114341U (enExample) * 1990-03-12 1991-11-25
US6493371B1 (en) * 1998-04-14 2002-12-10 Bandwidth9, Inc. Vertical cavity apparatus with tunnel junction
JP2004098685A (ja) * 2002-09-06 2004-04-02 Heidelberger Druckmas Ag 被印刷体に画像を印刷する方法、および印刷インキ担体にエネルギーを注入する装置
JP2004122512A (ja) * 2002-10-01 2004-04-22 Sanyo Electric Co Ltd プリントヘッド
JP2006351798A (ja) * 2005-06-15 2006-12-28 Fuji Xerox Co Ltd トンネル接合型面発光半導体レーザ装置およびその製造方法
JP2007158347A (ja) * 2005-12-05 2007-06-21 Osram Opto Semiconductors Gmbh 半導体素子およびレーザデバイス
JP2007251031A (ja) * 2006-03-17 2007-09-27 Furukawa Electric Co Ltd:The 半導体発光素子及びその製造方法
JP2009260205A (ja) * 2008-03-17 2009-11-05 Ricoh Co Ltd 光源装置、光走査装置及び画像形成装置
JP2017501052A (ja) * 2013-12-17 2017-01-12 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． レーザ印刷システム
WO2016189510A1 (en) * 2015-05-27 2016-12-01 Landa Labs (2012) Ltd. Imaging device
US20170075226A1 (en) * 2015-05-27 2017-03-16 Landa Labs (2012) Ltd. Imaging Device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023031262A (ja) * 2021-08-23 2023-03-08 パロ アルト リサーチ センター インコーポレイテッド 印刷システムのための半導体アレイイメージャー

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