JP2007158347A - 半導体素子およびレーザデバイス - Google Patents
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Abstract
【解決手段】本発明による半導体素子は、垂直な放出方向を有する面放出型の半導体素子として構成され、放射放出に適しており相互に離隔されて配置された複数の活性領域を有する半導体ボディを備えており、2つの活性領域間にトンネル接合部が該半導体ボディにモノリシック集積化されており、両活性領域はトンネル接合部によって該半導体素子の動作中に導電接続され、該半導体素子は、外部の共振器とともに動作するように構成されている。
【選択図】図1
Description
Claims (25)
- 垂直な放出方向を有する面放出型の半導体素子(1)において、
放射生成に適しており相互に離隔されて配置された複数の活性領域(4a,4b)を有する半導体ボディ(2)を備えており、
2つの活性領域間にトンネル接合部(5)が該半導体ボディにモノリシック集積化されており、
両活性領域は該トンネル接合部によって該半導体素子の動作中に導電接続され、
該半導体素子は、外部共振器とともに動作するように構成されていることを特徴とする、半導体素子。 - 2つの活性領域(4a,4b)は、前記外部共振器内で共通の動作を行うための増幅領域として設けられている、請求項1記載の半導体素子。
- 電気ポンピングされる半導体素子として動作するように構成されている、請求項1または2記載の半導体素子。
- 前記外部共振器を構成する内部ミラーを有する、請求項1から3までのいずれか1項記載の半導体素子。
- ポンプ電流は前記内部ミラー(8)を流れる、請求項4記載の半導体素子。
- 前記内部ミラー(8)はブラッグミラーとして形成されている、請求項4または5記載の半導体素子。
- 前記ブラッグミラー(8)と該ブラッグミラー(8)に隣接する活性領域(4a,4b)との間に、別のトンネル接合部(21)が配置されている、請求項6記載の半導体素子。
- 前記半導体ボディ(2)は、該半導体素子(1)の動作中に前記外部共振器内に形成される放射フィールドが、前記トンネル接合部内で強度結合点を有するように構成されている、請求項1から7までのいずれか1項記載の半導体素子。
- 2つの活性領域(4a,4b)は量子井戸構造を有する、請求項1から8までのいずれか1項記載の半導体素子。
- 前記トンネル接合部(5)は、異なる伝導型の2つのトンネル半導体層を有する、請求項1から9までのいずれか1項記載の半導体素子。
- 前記外部共振器に、周波数変換素子(14)を配置できるように構成されている、請求項1から10までのいずれか1項記載の半導体素子。
- 周波数選択素子(22)が前記半導体ボディに形成されている、請求項1から11までのいずれか1項記載の半導体素子。
- 前記周波数選択素子(22)は2つの活性領域(4a,4b)間に配置されている、請求項12記載の半導体素子。
- 前記周波数選択素子(22)は前記半導体ボディにモノリシック集積化されている、請求項12または13記載の半導体素子。
- 前記トンネル接合部(5)は前記周波数選択素子(22)によって包囲されている、請求項12から14までのいずれか1項記載の半導体素子。
- 前記周波数選択素子(22)は、該周波数選択素子(22)内部の強度が低減されるように構成されている、請求項12から15までのいずれか1項記載の半導体素子。
- 前記周波数選択素子(22)はブラッグミラー(23)を有する、請求項12から16までのいずれか1項記載の半導体素子。
- 前記周波数選択素子(22)は別のブラッグミラー(24)を有する、請求項17記載の半導体素子。
- 前記ブラッグミラー(23)および/または前記別のブラッグミラー(24)の反射率は95%以下であり、有利には90%以下であり、特に有利には80%以下である、請求項17または18記載の半導体素子。
- 2つの活性領域(4a,4b)間において、電流遮蔽部(25)が前記半導体ボディ(2)に形成されている、請求項1から8までのいずれか1項記載の半導体素子。
- 前記トンネル接合部(5)は両ブラッグミラー(23,24)間に配置されている、請求項18から20までのいずれか1項記載の半導体素子。
- 両ブラッグミラー(23,24)は異なる伝導型を有する、請求項18から21までのいずれか1項記載の半導体素子。
- 前記半導体ボディはIII‐V族半導体材料を含んでおり、たとえば、InxGayAl1−x−yP、InxGayAl1−x−yNまたはInxGayAl1−x−yAsのIII‐V族半導体材料体系から成る材料を含み、ここではそれぞれ、0≦x≦1、0≦y≦1およびx+y≦1である、請求項1から22までのいずれか1項記載の半導体素子。
- 前記半導体ボディはIII‐V族半導体材料を含んでおり、たとえば、InGaAsN、InGaAsSb、InGaAsSbNまたはInxGa1−xASyP1−yのIII‐V族半導体材料体系から成る材料を含み、ここではそれぞれ、0≦x≦1、0≦y≦1である、請求項1から23までのいずれか1項記載の半導体素子。
- 請求項1から24までのいずれか1項記載の半導体素子(1)を有し、
該半導体素子に所属する外部ミラー(13)によって構成される外部共振器を有することを特徴とする、レーザデバイス。
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DE102005058009.2 | 2005-12-05 | ||
DE102005058009 | 2005-12-05 | ||
DE102006010728.4 | 2006-03-08 | ||
DE102006010728A DE102006010728A1 (de) | 2005-12-05 | 2006-03-08 | Halbleiterbauelement und Laservorrichtung |
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JP2007158347A true JP2007158347A (ja) | 2007-06-21 |
JP5199568B2 JP5199568B2 (ja) | 2013-05-15 |
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EP (1) | EP1793462B1 (ja) |
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DE (2) | DE102006010728A1 (ja) |
Cited By (5)
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JP2009016825A (ja) * | 2007-06-29 | 2009-01-22 | Osram Opto Semiconductors Gmbh | 多重ビーム−レーザダイオードとしての構造を有するモノリシック集積型レーザダイオードチップ |
JP2012099647A (ja) * | 2010-11-02 | 2012-05-24 | Canon Inc | 垂直共振器型面発光レーザ、画像形成装置 |
US9466945B2 (en) | 2014-10-03 | 2016-10-11 | Fuji Xerox Co., Ltd. | Surface-emitting semiconductor laser device and method for producing the same |
WO2017122611A1 (ja) * | 2016-01-14 | 2017-07-20 | 株式会社アマダミヤチ | レーザ装置 |
JP2020529940A (ja) * | 2017-08-08 | 2020-10-15 | ランダ ラブズ (2012) リミテッド | 印刷システム及びその書込みモジュール |
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- 2006-12-05 US US11/634,461 patent/US8254426B2/en not_active Expired - Fee Related
- 2006-12-05 DE DE502006003077T patent/DE502006003077D1/de active Active
- 2006-12-05 JP JP2006328596A patent/JP5199568B2/ja not_active Expired - Fee Related
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JP2009016825A (ja) * | 2007-06-29 | 2009-01-22 | Osram Opto Semiconductors Gmbh | 多重ビーム−レーザダイオードとしての構造を有するモノリシック集積型レーザダイオードチップ |
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US8374205B2 (en) | 2010-11-02 | 2013-02-12 | Canon Kabushiki Kaisha | Vertical cavity surface emitting laser and image forming apparatus |
US9466945B2 (en) | 2014-10-03 | 2016-10-11 | Fuji Xerox Co., Ltd. | Surface-emitting semiconductor laser device and method for producing the same |
WO2017122611A1 (ja) * | 2016-01-14 | 2017-07-20 | 株式会社アマダミヤチ | レーザ装置 |
JPWO2017122611A1 (ja) * | 2016-01-14 | 2018-08-09 | 株式会社アマダミヤチ | レーザ装置 |
JP2020529940A (ja) * | 2017-08-08 | 2020-10-15 | ランダ ラブズ (2012) リミテッド | 印刷システム及びその書込みモジュール |
Also Published As
Publication number | Publication date |
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DE102006010728A1 (de) | 2007-06-06 |
US8254426B2 (en) | 2012-08-28 |
JP5199568B2 (ja) | 2013-05-15 |
US20070153867A1 (en) | 2007-07-05 |
DE502006003077D1 (de) | 2009-04-23 |
EP1793462A1 (de) | 2007-06-06 |
EP1793462B1 (de) | 2009-03-11 |
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