JP2020522124A - 層を介し光の位相及び振幅を計測する装置及び方法 - Google Patents
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
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- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
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- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
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- Testing Or Measuring Of Semiconductors Or The Like (AREA)
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Abstract
Description
本願では先行出願たるAbdurrahman (Apo) Sezginer et al.名義の2017年5月26日付米国仮特許出願第62/511444号の利益を主張しており、参照により同出願の全容が目的を問わず本願に繰り入れられている。
Claims (24)
- 移相ターゲットを有するフォトマスクの移相量を判別する方法であって、
検査又は計量システムを用い入射ビームを前記ターゲットへと差し向けるステップと、
前記入射ビームに応じた前記ターゲット内透過による複数個の強度値を前記検査又は計量システムを用い計測するステップと、
前記強度計測値に基づき前記ターゲットに係る移相量の値を判別して格納するステップと、
を有する方法。 - 請求項1に記載の方法であって、前記ターゲットが、基板上に堆積された移相層で形成された第1部分と、そこからその移相層が除去された第2部分と、を備え、それら第1及び第2部分が、それぞれ、前記入射ビームの照明野を完全に満たすサイズを有する方法。
- 請求項2に記載の方法であって、前記ターゲットが、更に、前記移相層内にエッチング形成された1個又は複数個の格子が備わる第3部分を備え、結像回折次数毎に前記強度計測値が取得される方法。
- 請求項3に記載の方法であって、前記第3部分が2個以上の格子を備える方法。
- 請求項3に記載の方法であって、前記1個又は複数個の格子が、前記移相層からエッチング形成された複数本の線で形成されている方法。
- 請求項3に記載の方法であって、前記1個又は複数個の格子が、前記移相層からエッチング形成された孔又はピラー(柱)の二次元アレイで形成されている方法。
- 請求項1に記載の方法であって、更に、前記入射ビームに応じた前記ターゲットでの反射による複数個の反射強度値を計測するステップを有し、前記移相量の値がそれら反射強度値にも基づく方法。
- 請求項1に記載の方法であって、前記強度計測値がベルトランレンズを用い瞳像から取得される方法。
- 請求項8に記載の方法であって、差し向ける動作及び計測する動作がレティクル検査システムによって実行される方法。
- 請求項9に記載の方法であって、前記検査システムが対物系を備え、その対物系の瞳像から前記強度計測値が取得される方法。
- 請求項10に記載の方法であって、前記対物系が反射又は屈折素子である方法。
- 請求項1に記載の方法であって、それにより計算される強度値と前記強度計測値との間の差分が最小化されるまで強度値計算モデルのパラメタ複数個を調整し、その上でそれらモデルパラメタに係る最終値に基づきそのモデルを用い移相量を判別することによって、前記移相量が判別される方法。
- 移相ターゲットを有するフォトマスクの移相量を判別するシステムであって、
入射ビームを前記ターゲットへと差し向ける照明光学系と、
前記入射ビームに応じた前記ターゲット内透過による複数個の強度値を計測する集光光学系と、
前記強度計測値に基づき前記ターゲットに係る移相量の値を判別して格納するよう構成されたコントローラと、
を備えるシステム。 - 請求項13に記載のシステムであって、ターゲットが、基板上に堆積された移相層で形成された第1部分と、そこからその移相層が除去された第2部分と、を備え、それら第1及び第2部分が、それぞれ、前記入射ビームの照明野を完全に満たすサイズを有するシステム。
- 請求項14に記載のシステムであって、前記ターゲットが、更に、前記移相層内にエッチング形成された1個又は複数個の格子が備わる第3部分を備え、結像回折次数毎に前記強度計測値が取得されるシステム。
- 請求項15に記載のシステムであって、前記第3部分が2個以上の格子を備えるシステム。
- 請求項15に記載のシステムであって、前記1個又は複数個の格子が、前記移相層からエッチング形成された複数本の線で形成されているシステム。
- 請求項15に記載のシステムであって、前記1個又は複数個の格子が、前記移相層からエッチング形成された孔又はピラー(柱)の二次元アレイで形成されているシステム。
- 請求項13に記載のシステムであって、前記コントローラが、更に、前記入射ビームに応じた前記ターゲットでの反射による複数個の反射強度値を計測するよう構成されており、前記移相量の値がそれら反射強度値にも基づくシステム。
- 請求項13に記載のシステムであって、前記強度計測値がベルトランレンズを用い瞳像から取得されるシステム。
- 請求項20に記載のシステムであって、レティクル検査システムの形態を採るシステム。
- 請求項21に記載のシステムであって、前記検査システムが更に対物系を備え、その対物系の瞳像から前記強度計測値が取得されるシステム。
- 請求項22に記載のシステムであって、前記対物系が反射又は屈折素子であるシステム。
- 請求項13に記載のシステムであって、それにより計算される強度値と前記強度計測値との間の差分が最小化されるまで強度値計算モデルのパラメタ複数個を調整し、その上でそれらモデルパラメタに係る最終値に基づきそのモデルを用い移相量を判別することによって、前記移相量が判別されるシステム。
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US201762511444P | 2017-05-26 | 2017-05-26 | |
US62/511,444 | 2017-05-26 | ||
US15/882,951 | 2018-01-29 | ||
US15/882,951 US11131629B2 (en) | 2017-05-26 | 2018-01-29 | Apparatus and methods for measuring phase and amplitude of light through a layer |
PCT/US2018/034521 WO2018218092A1 (en) | 2017-05-26 | 2018-05-25 | Apparatus and methods for measuring phase and amplitude of light through a layer |
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KR102622710B1 (ko) | 2024-01-08 |
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EP3593209A1 (en) | 2020-01-15 |
US20180340886A1 (en) | 2018-11-29 |
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