JP2020516024A5 - - Google Patents

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Publication number
JP2020516024A5
JP2020516024A5 JP2019553120A JP2019553120A JP2020516024A5 JP 2020516024 A5 JP2020516024 A5 JP 2020516024A5 JP 2019553120 A JP2019553120 A JP 2019553120A JP 2019553120 A JP2019553120 A JP 2019553120A JP 2020516024 A5 JP2020516024 A5 JP 2020516024A5
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Japan
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field
plasma source
plasma
magnetic field
frequency
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JP2019553120A
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Japanese (ja)
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JP7115759B2 (ja
JP2020516024A (ja
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Priority claimed from GBGB1705202.8A external-priority patent/GB201705202D0/en
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JP2019553120A 2017-03-31 2018-03-23 プラズマを遠隔検知するためのシステムおよび方法 Active JP7115759B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB1705202.8 2017-03-31
GBGB1705202.8A GB201705202D0 (en) 2017-03-31 2017-03-31 System and method for remote sensing a plasma
PCT/EP2018/057556 WO2018177965A1 (en) 2017-03-31 2018-03-23 System and method for remote sensing a plasma

Publications (3)

Publication Number Publication Date
JP2020516024A JP2020516024A (ja) 2020-05-28
JP2020516024A5 true JP2020516024A5 (https=) 2021-11-11
JP7115759B2 JP7115759B2 (ja) 2022-08-09

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JP2019553120A Active JP7115759B2 (ja) 2017-03-31 2018-03-23 プラズマを遠隔検知するためのシステムおよび方法

Country Status (7)

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US (2) US11476098B2 (https=)
EP (1) EP3602602B1 (https=)
JP (1) JP7115759B2 (https=)
KR (1) KR102311686B1 (https=)
CN (1) CN110520960B (https=)
GB (1) GB201705202D0 (https=)
WO (1) WO2018177965A1 (https=)

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CN110351940B (zh) * 2019-06-11 2021-07-30 中国科学院合肥物质科学研究院 一种用于测量离子回旋辐射的高频磁探针诊断系统
WO2021202129A1 (en) * 2020-03-31 2021-10-07 Lam Research Corporation Rf magnetic field sensor for harmonic measurements and uniformity control
GB202005828D0 (en) * 2020-04-21 2020-06-03 Univ Dublin City Electromagnetic field signal acquisition system for high signal-t-noise ratios, and electrical noise immunity
GB202016105D0 (en) * 2020-10-09 2020-11-25 Univ Dublin City Non-invasive measurement of plasma systems
CN112820618B (zh) * 2020-12-14 2023-04-07 兰州空间技术物理研究所 一种微型溅射离子泵等离子体诊断装置及诊断方法
EP4020520A1 (en) * 2020-12-22 2022-06-29 Impedans Ltd Apparatus for sensing rf signals from rf plasma processing equipment
CN113128050B (zh) * 2021-04-21 2023-04-25 西安电子科技大学 基于波阻抗不变点的等离子体电子密度和碰撞频率联合诊断方法
KR102946617B1 (ko) * 2021-10-07 2026-04-02 삼성전자주식회사 아킹 진단 장치와 이를 포함하는 플라즈마 공정 설비, 및 아킹 진단 방법
EP4466954B1 (en) * 2022-01-18 2026-03-04 UCL Business Ltd Plasma discharge monitoring method
KR102706432B1 (ko) * 2022-01-26 2024-10-04 김남헌 웨이퍼 식각을 위한 플라즈마 챔버 및 플라즈마 챔버를 이용한 웨이퍼 식각 방법
EP4250335A1 (en) 2022-03-25 2023-09-27 Impedans Ltd Apparatus for non-invasive sensing of radio-frequency current spectra flowing in a plasma processing chamber
KR102732381B1 (ko) * 2022-07-25 2024-11-25 한국기계연구원 박막 안테나형 플라즈마 진단장치 및 이를 포함하는 플라즈마 진단모듈
US20260066246A1 (en) * 2022-07-25 2026-03-05 Korea Institute Of Machinery & Materials Thin-film ultra-high frequency diagnostic device for plasma diagnosis and plasma diagnostic module comprising same
KR102790833B1 (ko) * 2022-08-18 2025-04-02 한국핵융합에너지연구원 플라즈마 모니터링용 뷰포트, 이를 포함하는 플라즈마 발생기 및 플라즈마 모니터링 방법
KR102743911B1 (ko) * 2022-10-21 2024-12-18 주식회사 나이스플라즈마 플라즈마 챔버 및 플라즈마 챔버를 이용한 웨이퍼 식각 방법

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US4588993A (en) * 1980-11-26 1986-05-13 The United States Of America As Represented By The Secretary Of The Department Of Health And Human Services Broadband isotropic probe system for simultaneous measurement of complex E- and H-fields
US6566272B2 (en) * 1999-07-23 2003-05-20 Applied Materials Inc. Method for providing pulsed plasma during a portion of a semiconductor wafer process
US7960670B2 (en) * 2005-05-03 2011-06-14 Kla-Tencor Corporation Methods of and apparatuses for measuring electrical parameters of a plasma process
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JP4364498B2 (ja) 2002-10-30 2009-11-18 原田産業株式会社 異常放電検出装置及び方法
JP5404984B2 (ja) * 2003-04-24 2014-02-05 東京エレクトロン株式会社 プラズマモニタリング方法、プラズマモニタリング装置及びプラズマ処理装置
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KR20160120382A (ko) * 2015-04-07 2016-10-18 삼성전자주식회사 광학 분광 분석 장치 및 플라즈마 처리 장치
KR102417178B1 (ko) * 2015-09-03 2022-07-05 삼성전자주식회사 마이크로파 탐침, 그 탐침을 구비한 플라즈마 모니터링 시스템, 및 그 시스템을 이용한 반도체 소자 제조방법

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