JP2020516024A5 - - Google Patents
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- JP2020516024A5 JP2020516024A5 JP2019553120A JP2019553120A JP2020516024A5 JP 2020516024 A5 JP2020516024 A5 JP 2020516024A5 JP 2019553120 A JP2019553120 A JP 2019553120A JP 2019553120 A JP2019553120 A JP 2019553120A JP 2020516024 A5 JP2020516024 A5 JP 2020516024A5
- Authority
- JP
- Japan
- Prior art keywords
- field
- plasma source
- plasma
- magnetic field
- frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004458 analytical method Methods 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- 230000008878 coupling Effects 0.000 claims 3
- 238000010168 coupling process Methods 0.000 claims 3
- 238000005859 coupling reaction Methods 0.000 claims 3
- 230000005672 electromagnetic field Effects 0.000 claims 3
- 230000007423 decrease Effects 0.000 claims 2
- 238000012544 monitoring process Methods 0.000 claims 2
- 238000010891 electric arc Methods 0.000 claims 1
- 230000001939 inductive effect Effects 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
- 238000004611 spectroscopical analysis Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB1705202.8A GB201705202D0 (en) | 2017-03-31 | 2017-03-31 | System and method for remote sensing a plasma |
| GB1705202.8 | 2017-03-31 | ||
| PCT/EP2018/057556 WO2018177965A1 (en) | 2017-03-31 | 2018-03-23 | System and method for remote sensing a plasma |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020516024A JP2020516024A (ja) | 2020-05-28 |
| JP2020516024A5 true JP2020516024A5 (https=) | 2021-11-11 |
| JP7115759B2 JP7115759B2 (ja) | 2022-08-09 |
Family
ID=58682689
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019553120A Active JP7115759B2 (ja) | 2017-03-31 | 2018-03-23 | プラズマを遠隔検知するためのシステムおよび方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US11476098B2 (https=) |
| EP (1) | EP3602602B1 (https=) |
| JP (1) | JP7115759B2 (https=) |
| KR (1) | KR102311686B1 (https=) |
| CN (1) | CN110520960B (https=) |
| GB (1) | GB201705202D0 (https=) |
| WO (1) | WO2018177965A1 (https=) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110351940B (zh) * | 2019-06-11 | 2021-07-30 | 中国科学院合肥物质科学研究院 | 一种用于测量离子回旋辐射的高频磁探针诊断系统 |
| KR102930008B1 (ko) * | 2020-03-31 | 2026-02-23 | 램 리써치 코포레이션 | 고조파 (harmonic) 측정들 및 균일도 제어를 위한 RF 자기장 센서 |
| GB202005828D0 (en) * | 2020-04-21 | 2020-06-03 | Univ Dublin City | Electromagnetic field signal acquisition system for high signal-t-noise ratios, and electrical noise immunity |
| GB202016105D0 (en) * | 2020-10-09 | 2020-11-25 | Univ Dublin City | Non-invasive measurement of plasma systems |
| CN112820618B (zh) * | 2020-12-14 | 2023-04-07 | 兰州空间技术物理研究所 | 一种微型溅射离子泵等离子体诊断装置及诊断方法 |
| EP4020520A1 (en) | 2020-12-22 | 2022-06-29 | Impedans Ltd | Apparatus for sensing rf signals from rf plasma processing equipment |
| CN113128050B (zh) * | 2021-04-21 | 2023-04-25 | 西安电子科技大学 | 基于波阻抗不变点的等离子体电子密度和碰撞频率联合诊断方法 |
| KR102946617B1 (ko) * | 2021-10-07 | 2026-04-02 | 삼성전자주식회사 | 아킹 진단 장치와 이를 포함하는 플라즈마 공정 설비, 및 아킹 진단 방법 |
| EP4466954B1 (en) * | 2022-01-18 | 2026-03-04 | UCL Business Ltd | Plasma discharge monitoring method |
| KR102706432B1 (ko) * | 2022-01-26 | 2024-10-04 | 김남헌 | 웨이퍼 식각을 위한 플라즈마 챔버 및 플라즈마 챔버를 이용한 웨이퍼 식각 방법 |
| EP4250335A1 (en) | 2022-03-25 | 2023-09-27 | Impedans Ltd | Apparatus for non-invasive sensing of radio-frequency current spectra flowing in a plasma processing chamber |
| US20260066246A1 (en) * | 2022-07-25 | 2026-03-05 | Korea Institute Of Machinery & Materials | Thin-film ultra-high frequency diagnostic device for plasma diagnosis and plasma diagnostic module comprising same |
| KR102732381B1 (ko) * | 2022-07-25 | 2024-11-25 | 한국기계연구원 | 박막 안테나형 플라즈마 진단장치 및 이를 포함하는 플라즈마 진단모듈 |
| KR102790833B1 (ko) * | 2022-08-18 | 2025-04-02 | 한국핵융합에너지연구원 | 플라즈마 모니터링용 뷰포트, 이를 포함하는 플라즈마 발생기 및 플라즈마 모니터링 방법 |
| KR102743911B1 (ko) * | 2022-10-21 | 2024-12-18 | 주식회사 나이스플라즈마 | 플라즈마 챔버 및 플라즈마 챔버를 이용한 웨이퍼 식각 방법 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4588993A (en) | 1980-11-26 | 1986-05-13 | The United States Of America As Represented By The Secretary Of The Department Of Health And Human Services | Broadband isotropic probe system for simultaneous measurement of complex E- and H-fields |
| US6566272B2 (en) * | 1999-07-23 | 2003-05-20 | Applied Materials Inc. | Method for providing pulsed plasma during a portion of a semiconductor wafer process |
| US7960670B2 (en) * | 2005-05-03 | 2011-06-14 | Kla-Tencor Corporation | Methods of and apparatuses for measuring electrical parameters of a plasma process |
| AU2003263746A1 (en) | 2002-07-03 | 2004-01-23 | Tokyo Electron Limited | Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| JP4364498B2 (ja) | 2002-10-30 | 2009-11-18 | 原田産業株式会社 | 異常放電検出装置及び方法 |
| JP5404984B2 (ja) * | 2003-04-24 | 2014-02-05 | 東京エレクトロン株式会社 | プラズマモニタリング方法、プラズマモニタリング装置及びプラズマ処理装置 |
| US20050188922A1 (en) * | 2004-02-26 | 2005-09-01 | Tokyo Electron Limited. | Plasma processing unit |
| JP4601439B2 (ja) | 2005-02-01 | 2010-12-22 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| US7655110B2 (en) * | 2006-03-29 | 2010-02-02 | Tokyo Electron Limited | Plasma processing apparatus |
| US20070227677A1 (en) | 2006-03-29 | 2007-10-04 | Fu-Lai Yu | Cordless window covering |
| US7993487B2 (en) | 2006-03-29 | 2011-08-09 | Tokyo Electron Limited | Plasma processing apparatus and method of measuring amount of radio-frequency current in plasma |
| KR101089951B1 (ko) * | 2008-03-07 | 2011-12-05 | 도쿄엘렉트론가부시키가이샤 | 플라즈마 처리 장치 |
| US20110217925A1 (en) | 2010-03-08 | 2011-09-08 | Mark Rhodes | Noise reducing near-field receiver antenna and system |
| JP5808697B2 (ja) | 2012-03-01 | 2015-11-10 | 株式会社日立ハイテクノロジーズ | ドライエッチング装置及びドライエッチング方法 |
| US20150364300A1 (en) * | 2014-06-16 | 2015-12-17 | Lam Research Corporation | Determining presence of conductive film on dielectric surface of reaction chamber |
| KR20160120382A (ko) * | 2015-04-07 | 2016-10-18 | 삼성전자주식회사 | 광학 분광 분석 장치 및 플라즈마 처리 장치 |
| KR102417178B1 (ko) * | 2015-09-03 | 2022-07-05 | 삼성전자주식회사 | 마이크로파 탐침, 그 탐침을 구비한 플라즈마 모니터링 시스템, 및 그 시스템을 이용한 반도체 소자 제조방법 |
-
2017
- 2017-03-31 GB GBGB1705202.8A patent/GB201705202D0/en not_active Ceased
-
2018
- 2018-03-23 JP JP2019553120A patent/JP7115759B2/ja active Active
- 2018-03-23 US US16/498,049 patent/US11476098B2/en active Active
- 2018-03-23 CN CN201880023299.9A patent/CN110520960B/zh active Active
- 2018-03-23 WO PCT/EP2018/057556 patent/WO2018177965A1/en not_active Ceased
- 2018-03-23 EP EP18717529.4A patent/EP3602602B1/en active Active
- 2018-03-23 KR KR1020197028391A patent/KR102311686B1/ko active Active
-
2022
- 2022-09-16 US US17/946,189 patent/US12278095B2/en active Active
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