JP2020512255A - 窒化チタン及びito系ir反射層を有する熱処理可能なコーティングされた物品 - Google Patents
窒化チタン及びito系ir反射層を有する熱処理可能なコーティングされた物品 Download PDFInfo
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- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 45
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 45
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000011521 glass Substances 0.000 claims description 108
- 238000000576 coating method Methods 0.000 claims description 78
- 239000011248 coating agent Substances 0.000 claims description 70
- 239000000758 substrate Substances 0.000 claims description 70
- 150000004767 nitrides Chemical class 0.000 claims description 27
- 230000005540 biological transmission Effects 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 229910052709 silver Inorganic materials 0.000 claims description 16
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 15
- 239000004332 silver Substances 0.000 claims description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 13
- 229910052760 oxygen Inorganic materials 0.000 claims description 13
- 239000001301 oxygen Substances 0.000 claims description 13
- 230000005855 radiation Effects 0.000 claims description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 11
- 239000010936 titanium Substances 0.000 claims description 11
- 229910052719 titanium Inorganic materials 0.000 claims description 11
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 5
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 4
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 description 26
- 238000005496 tempering Methods 0.000 description 16
- 239000000463 material Substances 0.000 description 13
- 229910052710 silicon Inorganic materials 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 6
- 229910001120 nichrome Inorganic materials 0.000 description 6
- 238000005259 measurement Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- 238000005452 bending Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229910010421 TiNx Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- UVGLBOPDEUYYCS-UHFFFAOYSA-N silicon zirconium Chemical compound [Si].[Zr] UVGLBOPDEUYYCS-UHFFFAOYSA-N 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000010981 turquoise Substances 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- CFJRGWXELQQLSA-UHFFFAOYSA-N azanylidyneniobium Chemical compound [Nb]#N CFJRGWXELQQLSA-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 238000005478 sputtering type Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
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- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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Abstract
Description
したがって、高温環境では、低SF値が望ましい場合がある。高光対太陽利得(LSG)値もまた望ましい。LSGはTvis/SHGCとして計算される。LSG値が高いほど、透過される可視光がより多くなり、コーティングされた物品によって透過される熱量が少なくなる。低いSF及びSHGC値、並びに高いLSG値は、IG窓ユニット及び/又はモノリシック窓などのコーティングされた物品に望ましい場合があるが、そのような値の達成は、呈色及び/又は反射率の値を犠牲にすることにより得ることができる。特に、低SHGC値を達成する従来の試みは、多くの場合、望ましくない低いLSG値及び/又はコーティングの望ましくない可視呈色をもたらした。特に、深く着色されていないガラス基材を使用することが所望される場合、窓用途のコーティングされた物品で許容可能な可視透過率(TY又はTvis)、望ましいガラス側反射呈色(例えば、望ましいa*及びb*ガラス側反射色値)、低SHGC、望ましくは低フィルム側の可視反射率、及び高LSGの組み合わせを達成することが、多くの場合望ましいが、困難である。
実施例
Claims (30)
- ガラス基材によって支持されたコーティングを含むコーティングされた物品であって、前記コーティングが、
前記ガラス基材上の、ITOを含む第1の赤外線(IR)反射層と、
前記ガラス基材上の、ITOを含む少なくとも前記第1のIR反射層の上にわたって窒化ケイ素を含む第1の誘電体層と、
前記ガラス基材上の、窒化ケイ素を含む少なくとも前記第1の誘電体層の上にわたってチタンの窒化物を含む第2の層IR反射層であって、そのため窒化ケイ素を含む前記第1の誘電体層が、少なくとも、ITOを含む前記第1のIR反射層と、前記チタンの窒化物を含む前記第2のIR反射層との間に位置する、第2の層IR反射層と、
前記ガラス基材上の、前記チタンの窒化物を含む少なくとも前記第2のIR反射層の上にわたって窒化ケイ素を含む第2の誘電体層と、を含み、
前記コーティングが、銀を主体とするIR反射層を含まず、
前記コーティングが、0.30以下の垂直放射(En)値を有し、
モノリシックに測定した前記コーティングされた物品が、約15〜80%の可視透過率と、10%以下のフィルム側可視反射率と、約30%以下のガラス側可視反射率と、−10.0〜+1.6のガラス側反射a*値と、少なくとも1.10の光対日射取得比(LSG)と、を有する、コーティングされた物品。 - 前記コーティングが、2つのIR反射層のみを含む、請求項1に記載のコーティングされた物品。
- 窒化ケイ素を含む前記第1の誘電体層が、前記第1のIR反射層と前記第2のIR反射層との間に位置し、これらに直接接触している、請求項1又は2に記載のコーティングされた物品。
- 前記チタンの窒化物を含む前記第2のIR反射層が、TiNxを含み、式中xは0.8〜1.2である、請求項1〜3のいずれか一項に記載のコーティングされた物品。
- 前記チタンの窒化物を含む前記第2のIR反射層が、TiNxを含み、式中xは0.9〜1.1である、請求項1〜4のいずれか一項に記載のコーティングされた物品。
- 前記第2のIR反射層が、0〜8%の酸素(原子%)を含有する、請求項1〜5のいずれか一項に記載のコーティングされた物品。
- 前記第2のIR反射層が、0〜5%の酸素(原子%)を含有する、請求項1〜6のいずれか一項に記載のコーティングされた物品。
- 前記コーティングが、前記ガラス基材と前記第1のIR反射層との間に位置してこれらに接触する、窒化ケイ素を含む別の誘電体層を更に含む、請求項1〜7のいずれか一項に記載のコーティングされた物品。
- 窒化ケイ素を含む前記別の誘電体層が、酸素を更に含む、請求項8に記載のコーティングされた物品。
- 前記第2のIR反射層が、前記チタンの窒化物から本質的になる、請求項1〜9のいずれか一項に記載のコーティングされた物品。
- 前記コーティングが、ジルコニウムの酸化物を含むオーバーコートを更に含む、請求項1〜10のいずれか一項に記載のコーティングされた物品。
- 前記コーティングされた物品が、約20〜70%の可視透過率と、少なくとも1.15の光対日射取得比(LSG)と、を有する、請求項1〜11のいずれか一項に記載のコーティングされた物品。
- 前記コーティングされた物品が、少なくとも1.22の光対日射取得比(LSG)を有する、請求項1〜12のいずれか一項に記載のコーティングされた物品。
- 前記コーティングされた物品が、8%以下のフィルム側可視反射率を有する、請求項1〜13のいずれか一項に記載のコーティングされた物品。
- 前記コーティングされた物品が、5%以下のフィルム側可視反射率を有する、請求項1〜14のいずれか一項に記載のコーティングされた物品。
- 前記ガラス基材が、透明なガラス基材である、請求項1〜15のいずれか一項に記載のコーティングされた物品。
- 前記コーティングされた物品が、−8〜+1.0のガラス側反射a*値と、−9〜+9のフィルム側反射a*値とを有する、請求項1〜16のいずれか一項に記載のコーティングされた物品。
- 窒化ケイ素を含む前記誘電体層のうちの1つ以上が、酸素を更に含み、アルミニウムでドープされる、請求項1〜17のいずれか一項に記載のコーティングされた物品。
- 前記コーティングされた物品が、モノリシック窓である、請求項1〜18のいずれか一項に記載のコーティングされた物品。
- モノリシックに測定した前記コーティングされた物品が、0.52以下のSHGC値を有する、請求項1〜19のいずれか一項に記載のコーティングされた物品。
- モノリシックに測定した前記コーティングされた物品が、0.45以下のSHGC値を有する、請求項1〜20のいずれか一項に記載のコーティングされた物品。
- ITOを含む前記第1のIR反射層が、100〜1,000Åの厚さであり、前記チタンの窒化物を含む前記第2のIR反射層が、50〜450Åの厚さである、請求項1〜21のいずれか一項に記載のコーティングされた物品。
- ITOを含む前記第1のIR反射層が、250〜450Åの厚さであり、かつ/又は、前記チタンの窒化物を含む前記第2のIR反射層が、130〜300Åの厚さである、請求項1〜22のいずれか一項に記載のコーティングされた物品。
- ガラス基材によって支持されたコーティングを含むコーティングされた物品であって、前記コーティングが、
前記ガラス基材上の、ITOを含む第1の赤外線(IR)反射層と、
前記ガラス基材上の、ITOを含む少なくとも前記第1のIR反射層の上にわたって窒化ケイ素を含む第1の誘電体層と、
前記ガラス基材上の、窒化ケイ素を含む少なくとも前記第1の誘電体層の上にわたってチタンの窒化物を含む第2の層IR反射層であって、そのため窒化ケイ素を含む前記第1の誘電体層が、少なくとも、ITOを含む前記第1のIR反射層と、前記チタンの窒化物を含む前記第2のIR反射層との間に位置する、第2の層IR反射層と、
前記ガラス基材上の、前記チタンの窒化物を含む少なくとも前記第2のIR反射層の上にわたって窒化ケイ素を含む第2の誘電体層と、を含み、
前記コーティングが、銀を主体とするIR反射層を含まず、
前記コーティングが、0.30以下の垂直放射(En)値を有し、
モノリシックに測定した前記コーティングされた物品が、約15〜80%の可視透過率と、少なくとも1.15の光対日射取得比(LSG)とを有する、コーティングされた物品。 - ガラス基材によって支持されたコーティングを含むコーティングされた物品であって、前記コーティングが、
前記ガラス基材上の、ITOを含む第1の赤外線(IR)反射層と、
前記ガラス基材上の、ITOを含む前記第1のIR反射層の上にわたり、かつこれに直接接触している第1の誘電体層と、
前記ガラス基材上の、前記第1の誘電体層の上にわたり、かつこれに直接接触している金属窒化物を含む第2の層IR反射層であって、そのため前記第1の誘電体層が、ITOを含む前記第1のIR反射層と、前記金属窒化物を含む前記第2のIR反射層との間に位置し、かつこれらに直接接触している、第2の層IR反射層と、
前記ガラス基材上の、前記金属窒化物を含む前記第2のIR反射層の上にわたり、かつこれに直接接触している第2の誘電体層と、を含み、
前記コーティングが、銀を主体とするIR反射層を含まず、
前記コーティングされた物品が、約15〜80%の可視透過率を有する、コーティングされた物品。 - 前記コーティングが、0.30以下の垂直放射(En)値を有する、請求項25に記載のコーティングされた物品。
- 前記金属窒化物が、チタンの窒化物である、請求項25又は26に記載のコーティングされた物品。
- 前記第1及び/又は第2の誘電体層が、窒化ケイ素を含む、請求項25〜27のいずれか一項に記載のコーティングされた物品。
- 前記コーティングされた物品が、10%以下のフィルム側可視反射率と、約30%以下のガラス側可視反射率と、−10.0〜+1.6のガラス側反射a*値と、少なくとも1.10の光対日射取得比(LSG)と、を有する、請求項25〜28のいずれか一項に記載のコーティングされた物品。
- ガラス基材によって支持されたコーティングを含むコーティングされた物品の製造方法であって、前記方法が、
前記ガラス基材上の、ITOを含む第1の赤外線(IR)反射層をスパッタ堆積させる工程と、
前記ガラス基材上の、ITOを含む少なくとも前記第1のIR反射層の上にわたって窒化ケイ素を含む第1の誘電体層をスパッタ堆積させる工程と
前記ガラス基材上の、窒化ケイ素を含む少なくとも前記第1の誘電体層の上にわたってチタンの窒化物を含む第2の層IR反射層をスパッタ堆積させる工程であって、そのため窒化ケイ素を含む前記第1の誘電体層が、少なくとも、ITOを含む前記第1のIR反射層と、前記チタンの窒化物を含む前記第2のIR反射層との間に位置する、工程と、
前記ガラス基材上の、少なくとも前記第1及び第2のIR反射層の上にわたって、窒化ケイ素を含む第2の誘電体層をスパッタ堆積させる工程であって、そのため前記コーティングが銀を主体とするIR反射層を含まず、前記コーティングが、0.30以下の垂直放射(En)値を有し、またモノリシックに測定した前記コーティングされた物品が、(i)約15〜80%の可視透過率、(ii)10%以下のフィルム側可視反射率、(iii)約30%以下のガラス側可視反射率、(iv)−10.0〜+1.6のガラス側反射a*値、及び(v)少なくとも1.10の光対日射取得比(LSG)を有する、工程と、を含む、方法。
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