JP2020510195A5 - - Google Patents

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JP2020510195A5
JP2020510195A5 JP2019546814A JP2019546814A JP2020510195A5 JP 2020510195 A5 JP2020510195 A5 JP 2020510195A5 JP 2019546814 A JP2019546814 A JP 2019546814A JP 2019546814 A JP2019546814 A JP 2019546814A JP 2020510195 A5 JP2020510195 A5 JP 2020510195A5
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measurement
overlay
targets
optical scattering
measurement system
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JP2019546814A
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JP7012734B2 (ja
JP2020510195A (ja
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JP2019546814A 2017-03-01 2018-03-01 光学散乱計測に基づくプロセスに対してロバストなオーバーレイ計測 Active JP7012734B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201762465163P 2017-03-01 2017-03-01
US62/465,163 2017-03-01
US15/861,938 2018-01-04
US15/861,938 US10732516B2 (en) 2017-03-01 2018-01-04 Process robust overlay metrology based on optical scatterometry
PCT/US2018/020342 WO2018160779A1 (en) 2017-03-01 2018-03-01 Process robust overlay metrology based on optical scatterometry

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JP2020510195A JP2020510195A (ja) 2020-04-02
JP2020510195A5 true JP2020510195A5 (enExample) 2021-04-08
JP7012734B2 JP7012734B2 (ja) 2022-01-28

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US (1) US10732516B2 (enExample)
EP (1) EP3577444A4 (enExample)
JP (1) JP7012734B2 (enExample)
KR (1) KR102356949B1 (enExample)
CN (1) CN110520715A (enExample)
IL (1) IL268861B (enExample)
TW (1) TWI748061B (enExample)
WO (1) WO2018160779A1 (enExample)

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