JP2020509651A - アップリンクビーム管理 - Google Patents

アップリンクビーム管理 Download PDF

Info

Publication number
JP2020509651A
JP2020509651A JP2019541708A JP2019541708A JP2020509651A JP 2020509651 A JP2020509651 A JP 2020509651A JP 2019541708 A JP2019541708 A JP 2019541708A JP 2019541708 A JP2019541708 A JP 2019541708A JP 2020509651 A JP2020509651 A JP 2020509651A
Authority
JP
Japan
Prior art keywords
wtru
trp
uplink
correspondence
management
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2019541708A
Other languages
English (en)
Japanese (ja)
Other versions
JP2020509651A5 (enExample
Inventor
カイル・ジュン−リン・パン
フェンジュン・シー
チュンシュアン・イエ
Original Assignee
アイディーエーシー ホールディングス インコーポレイテッド
アイディーエーシー ホールディングス インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by アイディーエーシー ホールディングス インコーポレイテッド, アイディーエーシー ホールディングス インコーポレイテッド filed Critical アイディーエーシー ホールディングス インコーポレイテッド
Publication of JP2020509651A publication Critical patent/JP2020509651A/ja
Publication of JP2020509651A5 publication Critical patent/JP2020509651A5/ja
Ceased legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04B—TRANSMISSION
    • H04B7/00—Radio transmission systems, i.e. using radiation field
    • H04B7/02—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas
    • H04B7/04—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas
    • H04B7/06—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the transmitting station
    • H04B7/0686—Hybrid systems, i.e. switching and simultaneous transmission
    • H04B7/0695—Hybrid systems, i.e. switching and simultaneous transmission using beam selection
    • H04B7/06952—Selecting one or more beams from a plurality of beams, e.g. beam training, management or sweeping
    • H04B7/06966—Selecting one or more beams from a plurality of beams, e.g. beam training, management or sweeping using beam correspondence; using channel reciprocity, e.g. downlink beam training based on uplink sounding reference signal [SRS]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
    • H01L21/2251—Diffusion into or out of group IV semiconductors
    • H01L21/2254—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/28008—Making conductor-insulator-semiconductor electrodes
    • H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
    • H01L21/28158—Making the insulator
    • H01L21/28238—Making the insulator with sacrificial oxide
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H01L21/30612—Etching of AIIIBV compounds
    • H01L21/30617—Anisotropic liquid etching
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04B—TRANSMISSION
    • H04B7/00—Radio transmission systems, i.e. using radiation field
    • H04B7/02—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas
    • H04B7/04—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas
    • H04B7/0408—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas using two or more beams, i.e. beam diversity
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04B—TRANSMISSION
    • H04B7/00—Radio transmission systems, i.e. using radiation field
    • H04B7/02—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas
    • H04B7/04—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas
    • H04B7/06—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the transmitting station
    • H04B7/0613—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the transmitting station using simultaneous transmission
    • H04B7/0615—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the transmitting station using simultaneous transmission of weighted versions of same signal
    • H04B7/0617—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the transmitting station using simultaneous transmission of weighted versions of same signal for beam forming
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04B—TRANSMISSION
    • H04B7/00—Radio transmission systems, i.e. using radiation field
    • H04B7/02—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas
    • H04B7/04—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas
    • H04B7/08—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the receiving station
    • H04B7/0868—Hybrid systems, i.e. switching and combining
    • H04B7/088—Hybrid systems, i.e. switching and combining using beam selection
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L25/00—Baseband systems
    • H04L25/02—Details ; arrangements for supplying electrical power along data transmission lines
    • H04L25/0202—Channel estimation
    • H04L25/0224—Channel estimation using sounding signals
    • H04L25/0226—Channel estimation using sounding signals sounding signals per se
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L5/00—Arrangements affording multiple use of the transmission path
    • H04L5/003—Arrangements for allocating sub-channels of the transmission path
    • H04L5/0048—Allocation of pilot signals, i.e. of signals known to the receiver
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L5/00—Arrangements affording multiple use of the transmission path
    • H04L5/003—Arrangements for allocating sub-channels of the transmission path
    • H04L5/0048—Allocation of pilot signals, i.e. of signals known to the receiver
    • H04L5/0051—Allocation of pilot signals, i.e. of signals known to the receiver of dedicated pilots, i.e. pilots destined for a single user or terminal
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04W—WIRELESS COMMUNICATION NETWORKS
    • H04W24/00—Supervisory, monitoring or testing arrangements
    • H04W24/08—Testing, supervising or monitoring using real traffic
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04W—WIRELESS COMMUNICATION NETWORKS
    • H04W24/00—Supervisory, monitoring or testing arrangements
    • H04W24/10—Scheduling measurement reports ; Arrangements for measurement reports
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04W—WIRELESS COMMUNICATION NETWORKS
    • H04W56/00—Synchronisation arrangements
    • H04W56/001—Synchronization between nodes
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04W—WIRELESS COMMUNICATION NETWORKS
    • H04W56/00—Synchronisation arrangements
    • H04W56/004—Synchronisation arrangements compensating for timing error of reception due to propagation delay
    • H04W56/0045—Synchronisation arrangements compensating for timing error of reception due to propagation delay compensating for timing error by altering transmission time
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04W—WIRELESS COMMUNICATION NETWORKS
    • H04W74/00—Wireless channel access
    • H04W74/002—Transmission of channel access control information
    • H04W74/004—Transmission of channel access control information in the uplink, i.e. towards network
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76224—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Mobile Radio Communication Systems (AREA)
JP2019541708A 2017-02-03 2018-02-02 アップリンクビーム管理 Ceased JP2020509651A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201762454568P 2017-02-03 2017-02-03
US62/454,568 2017-02-03
US201762501021P 2017-05-03 2017-05-03
US62/501,021 2017-05-03
PCT/US2018/016621 WO2018144844A1 (en) 2017-02-03 2018-02-02 Uplink beam management

Publications (2)

Publication Number Publication Date
JP2020509651A true JP2020509651A (ja) 2020-03-26
JP2020509651A5 JP2020509651A5 (enExample) 2021-02-18

Family

ID=61226679

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019541708A Ceased JP2020509651A (ja) 2017-02-03 2018-02-02 アップリンクビーム管理

Country Status (7)

Country Link
US (1) US20200136708A1 (enExample)
EP (1) EP3577793A1 (enExample)
JP (1) JP2020509651A (enExample)
KR (1) KR20190119582A (enExample)
CN (1) CN110419177A (enExample)
IL (1) IL268437A (enExample)
WO (1) WO2018144844A1 (enExample)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2735612C1 (ru) * 2017-02-06 2020-11-05 Гуандун Оппо Мобайл Телекоммьюникейшнс Корп., Лтд. Способ осуществления связи, терминальное устройство и сетевое устройство
KR102543491B1 (ko) * 2017-02-06 2023-06-14 삼성전자 주식회사 무선 통신 시스템에서 빔 탐색 및 운용 방법 및 장치
WO2018155726A1 (ko) * 2017-02-21 2018-08-30 엘지전자 주식회사 무선통신 시스템에서 srs를 전송하는 방법 및 이를 위한 단말
WO2018174687A1 (en) * 2017-03-24 2018-09-27 Samsung Electronics Co., Ltd. Method and apparatus for contention-free random access and uplink power control in wireless communication system
EP3602831B1 (en) * 2017-03-31 2024-03-13 Apple Inc. Beam management procedure triggering and signaling delivery in fall-back mode
CN108809369B (zh) * 2017-05-05 2023-11-03 华为技术有限公司 无线通信的方法、网络设备和终端设备
EP3665999B1 (en) * 2017-08-09 2020-11-04 Telefonaktiebolaget LM Ericsson (publ) Network node and method in a wireless communications network
US11405091B2 (en) * 2017-08-16 2022-08-02 Telefonaktiebolaget Lm Ericsson (Publ) Energy efficient camping with optimal beam finding before access
US10700748B2 (en) * 2017-10-09 2020-06-30 Qualcomm Incorporated Uplink beam training
CN109587780B (zh) * 2018-01-12 2019-11-19 华为技术有限公司 通信方法及装置
US11671149B2 (en) * 2018-08-17 2023-06-06 Interdigital Patent Holdings, Inc. Beam management for multi-TRP
CN110838861B (zh) * 2018-08-17 2023-03-17 大唐移动通信设备有限公司 信号传输方法、波束确定方法及其装置
CN115882918A (zh) 2018-09-17 2023-03-31 华为技术有限公司 波束训练方法及装置
US11363465B2 (en) 2018-09-26 2022-06-14 Qualcomm Incorporated Licensed supplemental uplink as fallback with unlicensed uplink and downlink
US11368200B2 (en) 2018-09-28 2022-06-21 Sony Group Corporation Dynamic control of beam correspondence
EP3858017B1 (en) * 2018-09-28 2025-08-27 ZTE Corporation Random access in wireless communication
US11178586B2 (en) * 2018-10-03 2021-11-16 Qualcomm Incorporated Systems and methods for reporting of beam correspondence state
US11581934B2 (en) 2019-02-14 2023-02-14 Sony Group Corporation Methods for beam correspondence signaling, related wireless devices and related network nodes
EP3925083A4 (en) * 2019-02-14 2022-11-09 Sony Group Corporation METHOD OF ESTABLISHING BEAM RECIPROCITY, RELATED WIRELESS DEVICES AND RELATED NETWORK NODES
WO2020168350A1 (en) * 2019-02-15 2020-08-20 Apple Inc. System and method for dynamically configuring user equipment sounding reference signal(srs) resources
TWI836031B (zh) * 2019-03-27 2024-03-21 美商內數位專利控股公司 Nr中閒置/不活動模式定位方法、裝置及系統
CN113796022B (zh) * 2019-04-30 2024-03-19 索尼集团公司 用于波束参考信令的方法
US10938459B2 (en) * 2019-05-10 2021-03-02 Qualcomm Incorporated Reduction of self-interference in full-duplex communication
WO2021062764A1 (zh) * 2019-09-30 2021-04-08 华为技术有限公司 终端的定时提前量ta处理的方法和装置
CN112583463B (zh) * 2019-09-30 2023-02-14 华为技术有限公司 一种波束的指示方法及装置
US12028147B2 (en) 2019-11-15 2024-07-02 Telefonaktiebolaget Lm Ericsson (Publ) Method and network node for uplink beam management
US11575420B2 (en) * 2019-12-10 2023-02-07 Qualcomm Incorporated Channel sounding techniques with analog beamforming
US11696333B2 (en) 2019-12-20 2023-07-04 Qualcomm Incorporated Beam sweep based random access msg 1 and msg 2
US12425897B2 (en) * 2019-12-20 2025-09-23 Qualcomm Incorporated Beam sweep based random access msg 2
EP4087149A4 (en) * 2020-01-07 2022-12-07 Guangdong Oppo Mobile Telecommunications Corp., Ltd. BEAM SELECTION METHOD, TERMINAL AND NETWORK DEVICE
EP4094398A4 (en) * 2020-01-25 2024-03-06 Qualcomm Incorporated CONFIGURATION OF FOUNDATION REFERENCE SIGNALS
US11831383B2 (en) 2020-01-27 2023-11-28 Qualcomm Incorporated Beam failure recovery assistance in upper band millimeter wave wireless communications
US11856570B2 (en) * 2020-01-27 2023-12-26 Qualcomm Incorporated Dynamic mixed mode beam correspondence in upper millimeter wave bands
EP4097870A1 (en) 2020-01-27 2022-12-07 Qualcomm Incorporated Antenna group selection and indication in frequency bands
US12401403B2 (en) 2020-01-27 2025-08-26 Qualcomm Incorporated Antenna group-specific parameter configuration in millimeter wave communications
US20210234597A1 (en) * 2020-01-27 2021-07-29 Qualcomm Incorporated Asymmetric uplink-downlink beam training in frequency bands
US12407385B2 (en) 2020-01-27 2025-09-02 Qualcomm Incorporated Signaling of beam correlation across millimeter wave frequency bands
US12374787B2 (en) 2020-02-11 2025-07-29 Qualcomm Incorporated Adjusting communications operations for changes to configurations for quasi co-location and number of antenna elements
US11672006B2 (en) * 2020-02-21 2023-06-06 Qualcomm Incorporated Message 3 repetition with receive beam sweep and associated beam refinement for message 4
US11743742B2 (en) 2020-03-31 2023-08-29 Qualcomm Incorporated Beam sweep based random access msg 3 and msg 4
US11832115B2 (en) * 2020-05-04 2023-11-28 Qualcomm Incorporated Estimating features of a radio frequency band based on an inter-band reference signal
US20220046431A1 (en) * 2020-08-06 2022-02-10 Qualcomm Incorporated Cell and full duplex beam pair updating
CN114126054B (zh) * 2020-08-28 2025-11-14 大唐移动通信设备有限公司 波束指示方法、网络设备、终端、装置及存储介质
US12069731B2 (en) * 2020-09-10 2024-08-20 Samsung Electronics Co., Ltd. Systems, methods, and devices for beam management for random access
US11363471B2 (en) * 2020-10-06 2022-06-14 Qualcomm Incorporated Data-aided beam management
CN114765860A (zh) * 2021-01-11 2022-07-19 中国移动通信有限公司研究院 传输方法、装置、设备及可读存储介质
US11864225B2 (en) * 2021-04-22 2024-01-02 Qualcomm Incorporated Managing uplink spatial filter configuration
US12309613B2 (en) * 2021-09-24 2025-05-20 Apple Inc. Uplink beam training on neighbor cell
WO2023066498A1 (en) * 2021-10-22 2023-04-27 Telefonaktiebolaget Lm Ericsson (Publ) Uplink beamforming at a wireless device
KR20230089161A (ko) * 2021-12-13 2023-06-20 삼성전자주식회사 단말 기반 빔 제어 기법의 승인 및 제어 방법 및 장치
US11949633B2 (en) * 2022-01-26 2024-04-02 Qualcomm Incorporated User equipment full duplex capability reporting as a function of transmission power
EP4518544A4 (en) * 2022-04-25 2025-12-10 Beijing Xiaomi Mobile Software Co Ltd METHOD AND APPARATUS FOR CHANNEL TRANSMISSION, AND STORAGE MEDIA
CN117042163A (zh) * 2022-04-29 2023-11-10 华为技术有限公司 通信方法及通信装置
US12401408B2 (en) 2022-08-23 2025-08-26 Samsung Electronics Co., Ltd. Method and apparatus for composite beam operation and overhead reduction
WO2024205456A1 (en) * 2023-03-27 2024-10-03 Telefonaktiebolaget Lm Ericsson (Publ) Determination of serving beam for a user equipment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120281680A1 (en) * 2011-05-02 2012-11-08 Telefonaktiebolaget Lm Ericsson (Publ) Prohibition Of Sounding Reference Signal Transmission On Newly Activated Secondary Cells
JP2015503888A (ja) * 2012-01-17 2015-02-02 クゥアルコム・インコーポレイテッドＱｕａｌｃｏｍｍ Ｉｎｃｏｒｐｏｒａｔｅｄ 二次キャリアにおいてランダム・アクセスを実行するための方法および装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102171561B1 (ko) * 2014-04-07 2020-10-29 삼성전자주식회사 빔포밍 기반 셀룰러 시스템의 상향링크 빔 추적 방법 및 장치
CN105490719B (zh) * 2014-09-17 2020-11-24 中兴通讯股份有限公司 一种上行同步方法、装置和系统
US9882620B2 (en) * 2014-09-24 2018-01-30 Mediatek Inc. Synchronization in a beamforming system
US10492161B2 (en) * 2015-05-06 2019-11-26 Lg Electronics Inc. Method and device for acquiring uplink synchronism in consideration of beam forming effect in wireless communication system
US10848216B2 (en) * 2015-06-26 2020-11-24 Lg Electronics Inc. Method and apparatus for transmitting uplink beam scanning signal in wireless communication system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120281680A1 (en) * 2011-05-02 2012-11-08 Telefonaktiebolaget Lm Ericsson (Publ) Prohibition Of Sounding Reference Signal Transmission On Newly Activated Secondary Cells
JP2015503888A (ja) * 2012-01-17 2015-02-02 クゥアルコム・インコーポレイテッドＱｕａｌｃｏｍｍ Ｉｎｃｏｒｐｏｒａｔｅｄ 二次キャリアにおいてランダム・アクセスを実行するための方法および装置

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
NTT DOCOMO, INC.: "Beam correspondence information (BCI) acquisition scheme[online]", 3GPP TSG-RAN WG1 MEETING #87 R1-1612732, JPN6020051160, 5 November 2016 (2016-11-05), ISSN: 0004447605 *
SAMSUNG: "Discussion on UL beam management[online]", 3GPP TSG RAN WG1 NR AH R1-1700926, JPN6020051159, 10 January 2017 (2017-01-10), ISSN: 0004447604 *
VIVO: "Discussion on beam management for NR MIMO[online]", 3GPP TSG RAN WG1 AH_NR MEETING R1-1700274, JPN6020051157, 9 January 2017 (2017-01-09), ISSN: 0004447603 *

Also Published As

Publication number Publication date
CN110419177A (zh) 2019-11-05
WO2018144844A1 (en) 2018-08-09
US20200136708A1 (en) 2020-04-30
KR20190119582A (ko) 2019-10-22
IL268437A (en) 2019-09-26
EP3577793A1 (en) 2019-12-11

Similar Documents

Publication Publication Date Title
US12225494B2 (en) Systems, methods and apparatuses for multiple access point (multi-AP) coordination in wireless local area networks (WLANs)
US11716704B2 (en) Beamformed paging transmission
US12302327B2 (en) Methods and apparatus for joint multi-AP transmission in WLANS
JP2020509651A (ja) アップリンクビーム管理
KR102636376B1 (ko) 미모 채널 접근
CN110089044B (zh) 基于群组的波束管理
JP6849793B2 (ja) ミリメートル波（ｍｍＷ）システムのためのマルチチャネルセットアップメカニズムおよび波形設計
US20210159966A1 (en) Beam indication for 5g new radio
KR20210134625A (ko) 2단계 rach에서 msg-a 전송을 위한 방법 및 장치
CN118300652A (zh) 用于多trp的波束管理
WO2018232090A1 (en) Unified beam management in a wireless network
US12069720B2 (en) Methods for supporting BSS edge user transmissions
TW201906466A (zh) 彈性的基於srs的上鏈波束管理
US20230078339A1 (en) Panel selection for uplink transmission in a multi-transmission-reception point (trp) system
US20240223250A1 (en) Multi-ap channel sounding feedback procedures for wlan systems
US20250260535A1 (en) Methods and apparatus for multi-trp srs enhancements in tdd
TW202441906A (zh) 用於啟用多鏈路毫米波波束調訓之方法
CA3130285C (en) Methods and apparatus for msg-a in two-step rach
WO2024211403A1 (en) Prach transmission power control based on cell measurements
WO2024211401A1 (en) Prach transmission power control with transmission index within pdcch order
KR20250165442A (ko) Pdcch 오더 사이의 시간 차이에 기초하는 prach 송신 전력 제어

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20191004

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20191114

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20190902

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20190813

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20201126

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210105

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20210302

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20210330

A045 Written measure of dismissal of application [lapsed due to lack of payment]

Free format text: JAPANESE INTERMEDIATE CODE: A045

Effective date: 20210727