IL268437A - High frequency beam steering - Google Patents

High frequency beam steering

Info

Publication number
IL268437A
IL268437A IL268437A IL26843719A IL268437A IL 268437 A IL268437 A IL 268437A IL 268437 A IL268437 A IL 268437A IL 26843719 A IL26843719 A IL 26843719A IL 268437 A IL268437 A IL 268437A
Authority
IL
Israel
Prior art keywords
beam management
uplink beam
uplink
management
Prior art date
Application number
IL268437A
Other languages
English (en)
Hebrew (he)
Inventor
Kyle Jung-Lin Pan
Fengjun Xi
Chunxuan Ye
Original Assignee
Idac Holdings Inc
Pan Kyle Jung Lin
Fengjun Xi
Chunxuan Ye
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idac Holdings Inc, Pan Kyle Jung Lin, Fengjun Xi, Chunxuan Ye filed Critical Idac Holdings Inc
Publication of IL268437A publication Critical patent/IL268437A/en

Links

Classifications

    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04B—TRANSMISSION
    • H04B7/00—Radio transmission systems, i.e. using radiation field
    • H04B7/02—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas
    • H04B7/04—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas
    • H04B7/06—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the transmitting station
    • H04B7/0686—Hybrid systems, i.e. switching and simultaneous transmission
    • H04B7/0695—Hybrid systems, i.e. switching and simultaneous transmission using beam selection
    • H04B7/06952—Selecting one or more beams from a plurality of beams, e.g. beam training, management or sweeping
    • H04B7/06966—Selecting one or more beams from a plurality of beams, e.g. beam training, management or sweeping using beam correspondence; using channel reciprocity, e.g. downlink beam training based on uplink sounding reference signal [SRS]
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04B—TRANSMISSION
    • H04B7/00—Radio transmission systems, i.e. using radiation field
    • H04B7/02—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas
    • H04B7/04—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas
    • H04B7/06—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the transmitting station
    • H04B7/0613—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the transmitting station using simultaneous transmission
    • H04B7/0615—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the transmitting station using simultaneous transmission of weighted versions of same signal
    • H04B7/0617—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the transmitting station using simultaneous transmission of weighted versions of same signal for beam forming
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04B—TRANSMISSION
    • H04B7/00—Radio transmission systems, i.e. using radiation field
    • H04B7/02—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas
    • H04B7/04—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas
    • H04B7/0408—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas using two or more beams, i.e. beam diversity
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04B—TRANSMISSION
    • H04B7/00—Radio transmission systems, i.e. using radiation field
    • H04B7/02—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas
    • H04B7/04—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas
    • H04B7/08—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the receiving station
    • H04B7/0868—Hybrid systems, i.e. switching and combining
    • H04B7/088—Hybrid systems, i.e. switching and combining using beam selection
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L25/00—Baseband systems
    • H04L25/02—Details ; arrangements for supplying electrical power along data transmission lines
    • H04L25/0202—Channel estimation
    • H04L25/0224—Channel estimation using sounding signals
    • H04L25/0226—Channel estimation using sounding signals sounding signals per se
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L5/00—Arrangements affording multiple use of the transmission path
    • H04L5/003—Arrangements for allocating sub-channels of the transmission path
    • H04L5/0048—Allocation of pilot signals, i.e. of signals known to the receiver
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L5/00—Arrangements affording multiple use of the transmission path
    • H04L5/003—Arrangements for allocating sub-channels of the transmission path
    • H04L5/0048—Allocation of pilot signals, i.e. of signals known to the receiver
    • H04L5/0051—Allocation of pilot signals, i.e. of signals known to the receiver of dedicated pilots, i.e. pilots destined for a single user or terminal
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04W—WIRELESS COMMUNICATION NETWORKS
    • H04W24/00—Supervisory, monitoring or testing arrangements
    • H04W24/08—Testing, supervising or monitoring using real traffic
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04W—WIRELESS COMMUNICATION NETWORKS
    • H04W24/00—Supervisory, monitoring or testing arrangements
    • H04W24/10—Scheduling measurement reports ; Arrangements for measurement reports
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04W—WIRELESS COMMUNICATION NETWORKS
    • H04W56/00—Synchronisation arrangements
    • H04W56/001—Synchronization between nodes
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04W—WIRELESS COMMUNICATION NETWORKS
    • H04W56/00—Synchronisation arrangements
    • H04W56/004—Synchronisation arrangements compensating for timing error of reception due to propagation delay
    • H04W56/0045—Synchronisation arrangements compensating for timing error of reception due to propagation delay compensating for timing error by altering transmission time
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04W—WIRELESS COMMUNICATION NETWORKS
    • H04W74/00—Wireless channel access
    • H04W74/002—Transmission of channel access control information
    • H04W74/004—Transmission of channel access control information in the uplink, i.e. towards network
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/013—Manufacture or treatment of electrodes having a conductor capacitively coupled to a semiconductor by an insulator
    • H10D64/01302—Manufacture or treatment of electrodes having a conductor capacitively coupled to a semiconductor by an insulator the insulator being formed after the semiconductor body, the semiconductor being silicon
    • H10D64/01332—Making the insulator
    • H10D64/01352—Making the insulator with sacrificial oxide
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/14—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase
    • H10P32/1408—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
    • H10P32/171—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being group IV material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/60—Wet etching
    • H10P50/64—Wet etching of semiconductor materials
    • H10P50/642—Chemical etching
    • H10P50/646—Chemical etching of Group III-V materials
    • H10P50/648—Anisotropic liquid etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/01—Manufacture or treatment
    • H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
    • H10W10/014—Manufacture or treatment of isolation regions comprising dielectric materials using trench refilling with dielectric materials, e.g. shallow trench isolations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/10—Isolation regions comprising dielectric materials
    • H10W10/17—Isolation regions comprising dielectric materials formed using trench refilling with dielectric materials, e.g. shallow trench isolations

Landscapes

  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mobile Radio Communication Systems (AREA)
IL268437A 2017-02-03 2019-08-01 High frequency beam steering IL268437A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762454568P 2017-02-03 2017-02-03
US201762501021P 2017-05-03 2017-05-03
PCT/US2018/016621 WO2018144844A1 (en) 2017-02-03 2018-02-02 Uplink beam management

Publications (1)

Publication Number Publication Date
IL268437A true IL268437A (en) 2019-09-26

Family

ID=61226679

Family Applications (1)

Application Number Title Priority Date Filing Date
IL268437A IL268437A (en) 2017-02-03 2019-08-01 High frequency beam steering

Country Status (7)

Country Link
US (1) US20200136708A1 (enExample)
EP (1) EP3577793A1 (enExample)
JP (1) JP2020509651A (enExample)
KR (1) KR20190119582A (enExample)
CN (1) CN110419177A (enExample)
IL (1) IL268437A (enExample)
WO (1) WO2018144844A1 (enExample)

Families Citing this family (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MX2019009340A (es) 2017-02-06 2019-11-28 Guangdong Oppo Mobile Telecommunications Corp Ltd Metodo de comunicacion, dispositivo terminal y dispositivo de red.
KR102543491B1 (ko) * 2017-02-06 2023-06-14 삼성전자 주식회사 무선 통신 시스템에서 빔 탐색 및 운용 방법 및 장치
EP3588884B1 (en) * 2017-02-21 2022-08-03 LG Electronics Inc. Method for transmitting srs in wireless communication system and terminal for same
US11224068B2 (en) * 2017-03-24 2022-01-11 Samsung Electronics Co., Ltd. Method and apparatus for contention-free random access and uplink power control in wireless communication system
EP3602831B1 (en) * 2017-03-31 2024-03-13 Apple Inc. Beam management procedure triggering and signaling delivery in fall-back mode
CN108809369B (zh) * 2017-05-05 2023-11-03 华为技术有限公司 无线通信的方法、网络设备和终端设备
JP2020530221A (ja) * 2017-08-09 2020-10-15 テレフオンアクチーボラゲット エルエム エリクソン（パブル） 無線通信ネットワークにおけるネットワークノードおよび方法
US11405091B2 (en) * 2017-08-16 2022-08-02 Telefonaktiebolaget Lm Ericsson (Publ) Energy efficient camping with optimal beam finding before access
US10700748B2 (en) * 2017-10-09 2020-06-30 Qualcomm Incorporated Uplink beam training
CN110035488B (zh) * 2018-01-12 2024-05-17 华为技术有限公司 通信方法及装置
EP3837774B1 (en) * 2018-08-17 2024-01-17 InterDigital Patent Holdings, Inc. Beam management for multi-trp
CN110838861B (zh) * 2018-08-17 2023-03-17 大唐移动通信设备有限公司 信号传输方法、波束确定方法及其装置
CN110912594B (zh) 2018-09-17 2022-12-06 华为技术有限公司 波束训练方法及装置
US11363465B2 (en) 2018-09-26 2022-06-14 Qualcomm Incorporated Licensed supplemental uplink as fallback with unlicensed uplink and downlink
EP3858017B1 (en) * 2018-09-28 2025-08-27 ZTE Corporation Random access in wireless communication
JP7199519B2 (ja) * 2018-09-28 2023-01-05 ソニーグループ株式会社 ビーム対応の動的制御
US11178586B2 (en) * 2018-10-03 2021-11-16 Qualcomm Incorporated Systems and methods for reporting of beam correspondence state
CN113412582A (zh) * 2019-02-14 2021-09-17 索尼集团公司 用于波束对应信号通知的方法、相关无线设备和相关网络节点
CN113412587B (zh) * 2019-02-14 2024-06-07 索尼集团公司 建立波束互易性的方法、相关无线装置以及相关网络节点
US11664874B2 (en) * 2019-02-15 2023-05-30 Apple Inc. System and method for dynamically configuring user equipment sounding reference signal (SRS) resources
TWI836031B (zh) 2019-03-27 2024-03-21 美商內數位專利控股公司 Nr中閒置/不活動模式定位方法、裝置及系統
JP7245361B2 (ja) * 2019-04-30 2023-03-23 ソニーグループ株式会社 ビーム参照シグナリングを可能にするための方法、無線デバイス、及びネットワークノード
US10938459B2 (en) * 2019-05-10 2021-03-02 Qualcomm Incorporated Reduction of self-interference in full-duplex communication
EP4027736B1 (en) * 2019-09-30 2024-05-29 Huawei Technologies Co., Ltd. Timing advance (ta) processing method and device for terminal
CN112583463B (zh) * 2019-09-30 2023-02-14 华为技术有限公司 一种波束的指示方法及装置
EP4059154B1 (en) 2019-11-15 2025-04-02 Telefonaktiebolaget LM Ericsson (publ) Method and network node for uplink beam management
US11575420B2 (en) 2019-12-10 2023-02-07 Qualcomm Incorporated Channel sounding techniques with analog beamforming
US11696333B2 (en) 2019-12-20 2023-07-04 Qualcomm Incorporated Beam sweep based random access msg 1 and msg 2
US12425897B2 (en) * 2019-12-20 2025-09-23 Qualcomm Incorporated Beam sweep based random access msg 2
WO2021138816A1 (zh) * 2020-01-07 2021-07-15 Oppo广东移动通信有限公司 用于波束选择的方法、终端设备和网络设备
US12335187B2 (en) * 2020-01-25 2025-06-17 Qualcomm Incorporated Sounding reference signal configuration
US11856570B2 (en) * 2020-01-27 2023-12-26 Qualcomm Incorporated Dynamic mixed mode beam correspondence in upper millimeter wave bands
US12676662B2 (en) 2020-01-27 2026-07-07 Qualcomm Incorporated Beam correlation for carrier aggregation
US12401403B2 (en) 2020-01-27 2025-08-26 Qualcomm Incorporated Antenna group-specific parameter configuration in millimeter wave communications
US11831383B2 (en) 2020-01-27 2023-11-28 Qualcomm Incorporated Beam failure recovery assistance in upper band millimeter wave wireless communications
US12531626B2 (en) 2020-01-27 2026-01-20 Qualcomm Incorporated Asymmetric uplink-downlink beam training in frequency bands
EP4097870A1 (en) 2020-01-27 2022-12-07 Qualcomm Incorporated Antenna group selection and indication in frequency bands
US12407385B2 (en) 2020-01-27 2025-09-02 Qualcomm Incorporated Signaling of beam correlation across millimeter wave frequency bands
US12374787B2 (en) 2020-02-11 2025-07-29 Qualcomm Incorporated Adjusting communications operations for changes to configurations for quasi co-location and number of antenna elements
US11672006B2 (en) * 2020-02-21 2023-06-06 Qualcomm Incorporated Message 3 repetition with receive beam sweep and associated beam refinement for message 4
US11743742B2 (en) 2020-03-31 2023-08-29 Qualcomm Incorporated Beam sweep based random access msg 3 and msg 4
US12058532B2 (en) 2020-05-04 2024-08-06 Qualcomm Incorporated Estimating features of a radio frequency band based on an inter-band reference signal
US11743932B2 (en) * 2020-06-16 2023-08-29 Qualcomm Incorporated Techniques for random access channel-based self-interference measurement
US20220046431A1 (en) * 2020-08-06 2022-02-10 Qualcomm Incorporated Cell and full duplex beam pair updating
CN114126054B (zh) * 2020-08-28 2025-11-14 大唐移动通信设备有限公司 波束指示方法、网络设备、终端、装置及存储介质
US12069731B2 (en) * 2020-09-10 2024-08-20 Samsung Electronics Co., Ltd. Systems, methods, and devices for beam management for random access
US11363471B2 (en) * 2020-10-06 2022-06-14 Qualcomm Incorporated Data-aided beam management
CN114765860B (zh) * 2021-01-11 2026-03-24 中国移动通信有限公司研究院 传输方法、装置、设备及可读存储介质
US11864225B2 (en) * 2021-04-22 2024-01-02 Qualcomm Incorporated Managing uplink spatial filter configuration
US12309613B2 (en) * 2021-09-24 2025-05-20 Apple Inc. Uplink beam training on neighbor cell
WO2023066498A1 (en) * 2021-10-22 2023-04-27 Telefonaktiebolaget Lm Ericsson (Publ) Uplink beamforming at a wireless device
KR20230089161A (ko) 2021-12-13 2023-06-20 삼성전자주식회사 단말 기반 빔 제어 기법의 승인 및 제어 방법 및 장치
US11949633B2 (en) * 2022-01-26 2024-04-02 Qualcomm Incorporated User equipment full duplex capability reporting as a function of transmission power
EP4518544A4 (en) * 2022-04-25 2025-12-10 Beijing Xiaomi Mobile Software Co Ltd METHOD AND APPARATUS FOR CHANNEL TRANSMISSION, AND STORAGE MEDIA
CN117042163A (zh) * 2022-04-29 2023-11-10 华为技术有限公司 通信方法及通信装置
US12401408B2 (en) * 2022-08-23 2025-08-26 Samsung Electronics Co., Ltd. Method and apparatus for composite beam operation and overhead reduction
EP4690538A1 (en) * 2023-03-27 2026-02-11 Telefonaktiebolaget LM Ericsson (publ) Determination of serving beam for a user equipment

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2899916B1 (en) * 2011-05-02 2018-07-11 Telefonaktiebolaget LM Ericsson (publ) Method and apparatus for prohibiting sounding reference signal transmission on newly activated secondary cells in a wireless communication system
US9094988B2 (en) * 2012-01-17 2015-07-28 Qualcomm Incorporated Method and apparatus for performing random access on a secondary carrier
KR102171561B1 (ko) * 2014-04-07 2020-10-29 삼성전자주식회사 빔포밍 기반 셀룰러 시스템의 상향링크 빔 추적 방법 및 장치
CN105490719B (zh) * 2014-09-17 2020-11-24 中兴通讯股份有限公司 一种上行同步方法、装置和系统
US9705581B2 (en) * 2014-09-24 2017-07-11 Mediatek Inc. Synchronization in a beamforming system
US10492161B2 (en) * 2015-05-06 2019-11-26 Lg Electronics Inc. Method and device for acquiring uplink synchronism in consideration of beam forming effect in wireless communication system
WO2016209055A1 (ko) * 2015-06-26 2016-12-29 엘지전자 주식회사 무선 통신 시스템에서 상향링크 빔 스캐닝 신호를 전송하는 방법 및 장치

Also Published As

Publication number Publication date
US20200136708A1 (en) 2020-04-30
JP2020509651A (ja) 2020-03-26
EP3577793A1 (en) 2019-12-11
WO2018144844A1 (en) 2018-08-09
KR20190119582A (ko) 2019-10-22
CN110419177A (zh) 2019-11-05

Similar Documents

Publication Publication Date Title
PL3713314T3 (pl) Zarządzanie wiązką łącza wysyłania
SG11202006801RA (en) Uplink beam assignment
SG10201913661YA (en) Management System
ZA201705232B (en) Beam forming using an antenna arrangement
GB201716780D0 (en) Laser system
SG11202010075XA (en) Multi-uav management
ZA201807030B (en) Beam forming using an antenna arrangement
IL273908A (en) Escape system
GB2575406B (en) Support beam
GB2538772B (en) Beam scheduling
ZA201804138B (en) Uplink data indication
CA192919S (en) Beam
GB2564110B (en) Escape system
GB2563711B (en) Escape system
GB201708087D0 (en) Rodent Station
GB201711747D0 (en) Mosquito management
GB2567647B (en) Structural beam
DK3385721T3 (en) Light grid
PT3403498T (pt) Estação para roedores
IL253074A0 (en) Unit for use in flexographic printing
GB201502971D0 (en) Spreader beam
ZAF201801591S (en) Beam
ZAF201801593S (en) Beam
ZAF201801592S (en) Beam
ZAF201801034S (en) Beam