JP2020508568A5 - - Google Patents

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JP2020508568A5
JP2020508568A5 JP2019544642A JP2019544642A JP2020508568A5 JP 2020508568 A5 JP2020508568 A5 JP 2020508568A5 JP 2019544642 A JP2019544642 A JP 2019544642A JP 2019544642 A JP2019544642 A JP 2019544642A JP 2020508568 A5 JP2020508568 A5 JP 2020508568A5
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illumination
amount
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plasma
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JP2020508568A (ja
JP7181211B2 (ja
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JP2019544642A 2017-02-17 2018-02-16 厚膜及び高アスペクト比構造の計測方法及びシステム Active JP7181211B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201762460668P 2017-02-17 2017-02-17
US62/460,668 2017-02-17
US15/896,978 US10690602B2 (en) 2017-02-17 2018-02-14 Methods and systems for measurement of thick films and high aspect ratio structures
US15/896,978 2018-02-14
PCT/US2018/018457 WO2018152382A1 (en) 2017-02-17 2018-02-16 Methods and systems for measurement of thick films and high aspect ratio structures

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JP2020508568A JP2020508568A (ja) 2020-03-19
JP2020508568A5 true JP2020508568A5 (cg-RX-API-DMAC10.html) 2021-05-06
JP7181211B2 JP7181211B2 (ja) 2022-11-30

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US (2) US10690602B2 (cg-RX-API-DMAC10.html)
EP (1) EP3563408B1 (cg-RX-API-DMAC10.html)
JP (1) JP7181211B2 (cg-RX-API-DMAC10.html)
KR (1) KR102629264B1 (cg-RX-API-DMAC10.html)
CN (1) CN110313059B (cg-RX-API-DMAC10.html)
WO (1) WO2018152382A1 (cg-RX-API-DMAC10.html)

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