JP2020142403A - 化粧シート - Google Patents
化粧シート Download PDFInfo
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- JP2020142403A JP2020142403A JP2019039084A JP2019039084A JP2020142403A JP 2020142403 A JP2020142403 A JP 2020142403A JP 2019039084 A JP2019039084 A JP 2019039084A JP 2019039084 A JP2019039084 A JP 2019039084A JP 2020142403 A JP2020142403 A JP 2020142403A
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Abstract
Description
化粧シート10について、図1〜3を参照して説明する。化粧シート10は、所定の製品用又は部品用の表皮材である。化粧シート10は、基材20と、凹部30を含む(図1参照)。凹部30は、基材20の表面に設けられる。実施形態では、化粧シート10及び基材20は、長尺のシート材とする。基材20の長手方向及び短手方向の各寸法は、諸条件を考慮して適宜決定される。また、化粧シート10は、複数の凹部30を含むこととする。複数の凹部30は、エンボス加工装置50により基材20の表面に形成される。エンボス加工装置50は、エンボス加工方法を実施する。エンボス加工装置50及びエンボス加工方法については、後述する。基材20の長手方向は、化粧シート10の長手方向となり、基材20の短手方向は、化粧シート10の短手方向となる。実施形態では、化粧シート10及び基材20の長手方向を「長手方向」といい、化粧シート10及び基材20の短手方向を「短手方向」という(図1,2参照)。長手方向及び短手方向は、互いに直交する。
[試験方法]
試験片形状:φ300mm
試験装置:インストロン型引張試験機(株式会社島津製作所製オートグラフAG−1)
評点配置:試験片中央部,経方向
評点間隔:200mm
引張速度:200mm/分
5%モジュラスを10N以上とすることで、基材20の表面に凹部30を形成し易くすることができる。5%モジュラスを500N以下とすることで、化粧シート10の意匠性を良好にすることができる。更に、複雑な形状の凹部への対応が可能となる。好ましくは、5%モジュラスは、109〜498Nとするとよい。5%モジュラスを前述の範囲とすることで、エンボス加工装置50で製造される化粧シート10で、凹部30の底面32を次の形状の面とし易くすることができる。前述の形状は、後述する型部70の頂面に対応する形状である。型部70では、前述の頂面は、上述した通り、階段状の形状を有する。
エンボス加工装置50について、図4,5を参照して説明する。エンボス加工装置50は、化粧シート10を製造する加工装置である。エンボス加工装置50は、供給装置95から繰り出された長尺の基材20を搬送し、基材20にエンボス加工を行う(図4参照)。エンボス加工装置50では、エンボス加工は、連続的に行われる。基材20は、エンボス加工装置50でエンボス加工が施された後、化粧シート10として、回収装置96に回収される。
エンボス加工方法について、図1,2,4を参照して説明する。エンボス加工方法は、エンボス加工装置50で実施される。エンボス加工方法は、供給工程と、エンボス工程と、回収工程を含む(図4参照)。エンボス加工方法により、図2の基材20から図1の化粧シート10が製造される。従って、エンボス加工方法は、化粧シート10の製造方法ともいえる。エンボス加工方法では、基材20を搬送方向に間欠的に搬送しつつ、供給工程、エンボス工程及び回収工程が順次実施される。供給工程は、繰り返し実施される。エンボス工程は、繰り返し実施される。回収工程は、繰り返し実施される。化粧シート10では、複数の凹部30が長手方向に所定の間隔Wで繰り返される(図1参照)。エンボス加工装置50では、型部70は、エンボス加工型60に1つ設けられる(図4参照)。従って、エンボス加工装置50では、基材20の1回の搬送量は、間隔Wに一致した量とされる。
実施形態によれば、次のような効果を得ることができる。
実施形態は、次のようにすることもできる。以下に示す変形例のうちの幾つかの構成は、適宜組み合わせて採用することもできる。以下では、上記とは異なる点を説明することとし、同様の点についての説明は、適宜省略する。
26 第三シート、 30 凹部、 32 底面、 50 エンボス加工装置
60 エンボス加工型、 62 シャフト、 64 ベース面、 70 型部
80 エンボス受型、 82 シャフト、 84 弾性部、 86 本体部
90 加熱部、 95 供給装置、 96 回収装置、 A 第一面、 B 第二面
C 第三面、 D 第四面、 E 第五面、 F 第六面、 G 第七面
H 第八面、 I 第九面、 J 第十面、 K 第十一面
P,P1,P2,P3,P4,P5,P6,P7 突起
S,S1,S2,S3,S4,S5,S6,SL スリット、 W 間隔、 θ 角度
Claims (2)
- 基材の表面に凹部が設けられ、
前記凹部は、底面を含み、
前記底面は、
前記基材の厚さ方向に沿った前記基材の表面からの深さ寸法が第一値である第一面と、
前記深さ寸法が前記第一値より小さい第二値である第二面と、
前記厚さ方向の裏側で前記第一面と繋がり、前記厚さ方向の表側で前記第二面と繋がる第三面と、を含む、化粧シート。 - 前記底面は、更に、
前記深さ寸法が前記第二値より小さい第三値である第四面と、
前記厚さ方向の裏側で前記第二面と繋がり、前記厚さ方向の表側で前記第四面と繋がる第五面と、を含み、
前記第一面、前記第二面及び前記第四面は、前記基材の表面に沿った面であり、
前記第五面は、前記第五面の厚さ方向に沿った段差寸法が前記第三面の前記段差寸法と同一値となる面である、請求項1に記載の化粧シート。
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