JP2020134649A5

JP2020134649A5 - Forming method, pattern forming system, and manufacturing method of articles

Info

Publication number: JP2020134649A5
Application number: JP2019026671A
Authority: JP
Filing date: 2019-02-18
Publication date: 2022-02-18
Anticipated expiration: 2039-02-18

Claims

It is a forming method for forming a pattern on one layer on a substrate by using a first device and a second device.
The mark forming step of forming a mark on the substrate by the first apparatus,
The first forming step of forming the first pattern on the substrate by the first apparatus,
The second forming step of forming the second pattern on the substrate by the second apparatus, and
Perform processing including
As the mode of the processing, the first mode in which the measurement step of measuring the position of the mark by the first apparatus is performed and the formation of the second pattern is controlled based on the measurement result of the measurement step, and the measurement step are performed. A forming method, which is omitted and includes a second mode for controlling the formation of the second pattern based on the measurement result of the previous measurement step.

When the fluctuation of the measurement result of the measurement step in the plurality of times of the first mode is within the permissible range, the mode of the process is changed from the first mode to the second mode. The forming method according to claim 1.

The forming method according to claim 2, wherein the variation in the measurement result of the measurement step is obtained based on the difference in the measurement result of the measurement step in the plurality of times of the processing in the first mode.

In the second mode, the measurement step is included in the processing for each of a plurality of substrates.
Claims 1 to 3 are characterized in that, when the fluctuation of the measurement result of the measurement step in the second mode is not within the permissible range, the mode of the process is changed from the second mode to the first mode. The forming method according to any one of the above.

The process further includes a second measurement step of measuring the position of the mark with the second device.
The formation method according to any one of claims 1 to 4, wherein in the second measurement step, the formation of the second pattern is controlled based on the measurement result of the second measurement step.

In the second measurement step, the formation of the second pattern is controlled based on the difference between the position information of the mark measured in the measurement step and the position information of the mark measured in the second measurement step. , The forming method according to claim 5.

In the second measurement step, a correction value for correcting the magnification difference between the first apparatus and the second apparatus is determined based on the difference, and information indicating a target position where the second pattern should be formed is obtained. The forming method according to claim 6, wherein the second pattern is formed on a substrate based on the result corrected by the correction value.

The forming method according to any one of claims 1 to 7, wherein the first pattern and the second pattern have the same shape and are formed on a substrate in different directions.

In the mark forming step, a mark is formed on the substrate by a plurality of forming portions in the first apparatus.
One of claims 1 to 8, wherein when the variation in the relative positions of the plurality of forming portions is within the permissible range, the mode of the processing is shifted from the first mode to the second mode. The forming method according to item 1.

The forming method according to claim 9, wherein when the fluctuation of the relative positions of the plurality of forming portions is not within the permissible range, the mode of the processing is changed from the second mode to the first mode. ..

A forming step of forming a pattern on a substrate by using the forming method according to any one of claims 1 to 10.
Including a processing step of processing the substrate on which a pattern is formed in the forming step.
A method for manufacturing an article, which comprises manufacturing an article from the substrate processed in the processing step.

A pattern including a first device for forming the first pattern on the substrate and a second device for forming the second pattern in a region different from the region where the first pattern is formed in the layer forming the first pattern. It ’s a formation system,
The first device is
A forming part that forms a mark on the substrate,
Includes a measuring unit that measures the position of the mark formed on the substrate by the forming unit.
The second device can form the second pattern based on the measurement result of the position of the mark formed by the forming portion.
Based on the measurement result of the position of the mark obtained by measuring the position of the mark by the measuring unit of the first device, the first mode of forming the second pattern in the second device and the first mode. A plurality of modes including a second mode in which the measurement of the mark position by the measurement unit of one device is omitted and the second pattern is formed in the second device based on the measurement result of the previous mark position. A pattern forming system characterized in that pattern formation is performed in a mode selected from.