JP2020106526A - 強化された時計構成部品 - Google Patents
強化された時計構成部品 Download PDFInfo
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- JP2020106526A JP2020106526A JP2019227842A JP2019227842A JP2020106526A JP 2020106526 A JP2020106526 A JP 2020106526A JP 2019227842 A JP2019227842 A JP 2019227842A JP 2019227842 A JP2019227842 A JP 2019227842A JP 2020106526 A JP2020106526 A JP 2020106526A
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- Prior art keywords
- timepiece
- component
- timepiece component
- silicon
- smoothing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052710 silicon Inorganic materials 0.000 claims abstract description 30
- 239000010703 silicon Substances 0.000 claims abstract description 30
- 238000009499 grossing Methods 0.000 claims abstract description 29
- 239000000463 material Substances 0.000 claims abstract description 28
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 18
- 239000001257 hydrogen Substances 0.000 claims abstract description 18
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims description 40
- 238000004519 manufacturing process Methods 0.000 claims description 19
- 238000005728 strengthening Methods 0.000 claims description 13
- 238000000708 deep reactive-ion etching Methods 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 9
- 230000033116 oxidation-reduction process Effects 0.000 claims description 6
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 6
- 238000011282 treatment Methods 0.000 claims description 5
- 150000002431 hydrogen Chemical class 0.000 claims description 3
- 238000003698 laser cutting Methods 0.000 claims description 2
- 230000008569 process Effects 0.000 claims description 2
- 239000010437 gem Substances 0.000 claims 1
- 229910001751 gemstone Inorganic materials 0.000 claims 1
- 238000005459 micromachining Methods 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 33
- 239000010410 layer Substances 0.000 description 9
- 238000002474 experimental method Methods 0.000 description 7
- 230000007547 defect Effects 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000013459 approach Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000011253 protective coating Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 238000007619 statistical method Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 241000237503 Pectinidae Species 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000005292 diamagnetic effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000013001 point bending Methods 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 235000020637 scallop Nutrition 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/005—Oxydation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/02—Heat treatment
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/08—Etching
- C30B33/10—Etching in solutions or melts
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B13/00—Gearwork
- G04B13/02—Wheels; Pinions; Spindles; Pivots
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B13/00—Gearwork
- G04B13/02—Wheels; Pinions; Spindles; Pivots
- G04B13/021—Wheels; Pinions; Spindles; Pivots elastic fitting with a spindle, axis or shaft
- G04B13/022—Wheels; Pinions; Spindles; Pivots elastic fitting with a spindle, axis or shaft with parts made of hard material, e.g. silicon, diamond, sapphire, quartz and the like
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B15/00—Escapements
- G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/04—Oscillators acting by spring tension
- G04B17/06—Oscillators with hairsprings, e.g. balance
- G04B17/066—Manufacture of the spiral spring
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B19/00—Indicating the time by visual means
- G04B19/04—Hands; Discs with a single mark or the like
- G04B19/042—Construction and manufacture of the hands; arrangements for increasing reading accuracy
-
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0069—Watchmakers' or watch-repairers' machines or tools for working materials for working with non-mechanical means, e.g. chemical, electrochemical, metallising, vapourising; with electron beams, laser beams
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- Micromachines (AREA)
Abstract
Description
2a 第一ブレーキレバー可動部分
2b 第二ブレーキレバー可動部分
3 がんぎ車
A2a 第三軸
A2b 第四軸
A3 軸
Claims (12)
- 微細加工可能な材料からなる時計構成部品であって、少なくとも水素による平滑化により平滑化された少なくとも一つの微細加工可能な材料表面部分を含み、その機械的強度を増加させるために1ミクロンより大きい厚みを有する酸化膜を含む、時計構成部品。
- 前記酸化膜は2ミクロン以上、または2.5ミクロン以上、または3ミクロン以上の厚みを有する、請求項1に記載の時計構成部品。
- 前記微細加工可能な材料はシリコンであり、前記酸化膜はシリコン酸化物である、請求項1または2に記載の時計構成部品。
- 前記時計構成部品は、脱進装置のシリコンからなる時計構成部品である、請求項1から3のいずれか一項に記載の時計構成部品。
- 前記時計構成部品は、弾性によってエネルギーを放出しない、剛性を有する時計構成部品である、およびまたは爪車、がんぎ車、針、振り石およびつめを含む要素のグループのうちの一つである、請求項1から4のいずれか一項に記載の時計構成部品。
- 前記時計構成部品は4000MPa以上の平均強度を有する、およびまたは前記時計構成部品は3000MPa以上の最低強度を有する、請求項1から5のいずれか一項に記載の時計構成部品。
- 請求項1から6のいずれか一項に記載の時計構成部品を含む、時計ムーブメント。
- 請求項1から6のいずれか一項に記載の時計構成部品か請求項7に記載の時計ムーブメントを含む、時計。
- 未完成の時計構成部品を形成する部品が、微細加工可能な材料から作り出される、時計構成部品を製造する方法であって、少なくとも前記部品の表面の少なくとも一部を水素により平滑化することを含む平滑化工程を含み、前記時計構成部品を機械的に強化するために、前記部品の表面の少なくとも一部に、1ミクロンより大きい、または2ミクロン以上の、または2.5ミクロン以上の、または3ミクロン以上の、厚さを有する酸化膜を形成する工程を含む、時計構成部品を製造する方法。
- 前記未完成の時計構成部品を形成する部品を作り出す前記工程が、特にディープ反応性イオンエッチング(DRIE)によって、およびまたはレーザ切断技術を使って、前記部品を微細加工することを含む、請求項9に記載の時計構成部品を製造する方法。
- 前記部品の表面の少なくとも一部を平滑化する前記工程は、水素による平滑化の工程の前に、酸化−還元による追加の平滑化の工程を含む、請求項9または10に記載の時計構成部品を製造する方法。
- 等方性エッチング液を使って前記部品を機械的に強化するための処理工程を含む、請求項9から11のいずれか一項に記載の時計構成部品を製造する方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP18213618.4A EP3671361A1 (fr) | 2018-12-18 | 2018-12-18 | Composant horloger renforcé |
EP18213618.4 | 2018-12-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020106526A true JP2020106526A (ja) | 2020-07-09 |
JP7539768B2 JP7539768B2 (ja) | 2024-08-26 |
Family
ID=64745928
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019227842A Active JP7539768B2 (ja) | 2018-12-18 | 2019-12-18 | 強化された時計構成部品 |
Country Status (4)
Country | Link |
---|---|
US (1) | US12061445B2 (ja) |
EP (1) | EP3671361A1 (ja) |
JP (1) | JP7539768B2 (ja) |
CN (1) | CN111338202A (ja) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008544290A (ja) * | 2005-06-28 | 2008-12-04 | ウーテーアー・エス・アー・マニファクチュール・オロロジェール・スイス | 強化された微小機械部品 |
WO2015113973A1 (fr) * | 2014-01-29 | 2015-08-06 | Cartier Création Studio Sa | Ressort spiral thermocompensé en céramique comprenant l' élément silicium dans sa composition et son procédé de réglage |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2136037A5 (ja) | 1971-04-05 | 1972-12-22 | Metaux Precieux Sa | |
US20060280738A1 (en) | 2005-06-08 | 2006-12-14 | Tedder Thomas F | Anti-CD19 antibody therapy for transplantation |
CH703445B1 (fr) * | 2007-05-22 | 2012-01-31 | Suisse Electronique Microtech | Pièce micromécanique en silicium et son procédé de fabrication. |
CH700059A2 (fr) | 2008-12-15 | 2010-06-15 | Montres Breguet Sa | Spiral à élévation de courbe en matériau à base de silicium. |
CH701499B1 (fr) | 2009-07-23 | 2016-09-15 | Montres Breguet Sa | Procède de fabrication d'une pièce micromécanique en silicium renforcé. |
CH702431B1 (fr) | 2009-12-21 | 2015-05-29 | Suisse Electronique Microtech | Procédé de fabrication d'une pièce micromécanique. |
JP5753252B2 (ja) | 2010-03-25 | 2015-07-22 | ロレックス・ソシエテ・アノニムRolex Sa | 非円形の開口部を有する切込み付きヒゲ玉 |
EP4224257A1 (fr) | 2011-09-29 | 2023-08-09 | Rolex Sa | Ensemble monolithique ressort spiral - virole |
CH707986B1 (fr) * | 2013-04-24 | 2018-05-31 | Lvmh Swiss Mft Sa | Pièce pour l'horlogerie. |
EP2937311B1 (fr) | 2014-04-25 | 2019-08-21 | Rolex Sa | Procédé de fabrication d'un composant horloger renforcé, composant horloger et pièce d'horlogerie correspondants |
JP2016173355A (ja) * | 2015-03-16 | 2016-09-29 | シチズンホールディングス株式会社 | 機械部品の製造方法 |
JP2017032321A (ja) * | 2015-07-29 | 2017-02-09 | シチズン時計株式会社 | 時計部品および時計部品の製造方法 |
US20170285573A1 (en) * | 2016-11-30 | 2017-10-05 | Firehouse Horology, Inc. | Crystalline Compounds for Use in Mechanical Watches and Methods of Manufacture Thereof |
EP3339968A1 (fr) * | 2016-12-20 | 2018-06-27 | Nivarox-FAR S.A. | Pièce pour mouvement d'horlogerie |
-
2018
- 2018-12-18 EP EP18213618.4A patent/EP3671361A1/fr active Pending
-
2019
- 2019-12-16 US US16/715,011 patent/US12061445B2/en active Active
- 2019-12-18 CN CN201911308119.4A patent/CN111338202A/zh active Pending
- 2019-12-18 JP JP2019227842A patent/JP7539768B2/ja active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008544290A (ja) * | 2005-06-28 | 2008-12-04 | ウーテーアー・エス・アー・マニファクチュール・オロロジェール・スイス | 強化された微小機械部品 |
WO2015113973A1 (fr) * | 2014-01-29 | 2015-08-06 | Cartier Création Studio Sa | Ressort spiral thermocompensé en céramique comprenant l' élément silicium dans sa composition et son procédé de réglage |
Also Published As
Publication number | Publication date |
---|---|
JP7539768B2 (ja) | 2024-08-26 |
CN111338202A (zh) | 2020-06-26 |
EP3671361A1 (fr) | 2020-06-24 |
US12061445B2 (en) | 2024-08-13 |
US20200192300A1 (en) | 2020-06-18 |
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