JP2020094213A - Resin material and multilayer printed wiring board - Google Patents

Abstract

To provide a resin material which 1) can lower a dielectric loss tangent of a cured product, 2) raises a glass transition temperature of the cured product, 3) enhances thermal dimensional stability of the cured product, 4) reduces sidelobes, and 5) can reduce surface roughness after etching.SOLUTION: A resin material contains an epoxy compound having a naphthylene ether skeleton, and an active ester compound having a naphthylene ether skeleton, in which a combination of the epoxy compound and the active ester compound is a first specific combination, a second specific combination or a third specific combination.SELECTED DRAWING: Figure 1

Description

The present invention relates to a resin material containing an epoxy compound. The present invention also relates to a multilayer printed wiring board using the above resin material.

Conventionally, various resin materials have been used to obtain electronic components such as semiconductor devices, laminated boards and printed wiring boards. For example, in a multilayer printed wiring board, a resin material is used to form an insulating layer for insulating the inner layers or to form an insulating layer located on the surface layer portion. Wiring, which is generally metal, is laminated on the surface of the insulating layer. Further, in order to form the insulating layer, a resin film obtained by filmizing the resin material may be used. The resin material and the resin film are used as an insulating material for a multilayer printed wiring board including a build-up film.

As an example of the above resin material, the following Patent Document 1 discloses (A) a polyfunctional epoxy resin (excluding a phenoxy resin), (B) a phenol-based curing agent and/or an active ester-based curing agent, (C). A resin composition containing a thermoplastic resin, (D) an inorganic filler, and (E) a quaternary phosphonium-based curing accelerator is disclosed. The (C) thermoplastic resin is a thermoplastic resin selected from a phenoxy resin, a polyvinyl acetal resin, a polyimide, a polyamideimide resin, a polyether sulfone resin, and a polysulfone resin. The (E) quaternary phosphonium-based curing accelerator is one or more quaternary phosphonium decanoate, (4-methylphenyl)triphenylphosphonium thiocyanate, tetraphenylphosphonium thiocyanate, and butyltriphenylphosphonium thiocyanate. It is a phosphonium-based curing accelerator.

In addition, Patent Document 2 below discloses a cured product of a resin composition containing an epoxy compound, a curing agent, an inorganic filler, and a polyimide. The cured product has a sea-island structure having a sea part and an island part, the island part has an average major axis of 5 μm or less, and the island part contains the polyimide. The content of the inorganic filler is 30% by weight or more and 90% by weight or less based on 100% by weight of the cured body. The cured product can be used as a material for the insulating layer.

JP, 2005-145498, A WO2018/062405A1

When the insulating layer is formed using the conventional resin material as described in Patent Documents 1 and 2, the dielectric loss tangent of the cured product does not become sufficiently low, or the glass transition temperature of the cured product does not become sufficiently high. Or, the thermal dimensional stability may not be sufficiently high.

Further, in the conventional resin materials described in Patent Documents 1 and 2, the resin material may be deteriorated by heat of a laser or the like when forming the via, and a side lobe may be relatively large around the formed via.

Furthermore, when the insulating layer is formed using the conventional resin material as described in Patent Documents 1 and 2, the surface roughness after etching may not be sufficiently reduced.

Thus, 1) lower the dielectric loss tangent of the cured product, 2) increase the glass transition temperature of the cured product, 3) increase the thermal dimensional stability of the cured product, 4) reduce the side lobes, and 5) after etching. It is extremely difficult to obtain a resin material that can exert all of the effects 1)-5) that the surface roughness can be reduced.

The object of the present invention is to 1) lower the dielectric loss tangent of the cured product, 2) increase the glass transition temperature of the cured product, 3) increase the thermal dimensional stability of the cured product, and 4) reduce side lobes, and 5). It is an object of the present invention to provide a resin material that can reduce the surface roughness after etching. Another object of the present invention is to provide a multilayer printed wiring board using the above resin material.

According to a broad aspect of the present invention, an epoxy compound having a naphthylene ether skeleton and an active ester compound having a naphthylene ether skeleton are contained, and the combination of the epoxy compound and the active ester compound has a naphthylene ether skeleton. A first combination of an epoxy compound having a softening point of 90° C. or less and an active ester compound having a naphthylene ether skeleton and having a softening point of more than 145° C., a naphthylene ether skeleton and 90° C. Second combination of an epoxy compound having a softening point of more than 1 and an active ester compound having a naphthylene ether skeleton and having a softening point of 145° C. or lower, or a softening point having a naphthylene ether skeleton and exceeding 90° C. A resin material is provided which is a third combination of an epoxy compound having a naphthylene ether skeleton and an active ester compound having a naphthylene ether skeleton and having a softening point of higher than 145°C.

In a specific aspect of the resin material according to the present invention, the combination of the epoxy compound and the active ester compound is the first combination or the third combination.

In a specific aspect of the resin material according to the present invention, the combination of the epoxy compound and the active ester compound is the second combination or the third combination.

In a specific aspect of the resin material according to the present invention, a combination of the epoxy compound and the active ester compound is the third combination.

In a particular aspect of the resin material according to the present invention, the combination of the epoxy compound and the active ester compound is the third combination, and all epoxy compounds and all curing agents contained in the resin material are included. Of the epoxy compound having the naphthylene ether skeleton and having a softening point of more than 90° C. and the active ester compound having the naphthylene ether skeleton and having a softening point of more than 145° C. in 100% by weight in total. Is 35% by weight or more.

In a particular aspect of the resin material according to the present invention, the combination of the epoxy compound and the active ester compound is the third combination, and all epoxy compounds and all curing agents contained in the resin material are included. Of the epoxy compound having the naphthylene ether skeleton and having a softening point of more than 90° C. and the active ester compound having the naphthylene ether skeleton and having a softening point of more than 145° C. in 100% by weight in total. Is 50% by weight or more.

In a specific aspect of the resin material according to the present invention, the resin material contains a bismaleimide compound.

In one specific aspect of the resin material according to the present invention, the bismaleimide compound is a bismaleimide compound having a skeleton derived from dimer diamine.

In one specific aspect of the resin material according to the present invention, the bismaleimide compound is a bismaleimide compound having a structure represented by the following formula (X).

In the formula (X), R1 represents a tetravalent organic group.

On the specific situation with the resin material which concerns on this invention, the said resin material contains an inorganic filler.

In one specific aspect of the resin material according to the present invention, the resin material is a resin film.

The resin material according to the present invention is preferably used for forming an insulating layer in a multilayer printed wiring board.

According to a broad aspect of the present invention, a circuit board, a plurality of insulating layers arranged on a surface of the circuit board, and a metal layer arranged between the plurality of insulating layers, the plurality of insulating layers Provided is a multilayer printed wiring board, in which at least one layer is a cured product of the above resin material.

The resin material according to the present invention contains an epoxy compound having a naphthylene ether skeleton and an active ester compound having a naphthylene ether skeleton. In the resin material according to the present invention, the combination of the epoxy compound and the active ester compound is the following first combination, second combination, or third combination. First combination: an epoxy compound having a naphthylene ether skeleton and a softening point of 90° C. or lower and an active ester compound having a naphthylene ether skeleton and having a softening point of higher than 145° C. Second combination: an epoxy compound having a naphthylene ether skeleton and a softening point of more than 90° C. and an active ester compound having a naphthylene ether skeleton and a softening point of 145° C. or less. Third combination: an epoxy compound having a naphthylene ether skeleton and having a softening point of more than 90° C. and an active ester compound having a naphthylene ether skeleton and having a softening point of more than 145° C. Since the resin material according to the present invention is provided with the above configuration, 1) the dielectric loss tangent of the cured product is lowered, 2) the glass transition temperature of the cured product is increased, and 3) the thermal dimensional stability of the cured product is improved. It is possible to exert all of the effects 1)-5) that are higher, 4) the side lobe can be reduced, and 5) the surface roughness after etching can be reduced.

FIG. 1 is a sectional view schematically showing a multilayer printed wiring board using a resin material according to an embodiment of the present invention.

Hereinafter, the present invention will be described in detail.

The resin material according to the present invention contains an epoxy compound having a naphthylene ether skeleton and an active ester compound having a naphthylene ether skeleton. The naphthylene ether skeleton in the epoxy compound having a naphthylene ether skeleton and the active ester compound having a naphthylene ether skeleton means a skeleton in which an oxygen atom is bonded to a carbon atom forming a naphthalene ring. The oxygen atom bonded to the carbon atom forming the naphthalene ring may be bonded to a carbonyl group. That is, the oxygen atom bonded to the carbon atom forming the naphthalene ring may be an oxygen atom forming the ester skeleton.

In the resin material according to the present invention, the combination of the epoxy compound having the naphthylene ether skeleton and the active ester compound having the naphthylene ether skeleton is the following first combination, second combination, or third combination. Is.

First combination: an epoxy compound having a naphthylene ether skeleton and a softening point of 90° C. or lower and an active ester compound having a naphthylene ether skeleton and having a softening point of higher than 145° C.

Second combination: an epoxy compound having a naphthylene ether skeleton and a softening point of more than 90° C. and an active ester compound having a naphthylene ether skeleton and a softening point of 145° C. or less.

Third combination: an epoxy compound having a naphthylene ether skeleton and having a softening point of more than 90° C. and an active ester compound having a naphthylene ether skeleton and having a softening point of more than 145° C.

Since the resin material according to the present invention is provided with the above configuration, 1) the dielectric loss tangent of the cured product is lowered, 2) the glass transition temperature of the cured product is increased, and 3) the thermal dimensional stability of the cured product is improved. It is possible to exert all of the effects 1)-5) that are higher, 4) the side lobe can be reduced, and 5) the surface roughness after etching can be reduced.

It is difficult for a conventional resin material that does not contain at least one of an epoxy compound having a naphthylene ether skeleton and an active ester compound having a naphthylene ether skeleton to exert all the above-mentioned effects 1) to 5).

Further, in a conventional resin material containing only one of an epoxy compound having a naphthylene ether skeleton and an active ester compound having a naphthylene ether skeleton, etching is likely to be excessive, and the surface roughness after etching is large. May be.

On the other hand, the resin material according to the present invention contains both an epoxy compound having a naphthylene ether skeleton and an active ester compound having a naphthylene ether skeleton, and the combination of the epoxy compound and the active ester compound is specific. Since it is a combination, all the above-mentioned effects 1)-5) can be exhibited. Further, in the resin material according to the present invention, since both the epoxy compound and the active ester compound have a naphthylene ether skeleton, the effect of 5) above is particularly effectively exhibited, and as a result, a multilayer having excellent transmission performance is obtained. A printed wiring board can be obtained. In the resin material according to the present invention, since the combination of the epoxy compound having the naphthylene ether skeleton and the active ester compound having the naphthylene ether skeleton is a specific combination, the above-mentioned effects 1)-4) are particularly effective. Is effectively exhibited. With the resin material according to the present invention, the glass transition temperature and thermal dimensional stability of the cured product can be considerably increased, and the heat resistance of the resin material can be increased, so that decomposition by heat can be effectively suppressed. As a result, the side lobes generated around the via (through hole) can be reduced.

The resin material according to the present invention may be a resin composition or a resin film. The resin composition has fluidity. The resin composition may be in a paste form. A liquid is included in the paste form. The resin material according to the present invention is preferably a resin film because of its excellent handleability.

The resin material according to the present invention is preferably a thermosetting material. When the resin material is a resin film, the resin film is preferably a thermosetting resin film.

Hereinafter, details of each component used in the resin material according to the present invention, and uses of the resin material according to the present invention will be described.

[(A) Epoxy compound having naphthylene ether skeleton]
The resin material according to the present invention contains (A) an epoxy compound having a naphthylene ether skeleton. The (A) epoxy compound is a compound having at least one naphthylene ether skeleton and at least one epoxy group. The naphthylene ether skeleton exists as a partial skeleton in the epoxy compound (A). As the epoxy compound (A), only one kind may be used, or two or more kinds may be used in combination.

The epoxy compound (A) preferably has two or more naphthylene ether skeletons, more preferably three or more, even more preferably four or more, preferably 15 or less, and 10 or less. It is more preferable to have. When the number of the naphthylene ether skeletons is at least the above lower limit, the dielectric loss tangent can be further lowered, and the linear expansion coefficient can be further lowered. When the number of naphthylene ether skeletons is not more than the above upper limit, the embeddability on the uneven surface can be further enhanced. Moreover, when the number of the naphthylene ether skeleton is not more than the upper limit, the flexibility of the resin film can be increased.

Examples of the epoxy compound (A) include naphthol aralkyl type epoxy compounds.

The (A) epoxy compound is preferably a solid epoxy compound at 25°C.

The molecular weight of the (A) epoxy compound is preferably 5000 or less. In this case, even if the content of the inorganic filler is 50% by weight or more in 100% by weight of the component excluding the solvent in the resin material, a resin material having high fluidity at the time of forming the insulating layer can be obtained. Therefore, when the uncured resin material or the B-staged resin material is laminated on the circuit board, the inorganic filler can be uniformly present.

The molecular weight of the (A) epoxy compound means the molecular weight that can be calculated from the structural formula when the (A) epoxy compound is not a polymer and when the structural formula of the (A) epoxy compound can be specified. Further, the molecular weight of the (A) epoxy compound means the weight average molecular weight when the (A) epoxy compound is a polymer.

From the viewpoint of further increasing the glass transition temperature and thermal dimensional stability of the cured product and the viewpoint of reducing side lobes, the softening point of the epoxy compound (A) is preferably higher than 90°C, more preferably 95°C or higher, and It is preferably 100°C or higher, preferably 200°C or lower, more preferably 150°C or lower, and further preferably 130°C or lower. The softening point of the epoxy compound (A) may be 90° C. or lower, 85° C. or lower, or 80° C. or lower.

(A) The softening point of the epoxy compound is measured by using a differential scanning calorimeter (for example, "Q2000" manufactured by TA Instruments Co., Ltd.) at a temperature rising rate of 3°C/min from -30°C to 200°C in a nitrogen atmosphere. It can be obtained from the inflection point of reverse heat flow by heating below.

The content of the epoxy compound (A) in 100% by weight of the component excluding the inorganic filler (E) and the solvent in the resin material is preferably 9% by weight or more, more preferably 15% by weight or more, and preferably 45% by weight or more. It is not more than 36% by weight, more preferably not more than 36% by weight. When the content of the epoxy compound (A) is at least the above lower limit and at most the above upper limit, the dielectric loss tangent of the cured product can be further reduced. When the content of the epoxy compound (A) is at most the above upper limit, the surface roughness after etching can be further reduced. Further, when the content of the (A) epoxy compound is not more than the above upper limit, the glass transition temperature of the cured product can be increased, and the heating temperature for the main curing of the resin material can be 200° C. or less. it can. Furthermore, when the content of the (A) epoxy compound is at most the above upper limit, the flexibility of the resin film can be increased.

[(B) Active ester compound having naphthylene ether skeleton]
The resin material contains (B) an active ester compound having a naphthylene ether skeleton. The (B) active ester compound is a curing agent. The active ester compound (B) is a compound having a naphthylene ether skeleton and an ester bond, and having an aliphatic chain, an aliphatic ring or an aromatic ring bonded to both sides of the ester bond. As the active ester compound (B), only one type may be used, or two or more types may be used in combination.

From the viewpoint of accelerating the curing reaction, the active ester compound (B) preferably has 3 or more naphthylene ether skeletons and 2 or more ester bonds. If the number of naphthylene ether skeletons in the active ester compound (B) is less than 3 or the number of ester bonds is less than 2, the curing reaction cannot be satisfactorily progressed, and the curing agent is It may not be able to function.

The active ester compound (B) preferably has 3 or more naphthylene ether skeletons, more preferably 4 or more, preferably 15 or less, more preferably 10 or less, 8 It is more preferable to have not more than one. When the number of naphthylene ether skeletons is equal to or more than the above lower limit, the dielectric loss tangent of the cured product can be further lowered, and the linear expansion coefficient can be further lowered. When the number of the naphthylene ether skeleton is not less than the above lower limit, the surface roughness after etching can be further reduced. When the number of naphthylene ether skeletons is at least the above lower limit, the glass transition temperature of the cured product can be increased, and the heating temperature for the main curing of the resin material can be 200°C or less. .. When the number of the naphthylene ether skeleton is not more than the above upper limit, the flexibility of the B stage film can be increased. Further, when the number of naphthylene ether skeletons is equal to or less than the above upper limit, embeddability on the uneven surface can be enhanced.

The naphthylene ether skeleton in the active ester compound (B) is preferably present in a portion other than the terminal. The active ester compound (B) is preferably an active ester compound having a naphthylene ether skeleton (excluding active ester compounds having a naphthylene ether skeleton at the terminal). The active ester compound (B) preferably has the above naphthylene ether skeleton in a portion other than the terminal. In this case, the effect of the present invention can be more effectively exhibited.

Examples of the active ester compound (B) include compounds represented by the following formula (1).

In the above formula (1), X1 represents a group containing an aliphatic chain, a group containing an aliphatic ring or a group containing an aromatic ring, X2 represents a group containing an aromatic ring, and among X1 and X2 At least one of them has a naphthylene ether skeleton.

In the above formula (1), X1 and X2 preferably have any of the following configurations (i) to (iii).

(I) In the above formula (1), X1 represents a group containing an aliphatic chain, a group containing an aliphatic ring or a group containing an aromatic ring, and X2 represents a group containing a naphthylene ether skeleton.

(Ii) In the above formula (1), X1 represents a group containing a naphthylene ether skeleton, and X2 represents a group containing an aromatic ring.

(Iii) In the above formula (1), X1 represents a group containing a naphthylene ether skeleton, and X2 represents a group containing a naphthylene ether skeleton.

In the formula (1), when X1 is a group containing a naphthylene ether skeleton, the X1 may further have an aliphatic chain or an aliphatic ring, and the naphthylene ether skeleton is Alternatively, it may further have an aromatic ring. Further, in the above formula (1), when X2 is a group containing a naphthylene ether skeleton, the X2 may further have an aromatic ring in addition to the naphthylene ether skeleton. Further, in the above formula (1), when X2 is a group containing a naphthylene ether skeleton, X2 may have a structure derived from a naphthalene diol compound, and a structure derived from a naphthalene diol compound is It may have a continuous structure. Further, the structure derived from the naphthalenediol compound may have two or more oxygen atoms. The naphthalene skeleton in the structure derived from the naphthalene diol compound may have a substituent.

Preferable examples of the group containing an aromatic ring in the above formula (1) include a benzene ring which may have a substituent and a naphthalene ring which may have a substituent. A hydrocarbon group is mentioned as said substituent.

The active ester compound having a naphthylene ether skeleton may have a linear structure or a branched structure.

For example, the active ester compound having a naphthylene ether skeleton may be a compound represented by the following formula (1A).

In the above formula (1A), R represents a group having an aliphatic skeleton or an aromatic skeleton, and n represents an integer of 1 or more. R in the above formula (1A) is a side chain. Examples of R in the above formula (1A) include a benzyl group.

From the viewpoint of enhancing the glass transition temperature, thermal dimensional stability and flame retardancy of the cured product, the (B) active ester compound preferably has at least one aromatic ring that does not form the naphthylene ether skeleton. It is more preferable to have two or more.

The softening point of the (B) active ester compound is preferably 145° C., from the viewpoint of further enhancing the thermal dimensional stability of the cured product, and further enhancing the flexibility of the B-stage film and the sufficient curability after the main curing. Is more than 150°C, more preferably 150°C or higher, preferably 200°C or lower, more preferably 190°C or lower, still more preferably 180°C or lower. The softening point of the active ester compound (B) may be 145°C or lower, or 140°C or lower.

(B) The softening point of the active ester compound is measured by using a differential scanning calorimeter (for example, “Q2000” manufactured by TA Instruments Co., Ltd.) at a temperature rising rate of 3° C./min from −30° C. to 200° C. nitrogen. It can be determined from the inflection point of reverse heat flow by heating in an atmosphere.

The content of the (B) active ester compound in 100% by weight of the component excluding the inorganic filler and the solvent in the resin material is preferably 9% by weight or more, more preferably 15% by weight or more, and preferably It is 45% by weight or less, more preferably 36% by weight or less. When the content of the active ester compound (B) is at least the above lower limit, the dielectric loss tangent can be further lowered and the thermal dimensional stability can be enhanced. When the content of the active ester compound (B) is not more than the above upper limit, the embeddability on the uneven surface can be further enhanced, and the heating temperature for the main curing of the resin material can be kept low. In addition, the flexibility of the B stage film can be increased.

<Other details of (A) epoxy compound and (B) active ester compound>
In the resin material according to the present invention, the combination of the (A) epoxy compound and the (B) active ester compound is the following first combination, second combination, or third combination.

First combination: an epoxy compound having a naphthylene ether skeleton and a softening point of 90° C. or lower and an active ester compound having a naphthylene ether skeleton and having a softening point of higher than 145° C.

Second combination: an epoxy compound having a naphthylene ether skeleton and a softening point of more than 90° C. and an active ester compound having a naphthylene ether skeleton and a softening point of 145° C. or less.

Third combination: an epoxy compound having a naphthylene ether skeleton and having a softening point of more than 90° C. and an active ester compound having a naphthylene ether skeleton and having a softening point of more than 145° C.

From the viewpoint of more effectively exhibiting the effects of the present invention, the combination of the (A) epoxy compound and the (B) active ester compound is preferably the first combination or the third combination, The second combination or the third combination is preferable.

From the viewpoint of exerting the effect of the present invention even more effectively, the combination of the (A) epoxy compound and the (B) active ester compound is preferably the third combination.

In the case where the combination of the epoxy compound (A) and the active ester compound (B) is the first combination described above, it is preferable that the following conditions are satisfied. The epoxy compound having the naphthylene ether skeleton and having the softening point of 90° C. or lower and the naphthylene ether skeleton are contained in 100% by weight of all the epoxy compounds and all the curing agents contained in the resin material. And the total content with the active ester compound having a softening point of higher than 145° C. is defined as the content (X). The content (X) is preferably 35% by weight or more, more preferably 55% by weight or more, preferably 85% by weight or less, more preferably 75% by weight or less. When the content (X) is at least the above lower limit and at most the above upper limit, the effects of the present invention can be more effectively exhibited.

In the case where the combination of the (A) epoxy compound and the (B) active ester compound is the second combination, it is preferable that the following conditions are satisfied. The epoxy compound having the naphthylene ether skeleton and having the softening point of more than 90° C. and the naphthylene ether skeleton in 100% by weight of the total amount of all the epoxy compounds and all the curing agents contained in the resin material. And the total content with the active ester compound having a softening point of 145° C. or lower is defined as the content (Y). The content (Y) is preferably 35% by weight or more, more preferably 55% by weight or more, preferably 85% by weight or less, more preferably 75% by weight or less. When the content (Y) is at least the above lower limit and at most the above upper limit, the effects of the present invention can be more effectively exhibited.

In the case where the combination of the epoxy compound (A) and the active ester compound (B) is the third combination, it is preferable that the following be satisfied. The epoxy compound having the naphthylene ether skeleton and having the softening point of more than 90° C. and the naphthylene ether skeleton in 100% by weight of the total amount of all the epoxy compounds and all the curing agents contained in the resin material. And the total content with the active ester compound having a softening point of higher than 145° C. is defined as the content (Z). The content (Z) is preferably 35% by weight or more, more preferably 50% by weight or more, preferably 80% by weight or less, more preferably 70% by weight or less. When the content (Z) is at least the above lower limit and at most the above upper limit, the effects of the present invention can be more effectively exhibited.

[(C) Epoxy compound having no naphthylene ether skeleton (second epoxy compound)]
The resin material preferably contains (C) an epoxy compound (second epoxy compound) having no naphthylene ether skeleton. As the second epoxy compound (C), a conventionally known epoxy compound having no naphthylene ether skeleton can be used. The (C) second epoxy compound is a compound having at least one epoxy group and having no naphthylene ether skeleton. The (C) second epoxy compound and the (A) epoxy compound are different compounds. As the second epoxy compound (C), only one kind may be used, or two or more kinds may be used in combination.

(C) As the second epoxy compound, a bisphenol A type epoxy compound, a bisphenol F type epoxy compound, a bisphenol S type epoxy compound, a phenol novolac type epoxy compound, a biphenyl type epoxy compound, a biphenyl novolac type epoxy compound, a biphenol type epoxy compound. , Naphthalene type epoxy compound, fluorene type epoxy compound, phenol aralkyl type epoxy compound, dicyclopentadiene type epoxy compound, anthracene type epoxy compound, epoxy compound having adamantane skeleton, epoxy compound having tricyclodecane skeleton, and skeleton of triazine nucleus The epoxy compound and the like included in 1.

From the viewpoint of further lowering the dielectric loss tangent and enhancing the thermal dimensional stability and flame retardancy of the cured product, the (C) second epoxy compound preferably contains an epoxy compound having an aromatic skeleton, and naphthalene An epoxy compound having a skeleton, a phenyl skeleton or a biphenyl skeleton is more preferable, and an epoxy compound having an aromatic skeleton is further preferable.

The (C) second epoxy compound preferably contains a liquid epoxy compound at 25° C., and more preferably contains a liquid epoxy compound at 25° C. and a solid epoxy compound at 25° C. In this case, since the curing reaction can be sufficiently advanced, the dielectric loss tangent can be further lowered, and the linear expansion coefficient (CTE) of the cured product can be improved. Further, in this case, since the melt viscosity of the resin material can be effectively reduced, the embeddability on the uneven surface can be enhanced and the curing temperature can be lowered.

The viscosity of the second epoxy compound (C) liquid at 25° C. at 25° C. is preferably 1000 mPa·s or less, more preferably 500 mPa·s or less.

(C) The viscosity of the second epoxy compound can be measured by using, for example, a dynamic viscoelasticity measuring device (“VAR-100” manufactured by Rheological Instruments).

The molecular weight of the (C) second epoxy compound is more preferably 1,000 or less. In this case, even if the content of the inorganic filler is 50% by weight or more in 100% by weight of the component excluding the solvent in the resin material, a resin material having high fluidity at the time of forming the insulating layer can be obtained. Therefore, when the uncured resin material or the B-staged resin material is laminated on the circuit board, the inorganic filler can be uniformly present.

The molecular weight of the (C) second epoxy compound is determined from the structural formula (C) when the second epoxy compound is not a polymer and when the structural formula of the (C) second epoxy compound can be specified. It means the molecular weight that can be calculated. The molecular weight of the (C) second epoxy compound means the weight average molecular weight when the (C) second epoxy compound is a polymer.

The content of the (C) second epoxy compound in 100% by weight of the component excluding the inorganic filler and the solvent in the resin material is preferably 6% by weight or more, more preferably 15% by weight or more, It is preferably 36% by weight or less, more preferably 30% by weight or less. (C) When the content of the second epoxy compound is at least the above lower limit and not more than the above upper limit, the thermal dimensional stability of the cured product is further enhanced, and the flexibility of the B stage film and sufficient curing after the main curing are achieved. Sex is even higher.

[(D) Curing Agent (Second Curing Agent)]
The resin material preferably contains a curing agent (second curing agent) different from the active ester compound (D) having a naphthylene ether skeleton. (D) The second curing agent is not particularly limited. (D) As the second curing agent, a conventionally known curing agent can be used. As the second curing agent (D), only one type may be used, or two or more types may be used in combination.

(D) As the second curing agent, a cyanate ester compound (cyanate ester curing agent), an active ester compound having no naphthylene ether skeleton, an amine compound (amine curing agent), a thiol compound (thiol curing agent), phosphine Examples thereof include compounds, dicyandiamide, phenol compounds (phenol curing agents), acid anhydrides, carbodiimide compounds (carbodiimide curing agents), and benzoxazine compounds (benzoxazine curing agents). The (D) second curing agent preferably has a functional group capable of reacting with the epoxy group of the epoxy compound.

From the viewpoint of further enhancing the thermal dimensional stability, the (D) second curing agent is a phenol compound, a cyanate ester compound, an acid anhydride, a carbodiimide compound, an active ester compound having no naphthylene ether skeleton, and benzoxazine. It is preferred to include at least one component of the compound. That is, the resin material is a curing agent containing at least one component selected from a phenol compound, a cyanate ester compound, an acid anhydride, a carbodiimide compound, an active ester compound having no naphthylene ether skeleton, and a benzoxazine compound. It is preferable to include. It is particularly preferable that the resin material contains the phenol compound.

In the present specification, "component X" means "at least one component of a phenol compound, a cyanate ester compound, an acid anhydride, a carbodiimide compound, an active ester compound having no naphthylene ether skeleton, and a benzoxazine compound". May be described.

Therefore, it is preferable that the resin material contains a curing agent containing the component X. As the component X, only one type may be used, or two or more types may be used in combination.

Examples of the phenol compound include novolac type phenol, biphenol type phenol, naphthalene type phenol, dicyclopentadiene type phenol, aralkyl type phenol and dicyclopentadiene type phenol.

As commercial products of the above-mentioned phenol compounds, novolac type phenols (“TD-2091” manufactured by DIC), biphenyl novolac type phenols (“MEH-7851” manufactured by Meiwa Kasei Co., Ltd.), aralkyl type phenol compounds (“MEH manufactured by Meiwa Kasei Co., Ltd.” -7800"), and a phenol having an aminotriazine skeleton ("LA1356" and "LA3018-50P" manufactured by DIC) and the like.

Examples of the cyanate ester compound include novolac type cyanate ester resins, bisphenol type cyanate ester resins, and prepolymers obtained by partially trimming these. Examples of the novolac type cyanate ester resin include a phenol novolac type cyanate ester resin and an alkylphenol type cyanate ester resin. Examples of the bisphenol type cyanate ester resin include a bisphenol A type cyanate ester resin, a bisphenol E type cyanate ester resin and a tetramethylbisphenol F type cyanate ester resin.

As commercial products of the above cyanate ester compounds, phenol novolac type cyanate ester resins (“PT-30” and “PT-60” manufactured by Lonza Japan Co., Ltd.), and a prepolymer obtained by trimerizing a bisphenol type cyanate ester resin (Lonza Japan "BA-230S", "BA-3000S", "BTP-1000S", and "BTP-6020S") manufactured by the company can be used.

Examples of the acid anhydride include tetrahydrophthalic anhydride, an alkylstyrene-maleic anhydride copolymer, and the like.

Examples of commercially available products of the acid anhydride include "Rikacid TDA-100" manufactured by Shin Nippon Rika Co., Ltd. and the like.

The carbodiimide compound has a structural unit represented by the following formula (2). In the following formula (2), the right end and the left end are binding sites with other groups. Only 1 type may be used for the said carbodiimide compound, and 2 or more types may be used together.

In the above formula (2), X is an alkylene group, a group in which a substituent is bonded to an alkylene group, a cycloalkylene group, a group in which a substituent is bonded to a cycloalkylene group, an arylene group, or a substituent is bonded to an arylene group. Represents a group, and p represents an integer of 1 to 5. When there are a plurality of Xs, the plurality of Xs may be the same or different.

In one preferable form, at least one X is an alkylene group, a group having a substituent bonded to an alkylene group, a cycloalkylene group, or a group having a substituent bonded to a cycloalkylene group.

Commercially available products of the above-mentioned carbodiimide compounds include "carbodilite V-02B", "carbodilite V-03", "carbodilite V-04K", "carbodilite V-07", "carbodilite V-09", and "carbodilite" manufactured by Nisshinbo Chemical Inc. 10M-SP", "Carbodilite 10M-SP (modified)", and "Stabaxol P", "Stabaxol P400", "Hikasil 510" manufactured by Rhein Chemie.

The active ester compound having no naphthylene ether skeleton has no naphthylene ether skeleton, has at least one ester bond, and has an aliphatic chain, an aliphatic ring, or an aromatic group on both sides of the ester bond. A compound in which a group ring is bonded. The active ester compound having no naphthylene ether skeleton is obtained, for example, by a condensation reaction of a carboxylic acid compound or a thiocarboxylic acid compound with a hydroxy compound or a thiol compound.

The active ester compound having no naphthylene ether skeleton is preferably an active ester compound having no naphthylene ether skeleton and having a dicyclopentadiene skeleton.

Examples of commercially available active ester compounds having no naphthylene ether skeleton include "HPC-8000L-65T" manufactured by DIC.

Examples of the benzoxazine compound include Pd type benzoxazine and Fa type benzoxazine.

As a commercial item of the said benzoxazine compound, "Pd type" by Shikoku Chemicals Co., Ltd. etc. are mentioned.

Content of all curing agents (100 parts by weight of (A) epoxy compound and (C) second epoxy compound) (100 parts by weight of all epoxy compounds) ((B) active ester compound and (D) second) The total content with the curing agent) is preferably 70 parts by weight or more, more preferably 80 parts by weight or more. Content of all curing agents (100 parts by weight of (A) epoxy compound and (C) second epoxy compound) (100 parts by weight of all epoxy compounds) ((B) active ester compound and (D) second) The total content with the curing agent) is preferably 150 parts by weight or less, more preferably 120 parts by weight or less. When the content is equal to or more than the lower limit and equal to or less than the upper limit, curability is more excellent, thermal dimensional stability is further enhanced, and volatilization of residual unreacted components can be further suppressed.

In 100% by weight of the components excluding the inorganic filler and solvent in the resin material, the total content of all epoxy compounds and all curing agents is preferably 40% by weight or more, more preferably 60% by weight or more. %, preferably 90% by weight or less, more preferably 85% by weight or less. When the total content is not less than the above lower limit and not more than the above upper limit, the curability is more excellent and the thermal dimensional stability can be further enhanced. The above-mentioned "total content of all epoxy compounds and all curing agents" means "(A) epoxy compound, (C) second epoxy compound, (B) active ester compound, and (D) second The total content with the curing agent".

[(E) Inorganic filler]
The resin material preferably contains (E) an inorganic filler. By using the inorganic filler (E), the dielectric loss tangent of the cured product can be further lowered. Further, the use of the inorganic filler (E) further reduces the dimensional change due to heat of the cured product. As the inorganic filler (E), only one type may be used, or two or more types may be used in combination.

Examples of the inorganic filler (E) include silica, talc, clay, mica, hydrotalcite, alumina, magnesium oxide, aluminum hydroxide, aluminum nitride, and boron nitride.

The surface roughness of the cured product is reduced, the adhesive strength between the cured product and the metal layer is further increased, and finer wiring is formed on the surface of the cured product, and the cured product has better insulation reliability. From the viewpoint of imparting, the (E) inorganic filler is preferably silica or alumina, more preferably silica, and further preferably fused silica. The use of silica results in a lower coefficient of thermal expansion of the cured product and a lower dielectric loss tangent of the cured product. Further, by using silica, the surface roughness of the surface of the cured product is effectively reduced, and the adhesive strength between the cured product and the metal layer is effectively increased. The shape of silica is preferably spherical.

The inorganic filler (E) is spherical silica from the viewpoint of promoting the curing of the resin regardless of the curing environment, effectively increasing the glass transition temperature of the cured product, and effectively reducing the thermal linear expansion coefficient of the cured product. Is preferred.

The average particle size of the inorganic filler (E) is preferably 50 nm or more, more preferably 100 nm or more, still more preferably 500 nm or more, preferably 5 μm or less, more preferably 3 μm or less, still more preferably 1 μm or less. (E) When the average particle size of the inorganic filler is not less than the above lower limit and not more than the above upper limit, the surface roughness after etching can be reduced and the plating peel strength can be increased, and the insulating layer and the metal layer It is possible to further improve the adhesiveness with.

(E) As the average particle diameter of the inorganic filler, the value of the median diameter (d50) at 50% is adopted. The average particle diameter can be measured using a laser diffraction/scattering particle size distribution measuring device.

The (E) inorganic filler is preferably spherical, and more preferably spherical silica. In this case, the surface roughness of the surface of the cured product is effectively reduced, and the adhesive strength between the cured product and the metal layer is effectively increased. When the (E) inorganic filler is spherical, the aspect ratio of the (E) inorganic filler is preferably 2 or less, more preferably 1.5 or less.

The inorganic filler (E) is preferably surface-treated, more preferably a surface-treated product with a coupling agent, and even more preferably a surface-treated product with a silane coupling agent. By surface-treating the inorganic filler (E), the surface roughness of the surface of the roughened cured product is further reduced, and the adhesive strength between the cured product and the metal layer is further enhanced. In addition, since the inorganic filler (E) is surface-treated, finer wiring can be formed on the surface of the cured product, and the insulation reliability between wirings and interlayer insulation reliability are improved. Can be attached to things.

Examples of the coupling agent include a silane coupling agent, a titanium coupling agent and an aluminum coupling agent. Examples of the silane coupling agent include methacrylsilane, acrylsilane, aminosilane, imidazolesilane, vinylsilane, and epoxysilane.

The content of the (E) inorganic filler in 100% by weight of the component excluding the solvent in the resin material is preferably 50% by weight or more, more preferably 60% by weight or more, further preferably 65% by weight or more, particularly preferably It is 68% by weight or more, preferably 90% by weight or less, more preferably 85% by weight or less, further preferably 80% by weight or less, particularly preferably 75% by weight or less. When the content of the inorganic filler (E) is at least the above lower limit, the dielectric loss tangent becomes effectively low. When the content of the inorganic filler (E) is less than or equal to the above upper limit, thermal dimensional stability can be increased and warpage of the cured product can be effectively suppressed. (E) When the content of the inorganic filler is not less than the above lower limit and not more than the above upper limit, the surface roughness of the surface of the cured product can be further reduced, and finer wiring can be formed on the surface of the cured product. can do. Further, the content of this inorganic filler can reduce the coefficient of thermal expansion of the cured product and at the same time improve the smear removing property.

[(F) Curing accelerator]
The resin material preferably contains (F) a curing accelerator. (F) By using the curing accelerator, the curing speed is further increased. By rapidly curing the resin material, the crosslinked structure in the cured product becomes uniform, the number of unreacted functional groups decreases, and as a result, the crosslink density increases. The curing accelerator (F) is not particularly limited, and conventionally known curing accelerators can be used. As the curing accelerator (F), only one type may be used, or two or more types may be used in combination.

Examples of the (F) curing accelerator include anionic curing accelerators such as imidazole compounds, cationic curing accelerators such as amine compounds, and curing other than anionic and cationic curing accelerators such as phosphorus compounds and organometallic compounds. Examples include accelerators and radical curing accelerators such as peroxides.

Examples of the imidazole compound include 2-undecylimidazole, 2-heptadecylimidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl- 2-methylimidazole, 1-benzyl-2-phenylimidazole, 1,2-dimethylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-un Decylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2,4-diamino-6-[2' -Methylimidazolyl-(1')]-ethyl-s-triazine, 2,4-diamino-6-[2'-undecylimidazolyl-(1')]-ethyl-s-triazine, 2,4-diamino- 6-[2'-ethyl-4'-methylimidazolyl-(1')]-ethyl-s-triazine, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s -Triazine isocyanuric acid adduct, 2-phenylimidazole isocyanuric acid adduct, 2-methylimidazole isocyanuric acid adduct, 2-phenyl-4,5-dihydroxymethylimidazole and 2-phenyl-4-methyl-5-dihydroxymethylimidazole Etc.

Examples of the amine compound include diethylamine, triethylamine, diethylenetetramine, triethylenetetramine and 4,4-dimethylaminopyridine.

Examples of the phosphorus compound include triphenylphosphine compounds and the like.

Examples of the organometallic compound include zinc naphthenate, cobalt naphthenate, tin octylate, cobalt octylate, bisacetylacetonato cobalt (II), and trisacetylacetonato cobalt (III).

Examples of the above-mentioned peroxides include dicumyl peroxide and perhexyl 25B.

From the viewpoint of further suppressing the curing temperature and effectively suppressing the warp of the cured product, the (F) curing accelerator preferably contains the anionic curing accelerator, and more preferably contains the imidazole compound. ..

From the viewpoint of further suppressing the curing temperature and effectively suppressing the warp of the cured product, the content of the anionic curing accelerator in 100% by weight of the (F) curing accelerator is preferably 20% by weight or more, It is more preferably 50% by weight or more, further preferably 70% by weight or more, and most preferably 100% by weight (total amount). Therefore, the (F) curing accelerator is most preferably the anionic curing accelerator.

The content of the (F) curing accelerator is not particularly limited. The content of the (F) curing accelerator is preferably 0.01% by weight or more, more preferably 0.05% by weight or more in 100% by weight of the component excluding the inorganic filler and the solvent in the resin material. %, preferably 5% by weight or less, more preferably 3% by weight or less. When the content of the (F) curing accelerator is at least the above lower limit and at most the above upper limit, the resin material is efficiently cured. If the content of the curing accelerator is in a more preferable range, the storage stability of the resin material will be further enhanced, and a better cured product will be obtained.

[(G) Compound having skeleton derived from dimer diamine or skeleton derived from trimer triamine and different from polyimide compound]
The resin material according to the present invention preferably has a skeleton derived from (G) dimer diamine or a skeleton derived from trimer triamine and contains a compound different from the polyimide compound. The compound (G) is a compound having a skeleton derived from dimer diamine or a skeleton derived from trimer triamine. The compound (G) is a compound different from the polyimide compound. The compound (G) may have a skeleton derived from dimerdiamine, may have a skeleton derived from trimertriamine, and has a skeleton derived from dimerdiamine and a skeleton derived from trimertriamine. You may have. As the compound (G), only one type may be used, or two or more types may be used in combination.

The skeleton derived from the dimer diamine or the skeleton derived from the trimer triamine is preferably present as a partial skeleton in the compound (G).

The compound (G) is preferably a maleimide compound. That is, the (G) compound is preferably a maleimide compound having a skeleton derived from dimer diamine or a skeleton derived from trimer triamine.

The maleimide compound is preferably a bismaleimide compound. That is, the (G) compound is also preferably a bismaleimide compound having a skeleton derived from dimer diamine.

The maleimide compound includes a citracone imide compound. The above citraconimide compound is a compound in which a methyl group is bonded to one of the carbon atoms constituting the double bond between carbon atoms in the maleimide group. The maleimide compound may be a citracone imide compound. Since the citraconic imide compound has lower reactivity than the maleimide compound, the storage stability of the resin material can be improved.

The compound (G) may have a skeleton derived from a diamine compound other than dimerdiamine or a skeleton derived from a triamine compound other than trimertriamine. In this case, the (G) compound may have a skeleton derived from a diamine compound other than dimerdiamine, or may have a skeleton derived from a triamine compound other than trimertriamine.

The (G) compound preferably has a skeleton derived from dimer diamine or trimer triamine in the main chain and a skeleton derived from a diamine compound other than dimer diamine or a triamine compound other than trimer triamine. In this case, the miscibility with each compounding component when obtaining the resin material can be increased, and the softening point of the (G) compound can be increased to improve the thermal dimensional stability of the cured product.

From the viewpoint of enhancing the thermal dimensional stability of the cured product, the diamine compound other than the dimer diamine or the triamine compound other than the trimer triamine is a diamine compound having a tricyclodecane skeleton or a triamine compound having a tricyclodecane skeleton. Is preferred.

The compound (G) may have a skeleton derived from dimer diamine or trimer triamine only at both ends of the main chain. The compound (G) may have a skeleton derived from a diamine compound other than dimerdiamine or a triamine compound other than trimertriamine at both ends of the main chain. From the viewpoint of enhancing reactivity, the (G) compound preferably has a skeleton derived from an aliphatic diamine compound at the end of the main chain.

The compound (G) preferably has a skeleton derived from the dimer diamine or a skeleton derived from trimer triamine at both ends of the main chain. In this case, the compound (G) may have a skeleton derived from the dimerdiamine at both ends of the main chain, or may have a skeleton derived from the trimertriamine at both ends of the main chain. .. In this case, the compound (G) may have a skeleton derived from the dimerdiamine at one end of the main chain and a skeleton derived from the trimertriamine at the other end of the main chain. Good. In this case, the compound (G) may have a skeleton derived from the dimer diamine or a skeleton derived from trimer triamine in both ends of the main chain and the skeleton other than both ends of the main chain. It may have a skeleton derived from the above dimer diamine or a skeleton derived from trimer triamine only at both ends of the chain.

The compound (G) more preferably has a skeleton derived from the dimer diamine or a skeleton derived from the trimer triamine only at both ends of the main chain. When the compound (G) has a skeleton derived from the dimer diamine or a skeleton derived from the trimer triamine only at both ends of the main chain, the main chain skeleton can be made relatively rigid. G) The softening point of the compound can be increased more effectively. Therefore, the thermal dimensional stability of the cured product can be further enhanced.

From the viewpoint of effectively exerting the effect of the present invention, the (G) compound preferably has a skeleton derived from a reaction product of a diamine compound and an acid dianhydride, at a portion other than both ends of the main chain. .

From the viewpoint of more effectively exerting the effect of the present invention, the compound (G) has a skeleton derived from the dimer diamine or a skeleton derived from trimer triamine only at both ends of the main chain, and the main chain It is preferable to have a skeleton derived from a reaction product of a diamine compound and an acid dianhydride, in a portion other than both ends of.

The compound (G) (maleimide compound) is an acid dianhydride such as tetracarboxylic acid dianhydride, a dimer diamine or trimer triamine, and, if necessary, a diamine compound other than dimer diamine or a triamine compound other than trimer triamine. It can be obtained by reacting the above with a maleic anhydride after the reaction is obtained.

The (G) compound (maleimide compound) having a skeleton derived from the dimer diamine or a skeleton derived from the trimer triamine only at both ends of the main chain can be obtained, for example, as follows. An acid dianhydride such as tetracarboxylic acid dianhydride is reacted with a diamine compound other than dimerdiamine or a triamine compound other than trimertriamine to obtain a first reaction product. The obtained first reaction product is reacted with dimer diamine or trimer triamine to obtain a second reaction product. The obtained second reactant is reacted with maleic anhydride.

The (G) compound (maleimide compound) having a skeleton derived from a reaction product of a diamine compound and an acid dianhydride at a portion other than both ends of the main chain can be obtained, for example, as follows. An acid dianhydride such as tetracarboxylic acid dianhydride is reacted with a diamine compound other than dimer diamine to obtain a first reaction product. The obtained first reaction product is reacted with dimer diamine or trimer triamine to obtain a second reaction product. The obtained second reactant is reacted with maleic anhydride.

Examples of the tetracarboxylic dianhydride include pyromellitic dianhydride, 3,3',4,4'-benzophenone tetracarboxylic dianhydride, 3,3',4,4'-biphenylsulfone tetra Carboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 3,3′,4,4′-biphenyl ether Tetracarboxylic acid dianhydride, 3,3′,4,4′-dimethyldiphenylsilane tetracarboxylic acid dianhydride, 3,3′,4,4′-Tetraphenylsilane tetracarboxylic acid dianhydride, 1,2 ,3,4-furantetracarboxylic dianhydride, 4,4'-bis(3,4-dicarboxyphenoxy)diphenyl sulfide dianhydride, 4,4'-bis(3,4-dicarboxyphenoxy)diphenyl Sulfone dianhydride, 4,4'-bis(3,4-dicarboxyphenoxy)diphenylpropane dianhydride, 3,3',4,4'-perfluoroisopropylidene diphthalic acid dianhydride, 3,3 ',4,4'-Biphenyltetracarboxylic dianhydride, bis(phthalic acid)phenylphosphine oxide dianhydride, p-phenylene-bis(triphenylphthalic acid) dianhydride, m-phenylene-bis(triphenyl Phthalic acid) dianhydride, bis(triphenylphthalic acid)-4,4′-diphenylether dianhydride, and bis(triphenylphthalic acid)-4,4′-diphenylmethane dianhydride.

From the viewpoint of further effectively reducing the surface roughness after etching, the acid dianhydride is preferably an acid dianhydride having an ester bond. Examples of the acid dianhydride having an ester bond include bis(1,3-dioxo-1,3-dihydroisobenzofuran-5-carboxylic acid)1,4-phenylene (manufactured by Tokyo Chemical Industry Co., Ltd.).

Examples of the dimer diamine include Versamine 551 (trade name, manufactured by BASF Japan Ltd., 3,4-bis(1-aminoheptyl)-6-hexyl-5-(1-octenyl)cyclohexene), Versamine 552 (trade name). , Hydrogenated product of Versamine 551 manufactured by Cognix Japan), PRIAMINE 1075, and PRIAMINE 1074 (trade names, all manufactured by Croda Japan Co., Ltd.).

Examples of the trimer triamine include PRIAMINE1071 (trade name, manufactured by Croda Japan) and the like. However, since PRIAMINE 1071 contains the triamine component in an amount of about 20% by mass to 25% by mass, it is necessary to use it in the reaction in consideration of the ratio.

Examples of diamine compounds other than the dimer diamine include 1,3-bis(aminomethyl)cyclohexane, 1,4-bis(aminomethyl)cyclohexane, bis(aminomethyl)norbornane, 3(4),8(9)-bis. (Aminomethyl)tricyclo[5.2.1.02,6]decane, 1,1-bis(4-aminophenyl)cyclohexane, 1,3-cyclohexanediamine, 1,4-cyclohexanediamine, 2,7-diamino Fluorene, 4,4'-ethylenedianiline, isophoronediamine, 4,4'-methylenebis(cyclohexylamine), 4,4'-methylenebis(2,6-diethylaniline), 4,4'-methylenebis(2-ethyl) -6-methylaniline), 4,4'-methylenebis(2-methylcyclohexylamine), 1,4-diaminobutane, 1,10-diaminodecane, 1,12-diaminododecane, 1,7-diaminoheptane, 1 ,6-diaminohexane, 1,5-diaminopentane, 1,8-diaminooctane, 1,3-diaminopropane, 1,11-diaminoundecane, and 2-methyl-1,5-diaminopentane.

The skeleton derived from the dimer diamine has or does not have an aliphatic ring. The skeleton derived from the dimer diamine may or may not have an aliphatic ring.

The skeleton derived from the trimer triamine has or does not have an aliphatic ring. The skeleton derived from the trimertriamine may or may not have an aliphatic ring.

The skeleton derived from the diamine compound may or may not have an aromatic ring. The skeleton derived from the diamine compound may or may not have an aromatic ring.

The skeleton derived from the triamine compound has or does not have an aromatic ring. The skeleton derived from the triamine compound may or may not have an aromatic ring.

The skeleton derived from the diamine compound and the triamine compound has or does not have an aliphatic ring. The skeleton derived from the diamine compound may or may not have an aliphatic ring.

Examples of the aromatic ring include a benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, tetracene ring, chrysene ring, triphenylene ring, tetraphene ring, pyrene ring, pentacene ring, picene ring and perylene ring.

Examples of the aliphatic ring include a monocycloalkane ring, a bicycloalkane ring, a tricycloalkane ring, a tetracycloalkane ring, and dicyclopentadiene.

From the viewpoint of enhancing the thermal dimensional stability of the cured product and enhancing the adhesion between the insulating layer and the metal layer, the softening point of the (G) compound is preferably 70° C. or higher, more preferably 75° C. or higher, and even more preferably Is 80° C. or higher, more preferably 85° C. or higher, particularly preferably 90° C. or higher, most preferably 95° C. or higher. The upper limit of the softening point of the compound (G) is not particularly limited. The softening point of the (G) compound may be 190° C. or lower in view of ease of synthesis of the (G) compound.

The softening point of the compound (G) is measured by using a differential scanning calorimeter (for example, “Q2000” manufactured by TA Instruments Co., Ltd.) at a temperature rising rate of 3° C./minute from −30° C. to 200° C. in a nitrogen atmosphere. It can be obtained from the inflection point of reverse heat flow by heating at.

From the viewpoint of further enhancing the embedding property on the uneven surface, the molecular weight of the (G) compound is preferably 1000 or more, more preferably 1500 or more, further preferably 2500 or more, particularly preferably 3000 or more, and preferably 50000 or less. , More preferably 40,000 or less, further preferably 20,000 or less, particularly preferably 15,000 or less. When the molecular weight of the compound (G) is at least the above lower limit, the linear expansion coefficient of the resin material can be suppressed low. Further, when the molecular weight of the (G) compound exceeds 50,000, the melt viscosity of the resin material becomes higher than that when the molecular weight of the (G) compound is 50,000 or less, and the embeddability on the uneven surface may deteriorate. .

The molecular weight of the (G) compound means a molecular weight that can be calculated from the structural formula when the (G) compound is not a polymer and when the structural formula of the (G) compound can be specified. Moreover, when the (G) compound is a polymer, the molecular weight of the (G) compound is a polystyrene-equivalent weight average molecular weight measured by gel permeation chromatography (GPC).

Weight ratio of content of (G) compound to total content of all epoxy compounds and all curing agents (content of (G) compound/total content of all epoxy compounds and all curing agents) The amount) is preferably 0.1 or more, more preferably 0.15 or more, even more preferably 0.2 or more, preferably 1.5 or less, more preferably 1.2 or less. When the weight ratio is not less than the lower limit and not more than the upper limit, the effects of the present invention can be more effectively exhibited. Further, when the weight ratio is not less than the above lower limit and not more than the above upper limit, the thermal dimensional stability can be further enhanced, the surface roughness after etching can be further reduced, and the plating peel strength can be further enhanced. it can. The above-mentioned "total content of all epoxy compounds and all curing agents" means "of the total of (A) epoxy compound, (C) epoxy compound, (B) active ester compound and (D) curing agent. Content”.

The content of the (G) compound is preferably 5% by weight or more, more preferably 10% by weight or more, further preferably 15% by weight or more in 100% by weight of the components excluding the inorganic filler and the solvent in the resin material. %, preferably 60% by weight or less, more preferably 50% by weight or less. When the content of the compound (G) is at least the above lower limit, the dielectric loss tangent in the low frequency band can be further lowered, and the smear can be more effectively removed by the desmear treatment. When the content of the compound (G) is at least the above lower limit, the adhesion between the insulating layer and the metal layer can be further enhanced, and the surface roughness after etching can be further reduced. When the content of the compound (G) is at most the above upper limit, the thermal dimensional stability can be further enhanced.

[(H) Maleimide compound having neither skeleton derived from dimer diamine nor skeleton derived from trimer triamine]
The resin material preferably contains (H) a maleimide compound having no skeleton derived from dimerdiamine and no skeleton derived from trimertriamine. The (H) maleimide compound is different from the (G) compound. By using the (G) compound and the (H) maleimide compound in combination, the effects of the present invention can be further exerted. The maleimide compound (H) preferably has a skeleton derived from a diamine compound other than dimerdiamine or a triamine compound other than trimertriamine. The (H) maleimide compound preferably has an aromatic skeleton. As the (H) maleimide compound, only one type may be used, or two or more types may be used in combination.

In the (H) maleimide compound, the nitrogen atom in the maleimide skeleton and the aromatic ring are preferably bonded.

Examples of the (H) maleimide compound include a bismaleimide compound and N-phenylmaleimide.

The content of the (H) maleimide compound in 100% by weight of the component excluding the (E) inorganic filler and the solvent in the resin material is preferably 2% by weight or more, more preferably 3% by weight or more, and further preferably 6%. It is not less than 50% by weight, preferably not more than 50% by weight, more preferably not more than 35% by weight. When the content of the (H) maleimide compound is not less than the above lower limit and not more than the above upper limit, the effects of the present invention can be further exerted.

From the viewpoint of effectively exerting the effect of the present invention, the molecular weight of the (H) maleimide compound is preferably 500 or more, more preferably 1000 or more, preferably less than 30,000, more preferably less than 20,000.

The molecular weight of the (H) maleimide compound means a molecular weight that can be calculated from the structural formula when the (H) maleimide compound is not a polymer and when the structural formula of the (H) maleimide compound can be specified. Moreover, the molecular weight of the (H) maleimide compound shows the weight average molecular weight in terms of polystyrene measured by gel permeation chromatography (GPC) when the (H) maleimide compound is a polymer.

Examples of commercially available maleimide compounds (H) include "BMI4000" and "BMI5100" manufactured by Daiwa Kasei Kogyo Co., Ltd.

In addition, when the said resin material contains a bismaleimide compound, a bismaleimide compound may be contained as (G) compound and a bismaleimide compound may be contained as (H) maleimide compound.

The bismaleimide compound in the (G) compound or the (H) maleimide compound is preferably a bismaleimide compound having a structure represented by the following formula (X).

In the formula (X), R1 represents a tetravalent organic group.

Examples of R1 in the above formula (X) include a group having an aromatic ring and a group having a biphenyl ether skeleton. Examples of the group having an aromatic ring include a group having a skeleton derived from pyromellitic anhydride. Examples of the group having a biphenyl ether skeleton include a group having a skeleton derived from 4,4'-oxydiphthalic anhydride.

The bismaleimide compound may have one structure represented by the above formula (X), may have two structures, or may have two or more structures.

[(I) Thermoplastic resin]
The resin material preferably contains (I) a thermoplastic resin. Examples of the thermoplastic resin (I) include polyvinyl acetal resin, polyimide resin and phenoxy resin. As the thermoplastic resin (I), only one type may be used, or two or more types may be used in combination.

The thermoplastic resin (I) is preferably a phenoxy resin from the viewpoint of effectively lowering the dielectric loss tangent and effectively improving the adhesion of the metal wiring regardless of the curing environment. By using the phenoxy resin, it is possible to suppress the deterioration of the embedding property of the resin film in the holes or the irregularities of the circuit board and the nonuniformity of the inorganic filler. Further, by using the phenoxy resin, the melt viscosity can be adjusted, so that the dispersibility of the inorganic filler is improved, and it becomes difficult for the resin composition or the B-staged product to wet and spread in an unintended region during the curing process.

The phenoxy resin contained in the resin material is not particularly limited. As the phenoxy resin, a conventionally known phenoxy resin can be used. The phenoxy resin may be used alone or in combination of two or more.

Examples of the phenoxy resin include a phenoxy resin having a skeleton such as a bisphenol A type skeleton, a bisphenol F type skeleton, a bisphenol S type skeleton, a biphenyl skeleton, a novolac skeleton, a naphthalene skeleton, and an imide skeleton.

Examples of commercially available phenoxy resins include "YP50", "YP55" and "YP70" manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., and "1256B40", "4250", "4256H40", "4275" manufactured by Mitsubishi Chemical Corporation. , "YX6954BH30" and "YX8100BH30".

The thermoplastic resin (I) is preferably a polyimide resin (polyimide compound) from the viewpoints of handling property, plating peel strength at low roughness, and adhesion between the insulating layer and the metal layer.

From the viewpoint of improving solubility, the polyimide compound is preferably a polyimide compound obtained by a method of reacting tetracarboxylic dianhydride and dimer diamine.

Examples of the tetracarboxylic dianhydride include pyromellitic dianhydride, 3,3',4,4'-benzophenone tetracarboxylic dianhydride, 3,3',4,4'-biphenylsulfone tetra Carboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 3,3′,4,4′-biphenyl ether Tetracarboxylic acid dianhydride, 3,3′,4,4′-dimethyldiphenylsilane tetracarboxylic acid dianhydride, 3,3′,4,4′-Tetraphenylsilane tetracarboxylic acid dianhydride, 1,2 ,3,4-furantetracarboxylic dianhydride, 4,4'-bis(3,4-dicarboxyphenoxy)diphenyl sulfide dianhydride, 4,4'-bis(3,4-dicarboxyphenoxy)diphenyl Sulfone dianhydride, 4,4'-bis(3,4-dicarboxyphenoxy)diphenylpropane dianhydride, 3,3',4,4'-perfluoroisopropylidene diphthalic acid dianhydride, 3,3 ',4,4'-Biphenyltetracarboxylic dianhydride, bis(phthalic acid)phenylphosphine oxide dianhydride, p-phenylene-bis(triphenylphthalic acid) dianhydride, m-phenylene-bis(triphenyl Phthalic acid) dianhydride, bis(triphenylphthalic acid)-4,4′-diphenylether dianhydride, and bis(triphenylphthalic acid)-4,4′-diphenylmethane dianhydride.

From the viewpoint of further effectively reducing the surface roughness after etching, the acid dianhydride is preferably an acid dianhydride having an ester bond. Examples of the acid dianhydride having an ester bond include bis(1,3-dioxo-1,3-dihydroisobenzofuran-5-carboxylic acid)1,4-phenylene (manufactured by Tokyo Chemical Industry Co., Ltd.).

Examples of the dimer diamine include Versamine 551 (trade name, manufactured by BASF Japan Ltd., 3,4-bis(1-aminoheptyl)-6-hexyl-5-(1-octenyl)cyclohexene), Versamine 552 (trade name, Examples include hydrogenated products of Versamine 551 manufactured by Cognix Japan Co., Ltd.), PRIAMINE1075, and PRIAMINE1074 (trade names, all manufactured by Croda Japan Co., Ltd.).

In addition, the said polyimide compound may have an acid anhydride structure, a maleimide structure, and a citraconimide structure at the terminal. In this case, the polyimide compound and the epoxy compound can be reacted. By reacting the polyimide compound with an epoxy compound, the thermal dimensional stability of the cured product can be enhanced.

From the viewpoint of obtaining a more excellent resin material due to storage stability, the weight average molecular weight of the (I) thermoplastic resin, the polyimide resin and the phenoxy resin is preferably 5,000 or more, more preferably 10,000 or more, and preferably It is 100,000 or less, more preferably 50,000 or less.

(I) The weight average molecular weight of the thermoplastic resin, the polyimide resin, and the phenoxy resin is a polystyrene-equivalent weight average molecular weight measured by gel permeation chromatography (GPC).

The contents of (I) the thermoplastic resin, the polyimide resin, and the phenoxy resin are not particularly limited. The content of the (I) thermoplastic resin in 100% by weight of the component excluding the inorganic filler and the solvent in the resin material is preferably 1% by weight or more, more preferably 2% by weight or more, preferably Is 30% by weight or less, more preferably 20% by weight or less. When the thermoplastic resin (I) is a polyimide resin or a phenoxy resin, the content of the (I) thermoplastic resin indicates the content of the polyimide resin or the phenoxy resin. When the content of the thermoplastic resin (I) is at least the above lower limit and not more than the above upper limit, the embeddability of the resin material into the holes or irregularities of the circuit board becomes good. When the content of the thermoplastic resin (I) is at least the above lower limit, the formation of the resin film becomes easier and a better insulating layer can be obtained. When the content of the thermoplastic resin (I) is at most the above upper limit, the coefficient of thermal expansion of the cured product will be even lower. When the content of the (I) thermoplastic resin is at most the above upper limit, the surface roughness of the surface of the cured product will be further reduced, and the adhesive strength between the cured product and the metal layer will be even higher.

[solvent]
The resin material does not include or includes a solvent. By using the above solvent, the viscosity of the resin material can be controlled within a suitable range, and the coatability of the resin material can be improved. Further, the solvent may be used to obtain a slurry containing the inorganic filler. As for the said solvent, only 1 type may be used and 2 or more types may be used together.

As the solvent, acetone, methanol, ethanol, butanol, 2-propanol, 2-methoxyethanol, 2-ethoxyethanol, 1-methoxy-2-propanol, 2-acetoxy-1-methoxypropane, toluene, xylene, methyl ethyl ketone, Examples thereof include N,N-dimethylformamide, methyl isobutyl ketone, N-methyl-pyrrolidone, n-hexane, cyclohexane, cyclohexanone and a mixture of naphtha.

Most of the above solvents are preferably removed when the resin composition is formed into a film. Therefore, the boiling point of the solvent is preferably 200°C or lower, more preferably 180°C or lower. The content of the solvent in the resin composition is not particularly limited. The content of the solvent can be appropriately changed in consideration of the coatability of the resin composition.

When the resin material is a B stage film, the content of the solvent in 100% by weight of the B stage film is preferably 1% by weight or more, more preferably 2% by weight or more, and preferably 10% by weight. % Or less, more preferably 5% by weight or less.

[Other ingredients]
For the purpose of improving impact resistance, heat resistance, resin compatibility, workability, etc., the above resin materials include leveling agents, flame retardants, coupling agents, coloring agents, antioxidants, ultraviolet deterioration inhibitors, and defoaming agents. A thermosetting resin other than the agent, the thickener, the thixotropic agent and the epoxy compound may be contained.

Examples of the coupling agent include a silane coupling agent, a titanium coupling agent and an aluminum coupling agent. Examples of the silane coupling agent include vinyl silane, amino silane, imidazole silane, and epoxy silane. The silane coupling agent may be a silane coupling agent containing a silane compound having a triazine ring or a benzotriazole unit.

Examples of the other thermosetting resin include polyphenylene ether resin, divinylbenzyl ether resin, polyarylate resin, diallyl phthalate resin, benzoxazine resin, benzoxazole resin, and acrylate resin.

(Resin film)
A resin film (B-staged product/B-stage film) is obtained by molding the above resin composition into a film. The resin material is preferably a resin film. The resin film is preferably a B stage film.

The following methods are mentioned as a method of forming a resin film by molding a resin composition into a film. An extrusion molding method in which a resin composition is melt-kneaded using an extruder, extruded, and then formed into a film by a T die, a circular die, or the like. A casting method for casting a resin composition containing a solvent to form a film. Other conventionally known film forming methods. An extrusion molding method or a casting molding method is preferable because it can be made thinner. The film includes a sheet.

A resin film which is a B-stage film can be obtained by molding the resin composition into a film and heating and drying at 50° C. to 150° C. for 1 minute to 10 minutes to such an extent that curing by heat does not proceed excessively. it can.

The film-shaped resin composition that can be obtained by the above-described drying process is referred to as a B stage film. The B stage film is in a semi-cured state. The semi-cured product is not completely cured, and curing can be further advanced.

The resin film may not be a prepreg. When the resin film is not a prepreg, migration does not occur along the glass cloth or the like. Further, when laminating or pre-curing the resin film, unevenness due to the glass cloth does not occur on the surface.

The resin film can be used in the form of a laminated film including a metal foil or a base film and a resin film laminated on the surface of the metal foil or the base film. The metal foil is preferably copper foil.

Examples of the base film of the laminated film include polyester resin films such as polyethylene terephthalate film and polybutylene terephthalate film, olefin resin films such as polyethylene film and polypropylene film, and polyimide resin film. The surface of the base film may be subjected to a release treatment, if necessary.

From the viewpoint of controlling the degree of curing of the resin film more uniformly, the thickness of the resin film is preferably 5 μm or more, and preferably 200 μm or less. When the resin film is used as an insulating layer of a circuit, the thickness of the insulating layer formed of the resin film is preferably equal to or larger than the thickness of the conductor layer (metal layer) forming the circuit. The thickness of the insulating layer is preferably 5 μm or more, and preferably 200 μm or less.

(Semiconductor devices, printed wiring boards, copper clad laminates and multilayer printed wiring boards)
The resin material is suitably used for forming a mold resin for embedding a semiconductor chip in a semiconductor device.

The resin material is preferably used for forming an insulating layer in a printed wiring board.

The printed wiring board is obtained, for example, by heat-press molding the resin material.

A member to be laminated having a metal layer on one surface or both surfaces thereof can be laminated on the resin film. It is possible to suitably obtain a laminated structure that includes a member to be laminated having a metal layer on the surface and a resin film laminated on the surface of the metal layer, and the resin film is the resin material described above. The method for laminating the resin film and the lamination target member having the metal layer on the surface is not particularly limited, and a known method can be used. For example, the above-mentioned resin film can be laminated on a lamination target member having a metal layer on its surface while heating or pressurizing without heating using a device such as a parallel plate press or a roll laminator.

The material of the metal layer is preferably copper.

The lamination target member having the metal layer on its surface may be a metal foil such as a copper foil.

The resin material is preferably used for obtaining a copper clad laminate. An example of the copper-clad laminate is a copper-clad laminate including a copper foil and a resin film laminated on one surface of the copper foil.

The thickness of the copper foil of the copper-clad laminate is not particularly limited. The thickness of the copper foil is preferably in the range of 1 μm to 50 μm. Further, in order to enhance the adhesive strength between the cured product of the resin material and the copper foil, the copper foil preferably has fine irregularities on the surface. The method for forming the unevenness is not particularly limited. Examples of the method of forming the unevenness include a method of forming by using a known chemical solution.

The resin material is preferably used for obtaining a multilayer substrate.

An example of the multilayer board is a multilayer board including a circuit board and an insulating layer laminated on the circuit board. The insulating layer of this multilayer substrate is formed of the above resin material. Moreover, the insulating layer of the multilayer substrate may be formed of the resin film of the laminated film using a laminated film. The insulating layer is preferably laminated on the surface of the circuit board on which the circuit is provided. A part of the insulating layer is preferably embedded between the circuits.

In the multilayer board, it is preferable that the surface of the insulating layer opposite to the surface on which the circuit board is laminated is roughened.

As the roughening treatment method, a conventionally known roughening treatment method can be used and is not particularly limited. The surface of the insulating layer may be swollen before the roughening treatment.

In addition, it is preferable that the multilayer substrate further includes a copper plating layer laminated on the roughened surface of the insulating layer.

As another example of the multilayer board, a circuit board, an insulating layer laminated on the surface of the circuit board, and an insulating layer laminated on the surface opposite to the surface on which the circuit board is laminated are laminated. And a copper foil. It is preferable that the insulating layer is formed by curing the resin film using a copper-clad laminate having a copper foil and a resin film laminated on one surface of the copper foil. Furthermore, it is preferable that the copper foil has been subjected to an etching treatment and is a copper circuit.

Another example of the above-mentioned multilayer board is a multilayer board including a circuit board and a plurality of insulating layers laminated on the surface of the circuit board. At least one layer of the plurality of insulating layers arranged on the circuit board is formed using the resin material. It is preferable that the multilayer substrate further includes a circuit laminated on at least one surface of the insulating layer formed by using the resin film.

Among multilayer boards, a multilayer printed wiring board is required to have a low dielectric loss tangent and high insulation reliability due to an insulating layer. In the resin material according to the present invention, the dielectric loss tangent can be lowered, and the adhesiveness between the insulating layer and the metal layer and the etching performance can be improved to effectively improve the insulation reliability. Therefore, the resin material according to the present invention is preferably used for forming an insulating layer in a multilayer printed wiring board.

The multilayer printed wiring board includes, for example, a circuit board, a plurality of insulating layers arranged on the surface of the circuit board, and a metal layer arranged between the plurality of insulating layers. At least one layer of the insulating layers is a cured product of the resin material.

FIG. 1 is a sectional view schematically showing a multilayer printed wiring board using a resin material according to an embodiment of the present invention.

In the multilayer printed wiring board 11 shown in FIG. 1, a plurality of insulating layers 13 to 16 are laminated on the upper surface 12a of the circuit board 12. The insulating layers 13 to 16 are cured product layers. A metal layer 17 is formed on a part of the upper surface 12 a of the circuit board 12. Of the plurality of insulating layers 13 to 16, the insulating layers 13 to 15 other than the insulating layer 16 located on the outer surface opposite to the circuit board 12 side are provided with the metal layer 17 in a part of the upper surface. Has been done. The metal layer 17 is a circuit. A metal layer 17 is arranged between the circuit board 12 and the insulating layer 13 and between the laminated insulating layers 13 to 16, respectively. The lower metal layer 17 and the upper metal layer 17 are connected to each other by at least one of via hole connection and through hole connection (not shown).

In the multilayer printed wiring board 11, the insulating layers 13 to 16 are formed of a cured product of the above resin material. In this embodiment, since the surfaces of the insulating layers 13 to 16 are roughened, fine holes (not shown) are formed on the surfaces of the insulating layers 13 to 16. Further, the metal layer 17 reaches the inside of the minute holes. Further, in the multilayer printed wiring board 11, the widthwise dimension (L) of the metal layer 17 and the widthwise dimension (S) of the portion where the metal layer 17 is not formed can be reduced. Further, in the multilayer printed wiring board 11, good insulation reliability is provided between the upper metal layer and the lower metal layer which are not connected by the via hole connection and the through hole connection (not shown).

(Roughening treatment and swelling treatment)
The resin material is preferably used for obtaining a cured product that is subjected to roughening treatment or desmear treatment. The above-mentioned cured product also includes a pre-cured product that can be further cured.

In order to form fine irregularities on the surface of the cured product obtained by pre-curing the resin material, the cured product is preferably roughened. Before the roughening treatment, the cured product is preferably subjected to a swelling treatment. The cured product is preferably subjected to a swelling treatment after the preliminary curing and before the roughening treatment, and is further cured after the roughening treatment. However, the cured product does not necessarily have to be subjected to the swelling treatment.

As a method of the swelling treatment, for example, a method of treating a cured product with an aqueous solution of a compound containing ethylene glycol or the like as a main component or an organic solvent dispersion solution is used. The swelling liquid used for the swelling treatment generally contains an alkali as a pH adjuster or the like. The swelling liquid preferably contains sodium hydroxide. Specifically, for example, the swelling treatment is performed by treating the cured product with a 40 wt% ethylene glycol aqueous solution or the like at a treatment temperature of 30°C to 85°C for 1 minute to 30 minutes. The temperature of the swelling treatment is preferably in the range of 50°C to 85°C. If the temperature of the swelling treatment is too low, the swelling treatment takes a long time, and the adhesive strength between the cured product and the metal layer tends to be low.

For the roughening treatment, for example, a chemical oxidizing agent such as a manganese compound, a chromium compound or a persulfate compound is used. These chemical oxidizing agents are used as an aqueous solution or an organic solvent dispersion solution after adding water or an organic solvent. The roughening liquid used for the roughening treatment generally contains an alkali as a pH adjuster and the like. The roughening liquid preferably contains sodium hydroxide.

Examples of the manganese compound include potassium permanganate and sodium permanganate. Examples of the chromium compound include potassium dichromate and anhydrous potassium chromate. Examples of the persulfate compound include sodium persulfate, potassium persulfate, ammonium persulfate and the like.

The arithmetic average roughness Ra of the surface of the cured product is preferably 10 nm or more, preferably less than 300 nm, more preferably less than 200 nm, and further preferably less than 150 nm. In this case, the adhesive strength between the cured product and the metal layer is increased, and further finer wiring is formed on the surface of the insulating layer. Furthermore, conductor loss can be suppressed and signal loss can be suppressed to a low level. The arithmetic mean roughness Ra is measured according to JIS B0601:1994.

(Desmear processing)
Through holes may be formed in a cured product obtained by pre-curing the resin material. In the above-mentioned multilayer substrate or the like, vias or through holes are formed as through holes. For example, the via can be formed by irradiation with a laser such as a CO ₂ laser. The diameter of the via is not particularly limited, but is about 60 μm to 80 μm. Due to the formation of the through holes, smear, which is a residue of resin derived from the resin component contained in the cured product, is often formed at the bottom of the via.

In order to remove the smear, the surface of the cured product is preferably desmeared. The desmear process may also serve as the roughening process.

Similar to the roughening treatment, for example, a chemical oxidizer such as a manganese compound, a chromium compound or a persulfate compound is used in the desmear treatment. These chemical oxidizing agents are used as an aqueous solution or an organic solvent dispersion solution after adding water or an organic solvent. The desmear processing liquid used for the desmear processing generally contains an alkali. The desmear treatment liquid preferably contains sodium hydroxide.

By using the above resin material, the surface roughness of the surface of the desmeared cured product is sufficiently reduced.

Hereinafter, the present invention will be specifically described by giving examples and comparative examples. The present invention is not limited to the following examples.

The following materials were prepared.

(Epoxy compound)
(A) Epoxy compound:
Epoxy compound 1 having naphthylene ether skeleton (“TX1507B” manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., solid content: 75% by weight)
Epoxy compound 2 having naphthylene ether skeleton (“ESN-475V” manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.)

(C) Second epoxy compound:
Biphenyl type epoxy compound ("NC-3000" manufactured by Nippon Kayaku Co., Ltd.)
Resorcinol diglycidyl ether ("EX-201" manufactured by Nagase Chemtex)

(Maleimide compound)
(G) Maleimide compound having a skeleton derived from dimer diamine:
N-alkyl bismaleimide compound 1 having a skeleton derived from dimer diamine ("BMI-3000" manufactured by Designer Moleculars Inc.)
N-alkyl bismaleimide compound 2 having a skeleton derived from dimer diamine ("BMI-689" manufactured by Designer Moleculars Inc.)
Maleimide compound having a skeleton derived from dimer diamine synthesized according to the following Synthesis Example 1 (molecular weight 8700)

<Synthesis example 1>
In a reaction vessel equipped with a stirrer, a water separator, a thermometer and a nitrogen gas introduction tube, 55 g of pyromellitic dianhydride (manufactured by Tokyo Kasei Co., molecular weight 254.15), 250 g of toluene and N-methyl-2- 50 g of pyrrolidone was added and the solution in the reaction vessel was heated to 60°C. Then, a solution prepared by dissolving 26.7 g of bis(aminomethyl)norbornane (manufactured by Tokyo Kasei Kogyo Co., Ltd., molecular weight 154.26) in cyclohexanone was added dropwise to the reaction vessel to cause reaction, and both ends were acid anhydrides. The reaction product was obtained. Next, 46.0 g of dimer diamine (“PRIAMINE 1075” manufactured by Croda Japan Co., Ltd.) was slowly added to the reaction vessel, and then 45.0 g of methylcyclohexane was added to the reaction vessel. A Dean Stark trap and a condenser were attached to the flask, and the mixture was heated to reflux for 2 hours to obtain an imide compound having an amine structure at both ends. Then, 8.7 g of maleic anhydride was added, and the resulting mixture was refluxed for another 12 hours for maleimidization. Then, the organic layer was washed with pure water and the water was removed by an evaporator. Then, it was reprecipitated using methanol to obtain a maleimide compound having a skeleton derived from dimer diamine only at both ends of the main chain. The yield of the maleimide compound was 80%.

The molecular weight of the maleimide compound synthesized in Synthesis Example 1 was determined as follows.

GPC (gel permeation chromatography) measurement:
Using a high-performance liquid chromatograph system manufactured by Shimadzu Corporation, tetrahydrofuran (THF) was used as a developing medium, and the measurement was performed at a column temperature of 40° C. and a flow rate of 1.0 ml/min. "SPD-10A" was used as a detector, and two columns of "KF-804L" (exclusion limit molecular weight 400,000) manufactured by Shodex were connected in series as a column. As the standard polystyrene, “TSK standard polystyrene” manufactured by Tosoh Corporation is used, and the weight average molecular weight Mw=354,000, 189,000, 98,900, 37,200, 17,100, 9,830, 5,870, 2, A calibration curve was prepared using 500, 1,050 and 500 substances and the molecular weight was calculated.

((E) Inorganic filler)
Silica-containing slurry (75% by weight of silica: "SC4050-HOA" manufactured by Admatechs Co., Ltd., average particle size 1.0 μm, aminosilane treatment, cyclohexanone 25% by weight)

(Curing agent)
(B) Active ester compound:
Liquid 1 containing an active ester compound having a naphthylene ether skeleton (“HPC-8150-62T” manufactured by DIC, solid content 62% by weight)
Liquid 2 containing an active ester compound having a naphthylene ether skeleton (“EXB-9416” manufactured by DIC, solid content 70% by weight)

(D) Second curing agent:
Active ester compound-containing liquid having a dicyclopentadiene skeleton ("HPC-8000L-65T" manufactured by DIC, solid content 65% by weight)
Phenolic compound-containing liquid having an aminotriazine skeleton (“LA-1356” manufactured by DIC, solid content 60% by weight)

((F) Curing accelerator)
Dimethylaminopyridine ("DMAP" manufactured by Wako Pure Chemical Industries, Ltd.)
2-Phenyl-4-methylimidazole ("2P4MZ" manufactured by Shikoku Chemicals, anionic curing accelerator)

((I) Thermoplastic resin)
Polyimide compound (polyimide resin):
A polyimide compound-containing solution (nonvolatile content: 26.8% by weight), which is a reaction product of tetracarboxylic dianhydride and dimer diamine, was synthesized according to Synthesis Example 2 below.

<Synthesis example 2>
300.0 g of tetracarboxylic dianhydride ("BisDA-1000" manufactured by SABIC Japan LLC) and 665.5 g of cyclohexanone were placed in a reaction vessel equipped with a stirrer, a water separator, a thermometer, and a nitrogen gas introduction tube. Then, the solution in the reaction vessel was heated to 60°C. Next, 89.0 g of dimer diamine (“PRIAMINE 1075” manufactured by Croda Japan) and 54.7 g of 1,3-bisaminomethylcyclohexane (manufactured by Mitsubishi Gas Chemical Co., Inc.) were dropped into the reaction vessel. Next, 121.0 g of methylcyclohexane and 423.5 g of ethylene glycol dimethyl ether were added to the reaction vessel, and the imidization reaction was performed at 140° C. for 10 hours. Thus, a polyimide compound-containing solution (nonvolatile content: 26.8% by weight) was obtained. The molecular weight (weight average molecular weight) of the obtained polyimide compound was 20,000. The acid component/amine component molar ratio was 1.04.

The molecular weight of the polyimide compound synthesized in Synthesis Example 2 was determined as follows.

GPC (gel permeation chromatography) measurement:
Using a high-performance liquid chromatograph system manufactured by Shimadzu Corporation, tetrahydrofuran (THF) was used as a developing medium, and the measurement was performed at a column temperature of 40° C. and a flow rate of 1.0 ml/min. "SPD-10A" was used as a detector, and two columns of "KF-804L" (exclusion limit molecular weight 400,000) manufactured by Shodex were connected in series as a column. As the standard polystyrene, “TSK standard polystyrene” manufactured by Tosoh Corporation is used, and the weight average molecular weight Mw=354,000, 189,000, 98,900, 37,200, 17,100, 9,830, 5,870, 2, A calibration curve was prepared using 500, 1,050 and 500 substances and the molecular weight was calculated.

(Examples 1 to 6 and Comparative Examples 1 and 2)
The components shown in Table 1 below were blended in the blending amounts shown in Table 1 below (unit: solid weight part), and the mixture was stirred at room temperature until a uniform solution was obtained to obtain a resin material.

Production of resin film:
Using an applicator, the obtained resin material was applied onto the release-treated surface of the release-treated PET film (“XG284” manufactured by Toray Industries, Inc., thickness 25 μm), and then 2 minutes in a gear oven at 100° C. After drying for 30 seconds, the solvent was evaporated. Thus, a laminated film (a laminated film of a PET film and a resin film) in which a resin film (B stage film) having a thickness of 40 μm was laminated on the PET film was obtained.

(Evaluation)
(1) Softening point of (A) epoxy compound and (B) active ester compound Using a differential scanning calorimeter (“Q2000” manufactured by TA Instruments Co., Ltd.), a temperature rising rate of 3° C./min to −30° C. To 200° C. in a nitrogen atmosphere, and the softening points of the (A) epoxy compound and (B) active ester compound were determined from the inflection points of the reverse heat flow.

(2) Dielectric loss tangent The obtained resin film was heated at 190° C. for 90 minutes to obtain a cured product. The obtained cured product was cut into a size of 2 mm in width and 80 mm in length and 10 sheets were stacked, and "Cavity resonance perturbation method dielectric constant measuring device CP521" manufactured by Kanto Electronics Application Development Co., Ltd. Using a network analyzer N5224A PNA, the dielectric loss tangent was measured by the cavity resonance method at room temperature (23° C.) at a frequency of 5.8 GHz.

[Judgment criteria of dielectric loss tangent]
◯: Dielectric loss tangent is less than 0.0033 ◯: Dielectric loss tangent is 0.0033 or more and less than 0.0037 ×: Dielectric loss tangent is 0.0037 or more

(3) Thermal dimensional stability (average linear expansion coefficient (CTE))
The cured film obtained by heating the obtained 40 μm-thick resin film (B stage film) at 190° C. for 90 minutes was cut into a size of 3 mm×25 mm. Using a thermo-mechanical analyzer (“EXSTAR TMA/SS6100” manufactured by SII Nano Technology Inc.), a cured product cut at 25° C. to 150° C. under conditions of a tensile load of 33 mN and a heating rate of 5° C./min. The average coefficient of linear expansion (ppm/°C.) was calculated.

[Criteria for thermal dimensional stability]
◯: Average linear expansion coefficient of 23 ppm/° C. or less ○: Average linear expansion coefficient of more than 23 ppm/° C. and less than 27 ppm/° C. ×: Average linear expansion coefficient of 27 ppm/° C. or more

(4) Glass transition temperature Tg
The cured film obtained by heating the obtained 40 μm-thick resin film (B stage film) at 190° C. for 90 minutes was cut into a size of 5 mm×50 mm. Using a thermomechanical analyzer (“DMS6100” manufactured by SII Nano Technology Inc.), chuck distance 20 mm, amplitude 10 μm, tension amplitude initial value 400 mN, 50° C. to 330° C. at a heating rate of 5° C./min. The measurement was performed under the conditions of increasing the temperature and the frequency of 10 Hz. In the obtained measurement results, the peak temperature of the loss tangent was defined as the glass transition temperature Tg (°C).

[Criteria for determination of glass transition temperature Tg]
○○: Tg is 180°C or higher ○: Tg is 175°C or higher and lower than 180°C ×: Tg is lower than 175°C

(5) Sidelobe Laminating/semi-curing treatment:
The obtained resin film was vacuum laminated on a CCL substrate (“E679FG” manufactured by Hitachi Chemical Co., Ltd.) and heated at 180° C. for 30 minutes to be semi-cured. In this way, a laminate A in which the semi-cured resin film was laminated on the CCL substrate was obtained.

Via (through hole) formation:
Using a CO ₂ laser (manufactured by Hitachi Via Mechanics Co., Ltd.) on the semi-cured resin film in the obtained laminate A, a via having a diameter of 60 μm at the upper end and a diameter of 40 μm at the lower end (bottom) (penetration) Holes) were formed. In this way, a laminate B was obtained in which the semi-cured resin film was laminated on the CCL substrate, and the semi-cured resin film was provided with vias (through holes).

Removal of residue from the bottom of the via:
(A) Swelling treatment The obtained laminated body B was put into a swelling liquid (“Swelling Dip Securigant P” manufactured by Atotech Japan Co., Ltd.) at 60° C. and shaken for 10 minutes. Then, it was washed with pure water.

(B) Permanganate treatment (roughening treatment and desmear treatment)
The laminated body B after the swelling treatment was put into a roughened aqueous solution of potassium permanganate (“Concentrate Compact CP” manufactured by Atotech Japan Co., Ltd.) at 80° C. and shaken for 30 minutes. Next, the sample was treated with a cleaning liquid at 25° C. (“Reduction Securigant P” manufactured by Atotech Japan Co., Ltd.) for 2 minutes and then washed with pure water to obtain an evaluation sample.

The periphery of the via of the evaluation sample was observed with a scanning electron microscope (SEM), and the side lobe length around the via was measured.

[Sidelobe criteria]
◯: Maximum sidelobe length is less than 15 μm ◯: Maximum sidelobe length is 15 μm or more and less than 30 μm ×: Maximum sidelobe length is 30 μm or more

(6) Surface Roughness after Etching On the surface of the evaluation sample (cured material subjected to the roughening treatment) obtained in the evaluation of "(5) Sidelobe", 10 areas of 94 μm×123 μm were arbitrarily selected. .. The arithmetic mean roughness Ra was measured for each of these 10 regions using a non-contact three-dimensional surface shape measuring device (“WYKO NT1100” manufactured by Veeco). The following surface roughness was evaluated from the average value of the arithmetic mean roughness Ra measured at 10 points, and the following from the absolute value of the difference between the maximum value and the minimum value of the arithmetic mean roughness Ra measured at 10 points: The uniformity of surface roughness was evaluated. The arithmetic mean roughness Ra was measured according to JIS B0601:1994.

[Criteria for determining surface roughness (surface roughness) after etching]
◯: Average value of arithmetic average roughness Ra is less than 50 nm ◯: Average value of arithmetic average roughness Ra is 50 nm or more and less than 80 μm x: Average value of arithmetic average roughness Ra is 80 nm or more

[Criteria for Uniformity of Surface Roughness (Surface Roughness) After Etching]
◯: The absolute value of the difference between the maximum value and the minimum value of the arithmetic average roughness Ra is less than 10 nm ×: The absolute value of the difference between the maximum value and the minimum value of the arithmetic average roughness Ra is 10 nm or more

(7) Flexibility of B stage film The obtained resin film (B stage film) was bent 10 times at 180 degrees. During 10 times, the number of times the resin film was cracked or cracked was observed.

[Criteria for B-stage film flexibility]
○○: The number of cracks or cracks was less than 3 times in 10 times. ○: The number of cracks or cracks was 3 times or more and less than 6 times in 10 times. ×: Cracks or cracks were generated in 10 times. Occurs more than 6 times

The composition and results are shown in Table 1 below.

11... Multilayer printed wiring board 12... Circuit board 12a... Upper surface 13-16... Insulating layer 17... Metal layer

Claims (13)

An epoxy compound having a naphthylene ether skeleton,
And an active ester compound having a naphthylene ether skeleton,
An active ester having a combination of the epoxy compound and the active ester compound, the epoxy compound having a naphthylene ether skeleton and a softening point of 90° C. or less and the naphthylene ether skeleton, and having a softening point of more than 145° C. First combination with a compound, second with an epoxy compound having a naphthylene ether skeleton and having a softening point above 90° C. and an active ester compound having a naphthylene ether skeleton and having a softening point below 145° C. Or a third combination of an epoxy compound having a naphthylene ether skeleton and having a softening point above 90° C. and an active ester compound having a naphthylene ether skeleton and having a softening point above 145° C. , Resin material. The resin material according to claim 1, wherein the combination of the epoxy compound and the active ester compound is the first combination or the third combination. The resin material according to claim 1, wherein the combination of the epoxy compound and the active ester compound is the second combination or the third combination. The resin material according to claim 1, wherein the combination of the epoxy compound and the active ester compound is the third combination. The combination of the epoxy compound and the active ester compound is the third combination,
The epoxy compound having the naphthylene ether skeleton and having the softening point of more than 90° C. and the naphthylene ether skeleton in 100% by weight of all the epoxy compounds and all the curing agents contained in the resin material. The resin material according to claim 1, wherein the total content with the active ester compound having a softening point of higher than 145°C is 35% by weight or more. The combination of the epoxy compound and the active ester compound is the third combination,
The epoxy compound having the naphthylene ether skeleton and having the softening point of more than 90° C. and the naphthylene ether skeleton in 100% by weight of all the epoxy compounds and all the curing agents contained in the resin material. The resin material according to claim 1, wherein the total content with the active ester compound having a softening point of higher than 145°C is 50% by weight or more. The resin material according to any one of claims 1 to 6, which contains a bismaleimide compound. The resin material according to claim 7, wherein the bismaleimide compound is a bismaleimide compound having a skeleton derived from dimer diamine. The resin material according to claim 7 or 8, wherein the bismaleimide compound is a bismaleimide compound having a structure represented by the following formula (X).

In the formula (X), R1 represents a tetravalent organic group. The resin material according to any one of claims 1 to 9, which contains an inorganic filler. The resin material according to any one of claims 1 to 10, which is a resin film. The resin material according to claim 1, which is used for forming an insulating layer in a multilayer printed wiring board. Circuit board,
A plurality of insulating layers disposed on the surface of the circuit board,
A metal layer disposed between the plurality of insulating layers,
A multilayer printed wiring board, wherein at least one layer of the plurality of insulating layers is a cured product of the resin material according to any one of claims 1 to 12.

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