JP2020090722A - 浸透コーティング及び反応性相溶射配合コーティングを含むコーティングシステム - Google Patents
浸透コーティング及び反応性相溶射配合コーティングを含むコーティングシステム Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims abstract description 371
- 239000011248 coating agent Substances 0.000 title claims abstract description 349
- 230000008595 infiltration Effects 0.000 title claims abstract description 45
- 238000001764 infiltration Methods 0.000 title claims abstract description 45
- 239000007921 spray Substances 0.000 title abstract description 47
- 239000000203 mixture Substances 0.000 title abstract description 41
- 238000009472 formulation Methods 0.000 title abstract description 18
- 239000012720 thermal barrier coating Substances 0.000 claims abstract description 444
- 239000011148 porous material Substances 0.000 claims abstract description 130
- 238000000034 method Methods 0.000 claims abstract description 111
- 239000000428 dust Substances 0.000 claims abstract description 44
- 239000000463 material Substances 0.000 claims description 206
- 238000005507 spraying Methods 0.000 claims description 150
- 239000008199 coating composition Substances 0.000 claims description 124
- 239000011230 binding agent Substances 0.000 claims description 117
- 239000002245 particle Substances 0.000 claims description 80
- 239000006193 liquid solution Substances 0.000 claims description 54
- 230000003204 osmotic effect Effects 0.000 claims description 45
- 239000007787 solid Substances 0.000 claims description 43
- 230000035515 penetration Effects 0.000 claims description 32
- 239000000853 adhesive Substances 0.000 claims description 28
- 230000001070 adhesive effect Effects 0.000 claims description 28
- 238000010438 heat treatment Methods 0.000 claims description 12
- 238000004299 exfoliation Methods 0.000 claims 1
- 239000012466 permeate Substances 0.000 claims 1
- 230000008569 process Effects 0.000 description 66
- 150000001875 compounds Chemical class 0.000 description 18
- 238000005240 physical vapour deposition Methods 0.000 description 18
- 239000000126 substance Substances 0.000 description 15
- 238000005328 electron beam physical vapour deposition Methods 0.000 description 14
- 230000008439 repair process Effects 0.000 description 13
- 239000000919 ceramic Substances 0.000 description 11
- 238000012423 maintenance Methods 0.000 description 11
- 238000012360 testing method Methods 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000012071 phase Substances 0.000 description 10
- 239000000725 suspension Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 238000005019 vapor deposition process Methods 0.000 description 9
- 230000004044 response Effects 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 230000008859 change Effects 0.000 description 6
- 230000032798 delamination Effects 0.000 description 6
- 230000035939 shock Effects 0.000 description 5
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 5
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 230000000149 penetrating effect Effects 0.000 description 4
- 238000005382 thermal cycling Methods 0.000 description 4
- 229910002080 8 mol% Y2O3 fully stabilized ZrO2 Inorganic materials 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- 239000000292 calcium oxide Substances 0.000 description 3
- 235000012255 calcium oxide Nutrition 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910052688 Gadolinium Inorganic materials 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 2
- CMIHHWBVHJVIGI-UHFFFAOYSA-N gadolinium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Gd+3].[Gd+3] CMIHHWBVHJVIGI-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000009766 low-temperature sintering Methods 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910000480 nickel oxide Inorganic materials 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- DHEQXMRUPNDRPG-UHFFFAOYSA-N strontium nitrate Chemical compound [Sr+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O DHEQXMRUPNDRPG-UHFFFAOYSA-N 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- NGCRLFIYVFOUMZ-UHFFFAOYSA-N 2,3-dichloroquinoxaline-6-carbonyl chloride Chemical compound N1=C(Cl)C(Cl)=NC2=CC(C(=O)Cl)=CC=C21 NGCRLFIYVFOUMZ-UHFFFAOYSA-N 0.000 description 1
- NGDQQLAVJWUYSF-UHFFFAOYSA-N 4-methyl-2-phenyl-1,3-thiazole-5-sulfonyl chloride Chemical compound S1C(S(Cl)(=O)=O)=C(C)N=C1C1=CC=CC=C1 NGDQQLAVJWUYSF-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- DQFUBCBSRILDHL-UHFFFAOYSA-N [N+](=O)([O-])[O-].[Al+3].[Gd+3].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-] Chemical compound [N+](=O)([O-])[O-].[Al+3].[Gd+3].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-] DQFUBCBSRILDHL-UHFFFAOYSA-N 0.000 description 1
- FWGZLZNGAVBRPW-UHFFFAOYSA-N alumane;strontium Chemical compound [AlH3].[Sr] FWGZLZNGAVBRPW-UHFFFAOYSA-N 0.000 description 1
- VXAUWWUXCIMFIM-UHFFFAOYSA-M aluminum;oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Al+3] VXAUWWUXCIMFIM-UHFFFAOYSA-M 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000004660 morphological change Effects 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/002—Pretreatement
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/082—Coating starting from inorganic powder by application of heat or pressure and heat without intermediate formation of a liquid in the layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
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- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/18—After-treatment
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01D—NON-POSITIVE DISPLACEMENT MACHINES OR ENGINES, e.g. STEAM TURBINES
- F01D5/00—Blades; Blade-carrying members; Heating, heat-insulating, cooling or antivibration means on the blades or the members
- F01D5/005—Repairing methods or devices
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01D—NON-POSITIVE DISPLACEMENT MACHINES OR ENGINES, e.g. STEAM TURBINES
- F01D5/00—Blades; Blade-carrying members; Heating, heat-insulating, cooling or antivibration means on the blades or the members
- F01D5/12—Blades
- F01D5/28—Selecting particular materials; Particular measures relating thereto; Measures against erosion or corrosion
- F01D5/288—Protective coatings for blades
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- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
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- F05B2220/00—Application
- F05B2220/30—Application in turbines
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- F05B2280/00—Materials; Properties thereof
- F05B2280/60—Properties or characteristics given to material by treatment or manufacturing
- F05B2280/6011—Coating
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2230/00—Manufacture
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Abstract
Description
遮熱コーティング上に反応性相溶射配合コーティングを適用することであって、反応性相溶射配合コーティングは、遮熱コーティング上の埃堆積物と反応するように構成される、ことと、
を含む方法。
遮熱コーティングに適用されるように構成された浸透コーティングであって、遮熱コーティングの少なくとも幾つかの気孔に浸透するように構成され、遮熱コーティングの少なくとも幾つかの気孔内で分解して、遮熱コーティングの少なくとも幾つかの気孔の一部を被覆するように構成され、遮熱コーティングの気孔率を減少させるように構成される、浸透コーティングと、
遮熱コーティングに適用されるように構成された反応性相溶射配合コーティングであって、遮熱コーティング上の埃堆積物と反応するように構成される、反応性相溶射配合コーティングと、
を含むコーティングシステム。
遮熱コーティング上に反応性相溶射配合コーティングを堆積させることであって、反応性相溶射配合コーティングは、ベース材料とバインダー材料とを含み、ベース材料は、バインダー材料のコンプライアンスよりも高いコンプライアンスを有し、バインダー材料は、ベース材料の凝集強度よりも大きい凝集強度を有し、バインダー材料は、ベース材料の接着強度よりも大きい接着強度を有し、バインダー材料は、ベース材料の表面積よりも大きい少なくとも10平方メートル/グラムの表面積を有する、ことと、
を含み、
浸透コーティング及び反応性相溶射配合コーティングは、浸透コーティング又は反応性相溶射配合コーティングの1つ以上が遮熱コーティング上に堆積されてない場合と比較して、遮熱コーティングの剥離量を減少させるように構成される、方法。
物品の遮熱コーティング上に堆積されるように構成されたコーティングシステムと、
を含むシステムであって、
コーティングシステムは、
遮熱コーティング上に堆積されるように構成された浸透コーティングであって、遮熱コーティングの少なくとも幾つかの気孔に浸透するように構成され、遮熱コーティングの少なくとも幾つかの気孔内で分解して、遮熱コーティングの少なくとも幾つかの気孔の一部を被覆するように構成され、遮熱コーティングの気孔率を減少させるように構成される、浸透コーティングと、
遮熱コーティング上に堆積されるように構成された反応性相溶射配合コーティングであって、遮熱コーティング上の埃堆積物と反応するように構成される、反応性相溶射配合コーティングと、
を含み、
浸透コーティング及び反応性相溶射配合コーティングは、浸透コーティング又は反応性相溶射配合コーティングの1つ以上が遮熱コーティング上に堆積されてない場合と比較して、遮熱コーティングの剥離量を減少させるように構成される、
システム。
102 反応性相溶射配合コーティング
104 埃堆積物
106、506 遮熱コーティング
108 上面又は外面
120 バルク
122 浸透コーティング
124、512 気孔
410、512 開気孔
412、516 孤立気孔
420、520 液体溶液
430、530 固体酸化物粒子
510、702 物品
514 スプラット境界
518 遮熱コーティング506の表面
603 ベース材料
605 バインダー材料
820 反応性デブリ
Claims (15)
- 物品(510)の遮熱コーティング(106)上に浸透コーティング(122)を適用することであって、前記浸透コーティング(122)は、前記遮熱コーティング(106)の少なくとも幾つかの気孔(124)に浸透するように構成され、前記浸透コーティング(122)は、前記遮熱コーティング(106)の前記少なくとも幾つかの気孔(124)内で分解して、前記遮熱コーティング(106)の前記少なくとも幾つかの気孔(124)の一部を被覆するように構成され、前記浸透コーティング(122)は、前記遮熱コーティング(106)の気孔率を減少させるように構成される、ことと、
前記遮熱コーティング(106)上に反応性相溶射配合コーティング(102)を適用することであって、前記反応性相溶射配合コーティング(102)は、前記遮熱コーティング(106)上の埃堆積物(104)と反応するように構成される、ことと、
を含む方法。 - 前記浸透コーティング(122)は、前記遮熱コーティング(106)の表面(518)から前記遮熱コーティング(106)の前記表面(518)から離れる距離まで、前記遮熱コーティング(106)に入り込むように構成される、請求項1に記載の方法。
- 前記浸透コーティング(122)は、前記浸透コーティング(122)が前記遮熱コーティング(106)の前記少なくとも幾つかの気孔(124)内で分解した後、前記遮熱コーティング(106)と一体化する、請求項1又は2に記載の方法。
- 前記遮熱コーティング(106)のバルク(120)は、第1の気孔率値を有する気孔率を有し、前記浸透コーティング(122)は、前記遮熱コーティング(106)の前記少なくとも幾つかの気孔(124)に浸透して、前記遮熱コーティング(106)の前記バルク(120)の気孔率を、前記第1の気孔率値から前記第1の気孔率値よりも小さい第2の気孔率値に減少させるように構成される、請求項1から3の何れか一項に記載の方法。
- 前記遮熱コーティング(106)の前記少なくとも幾つかの気孔(124)内で前記浸透コーティング(122)を分解することは、前記遮熱コーティング(106)の前記バルク(120)の気孔率を、前記第2の気孔率値から前記第2の気孔率値よりも小さい第3の気孔率値に減少させる、請求項4に記載の方法。
- 前記浸透コーティング(122)は、前記浸透コーティング(122)を加熱することにより分解するように構成され、前記浸透コーティング(122)を加熱すると、前記浸透コーティング(122)が液体溶液(420、520)から固体酸化物粒子(430、530)に変化する、請求項1から5の何れか一項に記載の方法。
- 前記浸透コーティング(122)の前記液体溶液(420、520)は、前記遮熱コーティング(106)の前記少なくとも幾つかの気孔(124)の一部を充填するように構成され、分解された前記浸透コーティング(122)の前記固体酸化物粒子(430、530)は、前記浸透コーティング(122)の前記液体溶液(420、520)によって充填された部分よりも少ない前記遮熱コーティング(106)の前記少なくとも幾つかの気孔(124、512)の部分を充填するように構成される、請求項6に記載の方法。
- 前記反応性相溶射配合コーティング(102)は、前記遮熱コーティング(106)の表面(518)上に残るように構成される、請求項1から7の何れか一項に記載の方法。
- 前記反応性相溶射配合コーティング(102)は、ベース材料(603)とバインダー材料(605)とを含む、請求項1から8の何れか一項に記載の方法。
- 前記ベース材料(603)は、前記バインダー材料(605)のコンプライアンスよりも高いコンプライアンスを有し、前記バインダー材料(605)は、前記ベース材料(603)の凝集強度よりも大きい凝集強度を有し、前記バインダー材料(605)は、前記ベース材料(603)の接着強度よりも大きい接着強度を有し、前記バインダー材料(605)は、前記ベース材料(603)の表面積よりも大きい少なくとも10平方メートル/グラムの表面積を有する、請求項9に記載の方法。
- 物品(510、702)の遮熱コーティング(106)に適用されるように構成されたコーティングシステム(100)であって、
前記遮熱コーティング(106)に適用されるように構成された浸透コーティング(122)であって、前記遮熱コーティング(106)の少なくとも幾つかの気孔(124)に浸透するように構成され、前記遮熱コーティング(106)の前記少なくとも幾つかの気孔(124)内で分解して、前記遮熱コーティング(106)の前記少なくとも幾つかの気孔(124)の一部を被覆するように構成され、前記遮熱コーティング(106)の気孔率を減少させるように構成される、浸透コーティング(122)と、
前記遮熱コーティング(106)に適用されるように構成された反応性相溶射配合コーティング(102)であって、前記遮熱コーティング(106)上の埃堆積物(104)と反応するように構成される、反応性相溶射配合コーティング(102)と、
を含むコーティングシステム(100)。 - 前記浸透コーティング(122)は、前記浸透コーティング(122)が前記遮熱コーティング(106)の前記少なくとも幾つかの気孔(124)内で分解した後、前記遮熱コーティング(106)と一体化する、請求項11に記載のコーティングシステム(100)。
- 前記遮熱コーティング(106)のバルク(120)は、第1の気孔率値を有する気孔率を有し、前記浸透コーティング(122)は、前記遮熱コーティング(106)の前記少なくとも幾つかの気孔(124)に浸透して、前記遮熱コーティング(106)の前記バルク(120)の気孔率を、前記第1の気孔率値から前記第1の気孔率値よりも小さい第2の気孔率値に減少させるように構成される、請求項11又は12に記載のコーティングシステム(100)。
- 前記物品(510、702)はタービンアセンブリの表面(518)である、請求項11から13の何れか一項に記載のコーティングシステム(100)。
- 遮熱コーティング(106)を含む物品(510、702)と、
前記物品(510、702)の前記遮熱コーティング(106)上に堆積されるように構成されたコーティングシステム(100)と、
を含むシステムであって、
前記コーティングシステム(100)は、
前記遮熱コーティング(106)上に堆積されるように構成された浸透コーティング(122)であって、前記遮熱コーティング(106)の少なくとも幾つかの気孔(124)に浸透するように構成され、前記遮熱コーティング(106)の前記少なくとも幾つかの気孔(124)内で分解して、前記遮熱コーティング(106)の前記少なくとも幾つかの気孔(124)の一部を被覆するように構成され、前記遮熱コーティング(106)の気孔率を減少させるように構成される、浸透コーティング(122)と、
前記遮熱コーティング(106)上に堆積されるように構成された反応性相溶射配合コーティング(102)であって、前記遮熱コーティング(106)上の埃堆積物(104)と反応するように構成される、反応性相溶射配合コーティング(102)と、
を含み、
前記浸透コーティング(122)及び前記反応性相溶射配合コーティング(102)は、前記浸透コーティング(122)又は前記反応性相溶射配合コーティング(102)の1つ以上が前記遮熱コーティング(106)上に堆積されてない場合と比較して、前記遮熱コーティング(106)の剥離量を減少させるように構成される、
システム。
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