JP2020075358A - Dresser for polishing cloth - Google Patents

Abstract

To provide a dresser which satisfies both of high pad grinding speed and high pad flatness.SOLUTION: A dresser for a polishing cloth in which a single layer of plural diamond abrasive grains is firmly adhered to a surface of a metal support. In this dresser, the diamond abrasive grain is bonded and firmly adhered to the metal support via a brazing material layer containing a brazing material, and a composition of the brazing material is 70%≤Ni+Fe≤95% (herein, 0≤Fe/(Ni+Fe)≤0.4), 2%≤Si+B≤15% (herein, 0≤B/(Si+B)≤0.8), 1%≤Cr≤15%, 0.5%≤P≤4%, and 0.2%≤X≤3% (herein, X is at least one kind of element selected from a group comprising Ti, Nb,Ta, V and Zr, 0.2≤X/P≤4) by mass%.SELECTED DRAWING: None

Description

  INDUSTRIAL APPLICABILITY The present invention is used to maintain the flatness of a polishing cloth and to remove clogging and foreign matter in a process of chemical and mechanical planarization (hereinafter, abbreviated as “CMP polishing”). The present invention relates to a dresser for polishing cloth.

  A device for polishing the surface of a semiconductor wafer, a device for flattening the surface of wiring or an insulating layer in the process of manufacturing an integrated circuit, a device for flattening the surface of an Al plate or a glass plate used for a magnetic hard disk substrate, Etc. use CMP polishing. In this CMP polishing, for example, the surface to be polished is flattened by pressing the surface to be polished while supplying a slurry liquid containing fine abrasive grains to a rotating substrate to which a polishing pad made of urethane is attached. Is the way. As a matter of course, the polishing ability of this polishing pad decreases with use time, but in order to suppress this decrease, the polishing pad surface layer is ground at regular intervals while maintaining the flatness of the polishing pad. , Always dressing so that a new side comes out. A component used for this dressing is called a dresser, and the dresser is obtained by bonding abrasive grains (diamond abrasive grains or the like) to a metal substrate by brazing or the like. As a brazing material used for brazing diamond abrasive grains, for example, a Ni-Cr-Si-B-P brazing material is described in Patent Document 1.

  Recently, there has been a conventional practice of eliminating scratches generated on the surface to be polished due to a shallower depth of focus of a pattern exposure apparatus due to an extremely narrow line / space of an integrated circuit or an increase in recording capacity of a magnetic hard disk. In addition to the above requirements, there is an increasing demand for flatness, such as reducing the waviness of the surface to be polished. In order to meet these demands, it is necessary to uniformly grind the pad surface by dressing to maintain the flatness of the pad. Further, the dressing is also required to have a pad grinding speed capable of removing the pad clogging and the foreign matter faster.

  Patent Document 2 discloses that a dresser having a grain size d of diamond abrasive grains and a center-to-center distance L between adjacent abrasive grains of d ≦ L <2d can achieve both high pad grinding speed and high pad flatness. Is disclosed. Patent Documents 3 and 4 disclose a dresser in which diamond abrasive grains are fixed to a single layer by a resin, a metal layer exists between the diamond abrasive grains and the resin, and the surface of the metal layer in contact with the resin has an uneven portion. However, it is disclosed that a high pad grinding speed and a high pad flatness can both be achieved.

JP, 2007-83352, A JP, 2009-196025, A JP 2012-232388A JP, 2014-14898, A

  As described above, although a dresser that uniformly grinds the pad surface has been disclosed, there is a high demand for a dresser that simultaneously satisfies a higher pad grinding speed and a higher pad flatness. However, the pad grinding speed and the pad flatness are in a trade-off relationship, and it is not easy to increase both of them at the same time. For example, if a diamond abrasive grain having a smaller abrasive grain size is used to improve the flatness of the pad, the protrusion height of the tip end portion of the diamond abrasive grain becomes small, so that the pad grinding force is reduced and the CMP process is performed. Productivity may decrease. On the other hand, in order to obtain a larger pad grinding force with a smaller abrasive grain size, if the brazing filler metal thickness is reduced and the protrusion height of the abrasive grains is increased, the bonding force between the brazing filler metal and the abrasive grains decreases. Abrasive grains may easily fall off.

  An object of the present invention is to provide a dresser that simultaneously satisfies a high pad grinding speed and a high pad flatness in order to solve the above-mentioned problems.

In view of the above problems, the first aspect of the present invention is the following dresser for polishing cloth.
[1] A dresser for polishing cloth, wherein a plurality of diamond abrasive grains are fixed in a single layer on the surface of a metal supporting material,
The diamond abrasive grains are bonded and fixed to the surface of the metal supporting material through a brazing material layer containing a brazing material,
The composition of the brazing material is% by mass,
70% ≦ Ni + Fe ≦ 95% (where 0 ≦ Fe / (Ni + Fe) ≦ 0.4),
2% ≦ Si + B ≦ 15% (where 0 ≦ B / (Si + B) ≦ 0.8),
1% ≤ Cr ≤ 15%,
0.5% ≦ P ≦ 4%, and
0.2% ≦ X ≦ 3%
(However, X is at least one element selected from the group consisting of Ti, Nb, Ta, V and Zr, and 0.2 ≦ X / P ≦ 4).
A dresser for polishing cloth, which is characterized in that
[2] The dresser for polishing cloth according to [1], wherein the composition of the brazing material is 0.4 ≦ X / P ≦ 2.0.
[3] The brazing material contains at least Ti as the element X, and the content of Ti is 0.5% ≦ Ti ≦ 3% in mass%, [1] or [2] ] The dresser for polishing cloths as described in.
[4] The brazing material contains at least Ti as the element X, and the content of Ti is 0.5% ≦ Ti ≦ 1% in mass%, [1] to [3] ] The dresser for polishing cloths in any one of these.
[5] The dresser for polishing cloth according to any one of [1] to [4], wherein the diamond abrasive grains have an average particle diameter d of 3 μm or more and less than 100 μm.
[6] The dresser for polishing cloth according to any one of [1] to [5], wherein the brazing material layer has a thickness of 0.1 d or more and less than 0.4 d.
[7] When the distance between the centers of adjacent diamond abrasive grains is L,
The ratio of the abrasive grains arranged such that the L of adjacent abrasive grains is d ≦ L <2d with respect to the total number of abrasive grains of the polishing cloth is 70% or more with respect to the total number of abrasive grains. Characterized by being
The dresser for polishing cloth according to any one of [1] to [6].
[8] The dresser for polishing cloth according to any one of [1] to [7], wherein the metal support material is made of stainless steel.

  According to the present invention, a dresser that simultaneously satisfies a high pad grinding speed and a high pad flatness is provided.

FIG. 1 is a graph showing the quantitative relationship between P and element X contained in a brazing filler metal used in a preferred embodiment of the present invention.

  The dresser for polishing cloth according to the present invention is a dresser for polishing cloth in which a plurality of diamond abrasive grains are fixed in a single layer on the surface of a metal support material. In the dresser for a polishing cloth according to the present invention, the diamond abrasive grains are bonded and fixed to the surface of the metal supporting material via the brazing material layer, and the average grain diameter d of the diamond abrasive grains is 3 μm or more and 100 μm or more. And less than 0.1d and less than 0.4d.

  In the dresser for a polishing cloth according to the present invention, the average particle diameter d of the diamond abrasive grains is reduced in order to improve the flatness of the ground pad. On the other hand, in the dresser for polishing cloth according to the present invention, the ratio of the thickness of the brazing material layer to the average particle diameter d of the diamond abrasive grains is made small in order to increase the grinding speed of the dresser for polishing cloth. However, as described above, the flatness of the pad and the pad grinding speed have a trade-off relationship. As a result of searching conditions satisfying both of them, the present inventor sets the average grain size d of the diamond abrasive grains to 3 μm or more and less than 100 μm, and the brazing material layer thickness to 0.1 d or more and less than 0.4 d. Then, it was found that the flatness of the ground pad can be further increased, and at the same time, the grinding speed can be increased.

  The average particle diameter d of the diamond abrasive grains can be set to the number average particle diameter by measuring the particle diameters of any number of diamond abrasive grains. The particle size of the diamond abrasive grains may be a value obtained by measuring the abrasive grains not adhered to the dresser for the polishing cloth, or may be a value obtained by directly measuring the particle size of the adhered abrasive grains. The particle size of the abrasive particles that are not fixed to the dresser for the polishing cloth may be obtained by measuring the abrasive particles before being fixed to the dresser for the polishing cloth, or the abrasive particles that are collected by peeling from the dresser for the polishing cloth are collected. It may be obtained by measurement and can be measured by a direct observation method including a sieve classification method, a laser diffraction method, a centrifugal sedimentation method and a scanning electron microscope (SEM). The particle size of the fixed abrasive grains can be the equivalent circle diameter obtained by the direct observation method using SEM.

  By setting the average particle diameter d to 3 μm or more, it becomes easy to arrange one crystal habit plane of the diamond abrasive grains substantially parallel to the surface of the metal support material, and it becomes possible to polish the pad surface more flatly. Become. Further, by setting the average particle diameter d to be less than 100 μm, the diamond abrasive particles having a small particle diameter can be arranged at a higher density on the surface of the metal supporting material, so that the pad surface can be polished more flatly. It will be possible. From the above viewpoint, if the average particle diameter d is 3 μm or more and less than 50 μm, a grinding speed of 2.0 μm / min or more and a pad flatness of 0.5 μm or less can be obtained, and it is preferable that the average particle diameter d is 3 μm or more and less than 20 μm. It is more preferable because pad flatness of 0.2 μm or less can be obtained while maintaining a grinding speed of 0 μm / min or more.

  By setting the thickness of the brazing material layer to 0.1 d or more, the diamond abrasive grains can be fixed to the surface of the metal supporting material with sufficient holding force. In addition, by setting the thickness of the brazing material layer to less than 0.4 d, the height of the diamond abrasive grains protruding above the brazing material layer can be made larger than that of the conventional dressing cloth dressing, so that the grinding force can be further improved. It is possible to increase the grinding speed and increase the grinding speed. From the above viewpoint, if the thickness of the brazing material layer is 0.14 d or more and less than 0.38 d, it is preferable that the balance between the pad grinding speed and the pad flatness is optimized in the average grain size of each abrasive grain. , 0.32d or more and less than 0.38d is more preferable.

  From the viewpoint of further increasing the grinding speed in the range of the average particle diameter d, when the distance between the centers of adjacent diamond abrasive grains is L, the number of abrasive grains of the entire dresser for polishing cloth is adjacent to each other. The ratio of the abrasive grains arranged such that the center-to-center distance L between the abrasive grains is d ≦ L <2d is preferably 70% or more with respect to the total number of abrasive grains. This means that when the average grain size d of the diamond abrasive grains is as small as less than 100 μm, the grinding speed can be increased and the flatness of the pad can be enhanced by reducing the distance between the diamond abrasive grains. According to the knowledge of the present inventor. By setting the center-to-center distance L to be 2d or more, the distance between the diamond abrasive grains can be reduced and the grinding speed can be increased. If the center-to-center distance L is smaller than the average particle diameter d of the diamond abrasive grains, the single-layer abrasive grains can no longer be arranged on the surface of the metal support material.

  The brazing material layer may be made of any material as long as the diamond abrasive grains having the average particle diameter d can be sufficiently adhered to the surface of the metal supporting material with the thickness of the brazing material layer. For example, according to the new finding of the present inventors, a brazing material having a composition of Ni-Fe-Cr-Si system has at least one selected from the group consisting of P and Ti, Nb, Ta, V and Zr. The brazing material containing the seed element can sufficiently fix the diamond abrasive grains on the surface of the metal support material.

Preferably, the brazing material has the following composition, in% by weight:
70% ≦ Ni + Fe ≦ 95%
(However, 0 ≦ Fe / (Ni + Fe) ≦ 0.4),
2% ≦ Si + B ≦ 15%
(However, 0 ≦ B / (Si + B) ≦ 0.8),
1% ≤ Cr ≤ 15%,
0.5% ≦ P ≦ 4%, and
0.2% ≦ X ≦ 3%,
(However, X is at least one element selected from the group consisting of Ti, Nb, Ta, V, and Zr, and 0.2 ≦ X / P ≦ 4.)

  Ni is the main element of the brazing material. When the total content of Ni and Fe is 70% or more and 95% or less and the ratio of Fe to the total of (Ni + Fe) is 0.4 or less, the melting point of the brazing material can be lowered, Since it is possible to prevent warping and bonding failure due to thermal deformation of the metal support material due to the rise of the brazing temperature, it is possible to increase the grinding speed, make the ground pad flatter, and cause diamond abrasive grains to fall off. Can be hardened. A preferable content of Ni and Fe is 72% or more and 93% or less, and a more preferable content is 75% or more and 93% or less. When stainless steel or the like is used as the metal support material, it is preferable that 0 <Fe / (Ni + Fe) ≦ 0.4. This is because, since Fe is contained in the metal supporting material, it is possible to improve the bondability between the brazing material and the supporting material when Fe is also contained in the brazing material.

  Cr is contained in order to improve the corrosion resistance of the brazing material. The dresser for polishing cloth is usually used under an acidic or alkaline slurry. Therefore, by setting the content of Cr to 1% or more, the corrosion resistance of the brazing material against acid or alkali can be further increased. The content of Cr may be increased to 15% or less, but no further improvement in corrosion resistance is observed.

  Si and B are contained in order to lower the melting point of the brazing material. When the total content of Si and B is 2% or more and 15% or less and the ratio of B to the total of (Si + B) is 0.8 or less, the melting point of the brazing material can be lowered, Since it is possible to prevent warping and bonding failure due to thermal deformation of the metal support material due to the rise of the brazing temperature, it is possible to increase the grinding speed, make the ground pad flatter, and cause diamond abrasive grains to fall off. Can be hardened. The preferable content of Si and B is 3% or more and 15% or less.

  There are two types of brazing material, foil-like and powder-like, and in order to obtain a foil-like one, for example, a manufacturing method of forming an amorphous foil by a single roll quenching method is generally used. There is. Since B is an element necessary for forming an amorphous material, it is necessary to contain at least 1% or more of B when manufacturing a foil-shaped brazing filler metal. In the case of producing a powdery brazing filler metal, B is not necessarily contained as long as the desired melting point is obtained. It should be noted that even if the ratio of B to the total of (Si + B) is more than 0.8, the formation of amorphous is not improved further, and the foil itself tends to become brittle.

  X is an element that easily forms carbides, and is added to form carbides with diamond to increase the bonding strength between the diamond and the brazing filler metal and to prevent diamond abrasive grains from falling off. X, Ti, Nb, Ta, V, and Zr easily form carbides such as titanium carbide, niobium carbide, tantalum carbide, vanadium carbide, and zirconium carbide, and these carbides are formed at the interface between the diamond and the bonding alloy. , A metal that is effective for joining diamonds. When the content of X is 0.2% or more, when the brazing material becomes hot, X diffuses into the diamond to form a carbide (for example, titanium carbide when X is Ti), The bonding strength between the diamond and the brazing material layer can be further increased. Even if the content of X is more than 3.0%, the above effect is not accumulated. X is Ti, Nb, Ta, V or Zr, and may be contained in the brazing material alone or in combination of two or more. When the brazing material contains two or more types of X, the total content of the two or more types of X is 0.2% or more and 3.0% or less. The preferable X content is 0.5% or more and 3% or less.

  From the viewpoint of increasing the bonding strength and more efficiently exhibiting the above effects, the brazing filler metal contains at least Ti as X, and the content of Ti in the brazing filler metal is 0.5% or more and 3.0% or more. The following is preferable. From the above viewpoint, it is more preferable that the brazing filler metal contains at least Ti as X, and that the content of Ti in the brazing filler metal is 0.5% or more and 1% or less.

  P is contained in order to stabilize the melting temperature by eliminating the difference between the melting point measured by the brazing material alone and the melting point measured by joining the brazing material to the metal supporting material. P makes it possible to stabilize the melting temperature even when the thickness of the brazing filler metal, the joining temperature, and the joining time change, so that it is possible to lower the brazing temperature, which has been set to a higher value in the past with a margin. This also makes it possible to reduce the deformation of the metal support material due to heat. Further, P enhances the wettability between the abrasive particles and the brazing material when the abrasive particles are brazed to the metal support material, so that the bondability is stabilized and the falling of the abrasive particles is suppressed. By setting the P content to be 0.5% or more, such an effect of stabilizing the melting point can be obtained. By setting the P content to 4% or less, the wettability between the abrasive grains and the brazing material can be adjusted to an appropriate range, and the brazing material can be prevented from covering the abrasive grains. A more preferable P content range is 0.5% ≦ P ≦ 4%. When the size of the abrasive grains is small, the abrasive grains are more likely to be covered with the brazing material, but by setting the upper limit of P to 4%, it is possible to prevent it more reliably.

  The present inventor has also found that P prevents graphitization of the diamond surface due to the addition of X. As described above, when X is added to the brazing filler metal, the carbon forming the diamond becomes a carbide with X to increase the bonding strength between the brazing filler metal and the diamond, while changing the crystal structure of the carbon. However, since it is graphitized, there is a limit to the improvement of the bonding strength. On the other hand, by adding X and P in combination to the brazing material, it is possible to further increase the bonding strength of the diamond and prevent the diamond abrasive grains from falling off. This is considered to be because the addition of P suppresses the graphitization of the diamond by X. When the content ratio (X / P) of X and P is 0.2 or more, the effect of suppressing the graphitization of diamond by P can be seen. Further, by setting X / P to be 4.0 or less, a sufficient amount of P with respect to X is present in the brazing material, and the wettability between the diamond abrasive grains and the brazing material does not become too large. Therefore, P can sufficiently suppress graphitization of the diamond by X, and the bonding strength between the diamond and the brazing material layer can be increased. The preferable range of X / P is 0.4 or more and 2.0 or less.

  FIG. 1 is a graph showing a quantitative relationship between P and element X contained in a brazing filler metal used in a preferred embodiment of the present invention, where a region surrounded by abdefh is 0.5% ≦ P ≦ 4.0%. , 0.2% ≦ X ≦ 3.0%, and 0.2 ≦ X / P ≦ 4.0. As is clear from this graph, the lower limit of X increases as the P content increases. The reason is that when P is increased, the amount of compound PX is also increased, and a part of X that should be spent for forming a carbide is consumed. In the present invention, the more preferable range is that all three conditions of 0.5% ≦ P ≦ 4.0%, 0.2% ≦ X ≦ 3.0%, and 0.4 ≦ X / P ≦ 2.0 are satisfied. The area to be filled is surrounded by cdghi in the graph. In this region, the lower limit value of X further increases as the P content increases.

  Since the brazing material layer having the above composition has a high bonding strength to diamond, the average particle diameter d of the diamond abrasive grains is 3 μm or more and less than 100 μm, and the thickness of the brazing material layer is 0.1 d or more and less than 0.4 d. Even in such a case, the diamond abrasive grains can be sufficiently fixed to the surface of the metal support material.

  It is preferable that the metal support material hardly react with the acidic or alkaline slurry, and specifically, stainless steel is preferable. Examples of the stainless steel preferably used for the metal support material include SUS304, SUS316, and SUS430, which are typical stainless steels. Further, a general structural steel such as carbon steel having a surface plated with Ni or the like can also be used.

  The shape of the metal support material is not particularly limited, and may be a polygonal shape such as an octagon or an decagon, but since the metal support material itself grinds the pad while rotating, uniform grindability is obtained. In order to secure the above, it is preferable that it is disk-shaped.

The dresser for a polishing cloth according to the present invention can be manufactured as follows. First, a brazing material is temporarily attached to the surface of the metal supporting material. After that, diamond abrasive grains are arranged at a predetermined interval on the surface of the metal supporting material to which the brazing material is temporarily attached. At this time, the diamond abrasive grains may be temporarily fixed with glue or the like so as not to shift. Next, after vacuuming to about 10 ⁻³ Pa, the environment is heated to a temperature at which the brazing material melts. Most of the glue and the like are vaporized during the temperature rise. The temperature at which the brazing material is melted is preferably equal to or higher than the melting point of the brazing material and is as low as possible. At most, the liquidus temperature of the brazing material is preferably within about + 20 ° C. This is because when the temperature is high, the deformation of the metal support material due to heat increases. It is sufficient that the holding time at the brazing temperature is about 5 to 30 minutes.

  Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto. In the examples, “%” is used, but “% by mass” is indicated unless otherwise specified.

[Example 1]
As the diamond abrasive grains, those having an average grain size d of 1.5 μm, 3.5 μm, 7.5 μm, 15 μm, 50 μm, 75 μm, 95 μm, 110 μm are used, respectively, and a brazing material thickness is 0.2 μm to 80 μm. A dresser for polishing cloth was produced.

  The composition of the brazing material was Ni-4.2% Si-3.0% B-7.0% Cr-1.0% P-2.0% Ti.

1. Manufacture of Dresser An alloy having the composition of the brazing material was melted to prepare a master alloy. Using this master alloy, a foil having a thickness of 15 μm to 40 μm and a width of 50 mm was manufactured by a known single roll quenching method. Specifically, a master alloy melted in a quartz crucible equipped with a 0.4 mm to 0.6 mm x 50 mm slot nozzle is melted, and is placed on a Cu cooling roll rotating at a peripheral speed of 20 to 30 mm / sec. A foil was manufactured by ejecting the molten metal through a slot nozzle. The thickness of the foil obtained by this method was 15 to 40 μm. A foil having a desired thickness was selected from these foils to obtain a brazing material having a brazing material thickness of 15 to 40 μm. Further, these foils were etched using a hydrofluoric acid-based or hydrochloric acid-based chemical etching solution to manufacture a brazing filler metal having a brazing filler metal thickness of less than 15 μm. The foil obtained by the single roll method was amorphous, and the composition in the foil was uniform, so that the foil could be uniformly thinned by etching. Also, a brazing material having a brazing material thickness of more than 40 μm was manufactured by stacking a plurality of the above foils.

  A disk made of SUS304 stainless steel and having a diameter of 100 mm and a thickness of 4 mm was used as the metal support material. Abrasive grains were arranged in a donut-shaped region between a circle having a radius of 35 mm and a circle having a radius of 48 mm drawn on one surface of the metal support material. At that time, the donut-shaped region was divided into six arcs at an equal angle when viewed from the center of the metal support, and adjacent arc-shaped regions were each provided with a region having a width of 2 mm and no abrasive grains. The diamond abrasive grains were arranged in a square pattern.

In order to arrange the abrasive grains, a sieve is prepared in accordance with the same pattern as the arrangement pattern of the abrasive grain size d to be fixed to each dresser and the predetermined abrasive grain interval L, and the abrasive grains are supported by the metal through the sieve. I placed them on the material. Specifically, a brazing material having a predetermined thickness is temporarily fixed in the spot area in the area where the abrasive grains are arranged. An organic binder was applied onto this foil, and abrasive grains were placed on the foil through a sieve. Then, using a heating furnace, a brazing process was performed at 1000 ° C. for 20 minutes in a vacuum of 10 ⁻³ Pa. The thickness of the brazing material was measured by observing the cross section with an optical microscope or SEM.

  In this way, the respective dressers shown in Table 1 and Table 2 were manufactured.

2. Evaluation of Dresser Using the dresser prepared above, the pad was actually ground, and the pad grinding rate, the pad flatness, and the number of diamond abrasive grains dropped were determined from the reduction amount of the pad thickness after grinding. The pad was made of foamed polyurethane and had a pad diameter of 250 mm.

  This pad was stuck on a polishing plate. The dresser was fixed to a device equipped with a rotating mechanism and a mechanism that swings in the radial direction of the pad, and a load of 1 kg was applied by a pressure mechanism to press it against the pad. The center of the dresser was swung in the radial direction within the range of 30 mm to 90 mm from the pad center in the radial direction of the pad. The pad rotation speed was 90 rpm, the dresser rotation speed was 80 rpm, and the oscillation was 10 reciprocations / minute. The pad rotation direction and the dresser rotation direction are the same. Water was supplied to such an extent that the entire surface of grinding was covered with a film of water.

  After 5 minutes had passed from the start of the grinding, the grinding was once interrupted, and the pad thickness was measured along the two diameters orthogonal to each other with a length measuring microscope. One diameter was divided into 10 equal parts at equal intervals, and a total of 20 points were measured in the vicinity of the center of the equally divided parts, and an average value was obtained. Grinding was continued again, and the same measurement was performed after 15 hours. From the average value of the pad thickness, the average pad grinding speed during the grinding time of 5 minutes to 15 hours after the start of grinding was determined. The flatness was determined as a value obtained by subtracting the minimum value from the maximum value among the values at 20 points measured after 15 hours.

  The number of diamond abrasive grains dropped is counted by observing the number of diamond abrasive grains adhered to the dresser with a microscope before and after grinding, and from the number of diamond abrasive grains adhered before grinding, after grinding. The number was determined by subtracting the number of fixed diamond abrasive grains.

  The results of the measured pad grinding speed, pad flatness, and the number of diamond abrasive grains that have fallen off are shown as the average grain size d of the abrasive grains, the brazing material thickness, the brazing material layer thickness / d, L / d, and d ≦ L <2d. It is shown in Tables 1 and 2 together with the ratio of the abrasive grains satisfying the conditions.

As is clear from Table 1 and Table 2, the dresser of the invention example in which the average particle diameter d of the diamond abrasive grains is 3 μm or more and less than 100 μm, and the thickness of the brazing material layer is 0.1 d or more and less than 0.4 d. Had a high grinding speed, the ground pad was flatter, and the diamond abrasive grains did not fall off.
On the other hand, Comparative Example No. 3 in which the average particle diameter d of the diamond abrasive grains is less than 3 μm. 1 and Comparative Example No. In the dresser No. 2, the number of diamond abrasive grains dropped was 12 or more. In addition, Comparative Example No. 1 having an average grain size d of diamond abrasive grains larger than 100 μm. 32 to Comparative Example No. The dresser No. 35 had a large difference in pad thickness, and its flatness was poorer than that of the other dressers.

  Comparative example No. 3 in which the thickness of the brazing material layer is smaller than 0.1 d. 3, Comparative Example No. 7, Comparative Example No. 12, Comparative Example No. 17, Comparative Example No. 22, Comparative Example No. 27, Comparative Example No. In No. 32, the bonding strength of the diamond abrasive grains probably decreased, so the number of diamond abrasive grains dropped was 5 or more.

  Comparative example No. 3 in which the thickness of the brazing material layer is larger than 0.4 d. 2, Comparative Example No. 6, Comparative Example No. 11, Comparative Example No. 16, Comparative Example No. 21, Comparative Example No. 26, Comparative Example No. 31, Comparative Example No. The dresser of No. 35 has the same L / d value. Inventive Example No. 1 5, Invention Example No. 9, Invention Example No. 14, Invention Example No. 19, Invention Example No. 24, Invention Example No. 29, Invention Example No. The pad grinding speed was 0.78 to 0.85 times slower when compared with No. 34, respectively.

  Invention Example No. in which the ratio of the abrasive grains arranged so that the L of adjacent abrasive grains is d ≦ L <2d is 70% or more with respect to the total number of abrasive grains. 9, Invention Example No. 14, Invention Example No. 19, Invention Example No. 24, Invention Example No. In the example No. 29 of the invention, the proportion of the above-mentioned arranged abrasive grains was less than 70%. Inventive Example No. 10 Inventive Example No. 15 20, Invention Example No. 25, invention example No. When compared with 30 respectively, the pad grinding speed was almost unchanged, but the pad flatness was as small as 0.59 to 0.66 times.

[Example 2]
A diamond abrasive having an average particle diameter d of 15 μm was used to manufacture a dresser in the same manner as in Example 1, and in the same manner as in Example 1, the grinding speed of the pad, the flatness of the pad and the falling of diamond abrasive The number was measured.

  At this time, the composition of the brazing material was changed as shown in Tables 3 and 4 except that P was 1.0% and Ti was 2.0%. The thickness of the brazing material layer was adjusted so that the thickness / d of the brazing material layer was in the range of 0.32 to 0.37. L / d was set to 1.5. The ratio of the abrasive grains arranged such that the center-to-center distance L between adjacent abrasive grains was d ≦ L <2d was 100% with respect to the total number of abrasive grains.

  The results of the measured pad grinding speed, pad flatness, and the number of diamond abrasive grains dropped are shown in Tables 3 and 4 together with the composition of the brazing material layer.

  As is clear from the results of Tables 3 and 4, the content of Ni + Fe in the brazing material is 70% or more and 95% or less, the Fe / (Ni + Fe) is 0.4% or less, and the content of Si + B is 2% or more and 15% or less, B / (Si + B) is 0.8% or less, P content is 0.5% or more and 4% or less, and X (Ti) content is 0.2. The dresser of the invention example in which the amount of the abrasive grains was not less than 3% and not more than 3% had a high grinding speed, the ground pad was flatter, and the diamond abrasive grains did not fall off.

  On the other hand, Inventive Example No. 7 which does not satisfy the condition that the content of Ni + Fe is 70% or more and 95% or less, or Fe / (Ni + Fe) is 0.4% or less. 41, Invention Example No. 52, invention example No. In the dresser No. 56, one or more and three or less diamond abrasive grains dropped out.

  Invention Example No. 1 in which the content of Si + B does not satisfy the condition of 2% or more and 15% or less. 42, Invention Example No. In No. 51, the melting point of the brazing material probably increased, and at the brazing temperature of 1000 ° C., the diamond abrasive grains were defectively bonded, so that one or more and three or less diamond abrasive grains fell out.

  Invention Example No. in which B / (Si + B) is more than 0.8%. In No. 61, probably the brazing material became brittle, and three diamond abrasive grains were dropped.

[Example 3]
A diamond abrasive having an average particle diameter d of 50 μm was used to manufacture a dresser in the same manner as in Example 1, and in the same manner as in Example 1, the grinding speed of the pad, the flatness of the pad and the falling of diamond abrasive The number was measured.

  At this time, the composition of the brazing material was changed as shown in Table 5 except that P was 3.7% and Ti was 2.8%. The thickness of the brazing material layer was adjusted so that the thickness / d of the brazing material layer was in the range of 0.32 to 0.37. L / d was 1.7. The ratio of the abrasive grains arranged such that the center-to-center distance L between adjacent abrasive grains was d ≦ L <2d was 100% with respect to the total number of abrasive grains.

  The results of the above measured pad grinding speed, pad flatness, and the number of diamond abrasive grains dropped are shown in Table 5 together with the composition of the brazing material layer.

  As is clear from the results in Table 5, the content of Ni + Fe in the brazing material is 70% or more and 95% or less, Fe / (Ni + Fe) is 0.4% or less, and the content of Si + B is 2% or more. 15% or less, B / (Si + B) is 0.8% or less, P content is 0.5% or more and 4% or less, and X (Ti) content is 0.2% or more 3 Even when the average particle diameter d of the diamond abrasive grains was 50 μm, the dresser of the invention example having a content of 10% or less had a high grinding speed, the ground pad was flatter, and the diamond abrasive particles did not fall off.

[Example 4]
A diamond abrasive having an average particle diameter d of 15 μm was used to manufacture a dresser in the same manner as in Example 1, and in the same manner as in Example 1, the grinding speed of the pad, the flatness of the pad and the falling of diamond abrasive The number was measured.

  At this time, the composition of the brazing material is 0.08% for Fe, 4.2% for Si, 3.0% for B, 7.0 for Cr, and P and X in the amounts shown in Tables 6 and 7, Ni was the remaining amount. The thickness of the brazing material layer was adjusted so that the thickness / d of the brazing material layer was in the range of 0.32 to 0.37. L / d was set to 1.5. The ratio of the abrasive grains arranged such that the center-to-center distance L between adjacent abrasive grains was d ≦ L <2d was 100% with respect to the total number of abrasive grains.

  The results of the above measured pad grinding speed, pad flatness, and the number of diamond abrasive grains dropped are shown in Tables 6 and 7 together with the composition of the brazing material layer.

  In Tables 6 and 7, in the “range of FIG. 1” column, the content of X and P is within the range enclosed by cdghi in FIG. 1 is within the range enclosed by “A” and abci. "B1" indicates the case, "B2" indicates the case within the range surrounded by defg, and "C" indicates the case outside the range. Further, in the column of “X”, the element used as X is shown in parentheses.

  As is clear from the results of Table 6 and Table 7, the content of Ni + Fe in the brazing material is 70% or more and 95% or less, Fe / (Ni + Fe) is 0.4% or less, and the content of Si + B is 2% or more and 15% or less, B / (Si + B) is 0.8% or less, P content is 0.5% or more and 4% or less, and X (Ti) content is 0.2. In the dresser of the invention example of not less than 3% and not more than 3%, even if the average particle diameter d of the diamond abrasive grains is 50 μm, the grinding speed is high, the ground pad is flatter, and the diamond abrasive grains are not dropped. There were few and less.

  Further, X / P is 0.4 or more and 2.0 or less, and the invention example No. 1 included in the range surrounded by cdghi in FIG. 89, invention example No. 90, invention example No. 94 to Invention Example No. 96, Invention Example No. 99, invention example No. 100, invention example No. 103 to Invention Example No. 105, invention example No. In 107, the diamond abrasive grains did not fall off. This is because when X / P is in this range, carbides that contribute to bonding are sufficiently formed to increase the bonding strength, and the effect of suppressing graphitization of the diamond surface by P is more sufficiently exerted. Conceivable.

  On the other hand, Invention Example No. with a P content of less than 0.5%. 81, Invention Example No. 86, invention example no. 92, Invention Example No. 98, Invention Example No. In 106, the effect of suppressing the graphitization by P was probably small, so that two or three diamond abrasive grains were dropped.

  Inventive Example No. with a P content of more than 4.0%. 85, invention example No. 91, Invention Example No. 97, Invention Example No. In No. 102, the wettability between the diamond abrasive grains and the brazing material was probably too large, and the protrusion height of the diamond abrasive grains was not sufficient, so that the grinding speed tended to decrease.

  Invention Example No. 1 in which the content of X (Ti) is less than 0.2%. 110, invention example No. No. 111 probably had a low content of carbide-forming elements and had a lower carbide bond strength, resulting in the loss of four diamond abrasive grains.

  Invention Example No. 1 in which the content of X (Ti) is more than 3.0%. 81 to Invention Example No. Even at 85, there was no change in the grinding speed, the flatness of the pad, and the falling of diamond abrasive grains. Therefore, the effect of X (Ti) is probably saturated at 3.0%.

  Invention Example No. in which X / P is smaller than 0.2. 109, Invention Example No. 110, invention example No. No. 111 probably had a low content of carbide forming elements and had a lower carbide bond strength, resulting in the loss of 3 or 4 diamond abrasive grains.

[Example 5]
Among the dressers produced in Example 4, the number shown in Table 8 was measured in the same manner as in Example 4 except that the weight applied when the pad was ground was 3.5 kg.

  Table 8 shows the results of the number of diamond abrasive grains that have fallen off as measured above, together with the composition of the brazing material layer.

  In Table 8, in the “range of FIG. 1” column, the contents of X and P are those within the range enclosed by cdghi in FIG. 1 and those within the range enclosed by abci. “B1” was described, cases in the range enclosed by defg were described as “B2”, and those outside these ranges were described as “C”. Further, in the column of “X”, the element used as X is shown in parentheses.

  As is clear from the results of Table 8, Invention Example No. containing Ti as the element X and having a Ti content of 0.5% or more and 3% or less. 89, invention example No. 90, invention example No. 94 to Invention Example No. 96, Invention Example No. 100, invention example No. 103 to Invention Example No. In No. 105, even if the load was increased to 3.5 kg, the diamond abrasive grains did not drop off much.

  Further, Invention Example No. 1 containing Ti as the element X and having a Ti content of 0.5% or more and 1% or less. 103 to Invention Example No. In No. 105, the diamond abrasive grains did not fall off even if the load was increased to 3.5 kg.

  On the other hand, invention example No. 1 in which the content of Ti is less than 0.5%. 107, invention example No. In No. 108, when the load was increased to 3.5 kg, the number of diamond abrasive grains that fell off increased.

[Example 6]
A diamond abrasive having an average particle diameter d of 15 μm was used to manufacture a dresser in the same manner as in Example 1, and in the same manner as in Example 1, the grinding speed of the pad, the flatness of the pad and the falling of diamond abrasive The number was measured.

  At this time, the composition of the brazing filler metal is such that Fe is 0.08%, Si is 4.2%, B is 3.0%, Cr is 7.0, and P and X are the amounts described in Tables 9 and 10. Ni was the remaining amount. The thickness of the brazing material layer was adjusted so that the thickness / d of the brazing material layer was in the range of 0.32 to 0.37. L / d was set to 1.5. The ratio of the abrasive grains arranged such that the center-to-center distance L between adjacent abrasive grains was d ≦ L <2d was 100% with respect to the total number of abrasive grains.

  The results of the measured pad grinding speed, pad flatness, and the number of diamond abrasive grains dropped are shown in Tables 9 and 10 together with the composition of the brazing material layer.

  In Tables 9 and 10, in the “range of FIG. 1” column, the contents of X and P are within the range enclosed by cdghi in FIG. 1 and within the range enclosed by abci. "B1" indicates the case, "B2" indicates the case within the range surrounded by defg, and "C" indicates the case outside the range. Further, in the column of “X”, the element used as X is shown in parentheses.

  As is clear from the results in Tables 9 and 10, the dressers of the invention examples containing Nb, Ta, V or Zr as X also had a high grinding speed, the ground pad was flatter, and There were few dropouts of less than two.

  Further, as in the case where X is Ti, X / P is 0.4 or more and 2.0 or less, and the invention example No. 1 included in the range surrounded by cdghi in FIG. 122 to Invention Example No. 124, Invention Example No. 126, Invention Example No. 128-Invention Example No. 130, Invention Example No. 132, Invention Example No. 134 to Invention Example No. 136, Invention Example No. 138, invention example No. 140-invention example No. 142, invention example no. In 144, the diamond abrasive grains did not fall off. This is because when X / P is in this range, carbides that contribute to the bonding are sufficiently formed to increase the bonding strength, and the effect of suppressing the graphitization of the diamond surface by P is more sufficiently exhibited. Conceivable.

[Example 7]
A diamond abrasive having an average particle diameter d of 15 μm was used to manufacture a dresser in the same manner as in Example 1, and in the same manner as in Example 1, the grinding speed of the pad, the flatness of the pad and the falling of diamond abrasive The number was measured. However, the number of dropped diamond abrasive grains was measured both when the weight for grinding the pad was 1.0 kg and when it was 3.5 kg.

  At this time, the composition of the brazing material is 0.08% for Fe, 4.2% for Si, 3.0% for B, 7.0 for Cr, and P and X are shown in Table 11, Table 12 and Table 13. And Ni as the remaining amount. The thickness of the brazing material layer was adjusted so that the thickness / d of the brazing material layer was in the range of 0.32 to 0.37. L / d was set to 1.5. The ratio of the abrasive grains arranged such that the center-to-center distance L between adjacent abrasive grains was d ≦ L <2d was 100% with respect to the total number of abrasive grains.

  The results of the above measured pad grinding speed, pad flatness, and the number of diamond abrasive grains dropped are shown in Tables 11, 12, and 13 together with the composition of the brazing material layer.

  In Table 11, Table 12 and Table 13, in the “range of FIG. 1” column, the content of X and P within the range surrounded by cdghi of FIG. 1 was described as “A”. Further, in the column of “X”, the element used as X is shown in parentheses.

  As is clear from the results of Tables 11 to 13, both the dresser of the present invention containing two or more kinds of elements among Ti, Nb, Ta, V or Zr as X, the grinding speed is high, and the ground pad is It was flatter, and the diamond abrasive grains did not fall off with a load of 1 kg.

  However, Invention Example No. 1 containing no Ti. 167 to Invention Example No. In the dresser No. 178, two or more and four or less diamond abrasive grains were seen to fall off when the load was 3.5 kg.

  Inventive Example No. 1 in which the content of X is in the range of 0.2% or more and 3% or less, and the content of Ti is less than 0.5% even if at least Ti is contained as X. 151, invention example No. 155, invention example No. 159, invention example No. In the dresser No. 163, two diamond abrasive grains were found to have fallen off when the load was 3.5 kg.

  Further, the content of X is in the range of 0.2% or more and 3% or less, and even if at least Ti is contained as X, the content of Ti is more than 1.0%. 154, Invention Example No. 158, invention example no. 162, Invention Example No. In the dresser of 166, one diamond abrasive grain was found to have fallen off when the load was 3.5 kg.

  From these results, when at least Ti is contained as the element X and the content of Ti is 0.5% ≦ Ti ≦ 1%, the bonding force of the diamond abrasive grains is increased, and the diamond abrasive grains can be prevented from falling off. I understood.

[Example 8]
A brazing material layer was manufactured in the same manner as in Example 1.

  A disk made of SUS304 stainless steel and having a diameter of 100 mm and a thickness of 4 mm was used as the metal support material. Diamond abrasive grains having an average particle diameter d of 50 μm were arranged in a doughnut-shaped region between a circle having a radius of 35 mm and a circle having a radius of 48 mm drawn on one surface of this metal support material. At that time, the donut-shaped region was divided into six arcs at an equal angle when viewed from the center of the metal support, and adjacent arc-shaped regions were each provided with a region having a width of 2 mm and no abrasive grains.

  A mesh was drawn in a lattice pattern in the diamond abrasive grain placement region, and diamond abrasive grains were placed at the intersections. The lattice spacing corresponds to the distance L between the abrasive grains. At that time, the lattice spacing was set to two of 85 μm (L = 1.7d) and 160 μm (L = 3.2d), and both were randomly arranged at a predetermined ratio. Specifically, first, a foil-shaped brazing material was temporarily attached to the diamond-disposed region of the stainless steel support material by spot welding. Next, a sieve having holes through which the diamond passes was prepared, the sieve was placed on a support material, and the diamond was placed through the sieve. When the holes were formed in the sieve, the holes were positioned by drawing a grid in which a grid having an interval of 85 μm and a grid having an interval of 160 μm were randomly arranged, and making holes at each grid point. When the number of lattice sides where L is 85 μm is N85 and the number where L is 160 μm is N160, {N85 / (N85 + N160)} × 100 (%) was designed to be the value shown in Table 8.

  In this way, each dresser shown in Table 14 was manufactured.

  With respect to each dresser shown in Table 14, the pad grinding speed, the pad flatness, and the number of diamond abrasive grains dropped were measured in the same manner as in Example 1.

  Table 14 shows the results of the measured pad grinding speed, pad flatness, and the number of dropped diamond abrasive grains, together with {N85 / (N85 + N160)} × 100 (%).

  As is clear from the results in Table 14, the invention is such that the ratio of the abrasive grains arranged such that the L of adjacent abrasive grains is d ≦ L <2d is 70% or more with respect to the total number of abrasive grains. Example No. 181 to Invention Example No. With the 183 dresser, the grinding speed was faster and the ground pad was also flatter.

  Therefore, the dresser for a polishing cloth of the present invention can be applied to dressing of a polishing pad of various polishing apparatuses.

Claims (8)

A dresser for a polishing cloth in which a plurality of diamond abrasive grains are adhered in a single layer on the surface of a metal support,
The diamond abrasive grains are bonded and fixed to the surface of the metal supporting material through a brazing material layer containing a brazing material,
The composition of the brazing material is% by mass,
70% ≦ Ni + Fe ≦ 95% (where 0 ≦ Fe / (Ni + Fe) ≦ 0.4),
2% ≦ Si + B ≦ 15% (where 0 ≦ B / (Si + B) ≦ 0.8),
1% ≤ Cr ≤ 15%,
0.5% ≦ P ≦ 4%, and
0.2% ≦ X ≦ 3%
(However, X is at least one element selected from the group consisting of Ti, Nb, Ta, V and Zr, and 0.2 ≦ X / P ≦ 4).
A dresser for polishing cloth, which is characterized in that   The dresser for polishing cloth according to claim 1, wherein the composition of the brazing material is 0.4 ≦ X / P ≦ 2.0.   The polishing according to claim 1 or 2, wherein the brazing material contains at least Ti as the element X, and the content of Ti is 0.5% ≤ Ti ≤ 3% in mass%. Dresser for cloth.   The brazing material contains at least Ti as an element X, and the content of Ti is 0.5% ≦ Ti ≦ 1% in mass%, in any one of claims 1 to 3. Dresser for polishing cloth as described.   The dresser for polishing cloth according to claim 1, wherein the diamond abrasive grains have an average particle diameter d of 3 μm or more and less than 100 μm.   The dresser for polishing cloth according to any one of claims 1 to 5, wherein the brazing material layer has a thickness of 0.1d or more and less than 0.4d. When the distance between the centers of adjacent diamond abrasive grains is L,
The ratio of the abrasive grains arranged such that the L of adjacent abrasive grains is d ≦ L <2d with respect to the total number of abrasive grains of the polishing cloth is 70% or more with respect to the total number of abrasive grains. Characterized by being
The dresser for polishing cloth according to any one of claims 1 to 6.   The dresser for polishing cloth according to any one of claims 1 to 7, wherein the metal support material is made of stainless steel.

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