JP2020058126A - Semiconductor module - Google Patents

Semiconductor module Download PDF

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JP2020058126A
JP2020058126A JP2018186698A JP2018186698A JP2020058126A JP 2020058126 A JP2020058126 A JP 2020058126A JP 2018186698 A JP2018186698 A JP 2018186698A JP 2018186698 A JP2018186698 A JP 2018186698A JP 2020058126 A JP2020058126 A JP 2020058126A
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overlapping
island
semiconductor element
lower arm
metal layer
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JP6908012B2 (en
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鈴木　啓介
Keisuke Suzuki
鈴木　　啓介
高志 増澤
Takashi Masuzawa
高志 増澤
浩志 瀧
Hiroshi Taki
浩志 瀧
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Denso Corp
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    • H—ELECTRICITY
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    • H02M7/00—Conversion of ac power input into dc power output; Conversion of dc power input into ac power output
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Abstract

To provide a semiconductor module capable of suppressing warping of a multilayer substrate, and capable of reducing inductance.SOLUTION: A semiconductor module is provided with: a pair of semiconductor elements 2 connected to each other in series; a pair of DC terminals 3; and a multilayer substrate 10. The multilayer substrate 10 is provided with: an insulation substrate 4 composed of an insulation material; an element-side metal layer 50 formed on a main surface Son the semiconductor element 2 side of the insulation substrate 4; and an opposite-side metal layer 60 formed on a main surface Son the opposite side. A plurality of islands 5 are formed by the element-side metal layer 50. The opposite-side metal layer 60 is provided with a plurality of overlapping parts 6 and a coupling part 61. The overlapping parts 6 overlap with the respective islands 5 when viewed in the thickness direction of the insulation substrate 4. The coupling part 61 couples the plurality of overlapping parts 6.SELECTED DRAWING: Figure 1

Description

本発明は、一対の半導体素子と、該半導体素子を搭載した積層基板とを有する半導体モジュールに関する。   The present invention relates to a semiconductor module having a pair of semiconductor elements and a laminated substrate on which the semiconductor elements are mounted.

従来から、上アーム半導体素子と下アーム半導体素子との一対の半導体素子と、該半導体素子を搭載した積層基板とを有する半導体モジュールが知られている（図１９参照）。この半導体モジュールは、直流電源に電気接続される。そして、上記半導体素子をスイッチング動作させることにより、直流電源から供給される直流電力を交流電力に変換するよう構成されている。   2. Description of the Related Art Conventionally, there has been known a semiconductor module including a pair of semiconductor elements, an upper arm semiconductor element and a lower arm semiconductor element, and a stacked substrate on which the semiconductor elements are mounted (see FIG. 19). This semiconductor module is electrically connected to a DC power supply. The semiconductor device is configured to perform a switching operation to convert DC power supplied from a DC power supply into AC power.

上記積層基板は、絶縁材料からなる絶縁基板と、該絶縁基板の、半導体素子側の主面に形成された素子側金属層と、反対側の主面に形成された反対側金属層とを備える。上記素子側金属層をエッチングして、複数のアイランドを形成してある。これらのアイランドに半導体素子が搭載される。   The laminated substrate includes an insulating substrate made of an insulating material, an element-side metal layer formed on a semiconductor element-side main surface of the insulating substrate, and an opposite-side metal layer formed on an opposite main surface. . The element-side metal layer is etched to form a plurality of islands. Semiconductor elements are mounted on these islands.

また、上記積層基板では、反対側金属層によって、一つの大型のアイランドを形成してある（図１８参照）。半導体素子をスイッチング動作させると、半導体素子や素子側金属層に、周波数の高い交流電流が流れる。これに伴って、反対側金属層に渦電流が発生する。この渦電流の周囲に発生した磁束によって、上記交流電流の周囲に発生した磁束が相殺されるため、インダクタンスを低減することができる。そのため、半導体素子に大きなサージが加わることを抑制できる。   In the laminated substrate, one large island is formed by the metal layer on the opposite side (see FIG. 18). When the semiconductor element performs a switching operation, a high-frequency alternating current flows through the semiconductor element and the element-side metal layer. Accordingly, an eddy current is generated in the opposite metal layer. The magnetic flux generated around the eddy current cancels the magnetic flux generated around the alternating current, so that the inductance can be reduced. Therefore, it is possible to suppress a large surge from being applied to the semiconductor element.

しかしながら、上記半導体モジュールは、積層基板が反りやすいという課題がある。すなわち、上記半導体モジュールでは、反対側金属層によって一つの大型のアイランドを形成してあるため、素子側金属層と反対側金属層との、アイランドの形状が大きく異なる。そのため、温度が上昇したときに、２枚の金属層の、熱膨張によって生じる延び量（以下、熱膨張量とも記す）が大きく異なり、積層基板が反りやすくなる。その結果、半導体素子と素子側金属層との接合部等へ応力が集中し、半導体モジュールの寿命が低下する可能性が考えられる。   However, the semiconductor module has a problem that the laminated substrate is easily warped. That is, in the semiconductor module, since one large island is formed by the opposite metal layer, the island shapes of the element-side metal layer and the opposite metal layer are greatly different. Therefore, when the temperature rises, the amount of elongation (hereinafter, also referred to as the amount of thermal expansion) of the two metal layers caused by thermal expansion greatly differs, and the laminated substrate is easily warped. As a result, stress may be concentrated on the junction between the semiconductor element and the element-side metal layer, and the life of the semiconductor module may be reduced.

この課題を解決するため、素子側金属層および反対側金属層の、厚さとアイランド形状を等しくすることが検討されている（下記特許文献１参照）。例えば、反対側金属層をエッチングして、素子側金属層と同じパターンにする（図２０参照）。このようにすれば、２枚の金属層の熱膨張量が等しくなり、積層基板の反りを抑制できると考えられる。   In order to solve this problem, studies have been made to equalize the thickness and the island shape of the element-side metal layer and the opposite-side metal layer (see Patent Document 1 below). For example, the opposite side metal layer is etched to have the same pattern as the element side metal layer (see FIG. 20). By doing so, it is considered that the thermal expansion amounts of the two metal layers become equal, and the warpage of the laminated substrate can be suppressed.

特許第５９２８４８５号公報Japanese Patent No. 5928485

しかしながら、素子側金属層と反対側金属層とを同じパターンにすると、反対側金属層が細かく分割される。上述したように、半導体素子をスイッチング動作したときに、素子側金属層に交流電流が流れ、この交流電流の周囲に発生した磁束を打ち消す渦電流が反対側金属層に誘起されるが、反対側金属層を分割すると、渦電流が流れる経路が制限され（図２０参照）、渦電流が、交流電流の経路に沿って流れにくくなる。したがって、渦電流による磁束の打ち消し効果が低下する。その結果、寄生インダクタンスが大きくなり、半導体素子に加わるサージ電圧が増加する。   However, when the element-side metal layer and the opposite-side metal layer have the same pattern, the opposite-side metal layer is finely divided. As described above, when the semiconductor element performs a switching operation, an alternating current flows through the element-side metal layer, and an eddy current that cancels a magnetic flux generated around the alternating current is induced in the opposite metal layer. When the metal layer is divided, the path through which the eddy current flows is restricted (see FIG. 20), and the eddy current is less likely to flow along the path of the alternating current. Therefore, the effect of canceling the magnetic flux due to the eddy current is reduced. As a result, the parasitic inductance increases, and the surge voltage applied to the semiconductor element increases.

本発明は、かかる課題に鑑みてなされたものであり、積層基板の反りを抑制でき、かつインダクタンスを低減できる半導体モジュールを提供しようとするものである。   The present invention has been made in view of such a problem, and an object of the present invention is to provide a semiconductor module that can suppress warpage of a laminated substrate and reduce inductance.

本発明の一態様は、互いに直列に電気接続された、上アーム半導体素子（２U）と下アーム半導体素子（２L）との、少なくとも一対の半導体素子（２）と、
上記上アーム半導体素子に電気接続した正極端子（３P）と、上記下アーム半導体素子に電気接続した負極端子（３N）との、一対の直流端子（３）と、
絶縁材料からなる絶縁基板（４）と、該絶縁基板の上記半導体素子側の主面（Ｓ1）に形成された素子側金属層（５０）と、上記絶縁基板の、上記素子側金属層を設けた側とは反対側の主面（Ｓ2）に形成された反対側金属層（６０）と、を有する積層基板（１０）とを備え、
上記素子側金属層によって複数のアイランド（５）が形成され、該複数のアイランドのうち少なくとも一部の該アイランドは、上記半導体素子が搭載され、該半導体素子を流れる電流の経路をなしており、
上記反対側金属層は、上記絶縁基板の厚さ方向（Ｚ）から見たときに、個々の上記アイランドと重なり合う複数の重複部（６）と、該複数の重複部のうち少なくとも２個の該重複部を連結する連結部（６１）とを備え、
上記半導体素子のスイッチング動作に伴って、交流電流が、上記一対の直流端子の間に、上記一対の半導体素子および上記アイランドを介して流れたとき、渦電流が、上記複数の重複部と上記連結部とを含む経路に流れるよう構成されている、半導体モジュール（１）にある。 One embodiment of the present invention provides at least one pair of a semiconductor element (2) of an upper arm semiconductor element (2 U ) and a lower arm semiconductor element (2 L ) electrically connected in series with each other;
A pair of DC terminals (3) of a positive terminal (3 P ) electrically connected to the upper arm semiconductor element and a negative terminal (3 N ) electrically connected to the lower arm semiconductor element;
An insulating substrate made of an insulating material (4), the element-side metal layer formed on the semiconductor element side of the main surface of the insulating substrate (S 1) and (50), of the insulating substrate, the element-side metal layer and the main surface of the provided was opposite to the side opposite the metal layer formed on the (S 2) (60), and a multilayer substrate having a (10),
A plurality of islands (5) are formed by the element-side metal layer, and at least a part of the plurality of islands has the semiconductor element mounted thereon and forms a path of a current flowing through the semiconductor element.
The opposite metal layer has a plurality of overlapping portions (6) overlapping with the individual islands when viewed from the thickness direction (Z) of the insulating substrate, and at least two of the overlapping portions among the plurality of overlapping portions. A connecting portion (61) for connecting the overlapping portion,
When an alternating current flows between the pair of DC terminals through the pair of semiconductor elements and the islands in accordance with the switching operation of the semiconductor element, an eddy current is connected to the plurality of overlapping portions and the plurality of overlapping portions. The semiconductor module (1) is configured to flow in a path including

上記半導体モジュールでは、積層基板の上記反対側金属層によって、上記重複部と、上記連結部とを形成してある。そのため、積層基板の反りを抑制しつつ、インダクタンスを低減できる。
すなわち、上記重複部は、上記厚さ方向から見たときに、素子側金属層によって形成されたアイランドと重なり合うよう構成されている。そのため、素子側金属層と反対側金属層のパターンを近似させることができる。したがって、これらの金属層の熱膨張量が略等しくなり、積層基板の反りを抑制できる。 In the semiconductor module, the overlapping portion and the connecting portion are formed by the metal layer on the opposite side of the laminated substrate. Therefore, the inductance can be reduced while suppressing the warpage of the laminated substrate.
That is, the overlap portion is configured to overlap with the island formed by the element-side metal layer when viewed from the thickness direction. Therefore, the patterns of the element-side metal layer and the opposite-side metal layer can be approximated. Therefore, the thermal expansion amounts of these metal layers are substantially equal, and the warpage of the laminated substrate can be suppressed.

また、上記半導体モジュールでは、上記連結部を形成してあるため、上記交流電流が流れたときに、渦電流を、連結部を介して、複数の重複部の間に流すことができる。そのため、渦電流の経路が制限されにくくなり、渦電流を、交流電流の経路に沿って流しやすくなる。したがって、交流電流の磁束を、渦電流の磁束によって効果的に打ち消すことができ、インダクタンスを低減することが可能になる。そのため、半導体素子に大きなサージが加わることを抑制できる。   Further, in the semiconductor module, since the connecting portion is formed, the eddy current can flow between the plurality of overlapping portions via the connecting portion when the alternating current flows. Therefore, the path of the eddy current is less likely to be restricted, and the eddy current is more likely to flow along the path of the alternating current. Therefore, the magnetic flux of the alternating current can be effectively canceled by the magnetic flux of the eddy current, and the inductance can be reduced. Therefore, it is possible to suppress a large surge from being applied to the semiconductor element.

以上のごとく、上記態様によれば、積層基板の反りを抑制でき、インダクタンスを低減できる半導体モジュールを提供することができる。
なお、特許請求の範囲及び課題を解決する手段に記載した括弧内の符号は、後述する実施形態に記載の具体的手段との対応関係を示すものであり、本発明の技術的範囲を限定するものではない。 As described above, according to the above aspect, it is possible to provide a semiconductor module capable of suppressing the warpage of the laminated substrate and reducing the inductance.
Note that reference numerals in parentheses described in the claims and means for solving the problems indicate the correspondence with specific means described in the embodiments described below, and limit the technical scope of the present invention. Not something.

実施形態１における、半導体モジュールの斜視図。FIG. 2 is a perspective view of the semiconductor module according to the first embodiment. 実施形態１における、半導体モジュールの平面図であって、図３のII矢視図。FIG. 4 is a plan view of the semiconductor module according to the first embodiment, and is a view as viewed in the direction of the arrow II in FIG. 3. 図２のIII-III断面図。III-III sectional drawing of FIG. 実施形態１における、ケースを取り除いた半導体モジュールの平面図。FIG. 2 is a plan view of the semiconductor module according to the first embodiment from which a case is removed. 図４の裏面図。The back view of FIG. 実施形態１における、半導体モジュールの回路図。FIG. 2 is a circuit diagram of the semiconductor module according to the first embodiment. 実施形態２における、半導体モジュールの裏面図。FIG. 9 is a back view of the semiconductor module according to the second embodiment. 実施形態３における、半導体モジュールの裏面図。FIG. 10 is a back view of the semiconductor module according to the third embodiment. 実施形態４における、半導体モジュールの裏面図。FIG. 13 is a back view of the semiconductor module according to the fourth embodiment. シミュレーション例１における、サンプルＡの平面図。FIG. 3 is a plan view of a sample A in a simulation example 1. シミュレーション例１における、サンプルＡの裏面図。The back view of sample A in the simulation example 1. シミュレーション例１における、サンプルＢの裏面図。The back view of sample B in the simulation example 1. シミュレーション例１における、サンプルＣの裏面図。The back view of sample C in the simulation example 1. 図１３の要部拡大図。The principal part enlarged view of FIG. シミュレーション例１における、反り量の計算結果。9 is a calculation result of a warpage amount in a simulation example 1. シミュレーション例１における、インダクタンスの計算結果。9 is a calculation result of inductance in simulation example 1. シミュレーション例１における、半導体モジュールの回路図。FIG. 3 is a circuit diagram of a semiconductor module in a simulation example 1. 比較形態１における、半導体モジュールの裏面図であって、図１９のXVIII矢視図。FIG. 20 is a rear view of the semiconductor module in Comparative Embodiment 1, and is a view as seen in the direction of the arrow XVIII in FIG. 19. 比較形態１における、半導体モジュールの断面図。FIG. 7 is a cross-sectional view of a semiconductor module according to a first comparative example. 比較形態２における、半導体モジュールの裏面図。FIG. 9 is a back view of the semiconductor module in Comparative Embodiment 2.

（実施形態１）
上記半導体モジュールに係る実施形態について、図１〜図６を参照して説明する。図１〜図３に示すごとく、本形態の半導体モジュール１は、一対の半導体素子２と、一対の直流端子３と、積層基板１０とを備える。半導体素子２には、上アーム側に配された上アーム半導体素子２U（図６参照）と、下アーム側に配された下アーム半導体素子２Lとがある。これら一対の半導体素子２U，２Lは、互いに直列に接続されている。 (Embodiment 1)
An embodiment according to the semiconductor module will be described with reference to FIGS. As shown in FIGS. 1 to 3, the semiconductor module 1 of the present embodiment includes a pair of semiconductor elements 2, a pair of DC terminals 3, and a laminated substrate 10. The semiconductor elements 2 include an upper arm semiconductor element 2 U (see FIG. 6) arranged on the upper arm side and a lower arm semiconductor element 2 L arranged on the lower arm side. The pair of semiconductor elements 2 U and 2 L are connected in series with each other.

図１、図２に示すごとく、直流端子３には、上アーム半導体素子２Uに電気接続した正極端子３Pと、下アーム半導体素子２Lに電気接続した負極端子３Nとがある。 As shown in FIGS. 1 and 2, the DC terminal 3, there are a positive terminal 3 P in electrical connection to the upper arm semiconductor element 2 U, and the negative terminal 3 N in electrical connection to the lower arm semiconductor element 2 L is.

図３に示すごとく、積層基板１０は、絶縁材料からなる絶縁基板４と、素子側金属層５０と、反対側金属層６０とを備える。素子側金属層５０は、絶縁基板４の、半導体素子２側の主面Ｓ1に形成されている。また、反対側金属層６０は、絶縁基板４の、素子側金属層５０を設けた側とは反対側の主面Ｓ2に形成されている。 As shown in FIG. 3, the laminated substrate 10 includes an insulating substrate 4 made of an insulating material, an element-side metal layer 50, and an opposite-side metal layer 60. The element-side metal layer 50 is formed on the main surface S 1 of the insulating substrate 4 on the semiconductor element 2 side. Further, the side opposite the metal layer 60, the insulating substrate 4, is formed on the main surface S 2 on the opposite side to the side provided with the element-side metal layer 50.

図２、図４に示すごとく、素子側金属層５０によって複数のアイランド５が形成されている。複数のアイランド５のうち一部のアイランド５（５U，５L）に、半導体素子２が搭載されている。このアイランド５U，５Lは、半導体素子２に流れる電流の経路をなしている。 As shown in FIGS. 2 and 4, a plurality of islands 5 are formed by the element-side metal layer 50. The semiconductor element 2 is mounted on some of the islands 5 ( 5U , 5L ) among the plurality of islands 5. The islands 5 U and 5 L form a path for a current flowing through the semiconductor element 2.

図５に示すごとく、反対側金属層６０は、複数の重複部６と、連結部６１とを備える。重複部６は、絶縁基板４の厚さ方向（Ｚ方向）から見たときに、個々のアイランド５（図４参照）と重なり合う。重複部の周縁部６９は、アイランド５の周縁部５９と一致している。連結部６１は、複数の重複部６を連結している。   As shown in FIG. 5, the opposite side metal layer 60 includes a plurality of overlapping portions 6 and a connecting portion 61. The overlapping portion 6 overlaps with the individual islands 5 (see FIG. 4) when viewed from the thickness direction (Z direction) of the insulating substrate 4. The peripheral edge 69 of the overlapping portion coincides with the peripheral edge 59 of the island 5. The connecting portion 61 connects the plurality of overlapping portions 6.

図２、図４に示すごとく、半導体素子２のスイッチング動作に伴って、交流電流Ｉが、一対の直流端子３の間に、一対の半導体素子２およびアイランド５を介して流れたとき、図５に示すごとく、渦電流ｉが、複数の重複部６と連結部６１とを含む経路に流れるよう構成されている。   As shown in FIGS. 2 and 4, when an alternating current I flows between the pair of DC terminals 3 via the pair of semiconductor elements 2 and the island 5 in accordance with the switching operation of the semiconductor element 2, FIG. As shown in (1), the eddy current i is configured to flow through a path including the plurality of overlapping portions 6 and the connecting portion 61.

本形態の半導体モジュール１は、電気自動車やハイブリッド車等の車両に搭載するための、車載用半導体モジュールである。本形態では、３個の半導体モジュール１を用いて、インバータ回路１９（図１７参照）を構成してある。個々の半導体素子２をスイッチング動作させることにより、直流電源から供給される直流電力を交流電力に変換している。これにより、三相交流モータを駆動し、上記車両を走行させている。   The semiconductor module 1 according to the present embodiment is a vehicle-mounted semiconductor module to be mounted on a vehicle such as an electric vehicle or a hybrid vehicle. In this embodiment, an inverter circuit 19 (see FIG. 17) is configured using three semiconductor modules 1. The switching operation of each semiconductor element 2 converts DC power supplied from a DC power supply into AC power. Thus, the three-phase AC motor is driven to drive the vehicle.

図１に示すごとく、本形態の半導体モジュール１は、フレーム７を備える。このフレーム７内に、半導体素子２等が配されている。フレーム７の内部には、シリコン樹脂等からなる封止部材１２（図３参照）を充填してある。   As shown in FIG. 1, the semiconductor module 1 of the present embodiment includes a frame 7. The semiconductor element 2 and the like are arranged in the frame 7. The inside of the frame 7 is filled with a sealing member 12 (see FIG. 3) made of silicon resin or the like.

また、図１、図２、図４に示すごとく、アイランド５には、上アーム搭載アイランド５Uと、下アーム搭載アイランド５Lと、中継アイランド５Hと、フレームアイランド５Fとがある。上アーム搭載アイランド５Uに上アーム半導体素子２Uを搭載してあり、下アーム搭載アイランド５Lに下アーム半導体素子２Lを搭載してある。本形態では、はんだ層１８（図３参照）を用いて、半導体素子２をアイランド５（５U，５L）に接続してある。 In addition, as shown in FIG. 1, 2, 4, the island 5 is an upper arm mounted Island 5 U, and the lower arm mounting Island 5 L, and the relay Island 5 H, and the frame island 5 F is. Yes mounted upper arm semiconductor element 2 U in the upper arm mounted Island 5 U, it is equipped with a lower arm semiconductor element 2 L to the lower arm mounting island 5 L. In this embodiment, by using the solder layer 18 (see FIG. 3), it is connected to the semiconductor element 2 island 5 (5 U, 5 L) .

中継アイランド５Hには、半導体素子２が搭載されていない。中継アイランド５Hは、導電部材８（８B）を介して、下アーム半導体素子２Lに電気接続されている。また、中継アイランド５Hは、ボンディングワイヤ１１を介して、負極端子３Nに電気接続されている。 The relay Island 5 H, the semiconductor element 2 is not mounted. Relay Island 5 H are conductive member 8 through (8 B), and is electrically connected to the lower arm semiconductor element 2 L. The relay Island 5 H via the bonding wires 11 are electrically connected to the negative terminal 3 N.

フレームアイランド５Fは、上アーム搭載アイランド５Uと、下アーム搭載アイランド５Lと、中継アイランド５Hとを取り囲んでいる。フレームアイランド５Fは、Ｚ方向から見たときに、フレーム７と重なる。フレームアイランド５Fは、フレーム７を積層基板１０に接着するために形成されている。 Frame Island 5 F encloses an upper arm mounted Island 5 U, and the lower arm mounting Island 5 L, and a relay island 5 H. Frame Island 5 F, when viewed from the Z direction, overlaps with the frame 7. The frame island 5F is formed for bonding the frame 7 to the laminated substrate 10.

図１、図２に示すごとく、本形態の半導体モジュール１は、上記直流端子３P，３Nの他に、交流電力を出力する交流端子３９を備える。直流端子３及び交流端子３９は、ボンディングワイヤ１１を介して、半導体素子２に電気接続されている。 As shown in FIGS. 1 and 2, the semiconductor module 1 of this embodiment, in addition to the DC terminal 3 P, 3 N, comprises a AC terminal 39 for outputting the AC power. The DC terminal 3 and the AC terminal 39 are electrically connected to the semiconductor element 2 via the bonding wires 11.

また、フレーム７内には、上記導電部材８（８A，８B）が配されている。第１導電部材８Aは、上アーム半導体素子２U（ＭＯＳＦＥＴ）のソース電極と、下アーム搭載アイランド５Lとを電気接続している。また、第２導電部材８Bは、下アーム半導体素子２Lのソース電極と中継アイランド５Hとを電気接続している。 Also within the frame 7, the conductive member 8 (8 A, 8 B) are arranged. The first conductive member 8 A, and the source electrode of the upper arm semiconductor element 2 U (MOSFET), and a lower arm mounted Island 5 L are electrically connected. The second conductive member 8 B is electrically connected to the source electrode of the lower arm semiconductor element 2 L relay Island 5 H.

正極端子３Pは、ボンディングワイヤ１１を介して、上アーム搭載アイランド５Uに電気接続している。また、負極端子３Nは、ボンディングワイヤ１１を介して、中継アイランド５Hに電気接続している。本形態では、負極端子３Nを下アーム半導体素子２Lに直接、接続せず、中継アイランド５Hを介して、下アーム半導体素子２Lに電気接続している。これにより、下アーム半導体素子２Lから発生した熱が、負極端子３Nに直接、伝わらないようにしている。 The positive electrode terminal 3 P is electrically connected to the upper arm mounting island 5 U via the bonding wire 11. Moreover, the negative terminal 3 N via a bonding wire 11 is electrically connected to the relay Island 5 H. In this embodiment, direct negative terminal 3 N to the lower arm semiconductor element 2 L, not connected, via the relay Island 5 H, is electrically connected to the lower arm semiconductor element 2 L. Thus, heat generated from the lower arm semiconductor element 2 L is so that not transmitted directly to the negative terminal 3 N.

半導体素子２をスイッチング動作させると、半導体素子２やアイランド５U，５Lにオン電流が流れる。このオン電流に、周波数が例えば数ｋＨｚ以上の上記交流電流Ｉが、ノイズ成分として重畳する。交流電流Ｉは、２つの直流端子３P，３Nの間を、半導体素子２、導電部材８、アイランド５（５U，５L，５H）等を通って流れる。 When the semiconductor element 2 to the switching operation on current flows through the semiconductor element 2 and the islands 5 U, 5 L. The AC current I having a frequency of, for example, several kHz or more is superimposed on the ON current as a noise component. The alternating current I flows between the two DC terminals 3 P and 3 N through the semiconductor element 2, the conductive member 8, the islands 5 (5 U , 5 L , 5 H ) and the like.

交流電流Ｉは、インダクタンスが最小になる経路を流れやすい。図４に示す電流経路は、交流電流Ｉ同士が接近しており、磁界が互いに打ち消されるため、インダクタンスが小さい。したがって、交流電流Ｉは、図４に示す経路を流れやすい。   The alternating current I tends to flow on a path where the inductance is minimized. In the current path shown in FIG. 4, the alternating currents I are close to each other, and the magnetic fields cancel each other out, so that the inductance is small. Therefore, the alternating current I easily flows through the path shown in FIG.

上述したように本形態では、図５に示すごとく、直流端子３P，３N間に交流電流Ｉが流れたとき、複数の重複部６間に、連結部６１を介して渦電流ｉが流れるようにしている。この渦電流ｉの周囲に発生した磁束によって、交流電流Ｉの周囲に発生した磁束を打ち消すことができる。そのため、一対の直流端子３P，３N間のインダクタンスを低減でき、半導体素子２に高いサージが加わることを抑制できる。 As described above, in the present embodiment, as shown in FIG. 5, when the alternating current I flows between the DC terminals 3 P and 3 N , the eddy current i flows between the plurality of overlapping portions 6 via the connecting portion 61. Like that. The magnetic flux generated around the eddy current i can cancel the magnetic flux generated around the alternating current I. Therefore, the inductance between the pair of DC terminals 3 P and 3 N can be reduced, and the application of a high surge to the semiconductor element 2 can be suppressed.

図５に示すごとく、重複部６には、上アーム重複部６Uと、下アーム重複部６Lと、中継重複部６Hと、フレーム重複部６Fとがある。上アーム重複部６Uは、Ｚ方向から見たときに、上アーム搭載アイランド５U（図４参照）と重なる位置に形成されている。同様に、下アーム重複部６Lは、下アーム搭載アイランド５Lと重なり、中継重複部６Hは、中継アイランド５Hと重なる位置に形成されている。また、フレーム重複部６Fは、フレームアイランド５Fと重なる位置に形成されている。 As shown in FIG. 5, the overlapping portion 6 includes an upper arm overlapping portion 6U , a lower arm overlapping portion 6L , a relay overlapping portion 6H, and a frame overlapping portion 6F . Upper arm overlapping portion 6 U, when viewed from the Z direction are formed at positions overlapping with the upper arm mounted Island 5 U (see FIG. 4). Similarly, lower arm overlap 6 L overlaps the lower arm mounting Island 5 L, relay overlapping portion 6 H is formed at a position overlapping the relay Island 5 H. The frame overlapping unit 6 F is formed at a position overlapping the frame island 5 F.

図５に示すごとく、本形態では、４個の連結部６１を形成してある。第１連結部６１Aは、上アーム重複部６Uと下アーム重複部６Lとを連結している。第２連結部６１Bは、下アーム重複部６Lと中継重複部６Hとを連結している。第３連結部６１Cは、中継重複部６Hとフレーム重複部６Fとを連結している。また、第４連結部６１Dは、フレーム重複部６Fと上アーム重複部６Uとを連結している。これらの連結部６１A〜６１Dは、Ｚ方向から見たときに、交流電流Ｉの経路から外れた位置に形成されている。 As shown in FIG. 5, in this embodiment, four connecting portions 61 are formed. The first connecting portion 61 A, and connects the upper arm overlapping section 6 U and the lower arm overlapping part 6 L. The second connecting portion 61 B is coupled to the lower arm overlapping portion 6 L relay overlapping section 6 H. Third connecting portion 61 C couples the relay overlapping portion 6 H and the frame overlapping unit 6 F. The fourth connection portion 61 D couples the frame overlapping unit 6 F and upper arm overlapping section 6 U. These connections 61 A to 61 D, when viewed from the Z direction, and is formed on the outside of the path of the AC current I position.

反対側金属層６０は、図示しない冷却器に接触している。半導体素子２をスイッチング動作させると発熱するため、この冷却器を用いて、半導体素子２を冷却している。また、冷却器と反対側金属層６０との間には、ヒートシンクが介在していない。ヒートシンクを設けると、ヒートシンクの熱抵抗によって熱が冷却器に伝わりにくくなる。そのため本形態では、ヒートシンクを設けず、反対側金属層６０を冷却器に直接、接触させている。なお、反対側金属層６０を直接、冷却水に接触させても良い。   The opposite metal layer 60 is in contact with a not-shown cooler. Since the semiconductor element 2 generates heat when it is switched, the semiconductor element 2 is cooled using this cooler. Further, no heat sink is interposed between the cooler and the opposite metal layer 60. When the heat sink is provided, heat is less likely to be transmitted to the cooler due to the heat resistance of the heat sink. Therefore, in this embodiment, the heat sink is not provided, and the opposite metal layer 60 is directly in contact with the cooler. The opposite metal layer 60 may be brought into direct contact with the cooling water.

本形態の作用効果について説明する。図５に示すごとく、本形態では、反対側金属層６０によって、重複部６と連結部６１とを形成してある。そのため、積層基板１０の反りを抑制しつつ、インダクタンスを低減できる。
すなわち、重複部６は、Ｚ方向から見たときに、素子側金属層５０によって形成されたアイランド５と重なり合うよう構成されている。そのため、素子側金属層５０と反対側金属層６０のパターンを近似させることができる。したがって、これらの金属層５０，６０の熱膨張量が略等しくなり、積層基板１０の反りを抑制できる。 The operation and effect of the present embodiment will be described. As shown in FIG. 5, in this embodiment, the overlapping portion 6 and the connecting portion 61 are formed by the opposite metal layer 60. Therefore, the inductance can be reduced while suppressing the warpage of the laminated substrate 10.
That is, the overlapping portion 6 is configured to overlap the island 5 formed by the element-side metal layer 50 when viewed from the Z direction. Therefore, the patterns of the element-side metal layer 50 and the opposite-side metal layer 60 can be approximated. Therefore, the thermal expansion amounts of these metal layers 50 and 60 become substantially equal, and the warpage of the laminated substrate 10 can be suppressed.

また、本形態では、連結部６１を形成してあるため、上記交流電流Ｉが流れたときに、渦電流ｉを、連結部６１を介して、複数の重複部６の間に流すことができる。そのため、渦電流ｉの経路が制限されにくくなり、渦電流ｉを、交流電流Ｉの経路に沿って流しやすくなる。したがって、交流電流Ｉの磁束を、渦電流ｉの磁束によって効果的に打ち消すことができ、インダクタンスを低減することが可能になる。そのため、半導体素子２に大きなサージが加わることを抑制できる。   Further, in the present embodiment, since the connecting portion 61 is formed, when the AC current I flows, the eddy current i can flow between the plurality of overlapping portions 6 via the connecting portion 61. . Therefore, the path of the eddy current i is less likely to be restricted, and the eddy current i can easily flow along the path of the alternating current I. Therefore, the magnetic flux of the AC current I can be effectively canceled by the magnetic flux of the eddy current i, and the inductance can be reduced. Therefore, it is possible to suppress a large surge from being applied to the semiconductor element 2.

従来の半導体モジュール１は、図１８、図１９に示すごとく、反対側金属層６０によって１つの大型のアイランドを形成していた。そのため、素子側金属層５０と反対側金属層６０の面積差が大きく、熱膨張量の差が大きかった。したがって、半導体素子２が発熱して温度が上昇したときに、積層基板１０が反りやすかった。   In the conventional semiconductor module 1, as shown in FIGS. 18 and 19, one large island is formed by the metal layer 60 on the opposite side. Therefore, the area difference between the element-side metal layer 50 and the opposite-side metal layer 60 was large, and the difference in the amount of thermal expansion was large. Therefore, when the semiconductor element 2 generates heat and the temperature rises, the laminated substrate 10 is easily warped.

この問題を解決するため、図２０に示すごとく、反対側金属層６０を素子側金属層５０と同じパターンにすると、熱膨張量の差を低減でき、積層基板１０の反りを抑制できるものの、個々の重複部６が分断されてしまうため、渦電流ｉの経路が制限され、渦電流ｉが、交流電流Ｉに沿って流れにくくなる。そのため、磁束の打ち消し効果が低減し、インダクタンスが大きくなりやすい。   In order to solve this problem, as shown in FIG. 20, when the opposite metal layer 60 has the same pattern as the element-side metal layer 50, the difference in the amount of thermal expansion can be reduced and the warpage of the laminated substrate 10 can be suppressed. Of the eddy current i is restricted, and the eddy current i is less likely to flow along the alternating current I. Therefore, the effect of canceling out magnetic flux is reduced, and the inductance is likely to be increased.

これに対して、図５に示すごとく、本形態のように、重複部６と連結部６１とを形成すれば、素子側金属層５０と反対側金属層６０との、熱膨張量の差を低減でき、積層基板１０の反りを低減できると共に、渦電流ｉが、連結部６１を介して複数の重複部６間に流れるため、渦電流ｉの経路が制限されにくい。そのため、渦電流ｉが、交流電流Ｉの経路に沿って流れやすくなり、交流電流Ｉの磁束を、渦電流ｉの磁束によって効果的に打ち消すことができる。そのため、インダクタンスを低減でき、半導体素子２に大きなサージが加わることを抑制できる。   On the other hand, as shown in FIG. 5, when the overlapping portion 6 and the connecting portion 61 are formed as in the present embodiment, the difference in the amount of thermal expansion between the element-side metal layer 50 and the opposite-side metal layer 60 is reduced. Since the eddy current i flows between the plurality of overlapping portions 6 via the connecting portions 61, the path of the eddy current i is not easily limited. Therefore, the eddy current i easily flows along the path of the AC current I, and the magnetic flux of the AC current I can be effectively canceled by the magnetic flux of the eddy current i. Therefore, the inductance can be reduced, and the application of a large surge to the semiconductor element 2 can be suppressed.

また、本形態の半導体モジュール１は、図５に示すごとく、上アーム重複部６Uと、下アーム重複部６Lと、中継重複部６Hと、フレーム重複部６Fとを備える。そして、連結部６１を用いて、上アーム重複部６Uと下アーム重複部６Lとの間と、下アーム重複部６Lと中継重複部６Hとの間と、中継重複部６Hとフレーム重複部６Fとの間と、フレーム重複部６Fと上アーム重複部６Uとの間とを連結している。
このようにすると、渦電流ｉを、交流電流Ｉに沿って、長い距離にわたって流すことができる。そのため、交流電流Ｉから発生した磁束を、渦電流ｉの磁束によって効果的に打ち消すことができ、インダクタンスを効果的に低減することができる。 Further, the semiconductor module 1 of this embodiment, as shown in FIG. 5, comprises an upper arm overlapping section 6 U, and the lower arm overlapping section 6 L, the relay overlapping section 6 H, and a frame overlapping unit 6 F. Then, using the connecting portion 61, and between the upper arm overlapping portion 6 U and the lower arm overlapping section 6 L, and between the lower arm overlapping section 6 L relay overlapping section 6 H, a relay overlapping section 6 H It is connected and between the frame overlapping unit 6 F, and between the frame overlapping unit 6 F and upper arm overlapping section 6 U.
In this way, the eddy current i can flow over the long distance along the alternating current I. Therefore, the magnetic flux generated from the AC current I can be effectively canceled by the magnetic flux of the eddy current i, and the inductance can be effectively reduced.

以上のごとく、本形態によれば、積層基板の反りを抑制でき、インダクタンスを低減できる半導体モジュールを提供することができる。   As described above, according to the present embodiment, it is possible to provide a semiconductor module capable of suppressing the warpage of the laminated substrate and reducing the inductance.

なお、本形態では、図４に示すごとく、４個のアイランド５を形成したが、本発明はこれに限るものではない。すなわち、上アーム搭載アイランド５Uと下アーム搭載アイランド５Lとの、２個のアイランド５のみ形成してもよい。また、４個以上のアイランド５を形成してもよい。 In the present embodiment, four islands 5 are formed as shown in FIG. 4, but the present invention is not limited to this. That is, the upper arm mounted Island 5 U and the lower arm mounting Island 5 L, it may be formed only two islands 5. Further, four or more islands 5 may be formed.

また、本形態では、図１に示すごとく、半導体モジュール１内に一対の半導体素子２（２U，２L）を封止したが、本発明はこれに限るものではない。すなわち、後述するシミュレーション結果のように、３対の半導体素子２を１個の半導体モジュール１に封止してもよい。また、２対でもよく、４対以上の半導体素子を１個の半導体モジュール１に封止してもよい。 Further, in this embodiment, as shown in FIG. 1, but sealing the pair of semiconductor element 2 (2 U, 2 L) in the semiconductor module 1, the present invention is not limited thereto. That is, three pairs of semiconductor elements 2 may be sealed in one semiconductor module 1 as in a simulation result described later. Alternatively, two pairs or four or more pairs of semiconductor elements may be sealed in one semiconductor module 1.

また、本形態では、１個の上アーム半導体素子２Uと１個の下アーム半導体素子２Lとを互いに直列に接続したが、本発明はこれに限るものではない。すなわち、２個以上の上アーム半導体素子２Uを互いに並列接続して上アーム半導体素子群を構成すると共に、２個以上の下アーム半導体素子２Lを互いに並列接続して下アーム半導体素子群を構成し、これら２つの半導体素子群を互いに直列に接続してもよい。 Further, in this embodiment, although one upper arm semiconductor element 2 U and the one lower arm semiconductor element 2 L of the serially connected to each other, the present invention is not limited thereto. That is, two or more upper arm semiconductor elements 2 U are connected in parallel with each other to form an upper arm semiconductor element group, and two or more lower arm semiconductor elements 2 L are connected in parallel with each other to form a lower arm semiconductor element group. The two semiconductor element groups may be connected in series with each other.

以下の実施形態においては、図面に用いた符号のうち、実施形態１において用いた符号と同一のものは、特に示さない限り、実施形態１と同様の構成要素等を表す。   In the following embodiments, among the reference numerals used in the drawings, the same reference numerals as those used in the first embodiment represent the same components and the like as those in the first embodiment unless otherwise specified.

（実施形態２）
本形態は、反対側金属層６０の形状を変更した例である。図７に示すごとく、本形態の反対側金属層６０は、実施形態１と同様に、複数の重複部６と、複数の連結部６１（６１A，６１B，６１E）とを備える。第１連結部６１Aによって、上アーム重複部６Uと下アーム重複部６Lとを連結してある。また、第２連結部６１Bによって、下アーム重複部６Lと中継重複部６Hとを連結してある。さらに、別の連結部６１Eによって、中継重複部６Hと上アーム重複部６Uと連結している。本形態では、実施形態１と異なり、中継重複部６Hとフレーム重複部６Fとの間、及びフレーム重複部６Fと上アーム重複部６Uとの間は、連結していない。 (Embodiment 2)
This embodiment is an example in which the shape of the opposite metal layer 60 is changed. As shown in FIG. 7, the side opposite the metal layer 60 of this embodiment, similarly to Embodiment 1, includes a plurality of overlapping portions 6, and a plurality of connecting portions 61 (61 A, 61 B, 61 E). The first connecting portion 61 A, are connected to the upper arm overlapping section 6 U and the lower arm overlapping part 6 L. Also, the second connecting portion 61 B, are connected to the lower arm overlapping portion 6 L relay overlapping section 6 H. Furthermore, by another connecting portion 61 E, it is connected to the relay overlapping portion 6 H and the upper arm overlapping section 6 U. In this embodiment, unlike the first embodiment, the relay overlapping portion 6 H and the frame overlapping unit 6 F, and between the frame overlapping unit 6 F and upper arm overlapping section 6 U is not connected.

本形態の作用効果について説明する。上記構成にすると、実施形態１と比べて、連結部６１の数を少なくすることができる。そのため、素子側金属層５０と反対側金属層６０のパターンを、より近似させることができ、積層基板１０の反りをより効果的に抑制できる。また、上記構成を採用した場合も、渦電流ｉを、交流電流Ｉに沿って、比較的長い距離にわたって流すことができる。そのため、交流電流Ｉの磁束を、渦電流ｉの磁束によって効果的に打ち消すことができ、インダクタンスを効果的に低減できる。
その他、実施形態１と同様の構成および作用効果を備える。 The operation and effect of the present embodiment will be described. With the above configuration, the number of connecting portions 61 can be reduced as compared with the first embodiment. Therefore, the pattern of the element-side metal layer 50 and the pattern of the opposite-side metal layer 60 can be more approximated, and the warpage of the laminated substrate 10 can be more effectively suppressed. In addition, even when the above configuration is employed, the eddy current i can be caused to flow along the alternating current I over a relatively long distance. Therefore, the magnetic flux of the alternating current I can be effectively canceled by the magnetic flux of the eddy current i, and the inductance can be effectively reduced.
In addition, the second embodiment has the same configuration, operation and effect as those of the first embodiment.

（実施形態３）
本形態は、反対側金属層６０の形状を変更した例である。図８に示すごとく、本形態の半導体モジュール１は、実施形態１と同様に、４個の連結部６１（６１A〜６１D）を備える。これらの連結部６１によって、上アーム重複部６Uと下アーム重複部６Lとの間と、下アーム重複部６Lと中継重複部６Hとの間と、中継重複部６Hとフレーム重複部６Fとの間と、フレーム重複部６Fと上アーム重複部６Uとの間を連結している。また、本形態では、１個の連結部６１（第１連結部６１A）を、Ｚ方向から見たときに、交流電流Ｉと重なる位置に形成してある。 (Embodiment 3)
This embodiment is an example in which the shape of the opposite metal layer 60 is changed. As shown in FIG. 8, the semiconductor module 1 of this embodiment, similarly to Embodiment 1, it includes four coupling portions 61 (61 A ~61 D). These connecting portions 61 allow the frame overlap between the upper arm overlapping portion 6 U and the lower arm overlapping portion 6 L , between the lower arm overlapping portion 6 L and the relay overlapping portion 6 H, and between the relay overlapping portion 6 H and the frame overlapping portion. and between the parts 6 F, it is connected between the frame overlapping unit 6 F and upper arm overlapping section 6 U. In this embodiment, one connecting portion 61 (first connecting portion 61 A ) is formed at a position overlapping with the alternating current I when viewed from the Z direction.

本形態の作用効果について説明する。上述したように、本形態では、複数の連結部６１のうち、１個の連結部６１（第１連結部６１A）を、Ｚ方向から見たときに、交流電流Ｉと重なる位置に形成してある。
このようにすると、渦電流ｉを、交流電流Ｉに沿って、より長い距離にわたって流すことができる。そのため、渦電流ｉによる磁束の打ち消し効果をより高めることができ、インダクタンスをより低減できる。
その他、実施形態１と同様の構成および作用効果を備える。 The operation and effect of the present embodiment will be described. As described above, in the present embodiment, one connecting portion 61 (first connecting portion 61 A ) of the plurality of connecting portions 61 is formed at a position overlapping with the alternating current I when viewed from the Z direction. It is.
In this way, the eddy current i can flow over the longer distance along the alternating current I. Therefore, the effect of canceling out the magnetic flux due to the eddy current i can be further enhanced, and the inductance can be further reduced.
In addition, the second embodiment has the same configuration, operation and effect as those of the first embodiment.

なお、本形態では、複数の連結部６１のうち、１個の連結部６１（第１連結部６１A）を、Ｚ方向から見たときに交流電流Ｉと重なる位置に形成したが、本発明はこれに限るものではなく、２個以上の連結部６１を、交流電流Ｉと重なる位置に形成してもよい。
また、本形態の第１連結部６１Aは、Ｚ方向から見たときに、その全ての部位が交流電流Ｉと重なるよう構成されているが、本発明はこれに限るものではなく、第１連結部６１Aの一部のみが交流電流Ｉと重なるよう構成してもよい。
このように、複数の連結部６１のうち、少なくとも１個の連結部６１を、その少なくとも一部が、Ｚ方向から見たときに交流電流Ｉと重なるよう構成することができる。 In the present embodiment, one connecting portion 61 (first connecting portion 61 A ) of the plurality of connecting portions 61 is formed at a position overlapping with the alternating current I when viewed from the Z direction. However, the present invention is not limited to this, and two or more connecting portions 61 may be formed at positions overlapping with the alternating current I.
The first connecting portion 61 A of the present embodiment, when viewed from the Z direction, its all of the sites have been configured to overlap with the alternating current I, the present invention is not limited thereto, the first only a part of the connecting portion 61 a may be configured to overlap with the alternating current I.
In this manner, at least one of the plurality of connecting portions 61 can be configured so that at least a portion thereof overlaps with the alternating current I when viewed from the Z direction.

また、本形態では４個の連結部６１を設けたが、本発明はこれに限るものではない。すなわち、実施形態２のように、３個の連結部６１を設け、これら３個の連結部６１のうち、少なくとも１個の連結部６１を、Ｚ方向から見たときに交流電流Ｉと重なるよう構成してもよい。   In this embodiment, four connecting portions 61 are provided, but the present invention is not limited to this. That is, as in the second embodiment, three connecting portions 61 are provided, and at least one of the three connecting portions 61 overlaps with the AC current I when viewed in the Z direction. You may comprise.

（実施形態４）
本形態は、反対側金属層６０の形状を変更した例である。図９に示すごとく、本形態の半導体モジュール１は、実施形態１と同様に、４個の連結部６１（６１A〜６１D）を備える。これらの連結部６１によって、上アーム重複部６Uと下アーム重複部６Lとの間と、下アーム重複部６Lと中継重複部６Hとの間と、中継重複部６Hとフレーム重複部６Fとの間と、フレーム重複部６Fと上アーム重複部６Uとの間を連結している。また、本形態では、全ての連結部６１A〜６１Dを、Ｚ方向から見たときに、交流電流Ｉと重なる位置に形成してある。
個々の連結部６１は、Ｚ方向から見たときに、その全ての部位が、交流電流Ｉと重なるよう構成されている。なお、Ｚ方向から見たときに、個々の連結部６１の、一部のみが交流電流Ｉと重なるよう構成してもよい。 (Embodiment 4)
This embodiment is an example in which the shape of the opposite metal layer 60 is changed. As shown in FIG. 9, the semiconductor module 1 of this embodiment, similarly to Embodiment 1, it includes four coupling portions 61 (61 A ~61 D). These connecting portions 61 allow the frame overlap between the upper arm overlapping portion 6 U and the lower arm overlapping portion 6 L , between the lower arm overlapping portion 6 L and the relay overlapping portion 6 H, and between the relay overlapping portion 6 H and the frame overlapping portion. and between the parts 6 F, it is connected between the frame overlapping unit 6 F and upper arm overlapping section 6 U. Further, in this embodiment, all of the connecting portion 61 A to 61 D, when viewed from the Z direction, it is formed at a position overlapping the AC current I.
Each connecting portion 61 is configured such that all portions thereof overlap the alternating current I when viewed from the Z direction. Note that, when viewed from the Z direction, only a part of each of the connection portions 61 may be configured to overlap with the alternating current I.

本形態の作用効果について説明する。上述したように、本形態では、全ての連結部６１A〜６１Dを、Ｚ方向から見たときに、交流電流Ｉと重なる位置に形成してある。
そのため、渦電流ｉを、交流電流Ｉに沿って、より長い距離にわたって流すことができる。したがって、渦電流ｉによる磁束の打ち消し効果をより高めることができ、インダクタンスをより効果的に低減できる。
その他、実施形態１と同様の構成および作用効果を備える。 The operation and effect of the present embodiment will be described. As described above, in this embodiment, all of the connecting portion 61 A to 61 D, when viewed from the Z direction, it is formed at a position overlapping the AC current I.
Therefore, the eddy current i can flow over the longer distance along the alternating current I. Therefore, the effect of canceling out the magnetic flux by the eddy current i can be further enhanced, and the inductance can be reduced more effectively.
In addition, the second embodiment has the same configuration, operation and effect as those of the first embodiment.

（シミュレーション例）
本発明の効果を確認するためのシミュレーションを行った。まず、シミュレータ上で、半導体モジュール１の３個のサンプル（サンプルＡ、サンプルＢ、サンプルＣ）を作成した。サンプルＡは、図１０に示すごとく、３個の上アーム半導体素子２Uと、３個の下アーム半導体素子２Lとを備える。これらの半導体素子２によって、インバータ回路１９（図１７参照）を形成してある。また、サンプルＡは、１本の正極端子３Pと、２本の負極端子３Nとを備える。さらに、サンプルＡは、アイランド５として、上アーム半導体素子２Uを搭載した上アーム搭載アイランド５Uと、下アーム半導体素子２Lを搭載した下アーム搭載アイランド５Lと、中継アイランド５Hと、フレームアイランド５Fとを備える。中継アイランド５Hは、導電部材８Bを介して、下アーム半導体素子２Lのソース電極に電気接続している。下アーム搭載アイランド５Lに、交流端子３９が接続している。また、中継アイランド５Hと上アーム搭載アイランド５Uとの間には、これらを絶縁する素子側溝部５８が形成されている。サンプルＡの反対側金属層６０（図示しない）は、図１１に示すごとく、所謂ベタパターンになっている。 (Simulation example)
A simulation was performed to confirm the effects of the present invention. First, three samples (sample A, sample B, and sample C) of the semiconductor module 1 were created on the simulator. Sample A, as shown in FIG. 10 comprises a three upper arm semiconductor element 2 U, 3 and a lower arm semiconductor element 2 L. These semiconductor elements 2 form an inverter circuit 19 (see FIG. 17). In addition, the sample A includes one positive terminal 3 P and two negative terminals 3 N. Further, Sample A, as islands 5, an arm mounted Island 5 U on mounting the upper arm semiconductor element 2 U, and the lower arm mounting islands 5 L equipped with a lower arm semiconductor element 2 L, and the relay Island 5 H, and a frame island 5 F. Relay Island 5 H via a conductive member 8 B, it is electrically connected to the source electrode of the lower arm semiconductor element 2 L. A lower arm mounted Island 5 L, AC terminal 39 is connected. Between the relay Island 5 H and the upper arm mounted Island 5 U, the element-side groove portion 58 to insulate them is formed. The opposite metal layer 60 (not shown) of the sample A has a so-called solid pattern as shown in FIG.

図１０に示すごとく、半導体素子２をスイッチング動作させると、交流電流Ｉが、正極端子３Pと負極端子３Nとの間を流れる。交流電流Ｉは、一対の半導体素子２U，２Lと、導電部材８と、アイランド５（５U，５L，５H）を通過する。交流電流Ｉが流れると、図１１に示すごとく、反対側金属層６０に渦電流ｉが発生する。サンプルＡでは、反対側金属層６０をベタパターンにしてあるため、渦電流ｉの経路が制限を受けにくい。したがって、渦電流ｉは、交流電流Ｉの経路に沿って流れる。 As shown in FIG. 10, when the switching operation of the semiconductor element 2, the AC current I, flowing between the positive terminal 3 P and the negative terminal 3 N. AC current I is passed through a pair of semiconductor elements 2 U, 2 L, the conductive member 8, Island 5 (5 U, 5 L, 5 H). When the alternating current I flows, an eddy current i is generated in the opposite metal layer 60 as shown in FIG. In the sample A, since the opposite metal layer 60 has a solid pattern, the path of the eddy current i is hardly restricted. Therefore, the eddy current i flows along the path of the alternating current I.

次に、サンプルＢの説明を行う。サンプルＢの、半導体素子２側の構成は、サンプルＡ（図１０参照）と同一である。サンプルＢの反対側金属層６０は、図１２に示すごとく、素子側金属層５０のパターンと同一にしてある。より詳しくは、素子側金属層５０は、上アーム重複部６Uと、下アーム重複部６Lと、中継重複部６Hと、フレーム重複部６Fとを備える。これらの重複部６は、連結部６１によって連結されていない。そのため、サンプルＢでは、渦電流ｉが、複数の重複部６の間を流れず、渦電流ｉの経路が制限を受けやすい。したがって、渦電流ｉは、交流電流Ｉに沿って流れにくい。 Next, the sample B will be described. The configuration of the sample B on the semiconductor element 2 side is the same as that of the sample A (see FIG. 10). The metal layer 60 on the opposite side of the sample B has the same pattern as the metal layer 50 on the element side as shown in FIG. More specifically, the element-side metal layer 50 is provided with upper arm overlapping section 6 U, and the lower arm overlapping section 6 L, the relay overlapping section 6 H, and a frame overlapping unit 6 F. These overlapping portions 6 are not connected by the connecting portion 61. Therefore, in the sample B, the eddy current i does not flow between the plurality of overlapping portions 6, and the path of the eddy current i is easily limited. Therefore, the eddy current i does not easily flow along the alternating current I.

次に、サンプルＣの説明を行う。サンプルＣの、半導体素子２側の構成は、サンプルＡ（図１０参照）と同一である。図１３に示すごとく、サンプルＣでは、反対側金属層６０に、複数の重複部６と、連結部６１とを形成してある。この連結部６１により、上アーム重複部６Uと下アーム重複部６Lとの間、複数の下アーム重複部６L同士、下アーム重複部６Lと中継重複部６Hの間を連結している。また、中継重複部６Hと上アーム重複部６Uとの間には、反対側溝部６８が形成されている。図１３、図１４に示すごとく、反対側溝部６８の先端６８Pにも、連結部６１が形成されている。この連結部６１により、上アーム重複部６Uと中継重複部６Hとを連結している。サンプルＣでは、このように複数の連結部６１を形成することにより、複数の重複部６の間に渦電流ｉが流れるようにしてある。 Next, the sample C will be described. The configuration of the sample C on the semiconductor element 2 side is the same as that of the sample A (see FIG. 10). As shown in FIG. 13, in Sample C, a plurality of overlapping portions 6 and a connecting portion 61 are formed on the opposite metal layer 60. The connecting portion 61, between the upper arm overlapping portion 6 U and the lower arm overlapping section 6 L, a plurality of lower arm overlapping portion 6 L together, between the lower arm overlapping portion 6 L relay overlapping portion 6 H coupled ing. Between the relay overlapping portion 6 H and the upper arm overlapping section 6 U, opposite side groove portion 68 is formed. As shown in FIGS. 13 and 14, a connecting portion 61 is also formed at the tip 68 P of the opposite groove portion 68. The connecting portion 61 connects the upper arm overlapping portion 6U and the relay overlapping portion 6H . In the sample C, the eddy current i flows between the plurality of overlapping portions 6 by forming the plurality of connecting portions 61 in this manner.

上記３個のサンプルについてシミュレーションを行い、反り量とインダクタンスを算出した。まず、上記３個のサンプルを−４０℃から１５０℃に温度変化させ、積層基板１０の反り量を算出した。その結果を図１５に示す。このグラフでは、サンプルＡ（すなわち、反対側金属層６０をベタパターンにしたサンプル）の反り量を１としたときの、サンプルＢ、Ｃの反り量を比率にして表している。図１５から、反対側金属層６０をベタパターンにすると反り量が大きいことが分かる。また、サンプルＢ、Ｃは、反り量が少ないことが分かる。これは、素子側金属層５０と反対側金属層６０との、熱膨張量が略等しいためだと考えられる。   Simulations were performed on the three samples to calculate the amount of warpage and the inductance. First, the temperature of the three samples was changed from −40 ° C. to 150 ° C., and the amount of warpage of the laminated substrate 10 was calculated. The result is shown in FIG. In this graph, the warpage amounts of Samples B and C when the amount of warpage of Sample A (that is, the sample in which the opposite metal layer 60 has a solid pattern) is 1 are expressed as a ratio. From FIG. 15, it can be seen that the amount of warpage is large when the opposite metal layer 60 has a solid pattern. Further, it can be seen that samples B and C have a small amount of warpage. This is considered to be because the thermal expansion amounts of the element-side metal layer 50 and the opposite-side metal layer 60 are substantially equal.

次に、インダクタンスのシミュレーション結果を図１６に示す。このグラフでは、サンプルＡのインダクタンスを１としたときの、サンプルＢ、Ｃのインダクタンスを比率にして表している。図１６から、連結部６１を形成しないサンプルＢは、インダクタンスが高いことが分かる。また、連結部６１を形成したサンプルＣは、インダクタンスを低減でき、サンプルＡと略同じ値になることが分かる。これは、サンプルＣでは連結部６１を形成したため、渦電流ｉを、交流電流Ｉの経路に沿って流しやすくなり、交流電流Ｉの磁束を効果的に打ち消すことができるからだと考えられる。   Next, a simulation result of the inductance is shown in FIG. In this graph, when the inductance of sample A is set to 1, the inductance of samples B and C is expressed as a ratio. From FIG. 16, it can be seen that the sample B in which the connecting portion 61 is not formed has a high inductance. Further, it can be seen that the sample C in which the connecting portion 61 is formed can reduce the inductance, and has substantially the same value as the sample A. This is considered to be because the connecting portion 61 is formed in the sample C, so that the eddy current i easily flows along the path of the alternating current I, and the magnetic flux of the alternating current I can be effectively canceled.

本発明は上記各実施形態に限定されるものではなく、その要旨を逸脱しない範囲において種々の実施形態に適用することが可能である。   The present invention is not limited to the above embodiments, and can be applied to various embodiments without departing from the gist thereof.

１ 半導体モジュール
２ 半導体素子
３ 直流端子
４ 絶縁基板
５０ 素子側金属層
５ アイランド
６０ 反対側金属層
６ 重複部
６１ 連結部 DESCRIPTION OF SYMBOLS 1 Semiconductor module 2 Semiconductor element 3 DC terminal 4 Insulating substrate 50 Element side metal layer 5 Island 60 Opposite side metal layer 6 Overlap part 61 Connection part

Claims (4)

互いに直列に電気接続された、上アーム半導体素子（２U）と下アーム半導体素子（２L）との、少なくとも一対の半導体素子（２）と、
上記上アーム半導体素子に電気接続した正極端子（３P）と、上記下アーム半導体素子に電気接続した負極端子（３N）との、一対の直流端子（３）と、
絶縁材料からなる絶縁基板（４）と、該絶縁基板の上記半導体素子側の主面（Ｓ1）に形成された素子側金属層（５０）と、上記絶縁基板の、上記素子側金属層を設けた側とは反対側の主面（Ｓ2）に形成された反対側金属層（６０）と、を有する積層基板（１０）とを備え、
上記素子側金属層によって複数のアイランド（５）が形成され、該複数のアイランドのうち少なくとも一部の該アイランドは、上記半導体素子が搭載され、該半導体素子を流れる電流の経路をなしており、
上記反対側金属層は、上記絶縁基板の厚さ方向（Ｚ）から見たときに、個々の上記アイランドと重なり合う複数の重複部（６）と、該複数の重複部のうち少なくとも２個の該重複部を連結する連結部（６１）とを備え、
上記半導体素子のスイッチング動作に伴って、交流電流が、上記一対の直流端子の間に、上記一対の半導体素子および上記アイランドを介して流れたとき、渦電流が、上記複数の重複部と上記連結部とを含む経路に流れるよう構成されている、半導体モジュール（１）。 At least a pair of semiconductor elements (2) of an upper arm semiconductor element (2 U ) and a lower arm semiconductor element (2 L ) electrically connected in series with each other;
A pair of DC terminals (3) of a positive terminal (3 P ) electrically connected to the upper arm semiconductor element and a negative terminal (3 N ) electrically connected to the lower arm semiconductor element;
An insulating substrate made of an insulating material (4), the element-side metal layer formed on the semiconductor element side of the main surface of the insulating substrate (S 1) and (50), of the insulating substrate, the element-side metal layer and the main surface of the provided was opposite to the side opposite the metal layer formed on the (S 2) (60), and a multilayer substrate having a (10),
A plurality of islands (5) are formed by the element-side metal layer, and at least a part of the plurality of islands has the semiconductor element mounted thereon and forms a path of a current flowing through the semiconductor element.
The opposite metal layer has a plurality of overlapping portions (6) overlapping with the individual islands when viewed from the thickness direction (Z) of the insulating substrate, and at least two of the overlapping portions among the plurality of overlapping portions. A connecting portion (61) for connecting the overlapping portion,
When an alternating current flows between the pair of DC terminals through the pair of semiconductor elements and the islands in accordance with the switching operation of the semiconductor element, an eddy current is connected to the plurality of overlapping portions and the plurality of overlapping portions. A semiconductor module (1) configured to flow in a path including 複数の上記連結部を備え、上記アイランドとして、上記上アーム半導体素子を搭載した上アーム搭載アイランド（５U）と、上記下アーム半導体素子を搭載した下アーム搭載アイランド（５L）と、上記半導体素子が搭載されず導電部材（８）を介して上記半導体素子に電気接続した中継アイランド（５H）とを備え、上記重複部として、上記厚さ方向から見たときに上記上アーム搭載アイランドと重なる上アーム重複部（６U）と、上記下アーム搭載アイランドと重なる下アーム重複部（６L）と、上記中継アイランドと重なる中継重複部（６H）とを備え、個々の上記連結部によって、上記上アーム重複部と上記下アーム重複部との間と、該下アーム重複部と上記中継重複部との間と、該中継重複部と上記上アーム重複部との間を、それぞれ連結してある、請求項１に記載の半導体モジュール。 An upper arm mounting island (5 U ) having the plurality of connecting portions and mounting the upper arm semiconductor element as the island, a lower arm mounting island (5 L ) mounting the lower arm semiconductor element, and the semiconductor A relay island ( 5H ) electrically connected to the semiconductor element via a conductive member (8) without the element mounted thereon, wherein the overlapped portion includes the upper arm mounting island when viewed from the thickness direction as the overlapping portion. An upper arm overlapping portion ( 6U ) overlapping with the lower arm mounting island, a lower arm overlapping portion ( 6L ) overlapping with the lower arm mounting island, and a relay overlapping portion ( 6H ) overlapping with the relay island. Between the upper arm overlap and the lower arm overlap, between the lower arm overlap and the relay overlap, and between the relay overlap and the upper arm overlap, Is are connected, the semiconductor module according to claim 1. 複数の上記連結部を備え、上記アイランドとして、上記上アーム半導体素子を搭載した上アーム搭載アイランドと、上記下アーム半導体素子を搭載した下アーム搭載アイランドと、上記半導体素子が搭載されず導電部材を介して上記半導体素子に電気接続した中継アイランドと、上記上アーム搭載アイランドと上記下アーム搭載アイランドと上記中継アイランドとを取り囲むフレームアイランド（５F）とを備え、上記重複部として、上記厚さ方向から見たときに上記上アーム搭載アイランドと重なる上アーム重複部と、上記下アーム搭載アイランドと重なる下アーム重複部と、上記中継アイランドと重なる中継重複部と、上記フレームアイランドと重なるフレーム重複部（６F）とを備え、個々の上記連結部によって、上記上アーム重複部と上記下アーム重複部との間と、該下アーム重複部と上記中継重複部との間と、該中継重複部と上記フレーム重複部との間と、該フレーム重複部と上記上アーム重複部との間とを、それぞれ連結してある、請求項１に記載の半導体モジュール。 Equipped with a plurality of the connecting portions, as the island, an upper arm mounting island on which the upper arm semiconductor element is mounted, a lower arm mounting island on which the lower arm semiconductor element is mounted, and a conductive member on which the semiconductor element is not mounted. A relay island electrically connected to the semiconductor element through the relay arm; a frame island ( 5F ) surrounding the upper arm mounting island, the lower arm mounting island and the relay island; When viewed from above, an upper arm overlapping portion overlapping the upper arm mounting island, a lower arm overlapping portion overlapping the lower arm mounting island, a relay overlapping portion overlapping the relay island, and a frame overlapping portion overlapping the frame island ( 6 F) and provided with, by the individual of the connecting portion, the upper arm overlapping portion Between the lower arm overlapping portion, between the lower arm overlapping portion and the relay overlapping portion, between the relay overlapping portion and the frame overlapping portion, and between the frame overlapping portion and the upper arm overlapping portion. The semiconductor module according to claim 1, wherein the semiconductor module is connected to each other. 上記複数の連結部のうち少なくとも一個の該連結部は、その少なくとも一部が、上記厚さ方向から見たときに、上記交流電流の経路と重なるよう構成されている、請求項２又は３に記載の半導体モジュール。   The at least one connecting part of the plurality of connecting parts, at least a part thereof is configured to overlap with the path of the alternating current when viewed from the thickness direction. The semiconductor module as described in the above.
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JP2011254387A (en) * 2010-06-03 2011-12-15 Rohm Co Ltd Ac switch
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