JP2020004922A - 光電変換装置、電子機器および光電変換装置の製造方法 - Google Patents
光電変換装置、電子機器および光電変換装置の製造方法 Download PDFInfo
- Publication number
- JP2020004922A JP2020004922A JP2018125818A JP2018125818A JP2020004922A JP 2020004922 A JP2020004922 A JP 2020004922A JP 2018125818 A JP2018125818 A JP 2018125818A JP 2018125818 A JP2018125818 A JP 2018125818A JP 2020004922 A JP2020004922 A JP 2020004922A
- Authority
- JP
- Japan
- Prior art keywords
- photoelectric conversion
- electrode
- semiconductor layer
- conversion device
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 228
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 46
- 239000004065 semiconductor Substances 0.000 claims abstract description 268
- 239000000463 material Substances 0.000 claims abstract description 66
- 238000000034 method Methods 0.000 claims description 100
- 229910052738 indium Inorganic materials 0.000 claims description 18
- 229910052733 gallium Inorganic materials 0.000 claims description 11
- 229910052725 zinc Inorganic materials 0.000 claims description 7
- 239000010408 film Substances 0.000 description 270
- 238000000059 patterning Methods 0.000 description 54
- 230000015572 biosynthetic process Effects 0.000 description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 19
- 238000010586 diagram Methods 0.000 description 19
- 239000000758 substrate Substances 0.000 description 18
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 17
- 229910052750 molybdenum Inorganic materials 0.000 description 17
- 239000011733 molybdenum Substances 0.000 description 17
- 229910052581 Si3N4 Inorganic materials 0.000 description 14
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 14
- 238000003860 storage Methods 0.000 description 14
- 239000010949 copper Substances 0.000 description 11
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 10
- 235000012239 silicon dioxide Nutrition 0.000 description 10
- 239000000956 alloy Substances 0.000 description 9
- 229910045601 alloy Inorganic materials 0.000 description 9
- 239000003990 capacitor Substances 0.000 description 9
- 238000001312 dry etching Methods 0.000 description 9
- 238000001459 lithography Methods 0.000 description 9
- 239000002243 precursor Substances 0.000 description 9
- 239000000377 silicon dioxide Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 8
- 210000000707 wrist Anatomy 0.000 description 7
- 210000004204 blood vessel Anatomy 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 210000004369 blood Anatomy 0.000 description 5
- 239000008280 blood Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052798 chalcogen Inorganic materials 0.000 description 4
- DVRDHUBQLOKMHZ-UHFFFAOYSA-N chalcopyrite Chemical group [S-2].[S-2].[Fe+2].[Cu+2] DVRDHUBQLOKMHZ-UHFFFAOYSA-N 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- 239000003574 free electron Substances 0.000 description 4
- 230000031700 light absorption Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 4
- SPVXKVOXSXTJOY-UHFFFAOYSA-N selane Chemical compound [SeH2] SPVXKVOXSXTJOY-UHFFFAOYSA-N 0.000 description 4
- 229910000058 selane Inorganic materials 0.000 description 4
- 239000002585 base Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000008103 glucose Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000010365 information processing Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 238000004549 pulsed laser deposition Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 108091006149 Electron carriers Proteins 0.000 description 1
- 240000002329 Inga feuillei Species 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052795 boron group element Inorganic materials 0.000 description 1
- UPGUYPUREGXCCQ-UHFFFAOYSA-N cerium(3+) indium(3+) oxygen(2-) Chemical compound [O--].[O--].[O--].[In+3].[Ce+3] UPGUYPUREGXCCQ-UHFFFAOYSA-N 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- 229910001849 group 12 element Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 210000003462 vein Anatomy 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14609—Pixel-elements with integrated switching, control, storage or amplification elements
- H01L27/14612—Pixel-elements with integrated switching, control, storage or amplification elements involving a transistor
- H01L27/14616—Pixel-elements with integrated switching, control, storage or amplification elements involving a transistor characterised by the channel of the transistor, e.g. channel having a doping gradient
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B5/00—Measuring for diagnostic purposes; Identification of persons
- A61B5/0059—Measuring for diagnostic purposes; Identification of persons using light, e.g. diagnosis by transillumination, diascopy, fluorescence
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B5/00—Measuring for diagnostic purposes; Identification of persons
- A61B5/48—Other medical applications
- A61B5/4887—Locating particular structures in or on the body
- A61B5/489—Blood vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14609—Pixel-elements with integrated switching, control, storage or amplification elements
- H01L27/1461—Pixel-elements with integrated switching, control, storage or amplification elements characterised by the photosensitive area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14649—Infrared imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14689—MOS based technologies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14692—Thin film technologies, e.g. amorphous, poly, micro- or nanocrystalline silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/24—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only semiconductor materials not provided for in groups H01L29/16, H01L29/18, H01L29/20, H01L29/22
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
- H01L31/022475—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers composed of indium tin oxide [ITO]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0322—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B5/00—Measuring for diagnostic purposes; Identification of persons
- A61B5/02—Detecting, measuring or recording pulse, heart rate, blood pressure or blood flow; Combined pulse/heart-rate/blood pressure determination; Evaluating a cardiovascular condition not otherwise provided for, e.g. using combinations of techniques provided for in this group with electrocardiography or electroauscultation; Heart catheters for measuring blood pressure
- A61B5/0205—Simultaneously evaluating both cardiovascular conditions and different types of body conditions, e.g. heart and respiratory condition
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B5/00—Measuring for diagnostic purposes; Identification of persons
- A61B5/145—Measuring characteristics of blood in vivo, e.g. gas concentration, pH value; Measuring characteristics of body fluids or tissues, e.g. interstitial fluid, cerebral tissue
- A61B5/14532—Measuring characteristics of blood in vivo, e.g. gas concentration, pH value; Measuring characteristics of body fluids or tissues, e.g. interstitial fluid, cerebral tissue for measuring glucose, e.g. by tissue impedance measurement
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B5/00—Measuring for diagnostic purposes; Identification of persons
- A61B5/145—Measuring characteristics of blood in vivo, e.g. gas concentration, pH value; Measuring characteristics of body fluids or tissues, e.g. interstitial fluid, cerebral tissue
- A61B5/1455—Measuring characteristics of blood in vivo, e.g. gas concentration, pH value; Measuring characteristics of body fluids or tissues, e.g. interstitial fluid, cerebral tissue using optical sensors, e.g. spectral photometrical oximeters
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B5/00—Measuring for diagnostic purposes; Identification of persons
- A61B5/68—Arrangements of detecting, measuring or recording means, e.g. sensors, in relation to patient
- A61B5/6801—Arrangements of detecting, measuring or recording means, e.g. sensors, in relation to patient specially adapted to be attached to or worn on the body surface
- A61B5/6802—Sensor mounted on worn items
- A61B5/681—Wristwatch-type devices
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B5/00—Measuring for diagnostic purposes; Identification of persons
- A61B5/68—Arrangements of detecting, measuring or recording means, e.g. sensors, in relation to patient
- A61B5/6801—Arrangements of detecting, measuring or recording means, e.g. sensors, in relation to patient specially adapted to be attached to or worn on the body surface
- A61B5/6813—Specially adapted to be attached to a specific body part
- A61B5/6824—Arm or wrist
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
Abstract
Description
本実施形態では、光電変換装置と、光電変換装置の製造方法との特徴的な例について、図に従って説明する。第1の実施形態にかかわる光電変換装置について図1〜図4に従って説明する。図1は、光電変換装置の構成を示す概略配線図である。図1に示す光電変換装置1は光を入射して光の分布を電気信号に変換する装置である。
図6はステップS1の絶縁膜成膜工程及びステップS2の電極膜成膜工程に対応する図である。図6に示すように、ステップS1では基板2を用意する。基板2はアルカリ金属を含まない無アルカリガラスである。従って、基板2はp型半導体層23にアルカリ金属が含まれることを抑制することができる。
(1)本実施形態によれば、光電変換装置1は光電変換部5及びトランジスター6を備えている。光電変換部5は酸化物半導体を含んでいる。トランジスター6は半導体層28を有している。そして、酸化物半導体と半導体層28とは同じIGZOで構成されている。
次に、光電変換装置の一実施形態について図15〜図18を用いて説明する。本実施形態が第1の実施形態と異なるところは、図4に示した第2電極14の配置が異なる点にある。尚、第1の実施形態と同じ点については説明を省略する。
図17はステップS21の上部電極形成工程に対応する図である。図17に示すように、ステップS21では第2電極40、配線41、第1ソース・ドレイン電極17及び第2ソース・ドレイン電極18を形成する。
(1)本実施形態によれば、第2電極40、第1ソース・ドレイン電極17及び第2ソース・ドレイン電極18は同じ工程で形成される。つまり、同一工程で成膜とパターニングとが行われる。このとき、光電変換部38の第2電極40、第1ソース・ドレイン電極17及び第2ソース・ドレイン電極18をそれぞれ別の工程で製造するときに比べて成膜工程とパターニング工程の数を減らすことができる。その結果、光電変換装置36を生産性良く製造することができる。
次に、光電変換装置1または光電変換装置36を搭載した電子機器の一実施形態について図19及び図20を用いて説明する。図19は、生体情報取得装置の構成を示す概略斜視図である。図20は、生体情報取得装置の電気的な構成を示すブロック図である。
(1)本実施形態によれば、生体情報取得装置50のイメージセンサー58は光電変換装置1または光電変換装置36を備えている。光電変換装置1または光電変換装置36は生産性良く製造することができる。従って、生体情報取得装置50は生産性良く製造できる光電変換装置1または光電変換装置36を備えた機器とすることができる。
(変形例1)
前記第3の実施形態では、光電変換装置1または光電変換装置36を備えた生体情報取得装置50の説明をした。他にも指紋、虹彩、静脈パターン等を撮影する撮像装置に光電変換装置1または光電変換装置36を用いても良い。光電変換装置1または光電変換装置36は生産性良く製造できるので、撮像装置は生産性良く製造できる光電変換装置1または光電変換装置36を備えた装置にすることができる。
Claims (11)
- 酸化物半導体を含む光電変換部と、
前記光電変換部に対応して設けられたトランジスターと、を備え、
前記トランジスターの半導体層は、前記酸化物半導体と同一材料で構成されることを特徴とする光電変換装置。 - 請求項1に記載の光電変換装置であって、
前記光電変換部は、第1電極と、p型半導体層と、前記酸化物半導体を含むn型半導体層と、第2電極とを有し、
前記第1電極と同一材料で構成されるゲート電極を有する前記トランジスターと、前記第2電極と同一材料で構成されるソース・ドレイン電極とを有することを特徴とする光電変換装置。 - 請求項2に記載の光電変換装置であって、
前記光電変換部は、前記p型半導体層の側面を覆うように設けられた絶縁膜を有し、前記トランジスターは、前記絶縁膜と同一材料で構成されるゲート絶縁膜を有することを特徴とする光電変換装置。 - 請求項2または3に記載の光電変換装置であって、
前記n型半導体層は非晶質半導体を含むことを特徴とする光電変換装置。 - 請求項1〜4のいずれか一項に記載の光電変換装置であって、
前記酸化物半導体はIn、Ga、Znを含む酸化物であることを特徴とする光電変換装置。 - 請求項2に記載の光電変換装置であって、
前記第1電極の材質はMoであり、前記第2電極の材質はITOであることを特徴とする光電変換装置。 - 請求項2に記載の光電変換装置であって、
前記p型半導体層はCu[Inx、Ga1-x]Se2(0=<x=<1)であることを特徴とする光電変換装置。 - 請求項1〜7のいずれか一項に記載の光電変換装置を備えることを特徴とする電子機器。
- 酸化物半導体を含む光電変換部と、前記酸化物半導体を含む半導体層を有するトランジスターと、を備える光電変換装置の製造方法であって、
前記光電変換部の前記酸化物半導体と前記半導体層とは同じ工程で形成されることを特徴とする光電変換装置の製造方法。 - 請求項9に記載の光電変換装置の製造方法であって、
前記光電変換部は、第1電極と、p型半導体層と、前記酸化物半導体を含むn型半導体層と、第2電極とを有し、
前記第1電極と前記トランジスターのゲート電極とは同じ工程で形成され、
前記第2電極とソース・ドレイン電極とは同じ工程で形成されることを特徴とする光電変換装置の製造方法。 - 請求項10に記載の光電変換装置の製造方法であって、
前記p型半導体層の側面を覆う絶縁膜と、前記トランジスターのゲート絶縁膜とは同じ工程で形成されることを特徴とする光電変換装置の製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018125818A JP2020004922A (ja) | 2018-07-02 | 2018-07-02 | 光電変換装置、電子機器および光電変換装置の製造方法 |
US16/458,777 US20200006413A1 (en) | 2018-07-02 | 2019-07-01 | Photoelectric conversion device, electronic apparatus, and method for manufacturing photoelectric conversion device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018125818A JP2020004922A (ja) | 2018-07-02 | 2018-07-02 | 光電変換装置、電子機器および光電変換装置の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2020004922A true JP2020004922A (ja) | 2020-01-09 |
Family
ID=69055390
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018125818A Withdrawn JP2020004922A (ja) | 2018-07-02 | 2018-07-02 | 光電変換装置、電子機器および光電変換装置の製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20200006413A1 (ja) |
JP (1) | JP2020004922A (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002334987A (ja) * | 2000-12-20 | 2002-11-22 | General Electric Co <Ge> | イメージャ・アレイの製造方法 |
JP2006165530A (ja) * | 2004-11-10 | 2006-06-22 | Canon Inc | センサ及び非平面撮像装置 |
JP2011211697A (ja) * | 2010-03-08 | 2011-10-20 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
JP2012169517A (ja) * | 2011-02-16 | 2012-09-06 | Seiko Epson Corp | 光電変換装置、電子機器 |
JP2017157816A (ja) * | 2016-03-01 | 2017-09-07 | ソニー株式会社 | 撮像素子、積層型撮像素子及び固体撮像装置、並びに、固体撮像装置の駆動方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10286218B2 (en) * | 2009-07-31 | 2019-05-14 | Medtronic, Inc. | Connector enclosure assemblies of medical devices including an angled lead passageway |
US9515106B2 (en) * | 2014-08-15 | 2016-12-06 | Perkinelmer Holdings, Inc. | Radiation imaging device with metal-insulator-semiconductor photodetector and thin film transistor |
CN106935601B (zh) * | 2017-03-13 | 2019-08-23 | 京东方科技集团股份有限公司 | 半导体器件、阵列基板和半导体器件的制造方法 |
US20200006412A1 (en) * | 2018-06-28 | 2020-01-02 | Applied Materials, Inc. | Methods and apparatus for image sensor semiconductors |
-
2018
- 2018-07-02 JP JP2018125818A patent/JP2020004922A/ja not_active Withdrawn
-
2019
- 2019-07-01 US US16/458,777 patent/US20200006413A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002334987A (ja) * | 2000-12-20 | 2002-11-22 | General Electric Co <Ge> | イメージャ・アレイの製造方法 |
JP2006165530A (ja) * | 2004-11-10 | 2006-06-22 | Canon Inc | センサ及び非平面撮像装置 |
JP2011211697A (ja) * | 2010-03-08 | 2011-10-20 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
JP2012169517A (ja) * | 2011-02-16 | 2012-09-06 | Seiko Epson Corp | 光電変換装置、電子機器 |
JP2017157816A (ja) * | 2016-03-01 | 2017-09-07 | ソニー株式会社 | 撮像素子、積層型撮像素子及び固体撮像装置、並びに、固体撮像装置の駆動方法 |
Also Published As
Publication number | Publication date |
---|---|
US20200006413A1 (en) | 2020-01-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9343501B2 (en) | Photoelectric conversion apparatus, manufacturing method of photoelectric conversion apparatus, and electronic device | |
CN106449861B (zh) | 光传感器元件和光电转换装置 | |
US10861996B2 (en) | Near-infrared light sensors including 2-dimensional insulator | |
CN110364542B (zh) | 有源矩阵基板和具备有源矩阵基板的x射线摄像面板 | |
CN101615620B (zh) | 半导体装置以及电子设备 | |
JP5441643B2 (ja) | 光センサー、光センサーアレイ、光センサーの駆動方法、及び光センサーアレイの駆動方法 | |
US11515346B2 (en) | Touch screen panel for sensing touch using TFT photodetectors integrated thereon | |
US9496433B2 (en) | Photoelectric conversion device and method for manufacturing photoelectric conversion device | |
TW201610459A (zh) | 攝像面板、攝像面板之製造方法、及x射線攝像裝置 | |
CN110100311B (zh) | 摄像面板及其制造方法 | |
JP6443061B2 (ja) | 光電変換装置、光電変換装置の製造方法、及び電子機器 | |
EP3029741B1 (en) | Photoelectric conversion device | |
CN105679847B (zh) | 光电转换装置、光电转换装置的制造方法及电子设备 | |
US20200006413A1 (en) | Photoelectric conversion device, electronic apparatus, and method for manufacturing photoelectric conversion device | |
JP2014204053A (ja) | 光電変換装置、光電変換装置の製造方法、及び電子機器 | |
CN107039474A (zh) | 光电转换元件及其制造方法以及光电转换装置 | |
JP2019009367A (ja) | 光電変換装置の製造方法、光電変換装置、および電子機器 | |
JP2015056512A (ja) | 光電変換装置及びその製造方法並びに電子機器 | |
JP2015056484A (ja) | 光電変換装置、光電変換装置の製造方法及び電子機器 | |
US20180097027A1 (en) | Imaging panel and x-ray imaging device including same | |
JP2017212417A (ja) | 光電変換素子の製造方法 | |
JP2017212418A (ja) | 光電変換素子、光電変換装置および光電変換素子の製造方法 | |
JP2019153709A (ja) | 光電変換装置および電子機器 | |
CN113054051A (zh) | 检测器件及其制备方法、光电传感器和显示装置 | |
JP2019009207A (ja) | 光電変換装置、光電変換装置の製造方法、および電子機器 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD05 | Notification of revocation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7425 Effective date: 20180910 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20181120 |
|
RD07 | Notification of extinguishment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7427 Effective date: 20200810 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210521 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20210917 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20211108 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20220421 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220524 |
|
A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20220725 |